EP0321792A3 - Mikrowellenresonanz Hohlraum - Google Patents

Mikrowellenresonanz Hohlraum Download PDF

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Publication number
EP0321792A3
EP0321792A3 EP19880120527 EP88120527A EP0321792A3 EP 0321792 A3 EP0321792 A3 EP 0321792A3 EP 19880120527 EP19880120527 EP 19880120527 EP 88120527 A EP88120527 A EP 88120527A EP 0321792 A3 EP0321792 A3 EP 0321792A3
Authority
EP
European Patent Office
Prior art keywords
chamber
resonant cavity
side walls
wall
housing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP19880120527
Other languages
English (en)
French (fr)
Other versions
EP0321792A2 (de
Inventor
James J. Sullivan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HP Inc
Original Assignee
Hewlett Packard Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hewlett Packard Co filed Critical Hewlett Packard Co
Publication of EP0321792A2 publication Critical patent/EP0321792A2/de
Publication of EP0321792A3 publication Critical patent/EP0321792A3/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/044—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by a separate microwave unit
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Drying Of Semiconductors (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
EP19880120527 1987-12-23 1988-12-08 Mikrowellenresonanz Hohlraum Withdrawn EP0321792A3 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13730487A 1987-12-23 1987-12-23
US137304 1987-12-23

Publications (2)

Publication Number Publication Date
EP0321792A2 EP0321792A2 (de) 1989-06-28
EP0321792A3 true EP0321792A3 (de) 1991-03-20

Family

ID=22476757

Family Applications (1)

Application Number Title Priority Date Filing Date
EP19880120527 Withdrawn EP0321792A3 (de) 1987-12-23 1988-12-08 Mikrowellenresonanz Hohlraum

Country Status (2)

Country Link
EP (1) EP0321792A3 (de)
JP (1) JPH025399A (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4965540A (en) * 1987-12-23 1990-10-23 Hewlett-Packard Company Microwave resonant cavity
FR2665323B1 (fr) * 1990-07-27 1996-09-27 Reydel J Dispositif de production d'un plasma.
GB9025695D0 (en) * 1990-11-27 1991-01-09 Welding Inst Gas plasma generating system
CN113206359B (zh) * 2021-03-27 2022-04-05 西安电子科技大学 一种与波导馈源同轴连接的中心轮毂及应用
CN114242544B (zh) * 2021-11-08 2024-08-02 中国电子科技集团公司第十二研究所 一种用于速调管的输入结构及速调管

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1191519A (en) * 1966-12-28 1970-05-13 Hitachi Ltd Microwave Plasma Light Source
EP0145107A2 (de) * 1983-11-30 1985-06-19 Hewlett-Packard Company Gasentladungsdetektoren
US4575692A (en) * 1984-04-18 1986-03-11 The United States Of America As Represented By The Secretary Of The Air Force Microwave discharge apparatus and method with dual function priming resonator
US4623822A (en) * 1984-09-26 1986-11-18 Internorth, Inc. Electrodeless discharge resonance lamp

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1191519A (en) * 1966-12-28 1970-05-13 Hitachi Ltd Microwave Plasma Light Source
EP0145107A2 (de) * 1983-11-30 1985-06-19 Hewlett-Packard Company Gasentladungsdetektoren
US4575692A (en) * 1984-04-18 1986-03-11 The United States Of America As Represented By The Secretary Of The Air Force Microwave discharge apparatus and method with dual function priming resonator
US4623822A (en) * 1984-09-26 1986-11-18 Internorth, Inc. Electrodeless discharge resonance lamp

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
APPLIED SPECTROSCOPY. vol. 37, no. 1, February 1983, BALTIMORE US pages 82 - 85; D L HAAS: "AN INTERNALLY TUNED TM010 MICROWAVE RESONANT CAVITY FOR MODERATE POWER MICROWAVE INDUCED PLASMAS" *
JOURNAL OF PHYSICS E. SCIENTIFIC INSTRUMENTS. vol. 4, no. 4, April 1971, ISHING, BRISTOL GB pages 280 - 282; S HATTORI: "HIGH POWER MICROWAVE DISCHARGE AS AN EXCITATION SOURCE FOR SPECTROSCOPIC EXPERIMENTS" *
PHYSICS LETTERS. vol. 50A, no. 2, August 1974, AMSTERDAM NL pages 125 - 126; MOISAN M ET AL: "A NEW H.F.DEVICE FOR THE PRODUCTION OF LONG PLASMA COLUMNS AT HIGH ELECTRON DENSITY" *
REVIEW OF SCIENTIFIC INSTRUMENTS. vol. 54, no. 12, December 1983, NEW YORK US pages 1667 - 1673; L G MATUS: "TUNING AND MATCHING THE TM010 CAVITY" *
SPECTROCHIMICA ACTA. vol. 31b, 1976, OXFORD GB pages 483 - 486; BEENAKKER C I M: "A CAVITY FOR MICROVAVE-INDUCED PLASMAS OPERATEDIN HELIUM AND ARGON AT ATMOSPHERIC PRESSURE" *

Also Published As

Publication number Publication date
EP0321792A2 (de) 1989-06-28
JPH025399A (ja) 1990-01-10

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