EP0115006A1 - Procédé de fabrication de corps poreux métallisés - Google Patents
Procédé de fabrication de corps poreux métallisés Download PDFInfo
- Publication number
- EP0115006A1 EP0115006A1 EP19830112721 EP83112721A EP0115006A1 EP 0115006 A1 EP0115006 A1 EP 0115006A1 EP 19830112721 EP19830112721 EP 19830112721 EP 83112721 A EP83112721 A EP 83112721A EP 0115006 A1 EP0115006 A1 EP 0115006A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- metal
- metallized
- groups
- porous
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims description 21
- 230000008569 process Effects 0.000 title claims description 8
- 239000007787 solid Substances 0.000 claims abstract description 34
- 150000002500 ions Chemical class 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 9
- 238000011068 loading method Methods 0.000 claims abstract description 8
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 4
- 230000000737 periodic effect Effects 0.000 claims abstract description 4
- 239000003054 catalyst Substances 0.000 claims abstract description 3
- 229910001428 transition metal ion Inorganic materials 0.000 claims abstract description 3
- 238000005984 hydrogenation reaction Methods 0.000 claims abstract 2
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 230000004913 activation Effects 0.000 claims description 11
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 10
- 229910052763 palladium Inorganic materials 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- 150000002902 organometallic compounds Chemical class 0.000 claims description 4
- 125000000524 functional group Chemical group 0.000 claims description 3
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000004873 anchoring Methods 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 238000001465 metallisation Methods 0.000 abstract description 4
- 230000001235 sensitizing effect Effects 0.000 abstract description 2
- 230000003213 activating effect Effects 0.000 abstract 1
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 14
- 239000000243 solution Substances 0.000 description 14
- 239000002904 solvent Substances 0.000 description 11
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 10
- 230000009467 reduction Effects 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 239000012153 distilled water Substances 0.000 description 9
- 230000002378 acidificating effect Effects 0.000 description 8
- -1 heterocyclic radicals Chemical class 0.000 description 7
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 230000009471 action Effects 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- YPTUAQWMBNZZRN-UHFFFAOYSA-N dimethylaminoboron Chemical compound [B]N(C)C YPTUAQWMBNZZRN-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000012190 activator Substances 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- KMOUUZVZFBCRAM-UHFFFAOYSA-N 1,2,3,6-tetrahydrophthalic anhydride Chemical compound C1C=CCC2C(=O)OC(=O)C21 KMOUUZVZFBCRAM-UHFFFAOYSA-N 0.000 description 1
- VYXHVRARDIDEHS-UHFFFAOYSA-N 1,5-cyclooctadiene Chemical compound C1CC=CCCC=C1 VYXHVRARDIDEHS-UHFFFAOYSA-N 0.000 description 1
- 239000004912 1,5-cyclooctadiene Substances 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- PWHVEHULNLETOV-UHFFFAOYSA-N Nic-1 Natural products C12OC2C2(O)CC=CC(=O)C2(C)C(CCC2=C3)C1C2=CC=C3C(C)C1OC(O)C2(C)OC2(C)C1 PWHVEHULNLETOV-UHFFFAOYSA-N 0.000 description 1
- 241000080590 Niso Species 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 241000270295 Serpentes Species 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- YWNYNHHYXJOUIH-UHFFFAOYSA-N [amino(ethyl)boranyl]ethane Chemical class CCB(N)CC YWNYNHHYXJOUIH-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001336 alkenes Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical class B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- 125000005521 carbonamide group Chemical group 0.000 description 1
- 150000001733 carboxylic acid esters Chemical group 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 150000004697 chelate complex Chemical class 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 230000006735 deficit Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- GRWZHXKQBITJKP-UHFFFAOYSA-L dithionite(2-) Chemical compound [O-]S(=O)S([O-])=O GRWZHXKQBITJKP-UHFFFAOYSA-L 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid group Chemical group C(CCCCCCC\C=C/CCCCCCCC)(=O)O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920002717 polyvinylpyridine Polymers 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000000714 pyrimidinyl group Chemical group 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000002130 sulfonic acid ester group Chemical group 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical compound OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1644—Composition of the substrate porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
- C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
- C23C18/2073—Multistep pretreatment
- C23C18/208—Multistep pretreatment with use of metal first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
Definitions
- Porous solids are becoming increasingly important as adsorbents and catalysts. They differ from other solid bodies in that they have a cavity structure. This cavity structure is formed by a system of pores. The shape and opening width of the pores range from macroscopic depressions and cracks with a diameter of a few microns to cavities with opening widths that are in the order of magnitude of molecular diameters. The majority of synthetically produced adsorbents have pores that span different size ranges, and their distribution is rarely homogeneous.
- Porous solids can be found in numerous chemical classes. These include inorganic compounds such as silicon derivatives, metal oxides, activated carbons etc. but also porous metals and alloys as well as partially cross-linked polymers, especially ion exchangers.
- Porous solids have orders of magnitude higher specific surfaces than metals. As a result, the effects of surface reactions on such solids are greater. It is therefore of interest to use a method that can be used to change the chemical properties of the surface or the matrix by depositing a thin, diffuse metal layer.
- One of the most important advantages of combining the metal with the cavity geometry of the carrier material is, for example, easier dissipation of heat of reaction, due to the high thermal conductivity of the metal; Control of layer densities and intermediate grain volumes as well as the avoidance of the associated pressure losses by applying external magnetic fields when used in a fluidized or floating bed.
- the production of metallized porous solids is known per se.
- the general procedure is to load the porous substrates with ions of the transition metals, preferably Ru, Pd, Pt, Ag and Ni, and then with a reducing agent, preferably hydrogen (cf. DE 16 43 044, DE 25 53 762 , US 35 38 019, US 30 13 987 and DDR 40 953) or hydrazine, dithionite, borohydride etc. (see. DE 28 49 026, DE 20 03 522, DE 18 00 380, FR 22 70 238, US 40 76 622 Chem. Abstr. 67, 36671 s (1967)) treated or thermally decomposed metal compounds applied to the substrates (cf. US 30 13 987 and 39 54 883).
- a reducing agent preferably hydrogen (cf. DE 16 43 044, DE 25 53 762 , US 35 38 019, US 30 13 987 and DDR 40 953) or hydrazine, dithionite, borohydride
- transition metals can be applied to the substrates mentioned correctly, that is to say without any significant impairment of the pore structure, if these are mixed with the metal ions of the elements of the 1st or 8th subgroup of the periodic system before or after loading with transition metal ions or their compounds activated and the activation ions, if they are still present, sensitized with, for example, a snC1 2 solution.
- Activation is possible both with ionogenic and / or colloidal and with organic adducts of the elements of subgroups 1 and 8 of the periodic table, the elements Au, Ag, Pd, Pt and Cu being used with particular preference.
- Their amount per liter of solvent should be 0.1-15 g, the amounts of 0.3-1.5 g / 1 being used with particular preference.
- Palladium as sol or in particular in the form of an organometallic compound is preferred as the activation metal.
- the groups of the organic part of the organometallic compounds required for the metal bond are known per se (cf. DE 30 25 307). These are, for example, CC or CN double and triple bonds and groups which form a chelate complex can train, e.g. OH, SH, CO or COOH groups.
- the use of the organometallic compounds which, in addition to the groups necessary for metal bonding, have at least one further functional group has the advantage that the activation nuclei are better fixed on the substrate surface.
- Functional groups such as carboxylic acid groups, carboxylic acid halide groups, carboxylic acid hydride groups, carboxylic ester groups, carbonamide and carbonimide groups, aldehyde and ketone groups, ethers are particularly suitable for fixing the activator to the substrate surface groups, sulfonic acid halide groups, sulfonic acid ester groups, halogen-containing heterocyclic radicals, such as chlorotriazinyl, pyrazinyl, pyrimidinyl or quinoxalinyl groups, activated double bonds, such as in the case of vinylsulfonic acid or acrylic acid derivatives, amino groups, hydroxyl groups, isocyanate and mercapto groups, and acetylene groups, also olefleno groups, and olefin groups higher-chain alkyl or alkenyl radicals from C -f in particular oleic, linoleic, stearic or palmiting groups.
- the organometallic activators are used as a solution, dispersion, emulsion or suspension in an organic solvent or as a mixture with an organic solvent. Solvent mixtures can also be used. In contrast, it is not advisable to incorporate polymers, prepolymers or other paint-forming systems into these solvents.
- Particularly suitable solvents are polar, protic and aprotic solvents such as water, methylene chloride, chloroform, trichlorethylene, perchlorethylene, acetone, ethylene glycol and tetrahydrofuran, which can be blended with other solvents such as petrol, ligroin, toluene etc.
- polar, protic and aprotic solvents such as water, methylene chloride, chloroform, trichlorethylene, perchlorethylene, acetone, ethylene glycol and tetrahydrofuran, which can be blended with other solvents such as petrol, ligroin, toluene etc.
- the matrices of the substrates to be metallized are wetted with these solutions, the exposure time preferably being 1 second to 20 minutes. Methods such as immersing the particles in the solutions or spraying them with the activation solutions are particularly suitable for this purpose.
- the solvent is removed.
- Low-boiling solvents are preferably evaporated, e.g. in vacuum, removed.
- other methods such as extraction with a solvent in which the organic compounds are insoluble, are appropriate.
- the activation can also be carried out before loading with metal ions.
- the surfaces pretreated in this way may need to be sensitized.
- the solids activated in this way can be used directly for electroless metallization. However, it may also be necessary to rinse the surface of any residual sensitizing agent.
- the metallization is preferably carried out in aqueous solution.
- Other solvents such as alcohols, ethers, hydrocarbons can also be used.
- Suspensions or slurries of the reducing agents can also be used.
- Preferred reducing agents are alkali boranes, dimethyl, diethyl aminoboranes, alkali hypophosphite or formalin or their mixtures. Their amounts should preferably be 10-200 g / 1, in special cases they can be above or below.
- the reduction can be carried out at temperatures from -15 to the respective boiling point of the solvent, with room temperature being particularly preferred.
- the reduction baths In special cases, complexing agents such as citrate ions (sodium citrate, ammonium citrate, citric acid) and ammonium cations (NH 4 OH, NH 4 Cl) or ammonia can be added.
- porous solids with a surface area of 1 - 2000 m 2 / g are suitable for carrying out the new process.
- those based on SiO 2 , activated carbon, metal oxides and organic polymers such as polystyrene, divinylbenzene, polyurethane, polyisoprene, polybutadiene, polyvinyl chloride, polyvinyl pyridine, phenolic resins and epoxy resins should be mentioned.
- the metal content of the solids loaded according to the process should be 5-95% by weight.
- 10 g of macroporous solids according to Example 1 are loaded with Co 2+ ions under the action of slightly acidic aqueous 8% CoSO solution (pH 5), dried according to Example 1, activated and then metallized in a reduction bath according to Example 1. You get a fully metallized sample, the porous structure of which is not affected by the metal coating.
- 10 g of the above-mentioned metallized solids were mixed in an autoclave with 160 ml of ethanol and 24.62 g of nitrobenzene, stirred at 100 bar H 2 pressure and 100 ° C. for 2.5 h until the pressure was constant. After the reaction medium had been filled and the porous solids had been filtered, the reaction solution was examined by gas chromatography. The analyzes show that the nitrobenzene used has been reduced to aniline.
- Example 4 10 g of macroporous solids according to Example 4 are loaded with N i 2t ions according to Example 1, activated according to Example 2, dried and then metallized in a reduction bath of 15 g dimethylaminoborane and 82 g distilled water at 60 ° C. over a period of 45 minutes. A macroporous sample is metallized both on the surface and in the matrix.
- Example 10 g of the solids listed in Example 1 are loaded with Ni 2+ and Co 2+ ions at room temperature under the action of weakly acidic, aqueous salt solution of 3% NiSO 4 and 9% CoCl 2 , and then metallized according to Example 4.
- a porous sample is metallized on the surface or in the matrix.
- Example 10 g of the macroporous solids listed in Example 1 are loaded with Co 2+ ions according to Example 3, activated according to Example 1 and then in a reduction bath which consists of 15 g sodium hypophosphite, 17 g (NH 4 ) 2 SO 4 and 200 ml distilled water, at RT over 35 minutes with a macroporous metal coating.
- Example 2 10 g of the porous solids listed in Example 2 are loaded according to Example 1 with Ni 2 + ions, in an activation bath consisting of 0.7 g of 1,5-cyclooctadiene palladium chloride and 1 1 of trichloroethane, activated over the course of 2 minutes , washed with methanol and then metallized in a reducing agent consisting of 23 g dimethylaminoborane, 21 g malonic acid, 15 g (NH 4 ) 2 SO 4 at 40 ° C. in the course of 45 minutes. You get a porous, metallized sample.
- Example 10 50 g of the porous solids listed in Example 10 are loaded under the action of neutral, aqueous 15% CuSO 4 solution, dried at 50 ° C. under vacuum, activated according to Example 9 and then metallized in a reduction bath according to Example 2. A porous, metallized sample with a metal coating of 8% by weight is obtained.
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- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Catalysts (AREA)
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3248778 | 1982-12-31 | ||
| DE19823248778 DE3248778A1 (de) | 1982-12-31 | 1982-12-31 | Verfahren zur herstellung metallisierter poroeser festkoerper |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP0115006A1 true EP0115006A1 (fr) | 1984-08-08 |
Family
ID=6182262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP19830112721 Withdrawn EP0115006A1 (fr) | 1982-12-31 | 1983-12-17 | Procédé de fabrication de corps poreux métallisés |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4563371A (fr) |
| EP (1) | EP0115006A1 (fr) |
| JP (1) | JPS59133372A (fr) |
| DE (1) | DE3248778A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1029311C2 (nl) * | 2005-06-22 | 2006-12-27 | Nanotechnology B V | Microscopisch substraat alzijdig bedekt met een metaallaag en werkwijze voor het metalliseren van een microscopisch substraat. |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4603148A (en) * | 1983-05-12 | 1986-07-29 | Hercules Incorporated | Macroreticulate polymer scavengers for the removal of impurities from inert fluids |
| DE3510202A1 (de) * | 1985-03-21 | 1986-09-25 | Bayer Ag, 5090 Leverkusen | Elektrische leiterplatten |
| CA1279861C (fr) * | 1986-05-12 | 1991-02-05 | Karl T. Chuang | Ensemble catalyseur |
| US4892857A (en) * | 1987-05-20 | 1990-01-09 | Corning Incorporated | Electrically conductive ceramic substrate |
| CA1301400C (fr) * | 1987-11-09 | 1992-05-19 | Sellathurai Suppiah | Materiaux composites poreux et methode de fabrication |
| US4959132A (en) * | 1988-05-18 | 1990-09-25 | North Carolina State University | Preparing in situ electrocatalytic films in solid polymer electrolyte membranes, composite microelectrode structures produced thereby and chloralkali process utilizing the same |
| US5242713A (en) * | 1988-12-23 | 1993-09-07 | International Business Machines Corporation | Method for conditioning an organic polymeric material |
| JP2768390B2 (ja) * | 1990-12-11 | 1998-06-25 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 無電解金属付着のために基体をコンディショニングする方法 |
| DE4143122C2 (de) * | 1991-12-23 | 2001-07-05 | Stiftung A Wegener Inst Polar | Abformungsmodell und Verfahren zu seiner Herstellung |
| DE4214905C2 (de) * | 1992-05-05 | 1996-06-27 | Friwo Silberkraft Ges Fuer Bat | Verfahren zur Metallisierung von Kunststoff-Folien und deren Verwendung |
| US5496860A (en) * | 1992-12-28 | 1996-03-05 | Suntory Limited | Antibacterial fiber, textile and water-treating element using the fiber and method of producing the same |
| US5437887A (en) * | 1993-12-22 | 1995-08-01 | Enthone-Omi, Inc. | Method of preparing aluminum memory disks |
| DE19518942C2 (de) * | 1995-05-23 | 1998-12-10 | Fraunhofer Ges Forschung | Verfahren zur Herstellung von metallisierten Polymerpartikeln und nach dem Verfahren hergestelltes Polymermaterial sowie deren Verwendung |
| WO1999058242A1 (fr) * | 1998-05-12 | 1999-11-18 | Nippon Shokubai Co., Ltd. | Procede permettant d'activer un hydrogene actif et catalyseur d'activation |
| JP2003145674A (ja) * | 2001-11-08 | 2003-05-20 | Learonal Japan Inc | 樹脂複合材料の形成方法 |
| CN101972651B (zh) * | 2010-10-20 | 2012-06-13 | 中南民族大学 | 一种金属钯纳米材料催化剂及其制备和应用 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3222218A (en) * | 1962-01-02 | 1965-12-07 | Exxon Research Engineering Co | Metal coating process |
| US4364803A (en) * | 1980-03-11 | 1982-12-21 | Oronzio De Nora Impianti Elettrochimici S.P.A. | Deposition of catalytic electrodes on ion-exchange membranes |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2861045A (en) * | 1954-11-15 | 1958-11-18 | Exxon Research Engineering Co | Catalytic metal-modified resin |
| US3013987A (en) * | 1958-09-24 | 1961-12-19 | Union Carbide Corp | Metal loading of molecular sieves |
| US3351487A (en) * | 1963-11-06 | 1967-11-07 | Dow Chemical Co | Process for plating permeable membrane |
| US3440181A (en) * | 1965-03-22 | 1969-04-22 | Dow Chemical Co | Metal coated vermicular expanded graphite and polymer composition containing same |
| US3437507A (en) * | 1965-07-16 | 1969-04-08 | Mc Donnell Douglas Corp | Plating of substrates |
| DE1260454B (de) * | 1966-07-07 | 1968-02-08 | Rheinpreussen Ag | Verfahren zur kontinuierlichen einstufigen Herstellung von gesaettigten Carbonylverbindungen |
| US3532518A (en) * | 1967-06-28 | 1970-10-06 | Macdermid Inc | Colloidal metal activating solutions for use in chemically plating nonconductors,and process of preparing such solutions |
| US3578609A (en) * | 1967-10-02 | 1971-05-11 | Mobil Oil Corp | Ion exchange resin containing zero-valent metal |
| US3538019A (en) * | 1968-03-07 | 1970-11-03 | Atlas Chem Ind | Nickel phosphate-promoted supported nickel catalyst |
| US3684534A (en) * | 1970-07-06 | 1972-08-15 | Hooker Chemical Corp | Method for stabilizing palladium containing solutions |
| US3954883A (en) * | 1970-07-23 | 1976-05-04 | Mobil Oil Corporation | Catalytic polystep reactions |
| US3960962A (en) * | 1974-05-31 | 1976-06-01 | Ethyl Corporation | Process for replacing the hydroxy group of an aromatic hydroxy compound with an amine group |
| US4021314A (en) * | 1976-03-25 | 1977-05-03 | Western Electric Company, Inc. | Method of depositing a metal on a surface |
| US4076622A (en) * | 1976-06-22 | 1978-02-28 | Rohm And Haas Company | Microbiocidal macroreticular ion exchange resins, their method of preparation and use |
| US4311812A (en) * | 1979-03-29 | 1982-01-19 | Rohm And Haas Company | Borane reducing resins |
| US4347164A (en) * | 1980-12-08 | 1982-08-31 | Filtrol Corporation | Mono- and poly-metallic supported catalysts |
| DE3150985A1 (de) * | 1981-12-23 | 1983-06-30 | Bayer Ag, 5090 Leverkusen | Verfahren zur aktivierung von substratoberflaechen fuer die stromlose metallisierung |
| DE3202484A1 (de) * | 1982-01-27 | 1983-08-04 | Bayer Ag, 5090 Leverkusen | Metallisierte halbleiter und verfahren zu ihrer herstellung |
-
1982
- 1982-12-31 DE DE19823248778 patent/DE3248778A1/de not_active Withdrawn
-
1983
- 1983-12-17 EP EP19830112721 patent/EP0115006A1/fr not_active Withdrawn
- 1983-12-23 US US06/565,081 patent/US4563371A/en not_active Expired - Fee Related
- 1983-12-28 JP JP58245609A patent/JPS59133372A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3222218A (en) * | 1962-01-02 | 1965-12-07 | Exxon Research Engineering Co | Metal coating process |
| US4364803A (en) * | 1980-03-11 | 1982-12-21 | Oronzio De Nora Impianti Elettrochimici S.P.A. | Deposition of catalytic electrodes on ion-exchange membranes |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1029311C2 (nl) * | 2005-06-22 | 2006-12-27 | Nanotechnology B V | Microscopisch substraat alzijdig bedekt met een metaallaag en werkwijze voor het metalliseren van een microscopisch substraat. |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59133372A (ja) | 1984-07-31 |
| US4563371A (en) | 1986-01-07 |
| DE3248778A1 (de) | 1984-07-12 |
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Inventor name: LANGE, PETER MICHAEL, DR. Inventor name: MITSCHKER, ALFRED, DR. Inventor name: SIRINYAN, KIRKOR, DR. Inventor name: MERTEN, RUDOLF, DR. |