EP0821077A3 - Objet revêtu d'une couche de carbone et procédé pour sa production - Google Patents
Objet revêtu d'une couche de carbone et procédé pour sa production Download PDFInfo
- Publication number
- EP0821077A3 EP0821077A3 EP97110500A EP97110500A EP0821077A3 EP 0821077 A3 EP0821077 A3 EP 0821077A3 EP 97110500 A EP97110500 A EP 97110500A EP 97110500 A EP97110500 A EP 97110500A EP 0821077 A3 EP0821077 A3 EP 0821077A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- carbon film
- contact
- manufacturing
- same
- well
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title abstract 3
- 229910052799 carbon Inorganic materials 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000004888 barrier function Effects 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000002861 polymer material Substances 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000005060 rubber Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S427/00—Coating processes
- Y10S427/103—Diamond-like carbon coating, i.e. DLC
- Y10S427/104—Utilizing low energy electromagnetic radiation, e.g. microwave, radio wave, IR, UV, visible, actinic laser
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP03012938A EP1340835B1 (fr) | 1996-06-27 | 1997-06-26 | Objet revêtu d'une couche de carbone et procédé pour sa production |
Applications Claiming Priority (15)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP167027/96 | 1996-06-27 | ||
| JP16702796A JP3374661B2 (ja) | 1996-06-27 | 1996-06-27 | 画像形成装置回転部品及びその製造方法 |
| JP16702796 | 1996-06-27 | ||
| JP20291796A JP3861332B2 (ja) | 1996-07-13 | 1996-07-13 | 自転車用部品及びその製造方法 |
| JP202916/96 | 1996-07-13 | ||
| JP202917/96 | 1996-07-13 | ||
| JP20291796 | 1996-07-13 | ||
| JP20291696 | 1996-07-13 | ||
| JP20291696A JP3637687B2 (ja) | 1996-07-13 | 1996-07-13 | 自動車用ダイヤフラムの製造方法 |
| JP227456/96 | 1996-08-08 | ||
| JP22745696 | 1996-08-08 | ||
| JP22745696A JP3791060B2 (ja) | 1996-08-08 | 1996-08-08 | ゴム・樹脂にダイヤモンド状炭素膜を形成する方法 |
| JP22113396 | 1996-08-22 | ||
| JP22113396A JP3355950B2 (ja) | 1996-08-22 | 1996-08-22 | 機械部品及びその製造方法 |
| JP221133/96 | 1996-08-22 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP03012938A Division EP1340835B1 (fr) | 1996-06-27 | 1997-06-26 | Objet revêtu d'une couche de carbone et procédé pour sa production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0821077A2 EP0821077A2 (fr) | 1998-01-28 |
| EP0821077A3 true EP0821077A3 (fr) | 2000-09-06 |
Family
ID=27528418
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP97110500A Withdrawn EP0821077A3 (fr) | 1996-06-27 | 1997-06-26 | Objet revêtu d'une couche de carbone et procédé pour sa production |
| EP03012938A Expired - Lifetime EP1340835B1 (fr) | 1996-06-27 | 1997-06-26 | Objet revêtu d'une couche de carbone et procédé pour sa production |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP03012938A Expired - Lifetime EP1340835B1 (fr) | 1996-06-27 | 1997-06-26 | Objet revêtu d'une couche de carbone et procédé pour sa production |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6136386A (fr) |
| EP (2) | EP0821077A3 (fr) |
| CA (1) | CA2208718C (fr) |
| DE (1) | DE69736790T2 (fr) |
Families Citing this family (70)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3119172B2 (ja) * | 1995-09-13 | 2000-12-18 | 日新電機株式会社 | プラズマcvd法及び装置 |
| JP4013271B2 (ja) * | 1997-01-16 | 2007-11-28 | 日新電機株式会社 | 物品表面処理方法及び装置 |
| JP3469761B2 (ja) * | 1997-10-30 | 2003-11-25 | 東京エレクトロン株式会社 | 半導体デバイスの製造方法 |
| KR100436829B1 (ko) * | 1999-06-18 | 2004-06-23 | 닛신덴키 가부시키 가이샤 | 탄소막 및 그 형성방법, 탄소막 피복물품 및 그 제조방법 |
| US20010044028A1 (en) * | 1999-12-30 | 2001-11-22 | Anderson Jerrel Charles | Diamond-like carbon coated pet film and pet film glass laminate glazing structures for added hardness and abrasion resistance |
| CN1222036C (zh) * | 2000-02-15 | 2005-10-05 | 株式会社日立制作所 | 半导体器件制造方法和半导体器件的制造装置 |
| DE10025689A1 (de) | 2000-05-24 | 2001-12-06 | Bosch Gmbh Robert | Verfahren und Vorrichtung zum Beschichten von mindestens einem Wischgummi |
| US6713179B2 (en) | 2000-05-24 | 2004-03-30 | Guardian Industries Corp. | Hydrophilic DLC on substrate with UV exposure |
| US6524755B2 (en) | 2000-09-07 | 2003-02-25 | Gray Scale Technologies, Inc. | Phase-shift masks and methods of fabrication |
| JP3921934B2 (ja) * | 2000-10-12 | 2007-05-30 | 日新電機株式会社 | 使用時に人体皮膚が接触する物品 |
| JP3985444B2 (ja) * | 2000-10-17 | 2007-10-03 | 日新電機株式会社 | 軟質基材表面への炭素膜の形成方法 |
| US6458462B1 (en) | 2000-12-13 | 2002-10-01 | 3M Innovative Properties Company | Sporting goods having a ceramer coating |
| WO2002100928A1 (fr) * | 2001-06-12 | 2002-12-19 | North Carolina State University | Revetements d'arret pour materiaux elastomeres |
| DE10139305A1 (de) * | 2001-08-07 | 2003-03-06 | Schott Glas | Verbundmaterial aus einem Substratmaterial und einem Barriereschichtmaterial |
| US7106939B2 (en) * | 2001-09-19 | 2006-09-12 | 3M Innovative Properties Company | Optical and optoelectronic articles |
| US6802784B2 (en) * | 2002-05-29 | 2004-10-12 | Acushnet Company | Golf ball containing graphite nanosheets in a polymeric network |
| US20060128505A1 (en) * | 2001-10-09 | 2006-06-15 | Sullivan Michael J | Golf ball layers having improved barrier properties |
| EP1323942B1 (fr) * | 2001-12-25 | 2005-08-10 | Toyoda Koki Kabushiki Kaisha | Disque d'embrayage, embrayage à friction et dispositif d'embrayage |
| JP3961879B2 (ja) * | 2002-05-24 | 2007-08-22 | 株式会社豊田中央研究所 | 摩擦クラッチ及び駆動力伝達装置 |
| JP2004084899A (ja) * | 2002-08-29 | 2004-03-18 | Toyoda Mach Works Ltd | 駆動力伝達装置 |
| WO2004042373A1 (fr) * | 2002-11-06 | 2004-05-21 | Koninklijke Philips Electronics N.V. | Procede de mesure de l'adherence a l'interface de couches |
| US7866342B2 (en) | 2002-12-18 | 2011-01-11 | Vapor Technologies, Inc. | Valve component for faucet |
| US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
| US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
| US8555921B2 (en) | 2002-12-18 | 2013-10-15 | Vapor Technologies Inc. | Faucet component with coating |
| US7387081B2 (en) * | 2003-01-23 | 2008-06-17 | 3M Innovative Properties Company | Plasma reactor including helical electrodes |
| TW200511430A (en) * | 2003-05-29 | 2005-03-16 | Tokyo Electron Ltd | Plasma processing apparatus and plasma processing method |
| FR2865015A1 (fr) * | 2004-01-09 | 2005-07-15 | Hutchinson | Tuyau souple de transfert de fluide impermeable |
| KR100626005B1 (ko) * | 2004-06-09 | 2006-09-20 | 삼성에스디아이 주식회사 | 유기 전계 발광 소자 |
| JP2006138404A (ja) | 2004-11-12 | 2006-06-01 | Kobe Steel Ltd | 水系環境下での耐摩耗性に優れた摺動部材 |
| US20060159848A1 (en) * | 2005-01-20 | 2006-07-20 | Yucong Wang | Method of making wear-resistant components |
| US7833933B2 (en) * | 2005-11-28 | 2010-11-16 | Haldor Topsøe A/S | Process for the preparation of a paraffin isomerization catalyst |
| KR20090024805A (ko) * | 2006-06-22 | 2009-03-09 | 다이킨 고교 가부시키가이샤 | 밀봉재, 상기 밀봉재를 갖는 플라즈마 처리 장치용 부품 및상기 밀봉재의 제조 방법 |
| US20080038462A1 (en) * | 2006-08-09 | 2008-02-14 | Qimonda Ag | Method of forming a carbon layer on a substrate |
| ES2384470T3 (es) * | 2006-08-23 | 2012-07-05 | Europlasma Nv | Método para pretratar materiales plásticos compuestos reforzados con fibras antes de pintarlos y método para aplicar una capa de pintura sobre los materiales plásticos compuestos reforzados con fibras |
| KR100891540B1 (ko) * | 2007-06-12 | 2009-04-03 | 한국생산기술연구원 | 질소가 함유된 디엘씨 코팅방법 |
| US20090169275A1 (en) * | 2007-12-26 | 2009-07-02 | Kabushiki Kaisha Toshiba | Transfer member in image forming apparatus and image forming apparatus |
| GB0810326D0 (en) * | 2008-06-06 | 2008-07-09 | P2I Ltd | Filtration media |
| US8178802B2 (en) | 2008-07-31 | 2012-05-15 | Electrolux Home Products, Inc. | Unitized appliance control panel assembly and components of the assembly |
| US20100201088A1 (en) * | 2009-02-06 | 2010-08-12 | Martin Newman | Compressive coatings for ice skate blades and methods for applying the same |
| KR101534357B1 (ko) * | 2009-03-31 | 2015-07-06 | 도쿄엘렉트론가부시키가이샤 | 기판 지지 장치 및 기판 지지 방법 |
| US20100279103A1 (en) * | 2009-04-29 | 2010-11-04 | Xerox Corporation | Hydrophobic fluorinated nano diamond containing intermediate transfer members |
| IT1394221B1 (it) * | 2009-05-15 | 2012-06-01 | Colbachini Spa | Tubo flessibile di tipo perfezionato per il trasporto di materiali fluidi e di corrente elettrica. |
| US8920213B2 (en) | 2010-03-04 | 2014-12-30 | Omax Corporation | Abrasive jet systems, including abrasive jet systems utilizing fluid repelling materials, and associated methods |
| DE102010002687C5 (de) * | 2010-03-09 | 2015-09-10 | Federal-Mogul Burscheid Gmbh | Verfahren zur Beschichtung zumindest der Innenfläche eines Kolbenrings sowie Kolbenring |
| GB201011513D0 (en) | 2010-07-08 | 2010-08-25 | Danisco | Method |
| JP2012026023A (ja) * | 2010-07-28 | 2012-02-09 | Hitachi Powdered Metals Co Ltd | 鉄基焼結部材 |
| JP5412402B2 (ja) | 2010-11-02 | 2014-02-12 | 株式会社日立製作所 | 摺動部品およびそれを用いた機械装置 |
| WO2012074859A1 (fr) * | 2010-12-01 | 2012-06-07 | Novartis Ag | Moules de lentille ayant des revêtements à plasma atmosphérique |
| US9586306B2 (en) | 2012-08-13 | 2017-03-07 | Omax Corporation | Method and apparatus for monitoring particle laden pneumatic abrasive flow in an abrasive fluid jet cutting system |
| US9404334B2 (en) | 2012-08-31 | 2016-08-02 | Baker Hughes Incorporated | Downhole elastomeric components including barrier coatings |
| JP6672091B2 (ja) * | 2016-06-24 | 2020-03-25 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
| US11577366B2 (en) | 2016-12-12 | 2023-02-14 | Omax Corporation | Recirculation of wet abrasive material in abrasive waterjet systems and related technology |
| CN107142463B (zh) * | 2017-04-27 | 2019-03-05 | 湖州金象科技股份有限公司 | 一种等离子体化学气相沉积与磁控溅射或离子镀复合的镀覆方法 |
| US11224987B1 (en) | 2018-03-09 | 2022-01-18 | Omax Corporation | Abrasive-collecting container of a waterjet system and related technology |
| JP7148919B2 (ja) | 2018-06-25 | 2022-10-06 | 三菱電線工業株式会社 | シリコーンゴム成形体 |
| US12350790B2 (en) | 2019-07-29 | 2025-07-08 | Hypertherm, Inc. | Measuring abrasive flow rates in a conduit |
| US12403621B2 (en) | 2019-12-20 | 2025-09-02 | Hypertherm, Inc. | Motorized systems and associated methods for controlling an adjustable dump orifice on a liquid jet cutting system |
| EP4127527A1 (fr) | 2020-03-24 | 2023-02-08 | Hypertherm, Inc. | Joint haute pression pour système de coupe à jet de liquide |
| CN115768597A (zh) | 2020-03-26 | 2023-03-07 | 海别得公司 | 自由调速止回阀 |
| KR20230005840A (ko) | 2020-03-30 | 2023-01-10 | 하이퍼썸, 인크. | 다기능 접속 종방향 단부들을 갖는 액체 제트 펌프를 위한 실린더 |
| US12431354B2 (en) * | 2020-07-01 | 2025-09-30 | Asm Ip Holding B.V. | Silicon nitride and silicon oxide deposition methods using fluorine inhibitor |
| CN112251738A (zh) * | 2020-09-30 | 2021-01-22 | 深圳市创智捷科技有限公司 | 一种等离子化学气相沉基材表面纳米膜的制备方法 |
| CN114695051B (zh) * | 2020-12-31 | 2025-02-21 | 拓荆科技股份有限公司 | 半导体处理设备及方法 |
| KR20230063041A (ko) * | 2021-11-01 | 2023-05-09 | 주식회사 원익아이피에스 | 박막 증착 방법 |
| DE102022203401A1 (de) * | 2022-04-06 | 2023-10-12 | Robert Bosch Gesellschaft mit beschränkter Haftung | Verfahren zur Reinigung zumindest einer Oberseite eines Substrats |
| US12256479B2 (en) * | 2023-05-08 | 2025-03-18 | Honeywell Federal Manufacturing & Technologies, Llc | Carbonous materials for radio frequency heating in reaction systems |
| CN117070925A (zh) * | 2023-08-28 | 2023-11-17 | 中国科学院兰州化学物理研究所 | 一种柔性包装材料表面类金刚石阻湿涂层及其制备方法和应用 |
| CN116947398B (zh) * | 2023-09-14 | 2023-11-24 | 成都源盟石油科技有限公司 | 一种树脂水泥浆体及其制备方法 |
| CN117298883A (zh) * | 2023-09-28 | 2023-12-29 | 常州大学 | 一种量子点/有机硅混合基质膜及其制备方法和渗透汽化应用 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0330524A1 (fr) * | 1988-02-26 | 1989-08-30 | Semiconductor Energy Laboratory Co., Ltd. | Dépôt de couches minces en carbone |
| JPH03130363A (ja) * | 1989-10-16 | 1991-06-04 | Nikon Corp | ダイヤモンド状炭素膜被覆プラスチツック物品 |
| JPH0441672A (ja) * | 1990-06-04 | 1992-02-12 | Tdk Corp | 高周波プラズマcvd法による炭素膜の形成法 |
| EP0653501A1 (fr) * | 1993-11-11 | 1995-05-17 | Nissin Electric Company, Limited | Dispositif et procédé de dépôt chimique en phase vapeur assisté par plasma |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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- 1997-06-26 DE DE69736790T patent/DE69736790T2/de not_active Expired - Fee Related
- 1997-06-26 EP EP97110500A patent/EP0821077A3/fr not_active Withdrawn
- 1997-06-26 CA CA002208718A patent/CA2208718C/fr not_active Expired - Fee Related
- 1997-06-26 EP EP03012938A patent/EP1340835B1/fr not_active Expired - Lifetime
- 1997-06-27 US US08/884,554 patent/US6136386A/en not_active Expired - Lifetime
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| IQBAL S ATHWAL ET AL: "DLC FILMS BY PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION NEAR ROOM TEMPERATURE", DIAMOND AND RELATED MATERIALS,NL,ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, vol. 2, no. 12, 1 November 1993 (1993-11-01), pages 1483 - 1489, XP000413556, ISSN: 0925-9635 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CA2208718C (fr) | 2005-01-25 |
| DE69736790D1 (de) | 2006-11-16 |
| CA2208718A1 (fr) | 1997-12-27 |
| EP0821077A2 (fr) | 1998-01-28 |
| EP1340835A3 (fr) | 2003-11-26 |
| EP1340835B1 (fr) | 2006-10-04 |
| EP1340835A2 (fr) | 2003-09-03 |
| DE69736790T2 (de) | 2007-08-16 |
| US6136386A (en) | 2000-10-24 |
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