EP0881865A3 - Dispositif de production d'une pluralité de jets de plasma basse température - Google Patents

Dispositif de production d'une pluralité de jets de plasma basse température Download PDF

Info

Publication number
EP0881865A3
EP0881865A3 EP98109597A EP98109597A EP0881865A3 EP 0881865 A3 EP0881865 A3 EP 0881865A3 EP 98109597 A EP98109597 A EP 98109597A EP 98109597 A EP98109597 A EP 98109597A EP 0881865 A3 EP0881865 A3 EP 0881865A3
Authority
EP
European Patent Office
Prior art keywords
hollow cathode
plasma jets
low temperature
temperature plasma
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP98109597A
Other languages
German (de)
English (en)
Other versions
EP0881865A2 (fr
EP0881865B1 (fr
Inventor
Jürgen Prof. Dr. Dr. h.c. Engemann
Darius Dr. Korzec
Mark Mildner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JE PlasmaConsult GmbH
Original Assignee
JE PlasmaConsult GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JE PlasmaConsult GmbH filed Critical JE PlasmaConsult GmbH
Publication of EP0881865A2 publication Critical patent/EP0881865A2/fr
Publication of EP0881865A3 publication Critical patent/EP0881865A3/fr
Application granted granted Critical
Publication of EP0881865B1 publication Critical patent/EP0881865B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H05H1/481—Hollow cathodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
EP98109597A 1997-05-30 1998-05-27 Dispositif de production d'une pluralité de jets de plasma basse température Expired - Lifetime EP0881865B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19722624 1997-05-30
DE19722624A DE19722624C2 (de) 1997-05-30 1997-05-30 Vorrichtung zur Erzeugung einer Vielzahl von Niedertemperatur-Plasmajets

Publications (3)

Publication Number Publication Date
EP0881865A2 EP0881865A2 (fr) 1998-12-02
EP0881865A3 true EP0881865A3 (fr) 2000-06-28
EP0881865B1 EP0881865B1 (fr) 2002-09-18

Family

ID=7830910

Family Applications (1)

Application Number Title Priority Date Filing Date
EP98109597A Expired - Lifetime EP0881865B1 (fr) 1997-05-30 1998-05-27 Dispositif de production d'une pluralité de jets de plasma basse température

Country Status (2)

Country Link
EP (1) EP0881865B1 (fr)
DE (2) DE19722624C2 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7721673B2 (en) 2006-11-03 2010-05-25 Industrial Technology Research Institute Hollow cathode discharging apparatus
CN107852805A (zh) * 2014-12-05 2018-03-27 Agc玻璃欧洲公司 空心阴极等离子体源

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE516336C2 (sv) * 1999-04-28 2001-12-17 Hana Barankova Apparat för plasmabehandling av ytor
ATE245310T1 (de) * 2000-03-14 2003-08-15 Fraunhofer Ges Forschung Verfahren und vorrichtung zur plasmagestützten oberflächenbehandlung und verwendung des verfahrens
DE10120405B4 (de) * 2001-04-25 2008-08-21 Je Plasmaconsult Gmbh Vorrichtung zur Erzeugung eines Niedertemperatur-Plasmas
DE10203543B4 (de) * 2002-01-29 2008-04-30 Je Plasmaconsult Gmbh Vorrichtung zur Erzeugung eines APG-Plasmas
DE102004029081A1 (de) * 2004-06-16 2006-01-05 Je Plasmaconsult Gmbh Vorrichtung zur Bearbeitung eines Substrates mittels mindestens eines Plasma-Jets
DE102005032890B4 (de) * 2005-07-14 2009-01-29 Je Plasmaconsult Gmbh Vorrichtung zur Erzeugung von Atmosphärendruck-Plasmen
GB0612814D0 (en) * 2006-06-28 2006-08-09 Boc Group Plc Method of treating a gas stream
CN100559546C (zh) * 2006-11-21 2009-11-11 财团法人工业技术研究院 中空式阴极放电装置
FR2912864B1 (fr) 2007-02-15 2009-07-31 H E F Soc Par Actions Simplifi Dispositif pour generer un plasma froid dans une enceinte sous vide et utilisation du dispositif pour des traitements thermochimiques
KR101602517B1 (ko) 2008-08-04 2016-03-10 에이지씨 플랫 글래스 노스 아메리카, 인코퍼레이티드 Ｐｅｃｖｄ를 이용한 박막 코팅을 증착하기 위한 플라즈마 소스 및 방법
CN101730374B (zh) * 2008-10-30 2012-05-09 财团法人工业技术研究院 等离子体系统
DE102010027570B3 (de) 2010-07-19 2011-11-10 Eagleburgmann Germany Gmbh & Co. Kg Faltenbalg-Kompensator
RU2466514C2 (ru) * 2011-02-09 2012-11-10 Государственное образовательное учреждение высшего профессионального образования "Камская государственная инженерно-экономическая академия" (ИНЭКА) Способ получения электрического разряда в парах электролита и устройство для его осуществления
ES2900321T3 (es) 2014-12-05 2022-03-16 Agc Flat Glass Na Inc Fuente de plasma que utiliza un recubrimiento de reducción de macropartículas y procedimiento para usar una fuente de plasma que utiliza un recubrimiento de reducción de macropartículas para la deposición de recubrimientos de película delgada y modificación de superficies
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current
US10573499B2 (en) 2015-12-18 2020-02-25 Agc Flat Glass North America, Inc. Method of extracting and accelerating ions
US10242846B2 (en) 2015-12-18 2019-03-26 Agc Flat Glass North America, Inc. Hollow cathode ion source
EP3474635B1 (fr) 2017-10-17 2021-08-18 Leibniz-Institut für Plasmaforschung und Technologie e.V. Système de traitement à jet de plasma modulaire
FR3115180B1 (fr) * 2020-10-14 2022-11-04 Peter Choi Appareil de génération de plasma

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502829A1 (fr) * 1991-03-04 1992-09-09 PROEL TECNOLOGIE S.p.A. Dispositif à cathode creuse non chauffée pour la production dynamique de plasma
DE4233895A1 (de) * 1992-10-08 1994-04-14 Juergen Prof Dr Engemann Verfahren und Vorrichtung zur Plasmabehandlung bahnförmiger Materialien
EP0727508A1 (fr) * 1995-02-16 1996-08-21 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Procédé et appareil de traitement de surfaces de substrats

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CS246982B1 (en) * 1985-06-17 1986-11-13 Ladislav Bardos Method and apparatus for producing chemically active environment for plasma chemical reactions namely for deposition of thin layers
US4954751A (en) * 1986-03-12 1990-09-04 Kaufman Harold R Radio frequency hollow cathode
US5464667A (en) * 1994-08-16 1995-11-07 Minnesota Mining And Manufacturing Company Jet plasma process and apparatus
SE9403988L (sv) * 1994-11-18 1996-04-01 Ladislav Bardos Apparat för alstring av linjär ljusbågsurladdning för plasmabearbetning
DE19541236A1 (de) * 1995-11-06 1997-05-07 Leybold Ag Vorrichtung zum Beschichten der Oberflächen von als Rotationskörper ausgeformten Substraten

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502829A1 (fr) * 1991-03-04 1992-09-09 PROEL TECNOLOGIE S.p.A. Dispositif à cathode creuse non chauffée pour la production dynamique de plasma
DE4233895A1 (de) * 1992-10-08 1994-04-14 Juergen Prof Dr Engemann Verfahren und Vorrichtung zur Plasmabehandlung bahnförmiger Materialien
EP0727508A1 (fr) * 1995-02-16 1996-08-21 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Procédé et appareil de traitement de surfaces de substrats

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7721673B2 (en) 2006-11-03 2010-05-25 Industrial Technology Research Institute Hollow cathode discharging apparatus
CN107852805A (zh) * 2014-12-05 2018-03-27 Agc玻璃欧洲公司 空心阴极等离子体源
CN107852805B (zh) * 2014-12-05 2020-10-16 Agc玻璃欧洲公司 空心阴极等离子体源

Also Published As

Publication number Publication date
DE59805573D1 (de) 2002-10-24
EP0881865A2 (fr) 1998-12-02
DE19722624A1 (de) 1998-12-03
DE19722624C2 (de) 2001-08-09
EP0881865B1 (fr) 2002-09-18

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