EP0441502A3 - Endbearbeitungslösung für lithographische Platten - Google Patents

Endbearbeitungslösung für lithographische Platten Download PDF

Info

Publication number: EP0441502A3
Authority: EP; European Patent Office
Prior art keywords: plate finisher; finisher; plate; lithographic plate; ink receptivity
Prior art date: 1990-02-09
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

EP19910300533

Other languages

English (en)

French (fr)

Other versions

EP0441502A2 (de

EP0441502B1 (de

EP0441502B2 (de

Inventor

Akira C/O Fuji Photo Film Co. Ltd. Nishioka

Hiroshi C/O Fuji Photo Film Co. Ltd. Matsumoto

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujifilm Holdings Corp

Original Assignee

Fuji Photo Film Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1990-02-09

Filing date

1991-01-24

Publication date

1991-08-21

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=12304858&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP0441502(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1991-01-24 Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd

1991-08-14 Publication of EP0441502A2 publication Critical patent/EP0441502A2/de

1991-08-21 Publication of EP0441502A3 publication Critical patent/EP0441502A3/de

1994-12-28 Publication of EP0441502B1 publication Critical patent/EP0441502B1/de

1998-08-26 Application granted granted Critical

1998-08-26 Publication of EP0441502B2 publication Critical patent/EP0441502B2/de

2011-01-24 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

239000000839 emulsion Substances 0.000 abstract 1
239000002904 solvent Substances 0.000 abstract 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development

Landscapes

Printing Plates And Materials Therefor (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)

EP19910300533 1990-02-09 1991-01-24 Endbearbeitungslösung für lithographische Platten Expired - Lifetime EP0441502B2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP3047490A JPH03234595A (ja)	1990-02-09	1990-02-09	平版印刷版用版面保護剤
JP30474/90		1990-02-09

Publications (4)

Publication Number	Publication Date
EP0441502A2 EP0441502A2 (de)	1991-08-14
EP0441502A3 true EP0441502A3 (de)	1991-08-21
EP0441502B1 EP0441502B1 (de)	1994-12-28
EP0441502B2 EP0441502B2 (de)	1998-08-26

Family

ID=12304858

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EP19910300533 Expired - Lifetime EP0441502B2 (de)	1990-02-09	1991-01-24	Endbearbeitungslösung für lithographische Platten

Country Status (4)

Country	Link
EP (1)	EP0441502B2 (de)
JP (1)	JPH03234595A (de)
CA (1)	CA2034965A1 (de)
DE (1)	DE69106158T3 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE19719936A1 (de) *	1997-05-13	1998-11-19	Fogra Forschungsgesellschaft D	Feuchtmittel für den Offsetdruck
JP2001138656A (ja)	1999-11-10	2001-05-22	Fuji Photo Film Co Ltd	平版印刷用濃縮湿し水組成物
US20020187427A1 (en)	2001-05-18	2002-12-12	Ulrich Fiebag	Additive composition for both rinse water recycling in water recycling systems and simultaneous surface treatment of lithographic printing plates
DE102008025344A1 (de)	2007-10-01	2009-04-02	Heidelberger Druckmaschinen Ag	Verfahren zum Behandeln einer wiederbebilderbaren Druckform

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2653824A1 (de) *	1975-11-26	1977-06-08	Fuji Photo Film Co Ltd	Desensibilisator fuer lithographische druckplatten sowie verfahren zu dessen anwendung
EP0034788A1 (de) *	1980-02-25	1981-09-02	Hoechst Aktiengesellschaft	Lackemulsion und Verfahren zum Herstellen von Flachdruckformen
EP0326715A2 (de) *	1988-02-03	1989-08-09	Hoechst Celanese Corporation	Entwickler/Desensibilisierungszusammensetzung für lithographische Druckplatte

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5957793A (ja) *	1982-09-02	1984-04-03	Konishiroku Photo Ind Co Ltd	平版印刷版用版面保護剤
JPS5957242A (ja) *	1982-09-20	1984-04-02	Konishiroku Photo Ind Co Ltd	平版印刷版の製版方法

1990
- 1990-02-09 JP JP3047490A patent/JPH03234595A/ja active Pending
1991
- 1991-01-24 EP EP19910300533 patent/EP0441502B2/de not_active Expired - Lifetime
- 1991-01-24 DE DE1991606158 patent/DE69106158T3/de not_active Expired - Fee Related
- 1991-01-25 CA CA 2034965 patent/CA2034965A1/en not_active Abandoned

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2653824A1 (de) *	1975-11-26	1977-06-08	Fuji Photo Film Co Ltd	Desensibilisator fuer lithographische druckplatten sowie verfahren zu dessen anwendung
EP0034788A1 (de) *	1980-02-25	1981-09-02	Hoechst Aktiengesellschaft	Lackemulsion und Verfahren zum Herstellen von Flachdruckformen
EP0326715A2 (de) *	1988-02-03	1989-08-09	Hoechst Celanese Corporation	Entwickler/Desensibilisierungszusammensetzung für lithographische Druckplatte

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 11, no. 274 (P-612)(2721) 05 September 1987, & JP-A-62 73269 (KONISHIROKU PHOTO IND. CO. LTD.) *

Also Published As

Publication number	Publication date
EP0441502A2 (de)	1991-08-14
DE69106158D1 (de)	1995-02-09
EP0441502B1 (de)	1994-12-28
EP0441502B2 (de)	1998-08-26
DE69106158T3 (de)	1999-02-25
CA2034965A1 (en)	1991-08-10
JPH03234595A (ja)	1991-10-18
DE69106158T2 (de)	1995-05-04

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Legal Events

Date	Code	Title	Description
1991-06-28	PUAI	Public reference made under article 153(3) epc to a published international application that has entered the european phase	Free format text: ORIGINAL CODE: 0009012
1991-07-04	PUAL	Search report despatched	Free format text: ORIGINAL CODE: 0009013
1991-08-14	AK	Designated contracting states	Kind code of ref document: A2 Designated state(s): DE GB
1991-08-21	AK	Designated contracting states	Kind code of ref document: A3 Designated state(s): DE GB
1992-03-25	17P	Request for examination filed	Effective date: 19920127
1994-03-16	17Q	First examination report despatched	Effective date: 19940128
1994-11-11	GRAA	(expected) grant	Free format text: ORIGINAL CODE: 0009210
1994-12-28	AK	Designated contracting states	Kind code of ref document: B1 Designated state(s): DE GB
1995-02-09	REF	Corresponds to:	Ref document number: 69106158 Country of ref document: DE Date of ref document: 19950209
1995-10-02	PLBI	Opposition filed	Free format text: ORIGINAL CODE: 0009260
1995-11-22	26	Opposition filed	Opponent name: HOECHST AKTIENGESELLSCHAFT WERK KALLE-ALBERT Effective date: 19950927
1996-02-13	PLBF	Reply of patent proprietor to notice(s) of opposition	Free format text: ORIGINAL CODE: EPIDOS OBSO
1996-05-15	PLBF	Reply of patent proprietor to notice(s) of opposition	Free format text: ORIGINAL CODE: EPIDOS OBSO
1997-12-15	PLAW	Interlocutory decision in opposition	Free format text: ORIGINAL CODE: EPIDOS IDOP
1998-03-31	PLAW	Interlocutory decision in opposition	Free format text: ORIGINAL CODE: EPIDOS IDOP
1998-07-10	PUAH	Patent maintained in amended form	Free format text: ORIGINAL CODE: 0009272
1998-07-10	STAA	Information on the status of an ep patent application or granted ep patent	Free format text: STATUS: PATENT MAINTAINED AS AMENDED
1998-08-26	27A	Patent maintained in amended form	Effective date: 19980826
1998-08-26	AK	Designated contracting states	Kind code of ref document: B2 Designated state(s): DE GB
2002-01-01	REG	Reference to a national code	Ref country code: GB Ref legal event code: IF02
2007-01-11	PGFP	Annual fee paid to national office [announced via postgrant information from national office to epo]	Ref country code: GB Payment date: 20070111 Year of fee payment: 17
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2008-09-24	GBPC	Gb: european patent ceased through non-payment of renewal fee	Effective date: 20080124
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