EP0361933A3 - Système d'alignement - Google Patents

Système d'alignement Download PDF

Info

Publication number: EP0361933A3
Authority: EP; European Patent Office
Prior art keywords: wafer; mask; alignment; light; alignment marks
Prior art date: 1988-09-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

EP19890309914

Other languages

German (de)

English (en)

Other versions

EP0361933B1 (fr

EP0361933A2 (fr

Inventor

Naoto Abe

Shigeyuki Suda

Koji Uda

Hirohisa Ohta

Noriyuki Nose

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-09-30

Filing date

1989-09-28

Publication date

1991-04-03

1989-09-28 Application filed by Canon Inc filed Critical Canon Inc

1990-04-04 Publication of EP0361933A2 publication Critical patent/EP0361933A2/fr

1991-04-03 Publication of EP0361933A3 publication Critical patent/EP0361933A3/fr

1996-02-14 Application granted granted Critical

1996-02-14 Publication of EP0361933B1 publication Critical patent/EP0361933B1/fr

2009-09-28 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

238000009825 accumulation Methods 0.000 abstract 2

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7096—Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Length Measuring Devices By Optical Means (AREA)

EP89309914A 1988-09-30 1989-09-28 Système d'alignement Expired - Lifetime EP0361933B1 (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP246648/88		1988-09-30
JP63246648A JP2734004B2 (ja)	1988-09-30	1988-09-30	位置合わせ装置

Publications (3)

Publication Number	Publication Date
EP0361933A2 EP0361933A2 (fr)	1990-04-04
EP0361933A3 true EP0361933A3 (fr)	1991-04-03
EP0361933B1 EP0361933B1 (fr)	1996-02-14

Family

ID=17151540

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EP89309914A Expired - Lifetime EP0361933B1 (fr)	1988-09-30	1989-09-28	Système d'alignement

Country Status (4)

Country	Link
US (1)	US5028797A (fr)
EP (1)	EP0361933B1 (fr)
JP (1)	JP2734004B2 (fr)
DE (1)	DE68925665T2 (fr)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2704001B2 (ja) *	1989-07-18	1998-01-26	キヤノン株式会社	位置検出装置
JP2756331B2 (ja) *	1990-01-23	1998-05-25	キヤノン株式会社	間隔測定装置
DE69133626D1 (de) *	1990-03-27	2010-03-11	Canon Kk	Messverfahren und -vorrichtung
US5200800A (en) *	1990-05-01	1993-04-06	Canon Kabushiki Kaisha	Position detecting method and apparatus
US5250797A (en) *	1990-10-05	1993-10-05	Canon Kabushiki Kaisha	Exposure method and apparatus for controlling light pulse emission using determined exposure quantities and control parameters
US5418613A (en) *	1990-11-20	1995-05-23	Canon Kabushiki Kaisha	Method and apparatus for detecting the position of a substrate having first and second patterns of different sizes
US5241188A (en) *	1991-02-01	1993-08-31	Nikon Corporation	Apparatus for detecting a focussing position
JPH05152186A (ja) *	1991-05-01	1993-06-18	Canon Inc	測定装置及び露光装置及び露光装置の位置決め方法
JPH0540013A (ja) *	1991-08-05	1993-02-19	Canon Inc	ずれ測定方法及びこの方法を用いた露光装置
US5276337A (en) *	1991-10-31	1994-01-04	International Business Machines Corporation	Accuracy of alignment and O/L measurement systems by means of tunable source and handling of signal
US5495336A (en) *	1992-02-04	1996-02-27	Canon Kabushiki Kaisha	Position detecting method for detecting a positional relationship between a first object and a second object
JP3008654B2 (ja) *	1992-02-21	2000-02-14	キヤノン株式会社	位置検出装置
US5303034A (en) *	1992-05-01	1994-04-12	Storage Technology Corporation	Robotics targeting system
US5861952A (en) *	1992-11-16	1999-01-19	Canon Kabushiki Kaisha	Optical inspection method and apparatus including intensity modulation of a light beam and detection of light scattered at an inspection position
US5432603A (en) *	1992-11-20	1995-07-11	Canon Kabushiki Kaisha	Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected
JPH0786121A (ja) *	1993-06-30	1995-03-31	Canon Inc	ずれ測定方法及びそれを用いた位置検出装置
JPH0743313A (ja) *	1993-07-29	1995-02-14	Canon Inc	異物検査装置及びそれを用いた半導体デバイスの製造方法
US5959286A (en) *	1994-05-18	1999-09-28	Symbol Technologies, Inc.	Method and apparatus for raster scanning of images
US6005255A (en) *	1994-05-18	1999-12-21	Symbol Technologies, Inc.	Timing synchronization for image scanning
WO2005057174A2 (fr) *	2003-12-08	2005-06-23	Rosenthal Robert D	Methode et appareil de detection de taux de glucose dans le sang faibles
US7854524B2 (en) *	2007-09-28	2010-12-21	Anorad Corporation	High stiffness low mass supporting structure for a mirror assembly
EP2131243B1 (fr) *	2008-06-02	2015-07-01	ASML Netherlands B.V.	Appareil lithographique et procédé de calibration de position d'un dispositif de support
US7951615B2 (en) *	2009-04-01	2011-05-31	Taiwan Semiconductor Manufacturing Company, Ltd.	System and method for implementing multi-resolution advanced process control
TWI499876B (zh) *	2009-12-09	2015-09-11	Pc Fan Technology Inc	半導體元件之監控方法
NL2007634A (en) *	2010-12-13	2012-06-15	Asml Netherlands Bv	Lithographic apparatus and method.
JP6584170B2 (ja) *	2015-07-02	2019-10-02	キヤノン株式会社	検出装置、リソグラフィ装置、物品の製造方法、および検出方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB2131205A (en) *	1982-11-19	1984-06-13	Canon Kk	Aligning masks and wafers in the manufacture of semiconductor devices
US4714331A (en) *	1985-03-25	1987-12-22	Canon Kabushiki Kaisha	Method and apparatus for automatic focusing
US4728193A (en) *	1986-12-11	1988-03-01	Hughes Aircraft Company	Precision automatic mask-wafer alignment system

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS53135653A (en) *	1977-05-01	1978-11-27	Canon Inc	Photoelectric detecting optical device
JPS55101804A (en) *	1979-01-31	1980-08-04	Toshiba Corp	Positioning apparatus
US4398824A (en) *	1981-04-15	1983-08-16	Bell Telephone Laboratories, Incorporated	Wafer tilt compensation in zone plate alignment system
JPS57204405A (en) *	1981-06-12	1982-12-15	Hitachi Ltd	Plate thickness measuring device
US4634876A (en) *	1983-05-13	1987-01-06	Canon Kabushiki Kaisha	Object position detecting apparatus using accumulation type sensor
DE3573864D1 (en) *	1984-11-13	1989-11-23	Hitachi Ltd	Alignment method for reduction projection type aligner
JP2526546B2 (ja) *	1986-04-21	1996-08-21	日本電気株式会社	位置合わせ装置
DE3719538A1 (de) *	1986-06-11	1987-12-17	Toshiba Kawasaki Kk	Verfahren und vorrichtung zum einstellen eines spalts zwischen zwei objekten auf eine vorbestimmte groesse
US4815854A (en) *	1987-01-19	1989-03-28	Nec Corporation	Method of alignment between mask and semiconductor wafer
JP2569544B2 (ja) *	1987-04-08	1997-01-08	株式会社ニコン	位置決め装置

1988
- 1988-09-30 JP JP63246648A patent/JP2734004B2/ja not_active Expired - Fee Related
1989
- 1989-09-28 EP EP89309914A patent/EP0361933B1/fr not_active Expired - Lifetime
- 1989-09-28 DE DE68925665T patent/DE68925665T2/de not_active Expired - Fee Related
- 1989-09-28 US US07/413,739 patent/US5028797A/en not_active Expired - Lifetime

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB2131205A (en) *	1982-11-19	1984-06-13	Canon Kk	Aligning masks and wafers in the manufacture of semiconductor devices
US4714331A (en) *	1985-03-25	1987-12-22	Canon Kabushiki Kaisha	Method and apparatus for automatic focusing
US4728193A (en) *	1986-12-11	1988-03-01	Hughes Aircraft Company	Precision automatic mask-wafer alignment system

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SOLID STATE TECHNOLOGY. vol. 26, no. 5, May 1983, PORT WASHINGTON, NEW YORK US pages 87 - 91; D.Berry et al.: "Application of Automatic Alignment to MOS Processing in Projection Printing" *

Also Published As

Publication number	Publication date
DE68925665D1 (de)	1996-03-28
US5028797A (en)	1991-07-02
EP0361933B1 (fr)	1996-02-14
EP0361933A2 (fr)	1990-04-04
JP2734004B2 (ja)	1998-03-30
DE68925665T2 (de)	1996-07-11
JPH0293305A (ja)	1990-04-04

Legal Events

Date	Code	Title	Description
1990-02-17	PUAI	Public reference made under article 153(3) epc to a published international application that has entered the european phase	Free format text: ORIGINAL CODE: 0009012
1990-04-04	AK	Designated contracting states	Kind code of ref document: A2 Designated state(s): DE FR GB NL
1991-02-14	PUAL	Search report despatched	Free format text: ORIGINAL CODE: 0009013
1991-03-06	17P	Request for examination filed	Effective date: 19901231
1991-04-03	AK	Designated contracting states	Kind code of ref document: A3 Designated state(s): DE FR GB NL
1993-12-29	17Q	First examination report despatched	Effective date: 19931116
1996-01-08	GRAA	(expected) grant	Free format text: ORIGINAL CODE: 0009210
1996-02-14	AK	Designated contracting states	Kind code of ref document: B1 Designated state(s): DE FR GB NL
1996-03-28	REF	Corresponds to:	Ref document number: 68925665 Country of ref document: DE Date of ref document: 19960328
1996-05-15	ET	Fr: translation filed
1996-12-24	PLBE	No opposition filed within time limit	Free format text: ORIGINAL CODE: 0009261
1996-12-24	STAA	Information on the status of an ep patent application or granted ep patent	Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT
1997-02-12	26N	No opposition filed
2002-01-01	REG	Reference to a national code	Ref country code: GB Ref legal event code: IF02
2004-09-15	PGFP	Annual fee paid to national office [announced via postgrant information from national office to epo]	Ref country code: GB Payment date: 20040915 Year of fee payment: 16
2004-09-23	PGFP	Annual fee paid to national office [announced via postgrant information from national office to epo]	Ref country code: NL Payment date: 20040923 Year of fee payment: 16
2004-09-27	PGFP	Annual fee paid to national office [announced via postgrant information from national office to epo]	Ref country code: FR Payment date: 20040927 Year of fee payment: 16
2004-11-24	PGFP	Annual fee paid to national office [announced via postgrant information from national office to epo]	Ref country code: DE Payment date: 20041124 Year of fee payment: 16
2005-09-28	PG25	Lapsed in a contracting state [announced via postgrant information from national office to epo]	Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20050928
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2006-07-14	REG	Reference to a national code	Ref country code: FR Ref legal event code: ST Effective date: 20060531

Publication	Publication Date	Title
EP0361933A3 (fr)	1991-04-03	Système d'alignement
DE3887267D1 (de)	1994-03-03	Schaltungsanordnung zur Regelung eines Halbleiter-Lasers.
DK30588A (da)	1988-01-22	Tandplejeindretning til anbringelse paa en finger
AU6752887A (en)	1987-07-16	Negative photoresist compositions and processes for preparing thermally stable, negative images using them
DE3783315D1 (de)	1993-02-11	Vorrichtung zum abtasten eines optischen kodes.
DE69112120D1 (de)	1995-09-21	Vorrichtung zur Regelung eines Leistungssystems.
FI902021A0 (fi)	1990-04-23	Substituerade arylkarbamider som effektiva soetningsmedel.
DE3679180D1 (de)	1991-06-13	Ausgabeeinrichtung an warenschaechten eines selbstverkaeufers.
KR880701459A (ko)	1988-07-27	실리콘 웨이퍼에 바이어스를 형성하기 위한 플래너공정
DK0655454T3 (da)	2001-10-08	Fremgangsmåde til fremstilling af 2,2-difluorketensilylacetaler og alfa,alfa-difluor-beta-silyloxy-1,3-dioxolan-4-propansyreestere
DE69431067D1 (de)	2002-08-29	Phasentrennvorrichtung
EP0637064A3 (fr)	1995-05-17	Procédé et dispositif de polissage de wafers extra plats.
DE69007059D1 (de)	1994-04-07	Vorrichtung zum Konzentrieren von Strahlen.
DE68924622D1 (de)	1995-11-30	Vorrichtung zum Steuern eines Halbleiterlasers.
EP0376708A3 (fr)	1991-10-23	Appareil pour la détection de la lumière
SE8704822L (sv)	1989-06-03	Monolitisk optokoppldre
FR2630496B1 (fr)	1993-05-14	Dispositif de correction de balourd d'un rotor de turbomachine
EP0358425A3 (fr)	1990-12-27	Méthode et dispositif de détection de position
DE68901401D1 (de)	1992-06-11	Analogzeitgebende vorrichtung.
JPS5590145A (en)	1980-07-08	Optical signal transfer device
NO883978L (no)	1989-03-30	Anordning for tenning av et prosjektil g i naerheten av etmaal z.
FR2635613B1 (fr)	1991-11-08	Dispositif a semiconducteurs mos
MY106641A (en)	1995-07-31	Method for positioning a light beam on a picture surface.
DK192890D0 (da)	1990-08-14	24r-scumnol, fremgangsmaade til fremstilling heraf samt anvendelse af samme
DE68915098D1 (de)	1994-06-09	Vorrichtung zur Erzeugung eines Infrarotbildes.