EP0719575A3 - Vertikaler Verdampfer für halogenfreie Siliziumverbindungen - Google Patents

Vertikaler Verdampfer für halogenfreie Siliziumverbindungen Download PDF

Info

Publication number
EP0719575A3
EP0719575A3 EP95119162A EP95119162A EP0719575A3 EP 0719575 A3 EP0719575 A3 EP 0719575A3 EP 95119162 A EP95119162 A EP 95119162A EP 95119162 A EP95119162 A EP 95119162A EP 0719575 A3 EP0719575 A3 EP 0719575A3
Authority
EP
European Patent Office
Prior art keywords
halide
silicon
free
containing compounds
vertical vaporizer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP95119162A
Other languages
English (en)
French (fr)
Other versions
EP0719575A2 (de
EP0719575B1 (de
Inventor
Reed Richard Williams
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of EP0719575A2 publication Critical patent/EP0719575A2/de
Publication of EP0719575A3 publication Critical patent/EP0719575A3/de
Application granted granted Critical
Publication of EP0719575B1 publication Critical patent/EP0719575B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/22—Evaporating by bringing a thin layer of the liquid into contact with a heated surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/06—Flash distillation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/20—Specific substances in specified ports, e.g. all gas flows specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/65—Vaporizers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Chemical Vapour Deposition (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
EP95119162A 1994-12-30 1995-12-06 Verfahren zum Verdampfen von halogenfreien Siliziumverbindungen Expired - Lifetime EP0719575B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/368,318 US5632797A (en) 1994-12-30 1994-12-30 Method of providing vaporized halide-free, silicon-containing compounds
US368318 1994-12-30

Publications (3)

Publication Number Publication Date
EP0719575A2 EP0719575A2 (de) 1996-07-03
EP0719575A3 true EP0719575A3 (de) 1997-05-21
EP0719575B1 EP0719575B1 (de) 2002-09-25

Family

ID=23450735

Family Applications (1)

Application Number Title Priority Date Filing Date
EP95119162A Expired - Lifetime EP0719575B1 (de) 1994-12-30 1995-12-06 Verfahren zum Verdampfen von halogenfreien Siliziumverbindungen

Country Status (6)

Country Link
US (2) US5632797A (de)
EP (1) EP0719575B1 (de)
JP (1) JPH08239226A (de)
AU (1) AU703188B2 (de)
CA (1) CA2164563A1 (de)
DE (1) DE69528348T2 (de)

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KR100574123B1 (ko) * 1997-09-24 2006-04-25 코닝 인코포레이티드 용융 실리카-티타니아 유리의 제조방법
US6094940A (en) * 1997-10-09 2000-08-01 Nikon Corporation Manufacturing method of synthetic silica glass
JP3794664B2 (ja) 1998-07-29 2006-07-05 信越化学工業株式会社 合成石英ガラス部材及びその製造方法、並びにエキシマレーザ用光学部品
JP4143218B2 (ja) 1999-04-23 2008-09-03 株式会社日本触媒 薄膜式蒸発装置における重合防止方法および薄膜式蒸発装置
GB9920948D0 (en) * 1999-09-06 1999-11-10 Ici Plc Apparatus and method for separating mixed liquids
ATE370105T1 (de) 2002-06-28 2007-09-15 Prysmian Cavi Sistemi Energia Verfahren und vorrichtung zum verdampfen eines flüssigen vorlaüfers beim herstellen einer glasvorform
US7332058B2 (en) * 2003-07-31 2008-02-19 Fina Technology, Inc. Heat exchanger and process for devolatilizing polymers using same
US20050205215A1 (en) * 2004-03-17 2005-09-22 General Electric Company Apparatus for the evaporation of aqueous organic liquids and the production of powder pre-forms in flame hydrolysis processes
CA2571176C (en) * 2004-06-28 2013-05-28 Consolidated Engineering Company, Inc. Method and apparatus for removal of flashing and blockages from a casting
US8495973B2 (en) * 2009-11-03 2013-07-30 Protonex Technology Corporation Thin film vaporizer
US20140290090A1 (en) * 2010-08-24 2014-10-02 Jst Manufacturing, Inc. System and method for drying substrates
US20120276291A1 (en) * 2011-04-28 2012-11-01 Bird Chester D Methods and Apparatuses for Reducing Gelation of Glass Precursor Materials During Vaporization
US8840858B2 (en) 2011-07-06 2014-09-23 Corning Incorporated Apparatus for mixing vaporized precursor and gas and method therefor
JP6559423B2 (ja) 2011-08-05 2019-08-14 スリーエム イノベイティブ プロパティズ カンパニー 蒸気を処理するためのシステム及び方法
DE102011119374A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119341A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
DE102011119373A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119339A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011121190A1 (de) * 2011-12-16 2013-06-20 Heraeus Quarzglas Gmbh & Co. Kg OMCTS-Verdampfungsverfahren
JP2013177297A (ja) * 2012-02-09 2013-09-09 Asahi Glass Co Ltd ドープ石英ガラスの製造方法
DE102013202256B3 (de) * 2013-02-12 2014-07-17 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Titan-dotiertem synthetischen Quarzglas und dessen Verwendung
DE102013209673B3 (de) * 2013-05-24 2014-05-22 Heraeus Quarzglas Gmbh & Co. Kg Verfahren und Verdampfer zur Herstellung von synthetischem Quarzglas
DE102015201423A1 (de) 2015-01-28 2016-07-28 Wacker Chemie Ag Durch Kondensationsreaktion vernetzbare Organopolysiloxanmassen
JP6650820B2 (ja) * 2016-04-19 2020-02-19 株式会社フジクラ ガラスインゴットの製造方法
EP3409812A1 (de) * 2017-05-31 2018-12-05 Meyer Burger (Germany) AG Gasversorgungssystem und gasversorgungsverfahren
WO2019181045A1 (ja) * 2018-03-23 2019-09-26 株式会社 東芝 処理液及び処理方法
CN113439074A (zh) 2019-02-13 2021-09-24 康宁股份有限公司 蒸发器及包含该蒸发器的用于形成玻璃光纤预制件的设备
JP7058627B2 (ja) * 2019-06-11 2022-04-22 信越化学工業株式会社 光ファイバ用多孔質ガラス母材の製造装置および製造方法
JP7240770B2 (ja) * 2019-12-16 2023-03-16 株式会社フジキン 気化供給方法及び気化供給装置
JP7171639B2 (ja) * 2020-03-13 2022-11-15 信越化学工業株式会社 光ファイバ用多孔質ガラス母材の製造方法
JP7449842B2 (ja) * 2020-11-02 2024-03-14 信越化学工業株式会社 多孔質ガラス母材の製造方法及び製造装置

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR729439A (fr) * 1931-05-30 1932-07-23 Appareil d'évaporation et de concentration des liquides et principalement des liquides fragiles
US3438803A (en) * 1965-05-18 1969-04-15 Anchor Hocking Glass Corp Method and means for vapor coating
US4158092A (en) * 1974-07-25 1979-06-12 Hoechst Aktiengesellschaft Process for the manufacture of vinyl chloride polymer dispersions with a low monomer content
JPS58125633A (ja) * 1982-01-18 1983-07-26 Nippon Telegr & Teleph Corp <Ntt> ガラス微粒子製造におけるガス供給方法
US4529427A (en) * 1977-05-19 1985-07-16 At&T Bell Laboratories Method for making low-loss optical waveguides on an industrial scale
US5078092A (en) * 1989-12-22 1992-01-07 Corning Incorporated Flash vaporizer system for use in manufacturing optical waveguide fiber
US5090985A (en) * 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
WO1993024198A1 (de) * 1992-06-04 1993-12-09 Transferon Wäschereimaschinen Gmbh Verfahren zur aufbereitung verunreinigter höhersiedender lösemittel sowie vorrichtung zur durchführung des verfahrens
US5356451A (en) * 1993-12-20 1994-10-18 Corning Incorporated Method and apparatus for vaporization of liquid reactants

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JPS61254242A (ja) * 1985-05-01 1986-11-12 Sumitomo Electric Ind Ltd 原料供給装置
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US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR729439A (fr) * 1931-05-30 1932-07-23 Appareil d'évaporation et de concentration des liquides et principalement des liquides fragiles
US3438803A (en) * 1965-05-18 1969-04-15 Anchor Hocking Glass Corp Method and means for vapor coating
US4158092A (en) * 1974-07-25 1979-06-12 Hoechst Aktiengesellschaft Process for the manufacture of vinyl chloride polymer dispersions with a low monomer content
US4529427A (en) * 1977-05-19 1985-07-16 At&T Bell Laboratories Method for making low-loss optical waveguides on an industrial scale
JPS58125633A (ja) * 1982-01-18 1983-07-26 Nippon Telegr & Teleph Corp <Ntt> ガラス微粒子製造におけるガス供給方法
US5090985A (en) * 1989-10-17 1992-02-25 Libbey-Owens-Ford Co. Method for preparing vaporized reactants for chemical vapor deposition
US5078092A (en) * 1989-12-22 1992-01-07 Corning Incorporated Flash vaporizer system for use in manufacturing optical waveguide fiber
WO1993024198A1 (de) * 1992-06-04 1993-12-09 Transferon Wäschereimaschinen Gmbh Verfahren zur aufbereitung verunreinigter höhersiedender lösemittel sowie vorrichtung zur durchführung des verfahrens
US5356451A (en) * 1993-12-20 1994-10-18 Corning Incorporated Method and apparatus for vaporization of liquid reactants

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 007, no. 232 (C - 190) 14 October 1983 (1983-10-14) *

Also Published As

Publication number Publication date
DE69528348D1 (de) 2002-10-31
JPH08239226A (ja) 1996-09-17
AU4054195A (en) 1996-07-11
CA2164563A1 (en) 1996-07-01
EP0719575A2 (de) 1996-07-03
EP0719575B1 (de) 2002-09-25
DE69528348T2 (de) 2003-06-05
AU703188B2 (en) 1999-03-18
US5938853A (en) 1999-08-17
US5632797A (en) 1997-05-27

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