EP0735320A2 - Procédé et dispositif pour la purification des effluents gazeux nocifs par conversion chimique - Google Patents

Procédé et dispositif pour la purification des effluents gazeux nocifs par conversion chimique Download PDF

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Publication number
EP0735320A2
EP0735320A2 EP96102121A EP96102121A EP0735320A2 EP 0735320 A2 EP0735320 A2 EP 0735320A2 EP 96102121 A EP96102121 A EP 96102121A EP 96102121 A EP96102121 A EP 96102121A EP 0735320 A2 EP0735320 A2 EP 0735320A2
Authority
EP
European Patent Office
Prior art keywords
combustion chamber
fluorine
exhaust gases
pollutants
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP96102121A
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German (de)
English (en)
Other versions
EP0735320A3 (fr
EP0735320B1 (fr
Inventor
Horst Dr. Reichardt
Lothar Dipl.-Ing. Ritter
Günter Dipl.-Ing. Firkert
Lutz Dipl.-Phys. Labs
Konrad Dipl.-Phys. Gehmlich
Gerold Hofmann
Michael Dipl.-Ing. Hentrich
Wido Wiesenberg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Das-Duennschicht Anlagen Systeme Dresden GmbH
Das Duennschicht Anlagen Systeme GmbH
Original Assignee
Das-Duennschicht Anlagen Systeme Dresden GmbH
Das Duennschicht Anlagen Systeme GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Das-Duennschicht Anlagen Systeme Dresden GmbH, Das Duennschicht Anlagen Systeme GmbH filed Critical Das-Duennschicht Anlagen Systeme Dresden GmbH
Publication of EP0735320A2 publication Critical patent/EP0735320A2/fr
Publication of EP0735320A3 publication Critical patent/EP0735320A3/fr
Application granted granted Critical
Publication of EP0735320B1 publication Critical patent/EP0735320B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23M—CASINGS, LININGS, WALLS OR DOORS SPECIALLY ADAPTED FOR COMBUSTION CHAMBERS, e.g. FIREBRIDGES; DEVICES FOR DEFLECTING AIR, FLAMES OR COMBUSTION PRODUCTS IN COMBUSTION CHAMBERS; SAFETY ARRANGEMENTS SPECIALLY ADAPTED FOR COMBUSTION APPARATUS; DETAILS OF COMBUSTION CHAMBERS, NOT OTHERWISE PROVIDED FOR
    • F23M9/00—Baffles or deflectors for air or combustion products; Flame shields
    • F23M9/06—Baffles or deflectors for air or combustion products; Flame shields in fire-boxes
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G7/00—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
    • F23G7/06—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
    • F23G7/061—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating
    • F23G7/065—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating using gaseous or liquid fuel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23J—REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
    • F23J15/00—Arrangements of devices for treating smoke or fumes
    • F23J15/02—Arrangements of devices for treating smoke or fumes of purifiers, e.g. for removing noxious material
    • F23J15/04—Arrangements of devices for treating smoke or fumes of purifiers, e.g. for removing noxious material using washing fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23M—CASINGS, LININGS, WALLS OR DOORS SPECIALLY ADAPTED FOR COMBUSTION CHAMBERS, e.g. FIREBRIDGES; DEVICES FOR DEFLECTING AIR, FLAMES OR COMBUSTION PRODUCTS IN COMBUSTION CHAMBERS; SAFETY ARRANGEMENTS SPECIALLY ADAPTED FOR COMBUSTION APPARATUS; DETAILS OF COMBUSTION CHAMBERS, NOT OTHERWISE PROVIDED FOR
    • F23M5/00—Casings; Linings; Walls
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G2209/00—Specific waste
    • F23G2209/14—Gaseous waste or fumes
    • F23G2209/142—Halogen gases, e.g. silane
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23J—REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
    • F23J2215/00—Preventing emissions
    • F23J2215/30—Halogen; Compounds thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23J—REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
    • F23J2219/00—Treatment devices
    • F23J2219/40—Sorption with wet devices, e.g. scrubbers

Definitions

  • the invention relates to a method and a device for cleaning exhaust gases with preferably fluorine-containing pollutants, in particular from plants for the separation and removal by plasma processes and by chemical vapor phase separation.
  • These exhaust gases include fluorine-containing hydrocarbons or other fluorine compounds.
  • silanes are the main pollutants.
  • the exhaust gases are usually not themselves flammable.
  • the pollutants or their reaction products have a toxic effect or, due to their harmful effects in the atmosphere, promote ozone depletion and the greenhouse effect.
  • a whole series of methods are known for exhaust gas purification.
  • the cleaning is very often carried out by sorption of the harmful gases from the exhaust gas, in which it is passed, for example, through oxidizing, aqueous solutions (DE 3342 816 A1).
  • Pollutants that are not sorbed or only sorely efficiently can be removed from the exhaust gas by chemical conversion processes.
  • fluorine compounds can be converted into volatile silicon fluorides that are easier to dispose of by reacting with SiO 2 surfaces heated by indirect heating (D / 254 723 5).
  • the disadvantage here is the low efficiency of the conversion of the pollutants, for example caused by the cooling of the reaction surfaces by the exhaust gas.
  • a large number of exhaust gas purification processes are based on the thermal decomposition or oxidation of the pollutants in a combustion chamber. If the pollutants themselves are not combustible or if they are only constituents of exhaust gases with a high proportion of inert gas, they are introduced for chemical conversion into a combustion gas flame, for example from a natural gas or hydrogen / oxygen mixture (US Pat. No. 5,183,646). Harmful secondary substances of the conversion are then removed from the exhaust gas, for example by sorption or washing processes (US-A 288 9002). Exhaust gas cleaning is usually a multi-stage process in which sub-processes such as thermal decomposition or oxidation, cooling, sorption, hydrolysis and washing out of solid reaction products take place (034 689 3 B1). For this purpose, the exhaust gas is passed in succession, for example, through a device with a combustion chamber and at least one further device, for example one which operates on the washing principle.
  • Exhaust gas cleaning in a combustion chamber with a fuel gas flame has a low efficiency in its cleaning effect when used for exhaust gases with fluorinated hydrocarbons and with other fluorine compounds.
  • the cleaned exhaust gases With justifiable consumption of fuel gas, the cleaned exhaust gases still contain critically high proportions of pollutants. Cooling the reactor walls reduces their corrosion, but rather leads to a deterioration in the efficiency of the cleaning.
  • An improvement in the efficiency of cleaning in the direction of a low pollutant content in the cleaned exhaust gas can be achieved to a certain extent by increasing the amount of fuel gas relative to the amount of the supplied exhaust gas, but leads to a critical deterioration in the economy of exhaust gas cleaning because of the increase in fuel gas consumption.
  • An increase in the proportion of fuel gas in the fuel gas mixture compared to the stoichiometric ratio for all reactants supplied does improve the conversion of pollutants, in particular in the case of fluorine-containing hydrocarbons, but leads to the emission of unburned, even harmful, fuel gases from the cleaning system.
  • An increase in the proportion of oxygen in the fuel gas mixture (EP 0347753) compared to the stoichiometric ratio on the one hand brings about better conversion of e.g. B. silane-containing pollutants, but on the other hand leads to a critical deterioration of the pollutant conversion for fluorine-containing exhaust gases and thus to unacceptably high proportions of this pollutant in the cleaned exhaust gas.
  • the invention has for its object to increase the efficiency of cleaning, in particular in the cleaning of fluorine-containing exhaust gases, in the cleaning of exhaust gases with the aid of a method which works with a combustion chamber and a fuel gas flame. It is also through one and the same process to ensure a high efficiency of cleaning for different toxic components of the exhaust gases.
  • the economy of the cleaning process can be improved by reducing the fuel gas consumption and by longer uninterrupted operating times.
  • the method assumes that when carrying out technological processes, in particular in CVD and plasma processes, exhaust gases are produced, in particular also those with different pollutants, which are to be cleaned in a preferably multi-stage process.
  • the exhaust gases contain, proportionately or at least in a time interval, fluorine-containing hydrocarbons or other fluorine compounds.
  • the exhaust gases are cleaned in a device with a combustion chamber and a burner for generating a fuel gas flame which is used for heating and / or chemical conversion of pollutants.
  • the inner surfaces of the combustion chamber and / or surfaces additionally introduced into the combustion chamber are covered with a porous layer of silicon dioxide.
  • Exhaust gas with fluorine-containing pollutants heated in the fuel gas flame is guided along the surfaces also heated by the fuel gas flame, the heated fluorine-containing pollutants reacting with the heated material of the porous layer.
  • the separation of the Porous layer of silicon dioxide takes place by thermal oxidation of a silane-containing gas in the combustion chamber itself, preferably sequentially at time-based cleaning phases of exhaust gases with fluorine-containing pollutants.
  • the secondary, volatile pollutants in particular silicon fluorides, formed by chemical reaction with the hot silicon dioxide, together with the burned fuel gas and other reaction products of the harmful gases generated in the fuel gas flame, are hydrolyzed in a further process step with a sorbent, if necessary, additionally neutralized.
  • fluorine compounds that are not thermally decomposed or chemically converted in the fuel gas flame are heated in the fuel gas flame, that is, chemically activated.
  • the silicon dioxide which is located on the surfaces mentioned, by the heat radiation and by convection of the hot combustion gases, is thermally activated for a reaction.
  • the two activated reactants react on the surfaces to form volatile silicon fluoride.
  • the fluorine compounds of the exhaust gas are converted the more completely, the more perfect the contact of the heated exhaust gas flow with the inner surfaces of the combustion chamber and / or the surfaces additionally introduced into the combustion chamber.
  • a prerequisite for this is a sufficient size, surface structure and the arrangement of these surfaces, another is given by the porosity of the silicon dioxide layer. The pores practically guarantee an enlarged reaction area for the heated pollutants.
  • the fluorine-containing exhaust gas instead of the fluorine-containing exhaust gas, only a silane-containing gas is supplied in this phase.
  • the composition and / or the amount of the fuel gas mixture is additionally adapted to the two sequential procedures. For example, the proportion of oxygen in the silicon dioxide separation is set higher than when the fluorine-containing exhaust gas is heated.
  • a silane-containing gas or directly silane can be supplied in the regeneration phase by switching valves instead of fluorine-containing exhaust gas.
  • the regeneration of the surfaces in the combustion chamber takes place, in which the cleaning of exhaust gases with fluorine-containing pollutants and the sequential deposition of porous silicon oxide on said surfaces of the combustion chamber takes place by introducing exhaust gases of different compositions, which occur in different CVD or plasma processes in semiconductor technology attack.
  • the material of the porous silicon dioxide layer is used up during their chemical conversion.
  • this exhaust gas is not only cleaned, but in this case this phase also serves to regenerate the silicon oxide layer on the surfaces of the combustion chamber.
  • An important application for the method according to the invention is the exhaust gas cleaning of CVD or plasma coating systems in which the inner surfaces of these systems are cleaned with the aid of plasma etching processes after coating processes.
  • Exhaust gases with fluorine-containing pollutants and with silane-containing pollutants occur in a plant for the technological production of semiconductor circuits in a natural sequence, for the purification of which only process parameters of the exhaust gas purification device need to be adjusted. For example, this is an increased feed of fuel gas mixture in the burner of the exhaust gas cleaning device during the deposition of silicon on the semiconductor wafers in the coating system.
  • the process according to the invention can also be used if fluorine-containing and silane-containing pollutants occur together in the exhaust gas, because the silanes are chemically converted in the volume of the combustion gas flame, the fluorine compounds preferably on the hot surfaces of the combustion chamber. In this case, silicon dioxide is consumed on these surfaces and the deposition, ie regeneration, simultaneous.
  • the process is carried out with a device which essentially consists of a preferably rotationally symmetrical combustion chamber with a burner arranged on one side of the combustion chamber, expediently a ring burner.
  • the arrangement of the axis of the combustion chamber in space is of no importance for the effectiveness of the process.
  • the ring burner is supplied with a fuel gas and oxygen or a fuel gas mixture (e.g. natural gas / oxygen or hydrogen / oxygen).
  • a fuel gas flame forms on the burner.
  • the exhaust gases, in particular with fluorine-containing and hydride-containing pollutants, are fed in through a feed, preferably in the center of the ring burner.
  • the exhaust gas is enclosed on all sides by the fuel gas flame through a central supply, an important prerequisite for effective exhaust gas heating in the interest of chemical decomposition and / or the chemical conversion of constituents of the supplied pollutants.
  • the walls of the combustion chamber are thermally insulated from the outer boundaries or cladding, as a result of which the wall surfaces of the combustion chamber are heated. They heat up to high temperatures
  • openings or gaps ensure that the burned fuel gases and decomposition or reaction products of the harmful gases are fed to the exhaust gas purification system directly or via a suction device, to further non-thermal sub-processes.
  • this is a washing section with e.g. an aqueous sorbent, optionally with a neutralizing agent.
  • the gas stream cleaned in this way then passes into the ventilation system or into the open.
  • the internal surfaces of the combustion chamber are mechanically, chemically or electro-chemically processed in their effectively effective surface compared to that results from the macroscopic dimensions of the combustion chamber parts, enlarged.
  • additional parts are arranged on the walls and / or in the space of the combustion chamber in the hot gas stream above the fuel gas flame. The surfaces of these additional parts increase the total area available for the deposition of silicon dioxide and thus as a reaction surface for the activated fluorine-containing harmful gases.
  • a further increase in the effective reaction surfaces is achieved if the surfaces of the additionally arranged parts are also processed in the manner mentioned .
  • the effective surface of the combustion chamber or parts arranged in it can be enlarged by a large number of processing methods. In the simplest case, such an enlarged surface is already achieved by rough turning, which creates grooves in the surfaces of the parts. Chemical or electrochemical etching enlarges the microscopically effective upper compartment through the formation of pores. However, porous, sieve-like or mesh-like coatings or braid can also be applied to the surfaces of the combustion chamber and / or the additional parts with the said goal. Heat and corrosion-resistant metals or ceramics are suitable as materials. Such coatings also improve the adhesive strength of the silicon dioxide layers to be deposited on these surfaces.
  • the instructions given for the design of the device ensure that a higher number of impacts occur between the gas molecules of the heated pollutants and the heated surfaces of the combustion chamber and additionally arranged parts. This is a prerequisite for the chemical reaction between the activated pollutant molecules and the activated silicon dioxide to occur on said surfaces with high certainty.
  • a higher number of collisions between the gas molecules of heated pollutants and the heated silicon dioxide surfaces can also be achieved in that the parts additionally arranged in the combustion chamber are designed in their geometrical shape in such a way that the hot gas flow or parts thereof on the way from the fuel gas flame to Wash section is forced to change direction several times.
  • This can be achieved, for example, with concentric rings, the lateral surfaces of which are angled several times in a zigzag shape relative to the axis of the combustion chamber.
  • the majority of the gas molecules can only hit the wall surfaces several times if the flow of the hot gases is turbulent.
  • Known ways of doing this are: a sufficient flow rate, sufficiently narrow ring channels, high combustion gas temperature and roughened surfaces. The latter has already been called for in the interest of creating large contact areas for the reaction.
  • Fig. 1 shows the device in a schematic longitudinal section.
  • the device according to the invention essentially consists of a cylindrical combustion chamber (1) made of stainless steel. It is 18 cm in diameter and 90 cm long. This combustion chamber is thermally insulated with the help of brackets (2,3,4,5) in an outer envelope (6). In the area of the end face (7) of the combustion chamber (1) there is an annular burner (8) to which the fuel gas mixture of hydrogen and oxygen is fed via a feed (9). The ring burner (8) has a diameter of 25 mm. The fuel gas flame (11) forms on the annular channel (10). The exhaust gas with the fluorine-containing and silane-containing pollutants is fed to the burner (8) via the central feed (12). It enters the fuel gas flame (11) centrally through the bore (13).
  • the inner wall of the combustion chamber is made of heat-resistant, corrosion-resistant sheet metal cylindrical body (14) used, which has 4 wavy ribs with an axial wavelength of 40 mm at a radial shaft height of 20 mm.
  • Two similarly constructed cylindrical bodies (15) and (16) are used on brackets (17), (18), (19) and (20) in the space of the combustion chamber between the combustion gas flame (11) and cover (21) of the combustion chamber. In this way, the flow of hot gases is divided into two cylindrical flow channels in the area of the additionally arranged surfaces, the radial width of each of which is approximately 25 mm. The gas flow is deflected four times in the direction of the body (arrows 22, 23, 24, 25).
  • Fine-meshed sieves with a wire thickness of 0.5 mm made of heat-resistant steel are attached to the cylindrical bodies in order to enlarge the effective surface.
  • a plasma CVD coating system 60 l / min of exhaust gas is generated in the first part of a technological cycle for the deposition of silicon dioxide on silicon wafers.
  • the exhaust gas consists of 57 l / min nitrogen and 3l / min silane as the predominant pollutant.
  • the internal components of the plasma CVD coating system are changed process control of contaminating silicon layers cleaned by a plasma etching process. This process is carried out with CF 4 and oxygen as the process gas.
  • the resulting exhaust gas consists not only of 48 l / min argon, but mainly of 2 l / min CF 4 and silicon tetrafluoride as pollutants.
  • a first cleaning phase for the exhaust gases generated during the coating (57 l / min nitrogen and 3 l / min silane), this is introduced via the feed (12) into the fuel gas flame, which by admitting 24 l / min hydrogen and 18 l / min min oxygen is maintained in the feed (9).
  • Silane is primarily burned as a toxic pollutant. Silicon dioxide is deposited on said surfaces of the combustion chamber.
  • the exhaust gas with fluorine-containing compounds is generated sequentially when cleaning the coating system.
  • the exhaust gas (48 l / min argon and 2 l / min CH 4 and in.) Is fed into the exhaust gas flame, which is maintained by feeding l / min of hydrogen and l / min of oxygen, through the feed (12) smaller amount of other pollutants)
  • the exhaust gas, especially the fluorine compounds are heated in the fuel gas flame to approx. 1400 ° C. It pulls (in Fig. 1 in the direction of arrow 22 to 25) through said heated parts of the combustion chamber and comes into intimate contact with their surfaces. As a result of a surface reaction with the silicon dioxide on the surfaces, CF 4 is converted to volatile hydrogen fluoride.
  • the hot fuel gases with the secondary reaction products from the two sequential exhaust gas purification phases enter the space (27) above the combustion chamber through the gap (26), are collected there and are extracted via the suction (28) fed to a washing device.
  • An aqueous sorbent is effective in the washing device.
  • the hot exhaust gases are cooled to around 50 ° C.
  • the hydrogen fluoride is absorbed either with water or a basic solution (KOH, K 2 CO 3 etc.).
  • the process has a high cleaning effect for chemically very differently behaving pollutants.
  • the pollutant content of fluorine-containing compounds in the exhaust air of the exhaust gas cleaning device is reduced to less than 10 ppm.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Environmental & Geological Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Incineration Of Waste (AREA)
EP96102121A 1995-03-30 1996-02-14 Procédé et dispositif pour la purification des effluents gazeux nocifs par conversion chimique Expired - Lifetime EP0735320B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19511643A DE19511643A1 (de) 1995-03-30 1995-03-30 Verfahren und Einrichtung zur Reinigung von schadstoffhaltigen Abgasen durch chemische Umsetzung
DE19511643 1995-03-30

Publications (3)

Publication Number Publication Date
EP0735320A2 true EP0735320A2 (fr) 1996-10-02
EP0735320A3 EP0735320A3 (fr) 1997-03-26
EP0735320B1 EP0735320B1 (fr) 2000-10-11

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP96102121A Expired - Lifetime EP0735320B1 (fr) 1995-03-30 1996-02-14 Procédé et dispositif pour la purification des effluents gazeux nocifs par conversion chimique

Country Status (2)

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EP (1) EP0735320B1 (fr)
DE (2) DE19511643A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2308991A (en) * 1996-01-12 1997-07-16 Das Dunnschicht Anlagen System Purification of waste gas
WO2026085161A1 (fr) * 2024-10-16 2026-04-23 The Chemours Company Fc, Llc Oxydation thermique régénérative de composés fluorés

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2323312B (en) * 1997-03-21 2001-08-08 Korea M A T Co Ltd Gas scrubber and methods of disposing a gas using the same
DE29712026U1 (de) * 1997-07-09 1998-11-12 EBARA Germany GmbH, 63452 Hanau Brenner für die Verbrennung von Abgasen mit mindestens einer kondensationsfähigen Komponente
TW506852B (en) * 2000-08-28 2002-10-21 Promos Technologies Inc Device and method for processing exhaust from process chamber
DE102006052586B4 (de) * 2006-11-08 2008-07-03 Schott Solar Gmbh Verfahren und Vorrichtung zur Reinigung der Abgase einer Siliziumdünnschicht-Produktionsanlage
CN116428596A (zh) * 2022-12-30 2023-07-14 江苏优瑞德环境科技有限公司 一种含氟废气废液焚烧处理工艺

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Publication number Priority date Publication date Assignee Title
SE431196B (sv) * 1980-12-12 1984-01-23 Flemmert Goesta Lennart Sett att genom hydrolys av kiseltetrafluorid i en laga framstella finfordelad kiseloxid
DE3144744C2 (de) * 1981-11-11 1984-04-12 Lafarge Réfractaires, 92542 Montronge Heizungskessel
DD221088A1 (de) * 1983-09-12 1985-04-17 Univ Schiller Jena Verfahren und anordnung zur entgiftung von f-kohlenstoffhaltigen abgasen
DE3529309A1 (de) * 1985-08-16 1987-03-19 Hoechst Ag Vorrichtung zum verbrennen von fluorkohlenwasserstoffen
DD273008A1 (de) * 1988-06-15 1989-11-01 Elektromat Veb Vorrichtung zum reinigen von abgasen aus niederdruckprozessen
US4957717A (en) * 1989-01-09 1990-09-18 Nippon Shokubai Kagaku Kogyo Co., Ltd. Method of disposal of organic chlorine compounds by combustion
DE4107595C2 (de) * 1991-03-09 1994-02-17 Forschungszentrum Juelich Gmbh Metallischer Katalysator zur Entfernung von Wasserstoff aus einem Wasserstoff und Sauerstoff enthaltenden Gasgemisch und Verfahren zu seiner Herstellung
DE4413734C2 (de) * 1993-04-29 1996-02-29 Univ Karlsruhe Katalysatoren für die Verbrennung chlorierter Kohlenwasserstoffe
DE4319118A1 (de) * 1993-06-09 1994-12-15 Breitbarth Friedrich Wilhelm D Verfahren und Vorrichtung zur Entsorgung von Fluorkohlenstoffen und anderen fluorhaltigen Verbindungen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2308991A (en) * 1996-01-12 1997-07-16 Das Dunnschicht Anlagen System Purification of waste gas
WO2026085161A1 (fr) * 2024-10-16 2026-04-23 The Chemours Company Fc, Llc Oxydation thermique régénérative de composés fluorés

Also Published As

Publication number Publication date
EP0735320A3 (fr) 1997-03-26
EP0735320B1 (fr) 2000-10-11
DE59605974D1 (de) 2000-11-16
DE19511643A1 (de) 1996-10-02

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