EP0155307A1 - Revetement diminuant la reflexion pour un element optique a base d'un materiau organique - Google Patents

Revetement diminuant la reflexion pour un element optique a base d'un materiau organique

Info

Publication number
EP0155307A1
EP0155307A1 EP84903482A EP84903482A EP0155307A1 EP 0155307 A1 EP0155307 A1 EP 0155307A1 EP 84903482 A EP84903482 A EP 84903482A EP 84903482 A EP84903482 A EP 84903482A EP 0155307 A1 EP0155307 A1 EP 0155307A1
Authority
EP
European Patent Office
Prior art keywords
oxide
layer
organic material
optical element
covering according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP84903482A
Other languages
German (de)
English (en)
Inventor
Manfred Melzig
Horst Rösler
Medardus Schöbl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Optische Werke G Rodenstock
Original Assignee
Optische Werke G Rodenstock
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Optische Werke G Rodenstock filed Critical Optische Werke G Rodenstock
Publication of EP0155307A1 publication Critical patent/EP0155307A1/fr
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers

Definitions

  • the invention relates to a reflection-reducing
  • a reflection-reducing coating according to the preamble of claim 1 or 2 is, for example, from. the previously published documents DE-OS 22 10 505 of DE-OS 27 51 221 or from US-PS 4 196 246 known. The one from these
  • Known refraction-reducing coatings have a highly refractive layer, for example made of aluminum oxide (Al2O3) or chromium oxide ( ⁇ 203), in addition to layers with a low refractive index.
  • Al2O3 aluminum oxide
  • chromium oxide ⁇ 203
  • These layers are usually made by reactive vaporization of the corresponding metals or metal oxides applied in an oxygen atmosphere.
  • the reactive evaporation can lead to a non-reproducible layer structure, since the high refractive index layer can have very different refractive indices due to the different oxides that can result from reactive evaporation. Layers with deposits can also result during reactive evaporation. As a result, the quality of the anti-reflective coating is also greatly reduced.
  • a coating layer for a highly light-refractive synthetic resin lens is known, on which a reflection-reducing coating can be applied, which can consist of yttrium oxide (Y2O3), among others.
  • a reflection-reducing coating can consist of yttrium oxide (Y2O3), among others.
  • an organic coating layer is additionally provided, on which an inorganic coating layer and then only the reflection-reducing coating are applied.
  • yttrium oxide is applied in a "high-frequency plasma atmosphere" in argon gas.
  • the invention is based on the object of specifying a reflection-reducing coating according to the preambles of patent claims 1, 2 and 5, in which at least one highly refractive layer can be applied in the absence of oxygen and which is reproducible and inexpensive is adjustable.
  • the anti-reflective coating has at least one high-index layer of erbium oxide (Er 2 03), terbium oxide ( ⁇ 407), dysprosium oxide (D2O3) or holmium oxide (HI2O3). Layers made of these materials have not yet been used for clearly transparent optical elements made of organic material, such as spectacle lenses.
  • these layers can be applied by evaporating the respective oxides with the exclusion of oxygen. These oxides are not reduced in the process, so that no metal particles are embedded in the vapor-deposited layers. In addition, no other oxide forms can be formed by the evaporation with the exclusion of oxygen.
  • RNA ⁇ ⁇ _ reflection-reducing coatings of optical elements made of organic material are particularly suitable, since such
  • the oxides of samarium, europium, neodymium and ytterbium characterized in claim 2 partially decompose on evaporation with the exclusion of oxygen. Metal particles are thus embedded in the applied layer, which increase the absorption. This means that layers of the materials specified in claim 2 that are not reactively applied cannot be used without restriction for high-index layers whose thickness is up to X / 2.
  • metal oxides specified in claim 2 can be used for layers with a thickness of approximately between 2/10 and ⁇ / 20, and then provide a very reproducible refractive index with no significant absorption .
  • These metal oxides like the other metal oxides specified above, have the additional advantage that they can be vapor-deposited at low substrate temperatures and unexpectedly adhere well to silicon dioxide, so that they are particularly suitable for reflection-reducing layers of optical elements made of organic matter Suitable material.
  • the layer structure according to claim 3 or 4 leads to a particularly advantageous reflection-reducing multiple coating, since the oxides mentioned on silicon dioxide (SiO 2) - as already stated - adhere unexpectedly well.
  • This good adhesion of the oxides to silicon dioxide is particularly advantageous when the optical element consists of an organic material on which the oxides are would adhere poorly.
  • a well-adhering reflection-reducing coating can be achieved if the layer applied directly to the organic material consists of silicon dioxide, to which the respective metal oxide is then adhered.
  • the anti-reflective coating according to the invention is advantageously used for spectacle lenses made from a common organic material, e.g. B. diethylene glycol to allyl carbonate, polycarbonate or PMMA used. According to claim 10, this organic material preferably has a refractive index of 1.5.
  • high-index organic materials can also be used, such as those described in DE-OS 33 90 081, EU-OS 0 059 561 and GB-PS 2 076 836.
  • the layer of one of the specified metal oxides, which has a high refractive index according to the invention, can also be used, for example, in lenses made of organic material for any purpose.
  • Claim 11 again emphasizes that the metal oxides selected according to the invention have the advantage that they do not have to be applied reactively. In addition, they have the further surprising advantage that well-adhering layers can be produced at low substrate temperatures.
  • Three layers 2, 3 and 4 are applied, for example evaporated, to an optical element 1 made from an organic material, for example diethylene glycol to allyl carbonate, polycarbonate or PMMA.
  • organic material for example diethylene glycol to allyl carbonate, polycarbonate or PMMA.
  • the middle layer 3 consists of one of the above-mentioned metal oxides, which has a comparatively high refractive index, while the top layer 4 again consists of silicon dioxide with a comparatively low refractive index.
  • layer 2 has a thickness of approximately 0.1 to 5 m and layer 4 has a thickness of / t / 4.
  • _X a "center of gravity" wavelength of the incident light.
  • the middle layer 3 of one of the above-mentioned metal oxides preferably has a thickness of Z / 10 with a thickness of the lower 1 th layer 2 of about 2 ⁇ m.

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Eyeglasses (AREA)
  • Optical Filters (AREA)
  • Paints Or Removers (AREA)
  • Electroluminescent Light Sources (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)

Abstract

Revêtement diminuant la réflexion pour un élément optique tout à fait transparent, à base d'un matériau organique, par exemple un verre de lunettes. Le revêtement diminuant la réflexion comporte plusieurs couches, dont l'une au moins est un oxyde métallique. Dans un mode de réalisation de la présente invention, au moins une couche est formée d'oxyde d'erbium, d'oxyde de terbium, d'oxyde de dysprosium ou d'oxyde d'holmium. Dans un autre mode de réalisation, on prévoit une couche d'oxyde de samarium, d'oxyde d'europium, d'oxyde de néodyme ou d'oxyde d'ytterbium d'une épaisseur de lambda/10 à lambda/20. Dans un troisième mode de réalisation, une couche d'oxyde d'yttrium est métallisée sous vide sur une couche de dioxyde de silicium, qui est directement appliquée sur l'élément optique à base d'un matériau organique.
EP84903482A 1983-09-12 1984-09-12 Revetement diminuant la reflexion pour un element optique a base d'un materiau organique Pending EP0155307A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19833332872 DE3332872A1 (de) 1983-09-12 1983-09-12 Reflexionsvermindernder belag fuer ein optisches element aus organischem material
DE3332872 1983-09-12

Publications (1)

Publication Number Publication Date
EP0155307A1 true EP0155307A1 (fr) 1985-09-25

Family

ID=6208854

Family Applications (2)

Application Number Title Priority Date Filing Date
EP84110896A Expired - Lifetime EP0140096B1 (fr) 1983-09-12 1984-09-12 Revêtement antiréfléchissant pour éléments optiques en matière organique
EP84903482A Pending EP0155307A1 (fr) 1983-09-12 1984-09-12 Revetement diminuant la reflexion pour un element optique a base d'un materiau organique

Family Applications Before (1)

Application Number Title Priority Date Filing Date
EP84110896A Expired - Lifetime EP0140096B1 (fr) 1983-09-12 1984-09-12 Revêtement antiréfléchissant pour éléments optiques en matière organique

Country Status (7)

Country Link
US (1) US4927239A (fr)
EP (2) EP0140096B1 (fr)
JP (1) JPS60502173A (fr)
AT (1) ATE59236T1 (fr)
AU (2) AU3430784A (fr)
DE (2) DE3332872A1 (fr)
WO (1) WO1985001361A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8628687B2 (en) 2006-07-05 2014-01-14 Ube Industries, Ltd. Sialon-based oxynitride phosphor and production method thereof

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8514051D0 (en) * 1985-06-04 1985-07-10 British Telecomm Opto-electronic devices
DE3525892C1 (de) * 1985-07-19 1986-10-02 Optische Werke G. Rodenstock, 8000 München Reflexionsvermindernder Belag fuer ein optisches Element aus organischem Material
JP2620712B2 (ja) * 1988-11-08 1997-06-18 株式会社 トプコン 2波長反射防止多層膜
US5111329A (en) * 1990-11-28 1992-05-05 Ford Motor Company Solar load reduction panel with controllable light transparency
US5339198A (en) * 1992-10-16 1994-08-16 The Dow Chemical Company All-polymeric cold mirror
US5408353A (en) * 1993-07-13 1995-04-18 Ford Motor Company Controllable transparency panel with solar load reduction
DE4430363A1 (de) * 1994-08-26 1996-02-29 Leybold Ag Optische Linse aus einem klarsichtigen Kunststoff
CA2162451A1 (fr) * 1994-12-22 1996-06-23 John P. Murphy Pellicule anti-reflet pour lunettes
JP3351666B2 (ja) * 1995-10-20 2002-12-03 株式会社中戸研究所 防曇性反射防止膜、光学部品、及び防曇性反射防止膜の製造方法
US6327087B1 (en) 1998-12-09 2001-12-04 Canon Kabushiki Kaisha Optical-thin-film material, process for its production, and optical device making use of the optical-thin-film material
JP2003522092A (ja) * 2000-02-11 2003-07-22 デングラス テクノロジーズ エルエルシー. 膜が酸化セリウムを有する防反射性uv遮断多層コーティング
WO2004005975A2 (fr) * 2002-07-10 2004-01-15 Denglas Technologies, L.L.C. Procede de production de revetements multicouches antireflet resistant aux contraintes contenant un oxyde de cerium
JP6995491B2 (ja) 2017-04-21 2022-01-14 キヤノン株式会社 光学薄膜、光学素子、光学素子の製造方法
JP7418098B2 (ja) 2019-04-26 2024-01-19 キヤノン株式会社 光学多層膜の成膜方法および光学素子の製造方法
US11880018B2 (en) * 2021-03-12 2024-01-23 Raytheon Company Optical window with abrasion tolerance

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH292125A (de) * 1949-04-28 1953-07-31 Alois Dr Vogt Blendschutzbelag an lichtdurchlässigem Träger und Verfahren zur Herstellung desselben.
AT300401B (de) * 1970-07-13 1972-07-25 Eumig Entspiegelungsbelag
US3958042A (en) * 1971-04-05 1976-05-18 Agency Of Industrial Science & Technology Method for manufacture of reflection-proof film
DE2210505A1 (de) 1972-03-04 1973-09-20 Zeiss Carl Fa Verfahren zur herstellung einer entspiegelungsschicht auf optischen elementen aus transparentem thermisch empfindlichem material, insbesondere aus kunststoff
US4313647A (en) * 1975-12-23 1982-02-02 Mamiya Koki Kabushiki Kaisha Nonreflective coating
FR2371497A1 (fr) * 1976-06-23 1978-06-16 Nippon Kogaku Kk Revetement anti-reflechissant pour support de resine synthetique
DE2738044C2 (de) * 1976-09-27 1984-11-29 AO Inc., Southbridge, Mass. Linse aus einem synthetischen Polymerisat
CH625054A5 (fr) 1976-12-27 1981-08-31 Balzers Hochvakuum
US4168113A (en) * 1977-07-05 1979-09-18 American Optical Corporation Glass lens with ion-exchanged antireflection coating and process for manufacture thereof
US4246043A (en) * 1979-12-03 1981-01-20 Solarex Corporation Yttrium oxide antireflective coating for solar cells
JPS56138701A (en) * 1980-03-31 1981-10-29 Minolta Camera Co Ltd Antireflection film
US4369298A (en) 1980-05-27 1983-01-18 Tokuyama Soda Kabushiki Kaisha Novel cured resin, process for production thereof, and lens composed of said resin from bis(alkyleneoxyphenyl)-diacrylate, bis(alkyleneoxyphenyl)diallyl ether, bis(alkyleneoxyphenyl)diallyl carbonate monomers
JPS5835501A (ja) * 1981-08-28 1983-03-02 Seiko Epson Corp 合成樹脂製レンズ
US4609267A (en) * 1980-12-22 1986-09-02 Seiko Epson Corporation Synthetic resin lens and antireflection coating
US4443588A (en) 1981-02-19 1984-04-17 Toray Industries, Inc. Highly refractive urethane polymers for use in optical lenses and lenses prepared therefrom
FR2511047A1 (fr) * 1981-08-07 1983-02-11 Solarex Corp Procede pour appliquer un revetement antireflechissant et/ou dielectrique pour des cellules solaires
AU562310B2 (en) 1982-07-08 1987-06-04 Mitsui Toatsu Chemicals Inc. Resin for lens with high refractive index and lens composed of it
JPS5948702A (ja) * 1982-09-13 1984-03-21 Seiko Epson Corp 反射防止合成樹脂レンズ
IT8264412V0 (it) * 1982-10-01 1982-10-01 Timac Srl Dispositivo pneumomeccanico per la separazione dello sfrido dal disco, nell'operazione di taglio con cesoia circolare e per lo scarico separato degli stessi
JPS59126501A (ja) 1983-01-10 1984-07-21 Seiko Epson Corp ハ−ドコ−ト層を有する高屈折率合成樹脂レンズ

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO8501361A1 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8628687B2 (en) 2006-07-05 2014-01-14 Ube Industries, Ltd. Sialon-based oxynitride phosphor and production method thereof

Also Published As

Publication number Publication date
DE3332872A1 (de) 1985-04-04
DE3483770D1 (de) 1991-01-31
JPS60502173A (ja) 1985-12-12
AU3430784A (en) 1985-04-11
EP0140096A2 (fr) 1985-05-08
AU589328B2 (en) 1989-10-05
AU2832689A (en) 1989-05-04
ATE59236T1 (de) 1991-01-15
EP0140096A3 (en) 1985-06-05
EP0140096B1 (fr) 1990-12-19
US4927239A (en) 1990-05-22
WO1985001361A1 (fr) 1985-03-28

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Legal Events

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PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

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Effective date: 19850826

XX Miscellaneous (additional remarks)

Free format text: VERFAHREN ABGESCHLOSSEN INFOLGE VERBINDUNG MIT 84110896.2/0140096 (EUROPAEISCHE ANMELDENUMMER/VEROEFFENTLICHUNGSNUMMER) VOM 21.10.88.

RIN1 Information on inventor provided before grant (corrected)

Inventor name: SCHOEBL, MEDARDUS

Inventor name: ROESLER, HORST

Inventor name: MELZIG, MANFRED