JPH025399A - マイクロ波共振空胴 - Google Patents

マイクロ波共振空胴

Info

Publication number: JPH025399A
Authority: JP; Japan
Prior art keywords: chamber; resonant cavity; plasma; gas; cavity
Prior art date: 1987-12-23
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP63325717A

Other languages

English (en)

Japanese (ja)

Inventor

James J Sullivan

ジェイムス・ジェイ・サリヴァン

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

HP Inc

Original Assignee

Hewlett Packard Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-12-23

Filing date

1988-12-23

Publication date

1990-01-10

1988-12-23 Application filed by Hewlett Packard Co filed Critical Hewlett Packard Co

1990-01-10 Publication of JPH025399A publication Critical patent/JPH025399A/ja

Status Pending legal-status Critical Current

Links

230000005670 electromagnetic radiation Effects 0.000 claims abstract description 8
230000000149 penetrating effect Effects 0.000 claims 1
238000004904 shortening Methods 0.000 abstract description 2
238000001816 cooling Methods 0.000 description 32
210000002381 plasma Anatomy 0.000 description 27
238000007789 sealing Methods 0.000 description 16
239000007789 gas Substances 0.000 description 15
239000012212 insulator Substances 0.000 description 10
239000004020 conductor Substances 0.000 description 9
239000011521 glass Substances 0.000 description 6
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
239000002826 coolant Substances 0.000 description 4
239000000463 material Substances 0.000 description 4
238000000034 method Methods 0.000 description 4
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
239000000110 cooling liquid Substances 0.000 description 3
239000005350 fused silica glass Substances 0.000 description 3
239000001307 helium Substances 0.000 description 3
229910052734 helium Inorganic materials 0.000 description 3
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
238000010521 absorption reaction Methods 0.000 description 2
229910052782 aluminium Inorganic materials 0.000 description 2
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
229910052786 argon Inorganic materials 0.000 description 2
230000008878 coupling Effects 0.000 description 2
238000010168 coupling process Methods 0.000 description 2
238000005859 coupling reaction Methods 0.000 description 2
230000000694 effects Effects 0.000 description 2
239000012777 electrically insulating material Substances 0.000 description 2
238000005259 measurement Methods 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
239000003566 sealing material Substances 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
LJCZNYWLQZZIOS-UHFFFAOYSA-N 2,2,2-trichlorethoxycarbonyl chloride Chemical compound ClC(=O)OCC(Cl)(Cl)Cl LJCZNYWLQZZIOS-UHFFFAOYSA-N 0.000 description 1
229910001369 Brass Inorganic materials 0.000 description 1
241001533099 Callanthias legras Species 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
241000270295 Serpentes Species 0.000 description 1
239000004809 Teflon Substances 0.000 description 1
229920006362 Teflon® Polymers 0.000 description 1
PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
238000001636 atomic emission spectroscopy Methods 0.000 description 1
239000010951 brass Substances 0.000 description 1
239000003990 capacitor Substances 0.000 description 1
239000004568 cement Substances 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
239000003251 chemically resistant material Substances 0.000 description 1
239000000112 cooling gas Substances 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
238000010586 diagram Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
230000005284 excitation Effects 0.000 description 1
239000003292 glue Substances 0.000 description 1
239000010439 graphite Substances 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
238000007689 inspection Methods 0.000 description 1
230000001788 irregular Effects 0.000 description 1
230000009191 jumping Effects 0.000 description 1
239000007788 liquid Substances 0.000 description 1
230000013011 mating Effects 0.000 description 1
238000002844 melting Methods 0.000 description 1
230000008018 melting Effects 0.000 description 1
239000010445 mica Substances 0.000 description 1
229910052618 mica group Inorganic materials 0.000 description 1
230000010355 oscillation Effects 0.000 description 1
238000013021 overheating Methods 0.000 description 1
230000005855 radiation Effects 0.000 description 1
239000012858 resilient material Substances 0.000 description 1
230000000717 retained effect Effects 0.000 description 1
238000004611 spectroscopical analysis Methods 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/044—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by a separate microwave unit
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Electromagnetism (AREA)
Spectroscopy & Molecular Physics (AREA)
Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Plasma Technology (AREA)
Electron Sources, Ion Sources (AREA)
Drying Of Semiconductors (AREA)
Control Of Motors That Do Not Use Commutators (AREA)

JP63325717A 1987-12-23 1988-12-23 マイクロ波共振空胴 Pending JPH025399A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US13730487A	1987-12-23	1987-12-23
US137304		1987-12-23

Publications (1)

Publication Number	Publication Date
JPH025399A true JPH025399A (ja)	1990-01-10

Family

ID=22476757

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP63325717A Pending JPH025399A (ja)	1987-12-23	1988-12-23	マイクロ波共振空胴

Country Status (2)

Country	Link
EP (1)	EP0321792A3 (de)
JP (1)	JPH025399A (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4965540A (en) *	1987-12-23	1990-10-23	Hewlett-Packard Company	Microwave resonant cavity
FR2665323B1 (fr) *	1990-07-27	1996-09-27	Reydel J	Dispositif de production d'un plasma.
GB9025695D0 (en) *	1990-11-27	1991-01-09	Welding Inst	Gas plasma generating system
CN113206359B (zh) *	2021-03-27	2022-04-05	西安电子科技大学	一种与波导馈源同轴连接的中心轮毂及应用
CN114242544B (zh) *	2021-11-08	2024-08-02	中国电子科技集团公司第十二研究所	一种用于速调管的输入结构及速调管

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3541372A (en) *	1966-12-28	1970-11-17	Hitachi Ltd	Microwave plasma light source
US4654504A (en) *	1983-11-30	1987-03-31	Hewlett-Packard Company	Water-cooled gas discharge detector
US4575692A (en) *	1984-04-18	1986-03-11	The United States Of America As Represented By The Secretary Of The Air Force	Microwave discharge apparatus and method with dual function priming resonator
US4623822A (en) *	1984-09-26	1986-11-18	Internorth, Inc.	Electrodeless discharge resonance lamp

1988
- 1988-12-08 EP EP19880120527 patent/EP0321792A3/de not_active Withdrawn
- 1988-12-23 JP JP63325717A patent/JPH025399A/ja active Pending

Also Published As

Publication number	Publication date
EP0321792A2 (de)	1989-06-28
EP0321792A3 (de)	1991-03-20

Publication	Publication Date	Title
US4965540A (en)	1990-10-23	Microwave resonant cavity
US5086255A (en)	1992-02-04	Microwave induced plasma source
US8420021B2 (en)	2013-04-16	Ignition or plasma generation apparatus
US3942058A (en)	1976-03-02	Electrodeless light source having improved arc shaping capability
JP2922223B2 (ja)	1999-07-19	マイクロ波プラズマ発生装置
US6057645A (en)	2000-05-02	Plasma discharge device with dynamic tuning by a movable microwave trap
EP0030593B1 (de)	1985-04-10	Kompakte fluoreszierende Lichtquelle und Verfahren zur Erregung dieser Quelle
US20110036500A1 (en)	2011-02-17	Wide area radio frequency plasma apparatus for processing multiple substrates
Selby et al.	1987	Taming the surfatron
US8294071B2 (en)	2012-10-23	Microwave irradiation apparatus
JP2675561B2 (ja)	1997-11-12	プラズマ微量元素分折装置
GB2183087A (en)	1987-05-28	A method and apparatus for producing an hf-induced noble-gas plasma
US3942068A (en)	1976-03-02	Electrodeless light source with a termination fixture having an improved center conductor for arc shaping capability
CN206442573U (zh)	2017-08-25	一种自动点火的微波等离子体炬装置
CN106793439A (zh)	2017-05-31	一种自动点火的微波等离子体炬装置
US4095142A (en)	1978-06-13	High frequency discharge lamp for a spectral-line source
KR20090131660A (ko)	2009-12-29	마이크로파 플라즈마 처리 장치 및 마이크로파의 급전 방법
JPS59138101A (ja)	1984-08-08	空胴共振器
JPH07263187A (ja)	1995-10-13	プラズマ処理装置
Goode et al.	1984	A review of instrumentation used to generate microwave-induced plasmas
JPH025399A (ja)	1990-01-10	マイクロ波共振空胴
GB2234826A (en)	1991-02-13	Measuring temperature characteristics of dielectric materials
CN108398414A (zh)	2018-08-14	一种微波耦合等离子体激发光源
JPH09190803A (ja)	1997-07-22	無電極放電ランプ
US20210368611A1 (en)	2021-11-25	Waveguide injecting unit