EP0651071A1 - Procédé pour la production de pièces avec un revêtement résistant à l'usure - Google Patents
Procédé pour la production de pièces avec un revêtement résistant à l'usure Download PDFInfo
- Publication number
- EP0651071A1 EP0651071A1 EP94116862A EP94116862A EP0651071A1 EP 0651071 A1 EP0651071 A1 EP 0651071A1 EP 94116862 A EP94116862 A EP 94116862A EP 94116862 A EP94116862 A EP 94116862A EP 0651071 A1 EP0651071 A1 EP 0651071A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- copper
- tin
- weight
- resistant
- corrosion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 238000005260 corrosion Methods 0.000 claims abstract description 22
- 230000007797 corrosion Effects 0.000 claims abstract description 22
- 239000010949 copper Substances 0.000 claims abstract description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 14
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical class [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052802 copper Inorganic materials 0.000 claims abstract description 12
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052718 tin Inorganic materials 0.000 claims abstract description 10
- 239000011701 zinc Substances 0.000 claims abstract description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims abstract description 6
- 239000002184 metal Substances 0.000 claims abstract description 6
- 150000002739 metals Chemical class 0.000 claims abstract description 6
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 6
- 150000001247 metal acetylides Chemical class 0.000 claims abstract description 5
- 150000004767 nitrides Chemical class 0.000 claims abstract description 5
- 229910021332 silicide Inorganic materials 0.000 claims abstract description 5
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 3
- 239000000956 alloy Substances 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 12
- 229910001092 metal group alloy Inorganic materials 0.000 claims description 4
- 230000000737 periodic effect Effects 0.000 claims description 4
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 2
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims description 2
- 201000004624 Dermatitis Diseases 0.000 abstract 1
- 239000011229 interlayer Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 238000005240 physical vapour deposition Methods 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 6
- PDYXSJSAMVACOH-UHFFFAOYSA-N [Cu].[Zn].[Sn] Chemical compound [Cu].[Zn].[Sn] PDYXSJSAMVACOH-UHFFFAOYSA-N 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 229910001369 Brass Inorganic materials 0.000 description 5
- 239000010951 brass Substances 0.000 description 5
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- -1 chromium steel Chemical class 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 229910052500 inorganic mineral Inorganic materials 0.000 description 3
- 239000011707 mineral Substances 0.000 description 3
- 229910052763 palladium Inorganic materials 0.000 description 3
- 206010020751 Hypersensitivity Diseases 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 230000007815 allergy Effects 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910000967 As alloy Inorganic materials 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- HEFNNWSXXWATRW-UHFFFAOYSA-N Ibuprofen Chemical compound CC(C)CC1=CC=C(C(C)C(O)=O)C=C1 HEFNNWSXXWATRW-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 229920002253 Tannate Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000006887 Ullmann reaction Methods 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910001854 alkali hydroxide Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000008139 complexing agent Substances 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- JGUQDUKBUKFFRO-CIIODKQPSA-N dimethylglyoxime Chemical compound O/N=C(/C)\C(\C)=N\O JGUQDUKBUKFFRO-CIIODKQPSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 238000010285 flame spraying Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011572 manganese Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 125000005402 stannate group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/322—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
- C23C28/3225—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only with at least one zinc-based layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
Definitions
- the invention relates to the process for the production of workpieces and objects made of non-corrosion-resistant metals and metal alloys which are coated with wear-resistant, non-metallic coatings of nitrides, carbides, borides, oxides or silicides of the elements of subgroup 4 to 6 of the periodic table, and in which a corrosion-resistant intermediate layer is arranged between the workpiece surface and the coating.
- metals and metal alloys which are not very corrosion-resistant, with hard, wear-resistant and sometimes also decorative coatings made of nitrides, carbides, borides, oxides and silicides of the elements of the 4th to 6th subgroup of Periodic table, such as titanium, zirconium, vanadium, niobium, tantalum, chromium, molybdenum or tungsten. These coatings are applied using the so-called PVD process (physical vapor deposition). Layers of titanium nitride and titanium carbide are preferred.
- the coatings produced in this way have the disadvantage that they are brittle, porous and micro-cracked. Because of their stalk-like growth, these layers have a high so-called pinhole density. As a result, they do not offer good corrosion protection for the underlying material, especially since these layers separate behave in an electrochemically inert manner so that the less noble substrates are dissolved in a corrosive manner.
- electroplated copper-tin alloys as corrosion-resistant coatings is also known from "Ullmanns Encyklopadie der Technischen Chemie, 4th edition, vol. 12, pages 190 to 194".
- This object is achieved according to the invention in that an intermediate layer of a copper-tin alloy with 45 to 80% by weight of copper, 10 to 55% by weight of tin and 0 to 15% by weight of zinc is first galvanically applied to the objects and then the wear layer is by means of a PVD process is applied.
- Alloys which are composed of 45 to 65% by weight of copper and 35 to 55% by weight of tin, or of 50 to 80% by weight of copper, 10 to 35% by weight of tin and 1 to 15% by weight, are preferably applied as the intermediate layer.
- Zinc exist.
- These layers are very corrosion-resistant and have an electrochemical potential that comes close to that of brass and bronze alloys, which are often used as base materials. They also have a high hardness of around 600 HV and therefore offer a good transition between the PVD layers (1000-1500 HV) and the base material. Softer intermediate layers, like Palladium-nickel, too, promoted chipping of the PVD layers when subjected to mechanical stress.
- Copper-tin alloy layers can be electroplated inexpensively on practically all base materials, whereby closed layers with uniform layer thicknesses are obtained even with complicated geometries.
- Baths such as those described in DE-PS 33 39 541 have proven successful. They contain 1 to 60 g / l copper as copper cyanide, 7 to 30 g / l tin in the form of alkali tannate, 0.1 to 100 g / l of a complexing agent, 1 to 50 g / l free alkali metal cyanide, 1 to 50 g / l Alkali hydroxide, up to 50 g / l alkali carbonate and 0.05 to 5 g / l of an organic fatty acid compound or a naphthol.
- the intermediate layers are preferably applied with a layer thickness between 0.1 and 10 ⁇ m.
- the copper-tin or copper-tin-zinc layers can also take on the function of leveling and gloss formation.
- a copper-tin-zinc layer is preferably used to achieve leveling and gloss formation.
- Acidic copper electrolytes are usually used for leveling and glossing of rack goods. In the case of drumware, the acidic copper electrolytes can only level off but no gloss formation. With an electrolyte for the deposition of copper-tin-zinc layers, leveling and gloss formation are possible both for rack goods and for drum goods.
- the copper-tin or copper-tin-zinc layers can be galvanically coated with a 0.1 ⁇ m thick gold layer .
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4336664A DE4336664A1 (de) | 1993-10-27 | 1993-10-27 | Werkstücke aus nichtkorrosionsbeständigen Metallen mit nach dem PVD-Verfahren aufgebrachten Überzügen |
| DE4336664 | 1993-10-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0651071A1 true EP0651071A1 (fr) | 1995-05-03 |
| EP0651071B1 EP0651071B1 (fr) | 1997-07-30 |
Family
ID=6501152
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP94116862A Expired - Lifetime EP0651071B1 (fr) | 1993-10-27 | 1994-10-26 | Procédé pour la production de pièces avec un revêtement résistant à l'usure |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US5494565A (fr) |
| EP (1) | EP0651071B1 (fr) |
| JP (1) | JP3347898B2 (fr) |
| DE (2) | DE4336664A1 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015039152A1 (fr) * | 2013-09-18 | 2015-03-26 | Ing.W.Garhöfer Gesellschaft M.B.H. | Dépôt de couches de cu, sn, zn sur des substrats métalliques |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2531163T3 (es) * | 2002-10-11 | 2015-03-11 | Enthone | Procedimiento y electrolito para la deposición galvánica de bronces |
| US7156904B2 (en) * | 2003-04-30 | 2007-01-02 | Mec Company Ltd. | Bonding layer forming solution, method of producing copper-to-resin bonding layer using the solution, and layered product obtained thereby |
| US7029761B2 (en) * | 2003-04-30 | 2006-04-18 | Mec Company Ltd. | Bonding layer for bonding resin on copper surface |
| US20060260948A2 (en) * | 2005-04-14 | 2006-11-23 | Enthone Inc. | Method for electrodeposition of bronzes |
| US9586381B1 (en) * | 2013-10-25 | 2017-03-07 | Steriplate, LLC | Metal plated object with biocidal properties |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61119668A (ja) * | 1984-11-16 | 1986-06-06 | Seiko Instr & Electronics Ltd | 亜鉛合金製携帯時計ケ−スの製造方法 |
| JPS63171867A (ja) * | 1987-01-08 | 1988-07-15 | Sumitomo Electric Ind Ltd | 電線 |
| WO1990002218A1 (fr) * | 1988-08-26 | 1990-03-08 | Multi-Arc Gmbh | Procede de revetement au plasma d'objets avec un materiau a resistance mecanique elevee |
| JPH03215658A (ja) * | 1990-01-19 | 1991-09-20 | Citizen Watch Co Ltd | 装飾被膜の構造 |
| FR2688234A1 (fr) * | 1992-03-03 | 1993-09-10 | Sarrel | Procede de protection d'une piece en argent ou revetue d'argent. |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1970549A (en) * | 1932-10-18 | 1934-08-21 | City Auto Stamping Co | Process of electroplating bronze |
| US4036602A (en) * | 1975-11-26 | 1977-07-19 | Chromalloy American Corporation | Diffusion coating of magnesium in metal substrates |
| DE3339541C2 (de) * | 1983-11-02 | 1986-08-07 | Degussa Ag, 6000 Frankfurt | Alkalisch-cyanidisches Bad zur galvanischen Abscheidung von Kupfer-Zinn-Legierungsüberzügen |
| US4557980A (en) * | 1984-08-21 | 1985-12-10 | Martin Processing, Inc. | Radiation curable coating for film structure |
| US5192410A (en) * | 1988-07-28 | 1993-03-09 | Nippon Steel Corporation | Process for manufacturing multi ceramic layer-coated metal plate |
| DE4217612A1 (de) * | 1992-05-27 | 1993-12-02 | Linde Ag | Oberflächenschutzschicht sowie Verfahren zur Herstellung derselben |
-
1993
- 1993-10-27 DE DE4336664A patent/DE4336664A1/de not_active Ceased
-
1994
- 1994-10-17 US US08/323,928 patent/US5494565A/en not_active Expired - Fee Related
- 1994-10-26 EP EP94116862A patent/EP0651071B1/fr not_active Expired - Lifetime
- 1994-10-26 DE DE59403544T patent/DE59403544D1/de not_active Expired - Fee Related
- 1994-10-27 JP JP26372594A patent/JP3347898B2/ja not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61119668A (ja) * | 1984-11-16 | 1986-06-06 | Seiko Instr & Electronics Ltd | 亜鉛合金製携帯時計ケ−スの製造方法 |
| JPS63171867A (ja) * | 1987-01-08 | 1988-07-15 | Sumitomo Electric Ind Ltd | 電線 |
| WO1990002218A1 (fr) * | 1988-08-26 | 1990-03-08 | Multi-Arc Gmbh | Procede de revetement au plasma d'objets avec un materiau a resistance mecanique elevee |
| JPH03215658A (ja) * | 1990-01-19 | 1991-09-20 | Citizen Watch Co Ltd | 装飾被膜の構造 |
| FR2688234A1 (fr) * | 1992-03-03 | 1993-09-10 | Sarrel | Procede de protection d'une piece en argent ou revetue d'argent. |
Non-Patent Citations (3)
| Title |
|---|
| PATENT ABSTRACTS OF JAPAN vol. 010, no. 310 (C - 379) 22 October 1986 (1986-10-22) * |
| PATENT ABSTRACTS OF JAPAN vol. 012, no. 446 (C - 546) 24 November 1988 (1988-11-24) * |
| PATENT ABSTRACTS OF JAPAN vol. 015, no. 496 (C - 0894) 16 December 1991 (1991-12-16) * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015039152A1 (fr) * | 2013-09-18 | 2015-03-26 | Ing.W.Garhöfer Gesellschaft M.B.H. | Dépôt de couches de cu, sn, zn sur des substrats métalliques |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3347898B2 (ja) | 2002-11-20 |
| US5494565A (en) | 1996-02-27 |
| JPH07216560A (ja) | 1995-08-15 |
| EP0651071B1 (fr) | 1997-07-30 |
| DE59403544D1 (de) | 1997-09-04 |
| DE4336664A1 (de) | 1995-05-04 |
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