NO894009L - Fotobilleddannede sammensetning og toerrfilm dannet derfra. - Google Patents

Fotobilleddannede sammensetning og toerrfilm dannet derfra.

Info

Publication number: NO894009L
Authority: NO; Norway
Prior art keywords: dry; carboxyl groups; photoimageable composition; metal; photographic composition
Prior art date: 1988-10-07

Application number

NO89894009A

Other languages

English (en)

Other versions

NO894009D0 (no

Inventor

Melvin Alan Lipson

Thomas Paul Carter

James Garhard Shelnut

Leo Roos

Original Assignee

Thiokol Morton Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-10-07

Filing date

1989-10-06

Publication date

1990-04-09

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=22968948&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=NO894009(L) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1989-10-06 Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc

1989-10-06 Publication of NO894009D0 publication Critical patent/NO894009D0/no

1990-04-09 Publication of NO894009L publication Critical patent/NO894009L/no

Links

125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 3
239000002184 metal Substances 0.000 abstract 3
229920000642 polymer Polymers 0.000 abstract 3
239000013522 chelant Substances 0.000 abstract 2
239000011230 binding agent Substances 0.000 abstract 1
229910021645 metal ion Inorganic materials 0.000 abstract 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/155—Nonresinous additive to promote interlayer adhesion in element

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Compositions Of Macromolecular Compounds (AREA)
Photoreceptors In Electrophotography (AREA)
Materials For Photolithography (AREA)
Detergent Compositions (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Paints Or Removers (AREA)
Thermal Transfer Or Thermal Recording In General (AREA)
Inks, Pencil-Leads, Or Crayons (AREA)
Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Manufacturing Of Printed Circuit Boards (AREA)
Non-Metallic Protective Coatings For Printed Circuits (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

NO89894009A 1988-10-07 1989-10-06 Fotobilleddannede sammensetning og toerrfilm dannet derfra. NO894009L (no)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US07/255,579 US4943513A (en)	1988-10-07	1988-10-07	Photoimageable composition with reduced cold flow due to salt-bridging by metal ions and dry film formed therefrom

Publications (2)

Publication Number	Publication Date
NO894009D0 NO894009D0 (no)	1989-10-06
NO894009L true NO894009L (no)	1990-04-09

Family

ID=22968948

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO89894009A NO894009L (no)	1988-10-07	1989-10-06	Fotobilleddannede sammensetning og toerrfilm dannet derfra.

Country Status (10)

Country	Link
US (1)	US4943513A (no)
EP (1)	EP0363210B1 (no)
JP (1)	JPH02222953A (no)
KR (1)	KR930010773B1 (no)
AT (1)	ATE120287T1 (no)
AU (1)	AU610761B2 (no)
CA (1)	CA1334634C (no)
DE (1)	DE68921836T2 (no)
DK (1)	DK494889A (no)
NO (1)	NO894009L (no)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5656163A (en) *	1987-01-30	1997-08-12	Baxter International Inc.	Chamber for use in a rotating field to separate blood components
US5415749A (en) *	1994-03-04	1995-05-16	E. I. Du Pont De Nemours And Company	Process for electrodeposition of resist formulations which contain metal salts of β-diketones
US5512607A (en) *	1995-06-06	1996-04-30	W. R. Grace & Co.-Conn.	Unsaturated epoxy ester with quaternary ammonium and phosphate groups
WO1996041240A1 (en) *	1995-06-07	1996-12-19	W.R. Grace & Co.-Conn.	Water photoresist emulsions and methods of preparation thereof
US6551756B1 (en) *	2000-07-24	2003-04-22	Napp Systems, Inc.	Solvent-developable printing formulations with improved processing characteristics
EP1877863A2 (en) *	2005-04-14	2008-01-16	The President and Fellows of Harvard College	Adjustable solubility in sacrificial layers for microfabrication
US8007982B2 (en) *	2006-12-20	2011-08-30	Sony Corporation	Optical information recording medium
TWI491981B (zh) *	2009-11-04	2015-07-11	Sumitomo Chemical Co	Coloring the photosensitive resin composition
JP6417669B2 (ja) *	2013-03-05	2018-11-07	東レ株式会社	感光性樹脂組成物、保護膜及び絶縁膜並びにタッチパネルの製造方法
US12509570B2 (en) *	2020-12-11	2025-12-30	Autonetworks Technologies, Ltd.	Metal-containing additive, crosslinkable polymer composition, crosslinked polymer material, metal member, and wire harness

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3016297A (en) *	1956-02-13	1962-01-09	Du Pont	Photopolymerizable compositions comprising polymeric chelates and their use in the preparation of reliefs
DE2106574A1 (de) *	1970-03-03	1971-09-23	Shpley Co Inc	Lichtempfindliches Laminat
JPS5035529B2 (no) *	1972-09-19	1975-11-17
US4284744A (en) *	1976-08-16	1981-08-18	Hitco	Polymers containing chemically bonded metal atoms
JPS53111719A (en) *	1977-03-11	1978-09-29	Nitto Electric Ind Co	Method of forming material
US4332879A (en) *	1978-12-01	1982-06-01	Hughes Aircraft Company	Process for depositing a film of controlled composition using a metallo-organic photoresist
JPS59204036A (ja) *	1983-05-06	1984-11-19	Dainippon Ink & Chem Inc	レジストパタ−ンの形成法
US4513076A (en) *	1983-05-24	1985-04-23	Gaf Corporation	Electron beam sensitive resist
US4693957A (en) *	1985-03-14	1987-09-15	The United States Of America As Represented By The Secretary Of The Navy	Transition and inner transition metal chelate polymers for high energy resist lithography
CA1317811C (en) *	1986-04-30	1993-05-18	Richard Douglas Bauer	Photohardenable mixture
JPS64949A (en) *	1987-06-23	1989-01-05	Fuji Photo Film Co Ltd	Photopolymerizable composition
US4950696A (en) *	1987-08-28	1990-08-21	Minnesota Mining And Manufacturing Company	Energy-induced dual curable compositions
AU638258B2 (en) *	1990-06-21	1993-06-24	Edward L Weller III	Photoimaging process using water removable coatings

1988
- 1988-10-07 US US07/255,579 patent/US4943513A/en not_active Expired - Fee Related
1989
- 1989-09-15 CA CA000611570A patent/CA1334634C/en not_active Expired - Fee Related
- 1989-10-05 EP EP89310232A patent/EP0363210B1/en not_active Revoked
- 1989-10-05 AT AT89310232T patent/ATE120287T1/de not_active IP Right Cessation
- 1989-10-05 AU AU42620/89A patent/AU610761B2/en not_active Expired - Fee Related
- 1989-10-05 DE DE68921836T patent/DE68921836T2/de not_active Revoked
- 1989-10-06 DK DK494889A patent/DK494889A/da not_active Application Discontinuation
- 1989-10-06 NO NO89894009A patent/NO894009L/no unknown
- 1989-10-06 KR KR1019890014348A patent/KR930010773B1/ko not_active Expired - Fee Related
- 1989-10-06 JP JP1260374A patent/JPH02222953A/ja active Pending

Also Published As

Publication number	Publication date
ATE120287T1 (de)	1995-04-15
NO894009D0 (no)	1989-10-06
AU4262089A (en)	1990-04-12
KR930010773B1 (ko)	1993-11-10
DE68921836D1 (de)	1995-04-27
CA1334634C (en)	1995-03-07
DK494889A (da)	1990-04-08
EP0363210B1 (en)	1995-03-22
EP0363210A3 (en)	1990-12-05
DE68921836T2 (de)	1995-07-27
AU610761B2 (en)	1991-05-23
US4943513A (en)	1990-07-24
EP0363210A2 (en)	1990-04-11
JPH02222953A (ja)	1990-09-05
KR900006813A (ko)	1990-05-08
DK494889D0 (da)	1989-10-06

Publication	Publication Date	Title
JPS5374532A (en)	1978-07-03	Fluororesin coating composition
JPS51129449A (en)	1976-11-11	Multi-layered polymeric composition
JPS5331106A (en)	1978-03-24	Information recording member
NO894009L (no)	1990-04-09	Fotobilleddannede sammensetning og toerrfilm dannet derfra.
BE858913A (fr)	1978-01-16	Membranes bipolaires a film unique contenant au moins 15% d'un polymere aromatique reticule
DE69109978D1 (de)	1995-06-29	Mit einer Fluor und Si-enthaltenden Gleit-Beschichtung überzogene Aufzeichnungs- und Wiedergabegevorrichtung.
FR2464287B1 (fr)	1985-06-21	Composition polymerique ternaire a base de polycarbonate, copolymere d'acrylate et de copolymere butadiene-styrene
KR840004589A (ko)	1984-10-22	포지티브형(positive type) 감광성 내식막 조성물
JPS5330635A (en)	1978-03-23	Elastic coating composition
JPS5373228A (en)	1978-06-29	Composition for forming heat-resistant coating film
IT8223291A0 (it)	1982-09-15	Procedimento e composizione per rivestire un substrato metallico con un film polimerico.
JPS5384036A (en)	1978-07-25	Formation of protecting film
JPS52115839A (en)	1977-09-28	Weather resistant adhesive film
JPS5331112A (en)	1978-03-24	Magnetic tape
JPS52127332A (en)	1977-10-25	Connection of photographic film
BE875577A (fr)	1979-07-31	Duplicateur sur pellicule
KR860003586A (ko)	1986-05-26	자기 테이프
KR890013614A (ko)	1989-09-25	자기 디스크
JPS51134728A (en)	1976-11-22	Powdered coating composition
JPS527389A (en)	1977-01-20	Photochromic film composition
JPS5256140A (en)	1977-05-09	Adhesive tapes
SU652197A1 (ru)	1979-03-15	Полимерна композици
JPS52105957A (en)	1977-09-06	Polycarbonate resin composition
JPS528807A (en)	1977-01-24	Magnetic recording medium
JPS53111558A (en)	1978-09-29	Cooler