EP0000995A1 - Apparat und Verfahren zur kontrollierten Behandlung von strahlungsempfindlichen Vorrichtungen in Abhängigkeit von der Entwicklertemperatur - Google Patents

Apparat und Verfahren zur kontrollierten Behandlung von strahlungsempfindlichen Vorrichtungen in Abhängigkeit von der Entwicklertemperatur Download PDF

Info

Publication number
EP0000995A1
EP0000995A1 EP78300279A EP78300279A EP0000995A1 EP 0000995 A1 EP0000995 A1 EP 0000995A1 EP 78300279 A EP78300279 A EP 78300279A EP 78300279 A EP78300279 A EP 78300279A EP 0000995 A1 EP0000995 A1 EP 0000995A1
Authority
EP
European Patent Office
Prior art keywords
developer liquid
temperature
developer
plate
dependent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP78300279A
Other languages
English (en)
French (fr)
Other versions
EP0000995B1 (de
Inventor
Leslie Edward Lawson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
Vickers Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB34796/77A external-priority patent/GB1599301A/en
Application filed by Vickers Ltd filed Critical Vickers Ltd
Publication of EP0000995A1 publication Critical patent/EP0000995A1/de
Application granted granted Critical
Publication of EP0000995B1 publication Critical patent/EP0000995B1/de
Expired legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
    • G03D13/006—Temperature control of the developer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D13/00—Processing apparatus or accessories therefor, not covered by groups G11B3/00 - G11B11/00
    • G03D13/007—Processing control, e.g. test strip, timing devices

Definitions

  • Such radiation sensitive devices are used in the production of, for example, printing plates, in particular lithographic printing plates; printed circuits; and integrated circuits.
  • Radiation sensitive devices for use in the production of lithographic printing plates usually consist of a substrate in the form of a metallic support sheet, which is mechanically and/or chemically treated to provide a suitable working surface and which carries the radiation sensitive coating.
  • the device is image-wise exposed to actinic radiation using either a negative or a positive transparency of an appropriate subject. The effect of actinic radiation is to alter the solubility of the radiation-sensitive coating.
  • the image-wise exposed device is then processed.
  • an apparatus for processing an image-wise exposed radiation sensitive device which apparatus comprises
  • the apparatus additionally includes a source of actinic radiation arranged in or adjacent to the apparatus so that the processing also involves the step of subjecting the device to an overall uniform exposure prior to or during its contact with developer liquid.
  • a source of actinic radiation arranged in or adjacent to the apparatus so that the processing also involves the step of subjecting the device to an overall uniform exposure prior to or during its contact with developer liquid.
  • the degree to which the device is subjected to radiation from said source may be controlled in dependence on said output signal. This may conveniently be effected by interposing a variable aperture between the source and the path and regulating the size of the aperture in dependence on said output signal.
  • Positive working radiation-sensitive devices typified by quinone diazide sensitised devices are used in the technique known as 'screenless lithography' i.e. the technique in which the device is exposed directly through a continuous tone master, without the use of the conventional half tone screen. Processing the plate by subjecting it to an overall exposure before developing increases the range of tones that can be obtained. Again, however, it is difficult to obtain predictable and repeatable results when this is done manually.
  • An apparatus of the invention including a source of actinic radiation as aforesaid can be used to process these plates, variations in the tonal range being produced by varying the duration of the intensity of the overall exposure. Alternatively if it is desired to keep these parameters constant, the tonal range can be varied by altering the speed at which the plates pass the radiation source. Clearly, variation of exposure duration and intensity and variation of plate speed can be combined to give better control of the tonal range.
  • the apparatus comprises a tank 1 for containing developer liquid, a pair of rubber covered input rollers 2 and 2a, a pair of rubber covered output rollers 3 and 3a and a d.c. electric motor 4 connected to drive the roller 2.
  • Roller 2a is driven by contact with roller 2.
  • the rollers 3, 3a may also be driven from the motor 4 if desired).
  • a temperature sensitive member in the form of a probe 5 containing a thermistor is mounted in the tank 1 so as to lie in the developer.
  • the electrical control circuit consists of a constant voltage source 9 in the form of an integrated circuit voltage regulator, a temperature voltage converter 10 incorporating the thermistor, and a servodevice 11 in the form of a d.c. thyristor controller, the output of which controls the speed of the motor 4.
  • the regulated voltage from the source 9 is fed through the thermistor 12 to a pair of d.c. amplifiers 13 and 14. Variation in the temperature of the thermistor 12 causes a change in its resistance which in turn produces a change in the input voltage to the amplifier 13.
  • the output of the amplifier 14 is connected to the servo device 11.
  • a variable resistor 15 is provided to vary the gain of the amplifier 13.
  • the temperature compensation that will be suitable for one combination of radiation sensitive coating and developer liquid will not necessarily be suitable for another. Suitable variation of the change in motor speed with temperature may be obtained by adjusting the potentiometer 15. Further, in the case of a given radiation sensitive coating/developer liquid combination the potentiometer 15 may be adjusted to vary the contrast of the developed plate. Moreover, the setting of thepotentiometer 15 may be varied to allow for an alteration in the activity of the developer liquid as a result of partial exhaustion.
  • the apparatus includes a pair of rubber covered input rollers 20 and 20a, a pair of rubber covered output rollers 30 and 30a, and a d.c. electric motor 40 for driving the rollers 20 and 20a.
  • the apparatus includes a separate reservoir 21 for developer liquid and a pump 25 for delivering developer liquid to a spray bar 26 located between a pair of plush covered rollers 23 and 23a driven by a separate motor 24.
  • a planar member 22 is located under the rollers 23 and 23a and bar 26 and a catch tray 27 is provided to return developer liquid to the reservoir 21.
  • the apparatus includes a temperature sensitive probe 28 similar to that of the apparatus of Figure 1 and this is preferably located in the reservoir 21 as shown.
  • the apparatus also includes an electrical control circuit of the type shown in Figures 2 and 3 and the output from the servo device of the circuit is fed to motor 40 and/or motor 24.
  • an image-wise exposed radiation sensitive plate is fed face upwards along a path between the input rollers 20 and 20a, between the rollers 23 and 23a and the member 22, and then between the output rollers 30 and 30a.
  • the exposed radiation sensitive coating of the plate is contacted by the rollers 23 and 23a and development is carried out by a combined scrubbing and solvent action.
  • the arrangement is such that with increased developer liquid temperature, (i) motor 40 (and hence rollers 20 and 20a) rotate faster and hence the residence time of the plate in the apparatus is shorter and (ii) motor 24 (and hence rollers 23 and 23a) rotate slower and hence the developer liquid on the exposed coating is subjected to a less severe agitation.
  • the degree to which the plate is processed is thus dependent on the temperature of the developer liquid and, as in the case of the apparatus of Figures 1 to 3, this relationship can be adjusted as desired.
  • the apparatus comprises a tank 41 forcontaining the developer liquid and a pair of rubber covered input rollers 42 and 42a and a pair of rubber covered output rollers 43 and 43a defining a path 46 through the apparatus.
  • An electric motor 44 is included to drive the roller 42, roller 42a being frictionally driven by roller 42.
  • the rollers 43 and 43a may also be driven from the motor 44 if desired.
  • the apparatus also includes a means of subjecting radiation sensitive plates passing along the path 46 to an overall uniform exposure to actinic radiation. Preferably, this is in the form of a plurality of sources of actinic radiation and/or one or more moveable sources so that the apparatus can be used to process plates requiring to be subjected to an overall exposure from different positions.
  • references 45a to 45e Examples of suitable positions are denoted by references 45a to 45e.
  • the positions 45d and 45e are usable when the plate is being processed face down. In the case of position 45e the tank must, of course, be translucent.
  • a means (not shown) is provided to sense the presence of a plate along said path 46 and to actuate the source of actinic radiation when the plate reaches a position along the path 46 at which it can receive radiation from the source. (Alternatively, the source may be actuated manually when the plate reaches a suitable position along the path).
  • a temperature sensitive member in the form of a probe 31 containing a thermistor is mounted in the tank 41 so as to lie in the developer liquid.
  • the thermistor forms part of a control circuit of the type described with reference to Figures 2 and 3 and is operably connected to the motor 44 so that the speed of the motor increases (and hence the residence time of the plate decreases) with increase in developer temperature.
  • the thermistor may be operably connected to a means of regulating a variable aperture (e.g. in the form of a slit of adjustable width forming, for example, a part of a shutter mechanism) located between the radiation source and the plate path.
  • an image-wise exposed radiation sensitive plate is fed into the input rollers 42 and 42a which move the same along the path 46 through the apparatus and then out of the apparatus via output rollers 43 and 43a.
  • the plate is submerged in the developer liquid in the tank 41 whereby the more soluble areas of the image wise exposed radiation sensitive coating of the plate are selectively removed.
  • the residence time of the plate is controlled in dependence on the developer liquid temperature. As the plate passes the source of actinic radiation the whole surface of the plate is exposed. In the case where the apparatus includes a variable aperture as above described, this too is regulated in dependence on the temperature of the developer liquid in order to give the plate a desired overall exposure dependent on said temperature.
  • the source of actinic radiation may be of any suitable type, for example a mercury halide lamp, a pulsed xenon lamp or an ultra violet lamp.
  • the apparatus may include one or more filters and a means of interposing the same between the plate path and the source as appropriate in dependence on said temperature so that the amount of radiation reaching the plate during the overall exposure is dependent on the temperature of the developer liquid.
  • FIG. 6 parts corresponding to parts of the apparatus of Figure 5 are denoted by like reference numerals.
  • the apparatus is identical to that of Figure 5 except that the probe 31 is not operably connected to motor 44.
  • the probe 31 is operably connected to a means 50 of regulating the amount of radiation reaching the plate from the radiation source (45a) so that the degree to which the plate is given a uniform overall exposure as it passes through the apparatus is controlled in dependence on the developer liquid temperature.
  • Means 50 is shown schematically in Figure 6. It may, for example, be in the form of a controllable aperture located between the source and the plate path. Such an arrangement is illustrated in Figure 7a.
  • the source includes a tubular lamp 55 located within a casing 56 having a slit arranged transversely with respect to the path such that radiation from the source can impinge on plates passing along the plate path.
  • Shutters 57 are mounted at the sides of the slit and co-operate with the slit to provide a variable aperture for the source.
  • the shutters are displaceable towards one another so as to reduce the size of the aperture (and hence reduce the amount of radiation reaching the path) or away from one another so as to increase the size of the aperture (and hence increase the amount of radiation reaching the path).
  • Each shutter 57 carries a rack which is engaged by a pinion 58 driven by a motor (not shown) so as to displace the shutters 57.
  • the motor is operably connected to the probe immersed in the developer liquid in a manner such that the degree to which the pinion is rotated (andlence the size of the aperture)is dependent on the output signal generated by the probe and its associated circuitry. In this way, the amount of radiation to which the plates are subjected is determined by the developer liquid temperature.
  • the means 50 may be in the form of a plurality of filters arranged to be selectively interposed between the source and the plate path.
  • a displaceable radiation filter 59 which comprises adjacent portions of differing radiation transmittance.
  • the filter 59 carries a rack which is engaged by the pinion 58. Rotation of the pinion causes the filter 59 to be displaced across the slit so that one or other of its portions is interposed between the source and the path. The amount of radiation reaching the path is dependent on which of these portions is interposed between the source and the path.
  • the image-wise exposed radiation sensitive plate is placed on the member 22 face upwards.
  • the plate may be placed in position manually or automatically).
  • Developer liquid is sprayed onto the plate from a plurality of spray bars 26' arranged so that the entire surface of the stationary plate is contacted with developer liquid.
  • the liquid line carrying developer liquid from the reservoir 21 to the spray bars 26' includes a valve 60 actuated by a timer 61 operably connected to the output signal generated by the probe 28 and its associated circuitry. The arrangement is such that the period of time during which developer liquid issues from the spray bars 26' is dependent on the developer liquid temperature.
  • the apparatus of the present invention provides several advantages over conventional processors. It is possible to obtain repeatable plate processing accurately without having to monitor and adjust the working temperature of the developer, which thus can always be at the ambient temperature. Time is saved when the developer temperature is low e.g. at the start of processing in a cold environment, as it is not necessary to wait until the developer is heated to the normal working temperature as is the case with conventional developers. Further, in the case where the ambient temperature is higher than the normal working temperature, there is no need to provide a means of cooling the developer. This is particularly important in the case of large processors containing 30 or 40 litres of developer.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photographic Developing Apparatuses (AREA)
EP78300279A 1977-08-18 1978-08-11 Apparat und Verfahren zur kontrollierten Behandlung von strahlungsempfindlichen Vorrichtungen in Abhängigkeit von der Entwicklertemperatur Expired EP0000995B1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
GB34796/77A GB1599301A (en) 1977-08-18 1977-08-18 Processing of radiation sensitive devices
GB840278 1978-03-02
GB840278 1978-03-02
GB3479677 1978-05-26

Publications (2)

Publication Number Publication Date
EP0000995A1 true EP0000995A1 (de) 1979-03-07
EP0000995B1 EP0000995B1 (de) 1981-12-16

Family

ID=26242148

Family Applications (1)

Application Number Title Priority Date Filing Date
EP78300279A Expired EP0000995B1 (de) 1977-08-18 1978-08-11 Apparat und Verfahren zur kontrollierten Behandlung von strahlungsempfindlichen Vorrichtungen in Abhängigkeit von der Entwicklertemperatur

Country Status (10)

Country Link
US (1) US4240737A (de)
EP (1) EP0000995B1 (de)
JP (1) JPS5456431A (de)
AU (1) AU520944B2 (de)
CA (1) CA1109315A (de)
DE (1) DE2861444D1 (de)
DK (1) DK363178A (de)
IT (1) IT1098107B (de)
NO (1) NO146379C (de)
NZ (1) NZ188167A (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2465254A1 (fr) * 1979-09-10 1981-03-20 Dainippon Screen Mfg Procede de developpement uniforme d'une pellicule photographique pour machine de developpement automatique
EP0362896A3 (de) * 1988-10-07 1991-07-17 Fuji Photo Film Co., Ltd. Automatisches Filmentwicklungsgerät
KR100681400B1 (ko) * 2000-09-28 2007-02-09 가부시키가이샤 오하라 글라스 세라믹 및 온도보상 부재
US20110290381A1 (en) * 2008-11-21 2011-12-01 Hydro Aluminium Deutschland Gmbh Aluminium Strip for Lithographic Printing Plate Supports With High Flexural Fatigue Strength

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3020976C2 (de) * 1980-06-03 1983-01-27 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Verfahren zur Erhöhung der Verarbeitungsbreite von lichthärtbaren Aufzeichnungsmaterialien
DE8028682U1 (de) * 1980-10-28 1981-02-12 Hoechst Ag, 6000 Frankfurt Entwicklungsgeraet
US4505565A (en) * 1981-12-22 1985-03-19 Hiroshi Tanaka Device for detecting aging of developer for automatic film developing apparatus
US4600287A (en) * 1982-07-30 1986-07-15 Dainippon Screen Seizo Kabushiki Kaisha Method and device for automatically developing photosensitive material
DE3381022D1 (de) * 1982-10-21 1990-02-01 Vickers Plc Verarbeitung von lichtempfindlichen vorrichtungen.
US4740074A (en) * 1987-10-30 1988-04-26 Powell Charles S Film development system
JPH0795191B2 (ja) * 1988-08-19 1995-10-11 富士写真フイルム株式会社 写真現像装置
US4994837A (en) * 1990-03-16 1991-02-19 Eastman Kodak Company Processor with temperature responsive film transport lockout
JPH05190583A (ja) * 1992-01-16 1993-07-30 Fujitsu Ltd 半導体装置の製造方法
GB9415430D0 (en) * 1994-07-30 1994-09-21 Kodak Ltd Method of processing photographic silver halide materials
GB9600112D0 (en) * 1996-01-04 1996-03-06 Kodak Ltd Improvements in or relating to photographic processsing apparatus
GB0026953D0 (en) * 2000-11-03 2000-12-20 Eastman Kodak Co Processing photographic material
JP4704757B2 (ja) * 2005-01-05 2011-06-22 三菱製紙株式会社 導電性パタンを形成するための処理方法及びその処理装置
WO2017220170A1 (en) * 2016-06-24 2017-12-28 Hewlett-Packard Development Company, L.P. Connection determination in printing apparatus

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1098362B (de) * 1957-04-18 1961-01-26 Meteor Appbau Paul Schmeck G M Vorrichtung zum Einstellen der Verdampfungsgeschwindigkeit von Verdampfungsvorrichtungen fuer Ammoniakloesung
US3144334A (en) * 1958-04-24 1964-08-11 Ozalid Co Ltd Method of developing photographic materials by means of gases or vapours and to apparus for carrying the method into effect
US3147687A (en) * 1961-10-05 1964-09-08 Ozalid Co Ltd Method of and apparatus for the development of light sensitive diazotype materials
US3174420A (en) * 1963-04-22 1965-03-23 Aizawa Tatsuo Automatic electronic control system in the continuous printing and ammonia gas developing machine for sensitive papers
DE1271545B (de) * 1963-11-29 1968-06-27 Eastman Kodak Co Vorrichtung zur Anzeige der bei einer bestimmten Temperatur einzuhaltenden Solldrehzahl eines mit einem Antriebsglied von Filmentwicklungsvorrichtungen gekuppelten Koerpers
BE771221A (fr) * 1971-08-12 1971-12-16 Oussatoff Victor Ensemble electronique a temps variable et asservi a la temperature de traitement chimique, pour la photographie en couleurs
DE2523228B1 (de) * 1975-05-26 1976-03-11 Hoechst Ag Lichtpausmaschine mit einer einrichtung zum austreiben ueberschuessigen, ammoniakhaltigen entwicklermediums aus entwickeltem diazopapier

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2794377A (en) * 1954-05-12 1957-06-04 Polaroid Corp Self-developing camera, including temperature-compensated timing means
US3133490A (en) * 1961-01-19 1964-05-19 Arthur W Buck Apparatus for developing radiographic films
GB1198073A (en) * 1966-08-26 1970-07-08 Agfa Gevaert Nv Photographic Processing Device
DE1772512A1 (de) * 1968-05-28 1971-12-02 Ewald Puls Vorrichtung zum selbsttaetigen Entwickeln von Druckplatten
US3623416A (en) * 1968-06-24 1971-11-30 Claes Johan Anderberg Processing system for photographic material
US4081211A (en) * 1973-05-25 1978-03-28 Canon Kabushiki Kaisha Processing condition control system for a multi-purpose film handling cartridge
GB1476559A (en) * 1974-05-28 1977-06-16 Hoechst Ag Apparatus for developing electrophotographic materials
DE2438179A1 (de) * 1974-08-08 1976-02-19 Agfa Gevaert Ag Vorrichtung zur temperierung einer hochviskosen paste
DE2714335A1 (de) * 1976-04-13 1977-11-03 Morenar Sa Vorrichtung zur automatischen behandlung von belichteten fotopapierblaettern
DE2616869C2 (de) * 1976-04-15 1984-08-23 Agfa-Gevaert Ag, 5090 Leverkusen Heizeinrichtung für das Behandlungsbad einer Durchlauf-Entwicklungsmaschine
US4128326A (en) * 1977-06-02 1978-12-05 Astro Engineering Co. Chemical dispensing system
US4153363A (en) * 1977-11-07 1979-05-08 Cordell Engineering, Inc. Batch developing

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1098362B (de) * 1957-04-18 1961-01-26 Meteor Appbau Paul Schmeck G M Vorrichtung zum Einstellen der Verdampfungsgeschwindigkeit von Verdampfungsvorrichtungen fuer Ammoniakloesung
US3144334A (en) * 1958-04-24 1964-08-11 Ozalid Co Ltd Method of developing photographic materials by means of gases or vapours and to apparus for carrying the method into effect
US3147687A (en) * 1961-10-05 1964-09-08 Ozalid Co Ltd Method of and apparatus for the development of light sensitive diazotype materials
US3174420A (en) * 1963-04-22 1965-03-23 Aizawa Tatsuo Automatic electronic control system in the continuous printing and ammonia gas developing machine for sensitive papers
DE1271545B (de) * 1963-11-29 1968-06-27 Eastman Kodak Co Vorrichtung zur Anzeige der bei einer bestimmten Temperatur einzuhaltenden Solldrehzahl eines mit einem Antriebsglied von Filmentwicklungsvorrichtungen gekuppelten Koerpers
BE771221A (fr) * 1971-08-12 1971-12-16 Oussatoff Victor Ensemble electronique a temps variable et asservi a la temperature de traitement chimique, pour la photographie en couleurs
DE2523228B1 (de) * 1975-05-26 1976-03-11 Hoechst Ag Lichtpausmaschine mit einer einrichtung zum austreiben ueberschuessigen, ammoniakhaltigen entwicklermediums aus entwickeltem diazopapier

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2465254A1 (fr) * 1979-09-10 1981-03-20 Dainippon Screen Mfg Procede de developpement uniforme d'une pellicule photographique pour machine de developpement automatique
EP0362896A3 (de) * 1988-10-07 1991-07-17 Fuji Photo Film Co., Ltd. Automatisches Filmentwicklungsgerät
US5148206A (en) * 1988-10-07 1992-09-15 Fuji Photo Film Co., Ltd. Automatic film processor using ultrasonic wave generators
KR100681400B1 (ko) * 2000-09-28 2007-02-09 가부시키가이샤 오하라 글라스 세라믹 및 온도보상 부재
US20110290381A1 (en) * 2008-11-21 2011-12-01 Hydro Aluminium Deutschland Gmbh Aluminium Strip for Lithographic Printing Plate Supports With High Flexural Fatigue Strength

Also Published As

Publication number Publication date
NO146379B (no) 1982-06-07
AU520944B2 (en) 1982-03-11
AU3906578A (en) 1980-02-21
JPS6236214B2 (de) 1987-08-06
NZ188167A (en) 1983-02-15
JPS5456431A (en) 1979-05-07
NO782797L (no) 1979-02-20
CA1109315A (en) 1981-09-22
IT1098107B (it) 1985-09-07
NO146379C (no) 1982-09-15
US4240737A (en) 1980-12-23
DE2861444D1 (en) 1982-02-11
EP0000995B1 (de) 1981-12-16
IT7826826A0 (it) 1978-08-18
DK363178A (da) 1979-02-19

Similar Documents

Publication Publication Date Title
US4240737A (en) Processing of radiation sensitive devices
EP0107454B1 (de) Verarbeitung von lichtempfindlichen Vorrichtungen
US3640712A (en) Hydrophilic-hydrophobic photon-sensitive medium
US4573782A (en) Developing apparatus for forming an image in light-sensitive material using photopolymerizable composition
AU8836691A (en) Photosensitive polymeric printing medium and water developable printing plates
US2058396A (en) Photoink printing
US5467165A (en) Masking of photographs for reproduction
GB1599301A (en) Processing of radiation sensitive devices
GB2041569A (en) Apparatus and method for developing radiation sensitive devices
JPS6129494B2 (de)
GB1109131A (en) Methods of adding information to data storage media
GB1393558A (en) Method of and apparatus for developing photosensitive material
US3222175A (en) Process for forming metallic nonsilver images
GB1197974A (en) A Photolithographic Printing Process
US3666648A (en) In-situ reclamation of master patterns for printing microcircuit images on reversely sensitized material
US3424582A (en) Data processing system
EP0623853B1 (de) Negativ sowie positiv arbeitende, in einem Schritt entwickelbare Druckplatte sowie Bilderzeugungsverfahren
US3551049A (en) Photographic method for producing a copy and apparatus for carrying out this method
US3634084A (en) Multiple light flash photographic process
JPS58194033A (ja) パレスレ−ザ−光による直接製版法及びその装置
US3196016A (en) Photocomposing process for the production of process copies without use of a layout
US957596A (en) Process for producing printing-plates.
JPS5654440A (en) Photosensitive lithographic material and plate making method
US3375111A (en) Preparation of printing plates and cylinders with resist-forming film used directly in a camera
JP2761605B2 (ja) 感材処理装置

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Designated state(s): BE CH DE FR LU NL SE

17P Request for examination filed
GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Designated state(s): BE CH DE FR LU NL SE

REF Corresponds to:

Ref document number: 2861444

Country of ref document: DE

Date of ref document: 19820211

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19820831

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: SE

Payment date: 19900716

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 19900720

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 19900723

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: LU

Payment date: 19900730

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 19900831

Year of fee payment: 13

REG Reference to a national code

Ref country code: FR

Ref legal event code: TP

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 19910708

Year of fee payment: 14

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 19910729

Year of fee payment: 14

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Effective date: 19910812

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Effective date: 19910831

Ref country code: BE

Effective date: 19910831

REG Reference to a national code

Ref country code: FR

Ref legal event code: CD

NLT1 Nl: modifications of names registered in virtue of documents presented to the patent office pursuant to art. 16 a, paragraph 1

Owner name: VICKERS PLC TE LONDEN, GROOT-BRITTANNIE.

NLS Nl: assignments of ep-patents

Owner name: E.I. DU PONT DE NEMOURS AND COMPANY TE WILMINGTON,

BERE Be: lapsed

Owner name: E.I. DU PONT DE NEMOURS AND CY

Effective date: 19910831

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Effective date: 19920301

NLV4 Nl: lapsed or anulled due to non-payment of the annual fee
REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Effective date: 19930430

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Effective date: 19930501

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

EUG Se: european patent has lapsed

Ref document number: 78300279.3

Effective date: 19920306

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT