EP0155307A1 - Revetement diminuant la reflexion pour un element optique a base d'un materiau organique - Google Patents
Revetement diminuant la reflexion pour un element optique a base d'un materiau organiqueInfo
- Publication number
- EP0155307A1 EP0155307A1 EP84903482A EP84903482A EP0155307A1 EP 0155307 A1 EP0155307 A1 EP 0155307A1 EP 84903482 A EP84903482 A EP 84903482A EP 84903482 A EP84903482 A EP 84903482A EP 0155307 A1 EP0155307 A1 EP 0155307A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- oxide
- layer
- organic material
- optical element
- covering according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011368 organic material Substances 0.000 title claims abstract description 25
- 230000003287 optical effect Effects 0.000 title claims abstract description 18
- 238000000576 coating method Methods 0.000 title claims description 13
- 239000011248 coating agent Substances 0.000 title claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 12
- VQCBHWLJZDBHOS-UHFFFAOYSA-N erbium(iii) oxide Chemical compound O=[Er]O[Er]=O VQCBHWLJZDBHOS-UHFFFAOYSA-N 0.000 claims abstract description 8
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910003440 dysprosium oxide Inorganic materials 0.000 claims abstract description 7
- NLQFUUYNQFMIJW-UHFFFAOYSA-N dysprosium(iii) oxide Chemical compound O=[Dy]O[Dy]=O NLQFUUYNQFMIJW-UHFFFAOYSA-N 0.000 claims abstract description 7
- JYTUFVYWTIKZGR-UHFFFAOYSA-N holmium oxide Inorganic materials [O][Ho]O[Ho][O] JYTUFVYWTIKZGR-UHFFFAOYSA-N 0.000 claims abstract description 5
- OWCYYNSBGXMRQN-UHFFFAOYSA-N holmium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ho+3].[Ho+3] OWCYYNSBGXMRQN-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910003451 terbium oxide Inorganic materials 0.000 claims abstract description 4
- SCRZPWWVSXWCMC-UHFFFAOYSA-N terbium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Tb+3].[Tb+3] SCRZPWWVSXWCMC-UHFFFAOYSA-N 0.000 claims abstract description 4
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 claims abstract 6
- 229910001940 europium oxide Inorganic materials 0.000 claims abstract 5
- AEBZCFFCDTZXHP-UHFFFAOYSA-N europium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Eu+3].[Eu+3] AEBZCFFCDTZXHP-UHFFFAOYSA-N 0.000 claims abstract 5
- 229910001954 samarium oxide Inorganic materials 0.000 claims abstract 3
- 229940075630 samarium oxide Drugs 0.000 claims abstract 3
- FKTOIHSPIPYAPE-UHFFFAOYSA-N samarium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Sm+3].[Sm+3] FKTOIHSPIPYAPE-UHFFFAOYSA-N 0.000 claims abstract 3
- UZLYXNNZYFBAQO-UHFFFAOYSA-N oxygen(2-);ytterbium(3+) Chemical compound [O-2].[O-2].[O-2].[Yb+3].[Yb+3] UZLYXNNZYFBAQO-UHFFFAOYSA-N 0.000 claims abstract 2
- 229910003454 ytterbium oxide Inorganic materials 0.000 claims abstract 2
- 229940075624 ytterbium oxide Drugs 0.000 claims abstract 2
- 150000004706 metal oxides Chemical class 0.000 claims description 11
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 7
- 239000006117 anti-reflective coating Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 2
- -1 Tb2 © 3 Chemical compound 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 16
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 8
- 239000000377 silicon dioxide Substances 0.000 abstract description 8
- 238000001704 evaporation Methods 0.000 abstract description 7
- 230000008020 evaporation Effects 0.000 abstract description 6
- 239000010410 layer Substances 0.000 description 39
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 230000008901 benefit Effects 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 239000011247 coating layer Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- KKEBXNMGHUCPEZ-UHFFFAOYSA-N 4-phenyl-1-(2-sulfanylethyl)imidazolidin-2-one Chemical compound N1C(=O)N(CCS)CC1C1=CC=CC=C1 KKEBXNMGHUCPEZ-UHFFFAOYSA-N 0.000 description 3
- 230000007717 exclusion Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- JKJWYKGYGWOAHT-UHFFFAOYSA-N bis(prop-2-enyl) carbonate Chemical compound C=CCOC(=O)OCC=C JKJWYKGYGWOAHT-UHFFFAOYSA-N 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 101001024635 Homo sapiens RNA cytidine acetyltransferase Proteins 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 102100037011 RNA cytidine acetyltransferase Human genes 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Definitions
- the invention relates to a reflection-reducing
- a reflection-reducing coating according to the preamble of claim 1 or 2 is, for example, from. the previously published documents DE-OS 22 10 505 of DE-OS 27 51 221 or from US-PS 4 196 246 known. The one from these
- Known refraction-reducing coatings have a highly refractive layer, for example made of aluminum oxide (Al2O3) or chromium oxide ( ⁇ 203), in addition to layers with a low refractive index.
- Al2O3 aluminum oxide
- chromium oxide ⁇ 203
- These layers are usually made by reactive vaporization of the corresponding metals or metal oxides applied in an oxygen atmosphere.
- the reactive evaporation can lead to a non-reproducible layer structure, since the high refractive index layer can have very different refractive indices due to the different oxides that can result from reactive evaporation. Layers with deposits can also result during reactive evaporation. As a result, the quality of the anti-reflective coating is also greatly reduced.
- a coating layer for a highly light-refractive synthetic resin lens is known, on which a reflection-reducing coating can be applied, which can consist of yttrium oxide (Y2O3), among others.
- a reflection-reducing coating can consist of yttrium oxide (Y2O3), among others.
- an organic coating layer is additionally provided, on which an inorganic coating layer and then only the reflection-reducing coating are applied.
- yttrium oxide is applied in a "high-frequency plasma atmosphere" in argon gas.
- the invention is based on the object of specifying a reflection-reducing coating according to the preambles of patent claims 1, 2 and 5, in which at least one highly refractive layer can be applied in the absence of oxygen and which is reproducible and inexpensive is adjustable.
- the anti-reflective coating has at least one high-index layer of erbium oxide (Er 2 03), terbium oxide ( ⁇ 407), dysprosium oxide (D2O3) or holmium oxide (HI2O3). Layers made of these materials have not yet been used for clearly transparent optical elements made of organic material, such as spectacle lenses.
- these layers can be applied by evaporating the respective oxides with the exclusion of oxygen. These oxides are not reduced in the process, so that no metal particles are embedded in the vapor-deposited layers. In addition, no other oxide forms can be formed by the evaporation with the exclusion of oxygen.
- RNA ⁇ ⁇ _ reflection-reducing coatings of optical elements made of organic material are particularly suitable, since such
- the oxides of samarium, europium, neodymium and ytterbium characterized in claim 2 partially decompose on evaporation with the exclusion of oxygen. Metal particles are thus embedded in the applied layer, which increase the absorption. This means that layers of the materials specified in claim 2 that are not reactively applied cannot be used without restriction for high-index layers whose thickness is up to X / 2.
- metal oxides specified in claim 2 can be used for layers with a thickness of approximately between 2/10 and ⁇ / 20, and then provide a very reproducible refractive index with no significant absorption .
- These metal oxides like the other metal oxides specified above, have the additional advantage that they can be vapor-deposited at low substrate temperatures and unexpectedly adhere well to silicon dioxide, so that they are particularly suitable for reflection-reducing layers of optical elements made of organic matter Suitable material.
- the layer structure according to claim 3 or 4 leads to a particularly advantageous reflection-reducing multiple coating, since the oxides mentioned on silicon dioxide (SiO 2) - as already stated - adhere unexpectedly well.
- This good adhesion of the oxides to silicon dioxide is particularly advantageous when the optical element consists of an organic material on which the oxides are would adhere poorly.
- a well-adhering reflection-reducing coating can be achieved if the layer applied directly to the organic material consists of silicon dioxide, to which the respective metal oxide is then adhered.
- the anti-reflective coating according to the invention is advantageously used for spectacle lenses made from a common organic material, e.g. B. diethylene glycol to allyl carbonate, polycarbonate or PMMA used. According to claim 10, this organic material preferably has a refractive index of 1.5.
- high-index organic materials can also be used, such as those described in DE-OS 33 90 081, EU-OS 0 059 561 and GB-PS 2 076 836.
- the layer of one of the specified metal oxides, which has a high refractive index according to the invention, can also be used, for example, in lenses made of organic material for any purpose.
- Claim 11 again emphasizes that the metal oxides selected according to the invention have the advantage that they do not have to be applied reactively. In addition, they have the further surprising advantage that well-adhering layers can be produced at low substrate temperatures.
- Three layers 2, 3 and 4 are applied, for example evaporated, to an optical element 1 made from an organic material, for example diethylene glycol to allyl carbonate, polycarbonate or PMMA.
- organic material for example diethylene glycol to allyl carbonate, polycarbonate or PMMA.
- the middle layer 3 consists of one of the above-mentioned metal oxides, which has a comparatively high refractive index, while the top layer 4 again consists of silicon dioxide with a comparatively low refractive index.
- layer 2 has a thickness of approximately 0.1 to 5 m and layer 4 has a thickness of / t / 4.
- _X a "center of gravity" wavelength of the incident light.
- the middle layer 3 of one of the above-mentioned metal oxides preferably has a thickness of Z / 10 with a thickness of the lower 1 th layer 2 of about 2 ⁇ m.
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Eyeglasses (AREA)
- Optical Filters (AREA)
- Paints Or Removers (AREA)
- Electroluminescent Light Sources (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
Abstract
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833332872 DE3332872A1 (de) | 1983-09-12 | 1983-09-12 | Reflexionsvermindernder belag fuer ein optisches element aus organischem material |
| DE3332872 | 1983-09-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP0155307A1 true EP0155307A1 (fr) | 1985-09-25 |
Family
ID=6208854
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP84110896A Expired - Lifetime EP0140096B1 (fr) | 1983-09-12 | 1984-09-12 | Revêtement antiréfléchissant pour éléments optiques en matière organique |
| EP84903482A Pending EP0155307A1 (fr) | 1983-09-12 | 1984-09-12 | Revetement diminuant la reflexion pour un element optique a base d'un materiau organique |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP84110896A Expired - Lifetime EP0140096B1 (fr) | 1983-09-12 | 1984-09-12 | Revêtement antiréfléchissant pour éléments optiques en matière organique |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4927239A (fr) |
| EP (2) | EP0140096B1 (fr) |
| JP (1) | JPS60502173A (fr) |
| AT (1) | ATE59236T1 (fr) |
| AU (2) | AU3430784A (fr) |
| DE (2) | DE3332872A1 (fr) |
| WO (1) | WO1985001361A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8628687B2 (en) | 2006-07-05 | 2014-01-14 | Ube Industries, Ltd. | Sialon-based oxynitride phosphor and production method thereof |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8514051D0 (en) * | 1985-06-04 | 1985-07-10 | British Telecomm | Opto-electronic devices |
| DE3525892C1 (de) * | 1985-07-19 | 1986-10-02 | Optische Werke G. Rodenstock, 8000 München | Reflexionsvermindernder Belag fuer ein optisches Element aus organischem Material |
| JP2620712B2 (ja) * | 1988-11-08 | 1997-06-18 | 株式会社 トプコン | 2波長反射防止多層膜 |
| US5111329A (en) * | 1990-11-28 | 1992-05-05 | Ford Motor Company | Solar load reduction panel with controllable light transparency |
| US5339198A (en) * | 1992-10-16 | 1994-08-16 | The Dow Chemical Company | All-polymeric cold mirror |
| US5408353A (en) * | 1993-07-13 | 1995-04-18 | Ford Motor Company | Controllable transparency panel with solar load reduction |
| DE4430363A1 (de) * | 1994-08-26 | 1996-02-29 | Leybold Ag | Optische Linse aus einem klarsichtigen Kunststoff |
| CA2162451A1 (fr) * | 1994-12-22 | 1996-06-23 | John P. Murphy | Pellicule anti-reflet pour lunettes |
| JP3351666B2 (ja) * | 1995-10-20 | 2002-12-03 | 株式会社中戸研究所 | 防曇性反射防止膜、光学部品、及び防曇性反射防止膜の製造方法 |
| US6327087B1 (en) | 1998-12-09 | 2001-12-04 | Canon Kabushiki Kaisha | Optical-thin-film material, process for its production, and optical device making use of the optical-thin-film material |
| JP2003522092A (ja) * | 2000-02-11 | 2003-07-22 | デングラス テクノロジーズ エルエルシー. | 膜が酸化セリウムを有する防反射性uv遮断多層コーティング |
| WO2004005975A2 (fr) * | 2002-07-10 | 2004-01-15 | Denglas Technologies, L.L.C. | Procede de production de revetements multicouches antireflet resistant aux contraintes contenant un oxyde de cerium |
| JP6995491B2 (ja) | 2017-04-21 | 2022-01-14 | キヤノン株式会社 | 光学薄膜、光学素子、光学素子の製造方法 |
| JP7418098B2 (ja) | 2019-04-26 | 2024-01-19 | キヤノン株式会社 | 光学多層膜の成膜方法および光学素子の製造方法 |
| US11880018B2 (en) * | 2021-03-12 | 2024-01-23 | Raytheon Company | Optical window with abrasion tolerance |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH292125A (de) * | 1949-04-28 | 1953-07-31 | Alois Dr Vogt | Blendschutzbelag an lichtdurchlässigem Träger und Verfahren zur Herstellung desselben. |
| AT300401B (de) * | 1970-07-13 | 1972-07-25 | Eumig | Entspiegelungsbelag |
| US3958042A (en) * | 1971-04-05 | 1976-05-18 | Agency Of Industrial Science & Technology | Method for manufacture of reflection-proof film |
| DE2210505A1 (de) | 1972-03-04 | 1973-09-20 | Zeiss Carl Fa | Verfahren zur herstellung einer entspiegelungsschicht auf optischen elementen aus transparentem thermisch empfindlichem material, insbesondere aus kunststoff |
| US4313647A (en) * | 1975-12-23 | 1982-02-02 | Mamiya Koki Kabushiki Kaisha | Nonreflective coating |
| FR2371497A1 (fr) * | 1976-06-23 | 1978-06-16 | Nippon Kogaku Kk | Revetement anti-reflechissant pour support de resine synthetique |
| DE2738044C2 (de) * | 1976-09-27 | 1984-11-29 | AO Inc., Southbridge, Mass. | Linse aus einem synthetischen Polymerisat |
| CH625054A5 (fr) | 1976-12-27 | 1981-08-31 | Balzers Hochvakuum | |
| US4168113A (en) * | 1977-07-05 | 1979-09-18 | American Optical Corporation | Glass lens with ion-exchanged antireflection coating and process for manufacture thereof |
| US4246043A (en) * | 1979-12-03 | 1981-01-20 | Solarex Corporation | Yttrium oxide antireflective coating for solar cells |
| JPS56138701A (en) * | 1980-03-31 | 1981-10-29 | Minolta Camera Co Ltd | Antireflection film |
| US4369298A (en) | 1980-05-27 | 1983-01-18 | Tokuyama Soda Kabushiki Kaisha | Novel cured resin, process for production thereof, and lens composed of said resin from bis(alkyleneoxyphenyl)-diacrylate, bis(alkyleneoxyphenyl)diallyl ether, bis(alkyleneoxyphenyl)diallyl carbonate monomers |
| JPS5835501A (ja) * | 1981-08-28 | 1983-03-02 | Seiko Epson Corp | 合成樹脂製レンズ |
| US4609267A (en) * | 1980-12-22 | 1986-09-02 | Seiko Epson Corporation | Synthetic resin lens and antireflection coating |
| US4443588A (en) | 1981-02-19 | 1984-04-17 | Toray Industries, Inc. | Highly refractive urethane polymers for use in optical lenses and lenses prepared therefrom |
| FR2511047A1 (fr) * | 1981-08-07 | 1983-02-11 | Solarex Corp | Procede pour appliquer un revetement antireflechissant et/ou dielectrique pour des cellules solaires |
| AU562310B2 (en) | 1982-07-08 | 1987-06-04 | Mitsui Toatsu Chemicals Inc. | Resin for lens with high refractive index and lens composed of it |
| JPS5948702A (ja) * | 1982-09-13 | 1984-03-21 | Seiko Epson Corp | 反射防止合成樹脂レンズ |
| IT8264412V0 (it) * | 1982-10-01 | 1982-10-01 | Timac Srl | Dispositivo pneumomeccanico per la separazione dello sfrido dal disco, nell'operazione di taglio con cesoia circolare e per lo scarico separato degli stessi |
| JPS59126501A (ja) | 1983-01-10 | 1984-07-21 | Seiko Epson Corp | ハ−ドコ−ト層を有する高屈折率合成樹脂レンズ |
-
1983
- 1983-09-12 DE DE19833332872 patent/DE3332872A1/de not_active Withdrawn
-
1984
- 1984-09-12 JP JP59503515A patent/JPS60502173A/ja active Pending
- 1984-09-12 EP EP84110896A patent/EP0140096B1/fr not_active Expired - Lifetime
- 1984-09-12 DE DE8484110896T patent/DE3483770D1/de not_active Expired - Fee Related
- 1984-09-12 EP EP84903482A patent/EP0155307A1/fr active Pending
- 1984-09-12 WO PCT/DE1984/000189 patent/WO1985001361A1/fr not_active Ceased
- 1984-09-12 AT AT84110896T patent/ATE59236T1/de not_active IP Right Cessation
- 1984-09-12 AU AU34307/84A patent/AU3430784A/en not_active Abandoned
-
1989
- 1989-01-10 AU AU28326/89A patent/AU589328B2/en not_active Ceased
- 1989-01-23 US US07/300,192 patent/US4927239A/en not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| See references of WO8501361A1 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8628687B2 (en) | 2006-07-05 | 2014-01-14 | Ube Industries, Ltd. | Sialon-based oxynitride phosphor and production method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3332872A1 (de) | 1985-04-04 |
| DE3483770D1 (de) | 1991-01-31 |
| JPS60502173A (ja) | 1985-12-12 |
| AU3430784A (en) | 1985-04-11 |
| EP0140096A2 (fr) | 1985-05-08 |
| AU589328B2 (en) | 1989-10-05 |
| AU2832689A (en) | 1989-05-04 |
| ATE59236T1 (de) | 1991-01-15 |
| EP0140096A3 (en) | 1985-06-05 |
| EP0140096B1 (fr) | 1990-12-19 |
| US4927239A (en) | 1990-05-22 |
| WO1985001361A1 (fr) | 1985-03-28 |
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