EP0913833A3 - Dispositif de mémoire non-volatile à semi-conducteur - Google Patents
Dispositif de mémoire non-volatile à semi-conducteur Download PDFInfo
- Publication number
- EP0913833A3 EP0913833A3 EP98308874A EP98308874A EP0913833A3 EP 0913833 A3 EP0913833 A3 EP 0913833A3 EP 98308874 A EP98308874 A EP 98308874A EP 98308874 A EP98308874 A EP 98308874A EP 0913833 A3 EP0913833 A3 EP 0913833A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- memory cell
- voltage
- control gate
- drain
- bit lines
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000011159 matrix material Substances 0.000 abstract 2
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
- G11C16/12—Programming voltage switching circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
- G11C16/14—Circuits for erasing electrically, e.g. erase voltage switching circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0491—Virtual ground arrays
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/10—Programming or data input circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/30—Power supply circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/68—Floating-gate IGFETs
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Read Only Memory (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29916797A JP3558510B2 (ja) | 1997-10-30 | 1997-10-30 | 不揮発性半導体記憶装置 |
| JP29916797 | 1997-10-30 | ||
| JP299167/97 | 1997-10-30 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP0913833A2 EP0913833A2 (fr) | 1999-05-06 |
| EP0913833A3 true EP0913833A3 (fr) | 1999-10-06 |
| EP0913833B1 EP0913833B1 (fr) | 2005-12-07 |
Family
ID=17869001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP98308874A Expired - Lifetime EP0913833B1 (fr) | 1997-10-30 | 1998-10-29 | Dispositif de mémoire non-volatile à semi-conducteur |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6067251A (fr) |
| EP (1) | EP0913833B1 (fr) |
| JP (1) | JP3558510B2 (fr) |
| KR (1) | KR19990037481A (fr) |
| DE (1) | DE69832683T2 (fr) |
| TW (1) | TW415070B (fr) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10008002C2 (de) * | 2000-02-22 | 2003-04-10 | X Fab Semiconductor Foundries | Split-gate-Flash-Speicherelement, Anordnung von Split-gate-Flash-Speicherelementen und Methode zum Löschen derselben |
| JP2002026154A (ja) | 2000-07-11 | 2002-01-25 | Sanyo Electric Co Ltd | 半導体メモリおよび半導体装置 |
| DE60133619T2 (de) * | 2000-12-05 | 2009-06-10 | Halo Lsi Design And Device Technology Inc. | Programmier- und Löschverfahren in Zwilling-MONOS-Zellenspeichern |
| US7057938B2 (en) * | 2002-03-29 | 2006-06-06 | Macronix International Co., Ltd. | Nonvolatile memory cell and operating method |
| US6649453B1 (en) * | 2002-08-29 | 2003-11-18 | Micron Technology, Inc. | Contactless uniform-tunneling separate p-well (CUSP) non-volatile memory array architecture, fabrication and operation |
| US7151692B2 (en) * | 2004-01-27 | 2006-12-19 | Macronix International Co., Ltd. | Operation scheme for programming charge trapping non-volatile memory |
| US7075828B2 (en) * | 2004-04-26 | 2006-07-11 | Macronix International Co., Intl. | Operation scheme with charge balancing erase for charge trapping non-volatile memory |
| CN100463138C (zh) * | 2004-04-26 | 2009-02-18 | 旺宏电子股份有限公司 | 电荷陷入非易失性存储器的电荷平衡操作方法 |
| US7133313B2 (en) * | 2004-04-26 | 2006-11-07 | Macronix International Co., Ltd. | Operation scheme with charge balancing for charge trapping non-volatile memory |
| US7209390B2 (en) * | 2004-04-26 | 2007-04-24 | Macronix International Co., Ltd. | Operation scheme for spectrum shift in charge trapping non-volatile memory |
| US7164603B2 (en) * | 2004-04-26 | 2007-01-16 | Yen-Hao Shih | Operation scheme with high work function gate and charge balancing for charge trapping non-volatile memory |
| US7190614B2 (en) * | 2004-06-17 | 2007-03-13 | Macronix International Co., Ltd. | Operation scheme for programming charge trapping non-volatile memory |
| US20060113586A1 (en) * | 2004-11-29 | 2006-06-01 | Macronix International Co., Ltd. | Charge trapping dielectric structure for non-volatile memory |
| JP4683995B2 (ja) * | 2005-04-28 | 2011-05-18 | ルネサスエレクトロニクス株式会社 | 不揮発性半導体記憶装置 |
| US7397699B2 (en) * | 2005-07-27 | 2008-07-08 | Atmel Corporation | Channel discharging after erasing flash memory devices |
| US7242622B2 (en) * | 2005-12-06 | 2007-07-10 | Macronix International Co., Ltd. | Methods to resolve hard-to-erase condition in charge trapping non-volatile memory |
| US8223540B2 (en) | 2007-02-02 | 2012-07-17 | Macronix International Co., Ltd. | Method and apparatus for double-sided biasing of nonvolatile memory |
| US7486567B2 (en) * | 2007-04-30 | 2009-02-03 | Macronix International Co., Ltd | Method for high speed programming of a charge trapping memory with an enhanced charge trapping site |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3851317A (en) * | 1973-05-04 | 1974-11-26 | Ibm | Double density non-volatile memory array |
| EP0573170A1 (fr) * | 1992-06-01 | 1993-12-08 | National Semiconductor Corporation | Réseau de cellules EEPROM à haute densité d'intégration présentant un schéma de programmation nouveau et procédé de fabrication |
| EP0697702A2 (fr) * | 1994-08-19 | 1996-02-21 | Kabushiki Kaisha Toshiba | Dispositif de mémoire à semi-conducteur et circuit de commutation à haut voltage |
| US5546402A (en) * | 1992-09-11 | 1996-08-13 | International Business Machines Corporation | Flash-erase-type nonvolatile semiconductor storage device |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5222040A (en) * | 1990-12-11 | 1993-06-22 | Nexcom Technology, Inc. | Single transistor eeprom memory cell |
| JP3231437B2 (ja) * | 1992-07-06 | 2001-11-19 | 株式会社日立製作所 | 不揮発性半導体記憶装置 |
| US5515319A (en) * | 1993-10-12 | 1996-05-07 | Texas Instruments Incorporated | Non-volatile memory cell and level shifter |
| JP3273582B2 (ja) * | 1994-05-13 | 2002-04-08 | キヤノン株式会社 | 記憶装置 |
| US6475846B1 (en) * | 1995-05-18 | 2002-11-05 | Texas Instruments Incorporated | Method of making floating-gate memory-cell array with digital logic transistors |
| US5789776A (en) * | 1995-09-22 | 1998-08-04 | Nvx Corporation | Single poly memory cell and array |
-
1997
- 1997-10-30 JP JP29916797A patent/JP3558510B2/ja not_active Expired - Fee Related
-
1998
- 1998-10-27 US US09/179,914 patent/US6067251A/en not_active Expired - Lifetime
- 1998-10-29 KR KR1019980045665A patent/KR19990037481A/ko not_active Ceased
- 1998-10-29 EP EP98308874A patent/EP0913833B1/fr not_active Expired - Lifetime
- 1998-10-29 DE DE69832683T patent/DE69832683T2/de not_active Expired - Fee Related
- 1998-10-30 TW TW087118083A patent/TW415070B/zh not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3851317A (en) * | 1973-05-04 | 1974-11-26 | Ibm | Double density non-volatile memory array |
| EP0573170A1 (fr) * | 1992-06-01 | 1993-12-08 | National Semiconductor Corporation | Réseau de cellules EEPROM à haute densité d'intégration présentant un schéma de programmation nouveau et procédé de fabrication |
| US5546402A (en) * | 1992-09-11 | 1996-08-13 | International Business Machines Corporation | Flash-erase-type nonvolatile semiconductor storage device |
| EP0697702A2 (fr) * | 1994-08-19 | 1996-02-21 | Kabushiki Kaisha Toshiba | Dispositif de mémoire à semi-conducteur et circuit de commutation à haut voltage |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11134886A (ja) | 1999-05-21 |
| JP3558510B2 (ja) | 2004-08-25 |
| US6067251A (en) | 2000-05-23 |
| DE69832683D1 (de) | 2006-01-12 |
| KR19990037481A (ko) | 1999-05-25 |
| EP0913833A2 (fr) | 1999-05-06 |
| TW415070B (en) | 2000-12-11 |
| EP0913833B1 (fr) | 2005-12-07 |
| DE69832683T2 (de) | 2006-08-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0913833A3 (fr) | Dispositif de mémoire non-volatile à semi-conducteur | |
| US5995417A (en) | Scheme for page erase and erase verify in a non-volatile memory array | |
| JP4750906B2 (ja) | Nandフラッシュメモリデバイスのプログラミング方法 | |
| EP1227498A3 (fr) | Matrice-EEPROM et méthode d'opération | |
| EP1158526A3 (fr) | Mémoire non-volatile à semi-conducteur à caractéristiques effacables électriquement et collectivement | |
| EP0991080A3 (fr) | Dispositif de mémoire non volatile à semi-conducteurs | |
| WO2005055243A3 (fr) | Ensembles memoire eeprom basse tension | |
| KR940022566A (ko) | 메모리 셀 트랜지스터를 과잉 소거 상태로 되게 하는 기능을 구비한 비휘발성 반도체 메모리 장치와 그 장치에서의 데이타 기록 방법 | |
| EP0883133A3 (fr) | Dispositif de mémoire non volatile à semi-conducteurs | |
| KR960006048A (ko) | 반도체 불휘발성 기억장치 | |
| JP2977023B2 (ja) | 不揮発性半導体記憶装置及びその製造方法 | |
| KR100855963B1 (ko) | 불휘발성 메모리 장치 및 불휘발성 메모리 장치의프로그램, 독출 및 소거 방법 | |
| EP1274095A3 (fr) | Réseau de cellules de mémoire MONOS à deux bits avec organisation de lignes de bit métallique et opération à cellule unique | |
| EP1214715B1 (fr) | Cellule 1-transistor pour une application de memoire eeprom | |
| US6151250A (en) | Flash memory device and verify method thereof | |
| US5894438A (en) | Method for programming and erasing a memory cell of a flash memory device | |
| EP1137012A3 (fr) | Procédé de programmation amélioré pour une cellule de mémoire | |
| CN100557712C (zh) | 非易失性半导体存储器件 | |
| US5608671A (en) | Non-volatile semiconductor memory | |
| JPH0757484A (ja) | Nor型不揮発性メモリ制御回路 | |
| JP4443029B2 (ja) | スプリットゲート型フラッシュメモリ素子の消去方法 | |
| JP5261003B2 (ja) | 半導体記憶装置 | |
| JPS55105374A (en) | Nonvolatile semiconductor memory | |
| JP2624716B2 (ja) | 不揮発性半導体メモリ装置のしきい電圧設定方法 | |
| JP3362917B2 (ja) | 半導体メモリ装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): DE FR GB |
|
| AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
| PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
| AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE |
|
| AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
| RIC1 | Information provided on ipc code assigned before grant |
Free format text: 6G 11C 16/04 A, 6G 11C 16/06 B |
|
| 17P | Request for examination filed |
Effective date: 20000320 |
|
| AKX | Designation fees paid |
Free format text: DE FR GB |
|
| 17Q | First examination report despatched |
Effective date: 20030516 |
|
| GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
| GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
| GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
| AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): DE FR GB |
|
| REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
| REF | Corresponds to: |
Ref document number: 69832683 Country of ref document: DE Date of ref document: 20060112 Kind code of ref document: P |
|
| ET | Fr: translation filed | ||
| PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
| 26N | No opposition filed |
Effective date: 20060908 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20081027 Year of fee payment: 11 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20081014 Year of fee payment: 11 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20081029 Year of fee payment: 11 |
|
| REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20100630 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20091102 Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100501 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20091029 |