EP0144851A2 - Procédé de fabrication de couches de permalloy par pulvérisation - Google Patents

Procédé de fabrication de couches de permalloy par pulvérisation Download PDF

Info

Publication number
EP0144851A2
EP0144851A2 EP84113992A EP84113992A EP0144851A2 EP 0144851 A2 EP0144851 A2 EP 0144851A2 EP 84113992 A EP84113992 A EP 84113992A EP 84113992 A EP84113992 A EP 84113992A EP 0144851 A2 EP0144851 A2 EP 0144851A2
Authority
EP
European Patent Office
Prior art keywords
sputtering
gas
nitrogen
permalloy
argon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP84113992A
Other languages
German (de)
English (en)
Other versions
EP0144851B1 (fr
EP0144851A3 (en
Inventor
Hans-Werner Dipl.-Ing. Pötzlberger
Siegfried Bock
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Siemens Corp
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Publication of EP0144851A2 publication Critical patent/EP0144851A2/fr
Publication of EP0144851A3 publication Critical patent/EP0144851A3/de
Application granted granted Critical
Publication of EP0144851B1 publication Critical patent/EP0144851B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

Definitions

  • the invention relates to a method for producing magnetically anisotropic permalloy layers with a small coercive field strength (H c ) by sputtering.
  • Permalloy layers with small H c are required for various applications.
  • thin-film magnetic heads require several micrometer thick permalloy layers (Ni / Fe approx. 80/20), which are preferably applied by sputtering.
  • sputtering rates of up to approx. 3 pm / h are achieved.
  • Argon is used as the sputtering gas.
  • the invention is based on the object of realizing the method mentioned at the beginning which makes the application of magnetically anisotropic permalloy layers with a small H c reproducible.
  • This is achieved by adding reactive gas (nitrogen, air, etc.) to the sputtering gas (generally argon).
  • sputtering gas generally argon
  • This ensures that the same amount of reactive gas is always available when sputtering.
  • this method can be used reproducibly in systems based on the batch or lock principle or in dusting methods with different dusting rates (RF diode principle, magnetron principle).
  • an argon-nitrogen mixed gas is used as the sputtering gas.
  • 0.5-2% nitrogen is preferably added to the argon sputtering gas.
  • the invention is explained using exemplary embodiments.
  • the following substrates were used: titanium carbide with an aluminum oxide base (4 mm thick), soft glass (4 mm), silicon wafer (0.6 mm).
  • the layer thicknesses for these examples are 2-4 ⁇ m.

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Heads (AREA)
EP84113992A 1983-11-24 1984-11-19 Procédé de fabrication de couches de permalloy par pulvérisation Expired EP0144851B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3342533 1983-11-24
DE19833342533 DE3342533A1 (de) 1983-11-24 1983-11-24 Aufstaeubung von permalloy-schichten

Publications (3)

Publication Number Publication Date
EP0144851A2 true EP0144851A2 (fr) 1985-06-19
EP0144851A3 EP0144851A3 (en) 1985-07-17
EP0144851B1 EP0144851B1 (fr) 1989-02-08

Family

ID=6215167

Family Applications (1)

Application Number Title Priority Date Filing Date
EP84113992A Expired EP0144851B1 (fr) 1983-11-24 1984-11-19 Procédé de fabrication de couches de permalloy par pulvérisation

Country Status (3)

Country Link
EP (1) EP0144851B1 (fr)
JP (1) JPS60133716A (fr)
DE (2) DE3342533A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0251233A1 (fr) * 1986-06-26 1988-01-07 Research Development Corporation of Japan Matériau magnétique anisotrope à base de terres rares et procédé pour sa fabrication
EP0720154A3 (fr) * 1994-12-26 1996-09-18 Nec Corp Electrode à couche mince pour tel qu'une tête à effet magnétorésistif et procédé de fabrication
DE19531861A1 (de) * 1995-08-30 1997-03-06 Danfoss As Verfahren zum Herstellen von magnetischen Polen auf einem Grundkörper und Rotor einer elektrischen Maschine

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2194965B (en) * 1986-09-12 1991-01-09 Sharp Kk A process for preparing a soft magnetic film of ni-fe based alloy

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4094761A (en) * 1977-07-25 1978-06-13 Motorola, Inc. Magnetion sputtering of ferromagnetic material
US4271232A (en) * 1978-08-28 1981-06-02 International Business Machines Corporation Amorphous magnetic film
JPS5571006A (en) * 1978-11-22 1980-05-28 Matsushita Electric Ind Co Ltd Magnetic thin film and its manufacturing method
JPS57149706A (en) * 1981-03-12 1982-09-16 Tdk Corp Magnetic recording medium
JPS5987622A (ja) * 1982-11-09 1984-05-21 Ulvac Corp 磁気記録体並にその製造法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0251233A1 (fr) * 1986-06-26 1988-01-07 Research Development Corporation of Japan Matériau magnétique anisotrope à base de terres rares et procédé pour sa fabrication
US4933059A (en) * 1986-06-26 1990-06-12 Research Development Corporation Of Japan Process for preparing anisotropic rare earth magnet material
EP0720154A3 (fr) * 1994-12-26 1996-09-18 Nec Corp Electrode à couche mince pour tel qu'une tête à effet magnétorésistif et procédé de fabrication
DE19531861A1 (de) * 1995-08-30 1997-03-06 Danfoss As Verfahren zum Herstellen von magnetischen Polen auf einem Grundkörper und Rotor einer elektrischen Maschine

Also Published As

Publication number Publication date
EP0144851B1 (fr) 1989-02-08
JPS60133716A (ja) 1985-07-16
DE3342533A1 (de) 1985-06-05
EP0144851A3 (en) 1985-07-17
DE3476718D1 (en) 1989-03-16

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