EP0360992A2 - Verfahren zum Herstellen einer dielektrischen Schicht - Google Patents

Verfahren zum Herstellen einer dielektrischen Schicht Download PDF

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Publication number
EP0360992A2
EP0360992A2 EP89112712A EP89112712A EP0360992A2 EP 0360992 A2 EP0360992 A2 EP 0360992A2 EP 89112712 A EP89112712 A EP 89112712A EP 89112712 A EP89112712 A EP 89112712A EP 0360992 A2 EP0360992 A2 EP 0360992A2
Authority
EP
European Patent Office
Prior art keywords
layer
siloxane
interconnection
dielectric
dielectric layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP89112712A
Other languages
English (en)
French (fr)
Other versions
EP0360992B1 (de
EP0360992A3 (en
Inventor
Fabio Gualandris
Luisa Masini
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SRL
STMicroelectronics lnc USA
Original Assignee
SGS Thomson Microelectronics SRL
SGS Thomson Microelectronics Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SGS Thomson Microelectronics SRL, SGS Thomson Microelectronics Inc filed Critical SGS Thomson Microelectronics SRL
Publication of EP0360992A2 publication Critical patent/EP0360992A2/de
Publication of EP0360992A3 publication Critical patent/EP0360992A3/en
Application granted granted Critical
Publication of EP0360992B1 publication Critical patent/EP0360992B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
    • H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/65—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials
    • H10P14/6516—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials
    • H10P14/6529—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials by exposure to a gas or vapour
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/092—Manufacture or treatment of dielectric parts thereof by smoothing the dielectric parts
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/45—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts
    • H10W20/48—Insulating materials thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6328—Deposition from the gas or vapour phase
    • H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
    • H10P14/6336—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/69215—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material being a silicon oxide, e.g. SiO2

Definitions

  • This invention relates to a dielectric layer of first interconnection for electronic semiconductor devices.
  • the invention is also concerned with a method of forming such a dielectric layer.
  • a dielectric layer of an isolating oxide is deposited to a thickness in the range of 0.8 to 1.0 micrometers.
  • That dielectric layer commonly referred to as dielectric of first interconnection, separates the surface layer of polycrystalline silicon from the metallic paths of electrical interconnection.
  • the device shows a predetermined map.
  • the successive deposition of the dielectric layer of first interconnection follows this map enhancing, however, its features to the point that the subsequent masking, contact forming, and metal deposition steps are affected by it and reasult in a low yield of current manufacturing processes due to high rate of faulty devices.
  • surface irregularities on the mapping represent a major hindrance to a reduction in size of the interconnection paths to the metallization mask.
  • CMOS devices To obviate this drawback, the prior art has proposed, for CMOS devices, the use of a double dielectric layer formed of a first thickness of silicon dioxide over which a layer of borophosphosilicate is deposited.
  • Borophosphosilicate i.e. borophosphosilicate glass or BPSG
  • BPSG borophosphosilicate glass
  • a second prior technique as described for example in the "5th International IEEE V-Mic Conference", No. 293, June 13-14, 1988, consists of superimposing, on the borophosphosilicate, a layer of siloxane, or so-called spin-on-glass (SOG), which shows to be less sensitive to the underlying mapping during the selective attack step.
  • SOG spin-on-glass
  • the technical problem underlying this invention is to provide a novel type of dielectric of first interconnection which has such characteristics as to make it self-planarizing.
  • a dielectric layer of first interconnection being characterized in that it comprises a first thickness of tetraethylorthosilicate on which a layer of selfplanarizing siloxane is superimposed.
  • the drawing shows schematically a side elevation cross-sectional view of the structure of an electronic semiconductor device incorporating a dielectric layer of first interconnection according to the invention.
  • an electronic semiconductor device specifically a CMOS device, comprising a P-channel MOS transistor 2 and an N-channel MOS transistor serially connected to each other.
  • the device 1 comprises a semiconductor substrate 3 which is very slightly doped with impurities of the P type and in which a pod 4, commonly referred to as an N-well, is formed which is doped oppositely from the substrate.
  • zones 5 and 6 both doped P-type, which are adapted to form the source and drain of the transistor 2 as well as to bound a so-called channel region 7 overlaid by a layer 8 of an isolating oxide, the so-called gate oxide, with a gate 8a of polycrystalline silicon.
  • a layer or thickness 11 of tetraethylorthosilicate is deposited on the device 1 using an LPCVD reactor at a temperature in the 700-750°C range.
  • the thickness of the layer 11 is only by 500 ⁇ smaller than the thickness of the polycrystalline silicon of the gate 8a.
  • the layer 11 is overlaid by a layer 12 of self-planarizing siloxane.
  • That layer is formed by using a dispenser, known as spinner, whereby the siloxane is dispensed as diluted in alcohol which is then subjected to heat treatment for conversion into a dielectric.
  • the siloxane layer 12 is placed in contact with a heated plated to 200°C for 1 minute. Thereafter, it is subjected to a first heat treatment step at 425°C under a nitrogen atmosphere at a pressure of 100 mTorr for 60 minutes, and for a like time period, to a second heat treatment step at a temperature of 600°C.
  • the end product of the process just described is a planar structure which can then be passed to conventional masking, contact masking, contact attachment, resist removal, interconnection material and final passivation oxide layer deposition steps.
  • the dielectric layer of first interconnection according to the invention affords a high degree of planarity on any types of semiconductor devices.
  • this dielectric layer can improve the output of the contact and metallization layer lithography process and increase the lithographic resolution of metallization while favoring more compact interconnection structures.
  • this dielectric layer enables the interconnection structures to be designed independently of the substrate mapping, and facilitate automated designing.

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
EP89112712A 1988-09-29 1989-07-12 Verfahren zum Herstellen einer dielektrischen Schicht Expired - Lifetime EP0360992B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT8822123A IT1227245B (it) 1988-09-29 1988-09-29 Strato dielettrico di prima interconnessione per dispositivi elettronici a semiconduttore
IT2212388 1988-09-29

Publications (3)

Publication Number Publication Date
EP0360992A2 true EP0360992A2 (de) 1990-04-04
EP0360992A3 EP0360992A3 (en) 1990-08-29
EP0360992B1 EP0360992B1 (de) 1994-08-31

Family

ID=11191834

Family Applications (1)

Application Number Title Priority Date Filing Date
EP89112712A Expired - Lifetime EP0360992B1 (de) 1988-09-29 1989-07-12 Verfahren zum Herstellen einer dielektrischen Schicht

Country Status (5)

Country Link
US (1) US5045504A (de)
EP (1) EP0360992B1 (de)
JP (1) JP2856326B2 (de)
DE (1) DE68917840T2 (de)
IT (1) IT1227245B (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0495994A4 (en) * 1990-08-07 1992-11-04 Seiko Epson Corporation Semiconductor device and its manufacturing method
EP0519393A3 (en) * 1991-06-20 1993-02-03 Semiconductor Process Laboratory Co., Ltd. Method for planarizing a semiconductor substrate surface
EP0851463A1 (de) * 1996-12-24 1998-07-01 STMicroelectronics S.r.l. Herstellungsverfahren von einer dielektrischen Zwischenschicht zur Verbesserung der Planarität in elektronischen Halbleiterschaltungen
WO2006029651A1 (en) * 2004-09-16 2006-03-23 S.O.I.Tec Silicon On Insulator Technologies Method of manufacturing a silicon dioxide layer

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2757782B2 (ja) * 1994-06-30 1998-05-25 日本電気株式会社 半導体装置の製造方法
US7098499B2 (en) * 2004-08-16 2006-08-29 Chih-Hsin Wang Electrically alterable non-volatile memory cell
US7439111B2 (en) * 2004-09-29 2008-10-21 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4506435A (en) * 1981-07-27 1985-03-26 International Business Machines Corporation Method for forming recessed isolated regions
US4571366A (en) * 1982-02-11 1986-02-18 Owens-Illinois, Inc. Process for forming a doped oxide film and doped semiconductor
US4656732A (en) * 1984-09-26 1987-04-14 Texas Instruments Incorporated Integrated circuit fabrication process
US4619839A (en) * 1984-12-12 1986-10-28 Fairchild Camera & Instrument Corp. Method of forming a dielectric layer on a semiconductor device
EP0204631A3 (de) * 1985-06-04 1987-05-20 Fairchild Semiconductor Corporation Halbleiterstrukturen mit Polysiloxan-Nivellierschichten
FR2588417B1 (fr) * 1985-10-03 1988-07-29 Bull Sa Procede de formation d'un reseau metallique multicouche d'interconnexion des composants d'un circuit integre de haute densite et circuit integre en resultant
US4753901A (en) * 1985-11-15 1988-06-28 Ncr Corporation Two mask technique for planarized trench oxide isolation of integrated devices
US4775550A (en) * 1986-06-03 1988-10-04 Intel Corporation Surface planarization method for VLSI technology
US4806504A (en) * 1986-09-11 1989-02-21 Fairchild Semiconductor Corporation Planarization method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0495994A4 (en) * 1990-08-07 1992-11-04 Seiko Epson Corporation Semiconductor device and its manufacturing method
EP0519393A3 (en) * 1991-06-20 1993-02-03 Semiconductor Process Laboratory Co., Ltd. Method for planarizing a semiconductor substrate surface
US5286681A (en) * 1991-06-20 1994-02-15 Canon Sales Co., Inc. Method for manufacturing semiconductor device having a self-planarizing film
EP0851463A1 (de) * 1996-12-24 1998-07-01 STMicroelectronics S.r.l. Herstellungsverfahren von einer dielektrischen Zwischenschicht zur Verbesserung der Planarität in elektronischen Halbleiterschaltungen
US6239042B1 (en) 1996-12-24 2001-05-29 Sgs-Thomson Microelectronics S.R.L. Process for realizing an intermediate dielectric layer for enhancing the planarity in semiconductor electronic devices
US6472750B1 (en) 1996-12-24 2002-10-29 Stmicroelectronics S.R.L. Process for realizing an intermediate dielectric layer for enhancing the planarity in semiconductor electronic devices
WO2006029651A1 (en) * 2004-09-16 2006-03-23 S.O.I.Tec Silicon On Insulator Technologies Method of manufacturing a silicon dioxide layer

Also Published As

Publication number Publication date
EP0360992B1 (de) 1994-08-31
US5045504A (en) 1991-09-03
JP2856326B2 (ja) 1999-02-10
DE68917840T2 (de) 1994-12-22
EP0360992A3 (en) 1990-08-29
IT1227245B (it) 1991-03-27
DE68917840D1 (de) 1994-10-06
IT8822123A0 (it) 1988-09-29
JPH02123754A (ja) 1990-05-11

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