EP0985664B1 - Procédé de préparation de dérivés de pyrrolidine - Google Patents
Procédé de préparation de dérivés de pyrrolidine Download PDFInfo
- Publication number
- EP0985664B1 EP0985664B1 EP99307113A EP99307113A EP0985664B1 EP 0985664 B1 EP0985664 B1 EP 0985664B1 EP 99307113 A EP99307113 A EP 99307113A EP 99307113 A EP99307113 A EP 99307113A EP 0985664 B1 EP0985664 B1 EP 0985664B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- formula
- group
- benzyl
- pyrroline
- cis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims abstract description 35
- 150000003235 pyrrolidines Chemical class 0.000 title abstract description 10
- 239000002253 acid Substances 0.000 claims abstract description 27
- IAQRGUVFOMOMEM-ARJAWSKDSA-N cis-but-2-ene Chemical class C\C=C/C IAQRGUVFOMOMEM-ARJAWSKDSA-N 0.000 claims abstract description 23
- 150000002978 peroxides Chemical class 0.000 claims abstract description 14
- 238000007363 ring formation reaction Methods 0.000 claims abstract description 7
- 230000001590 oxidative effect Effects 0.000 claims abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 47
- -1 sulfonyloxy group Chemical group 0.000 claims description 29
- 125000003118 aryl group Chemical group 0.000 claims description 24
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 23
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 21
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 20
- KIWWEIOFOPULSX-UHFFFAOYSA-N 6-oxa-3-azabicyclo[3.1.0]hexane Chemical compound C1NCC2OC12 KIWWEIOFOPULSX-UHFFFAOYSA-N 0.000 claims description 13
- 150000007513 acids Chemical class 0.000 claims description 13
- 238000007254 oxidation reaction Methods 0.000 claims description 13
- 230000003647 oxidation Effects 0.000 claims description 12
- 150000003141 primary amines Chemical class 0.000 claims description 11
- JVQIKJMSUIMUDI-UHFFFAOYSA-N 3-pyrroline Chemical compound C1NCC=C1 JVQIKJMSUIMUDI-UHFFFAOYSA-N 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- 239000002585 base Substances 0.000 claims description 9
- 230000000737 periodic effect Effects 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- 150000001412 amines Chemical class 0.000 claims description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 150000002367 halogens Chemical class 0.000 claims description 6
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 239000003153 chemical reaction reagent Substances 0.000 claims description 5
- 150000002431 hydrogen Chemical class 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 150000004976 peroxydisulfates Chemical class 0.000 claims description 5
- FKCMADOPPWWGNZ-YUMQZZPRSA-N [(2r)-1-[(2s)-2-amino-3-methylbutanoyl]pyrrolidin-2-yl]boronic acid Chemical compound CC(C)[C@H](N)C(=O)N1CCC[C@H]1B(O)O FKCMADOPPWWGNZ-YUMQZZPRSA-N 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 150000001340 alkali metals Chemical group 0.000 claims description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 4
- 150000001342 alkaline earth metals Chemical group 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 4
- JCZPOYAMKJFOLA-UHFFFAOYSA-N pyrrolidine-3,4-diol Chemical compound OC1CNCC1O JCZPOYAMKJFOLA-UHFFFAOYSA-N 0.000 claims description 4
- ZCZJKVCIYONNJR-UHFFFAOYSA-N 4-aminopyrrolidin-3-ol Chemical compound NC1CNCC1O ZCZJKVCIYONNJR-UHFFFAOYSA-N 0.000 claims description 3
- 230000026030 halogenation Effects 0.000 claims description 3
- 238000005658 halogenation reaction Methods 0.000 claims description 3
- 150000004968 peroxymonosulfuric acids Chemical group 0.000 claims description 2
- 229910015955 MxHy Inorganic materials 0.000 claims 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 2
- ISTHALDGKGAEAG-UHFFFAOYSA-N 6-oxa-5-azabicyclo[3.1.0]hexane Chemical compound C1CCC2ON21 ISTHALDGKGAEAG-UHFFFAOYSA-N 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 claims 1
- 150000004066 3-pyrrolines Chemical class 0.000 abstract description 26
- JHHZLHWJQPUNKB-UHFFFAOYSA-N pyrrolidin-3-ol Chemical class OC1CCNC1 JHHZLHWJQPUNKB-UHFFFAOYSA-N 0.000 abstract description 16
- 238000006243 chemical reaction Methods 0.000 abstract description 15
- 238000005580 one pot reaction Methods 0.000 abstract description 12
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 125000002924 primary amino group Chemical class [H]N([H])* 0.000 abstract 1
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 82
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 81
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 44
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 42
- 238000003756 stirring Methods 0.000 description 40
- 239000002904 solvent Substances 0.000 description 38
- LRFHKHHUKGZIGE-UHFFFAOYSA-N 1-benzyl-2,5-dihydropyrrole Chemical compound C=1C=CC=CC=1CN1CC=CC1 LRFHKHHUKGZIGE-UHFFFAOYSA-N 0.000 description 34
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 34
- 239000000126 substance Substances 0.000 description 28
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical class [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 27
- NHQDETIJWKXCTC-UHFFFAOYSA-N 3-chloroperbenzoic acid Chemical compound OOC(=O)C1=CC=CC(Cl)=C1 NHQDETIJWKXCTC-UHFFFAOYSA-N 0.000 description 20
- SOOHWZBGWRAMJJ-UHFFFAOYSA-N 3-benzyl-6-oxa-3-azabicyclo[3.1.0]hexane Chemical compound C1C2OC2CN1CC1=CC=CC=C1 SOOHWZBGWRAMJJ-UHFFFAOYSA-N 0.000 description 19
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 19
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 17
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 15
- 238000001914 filtration Methods 0.000 description 15
- 235000019395 ammonium persulphate Nutrition 0.000 description 14
- 229910052724 xenon Inorganic materials 0.000 description 14
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 14
- QJRIUWQPJVPYSO-UHFFFAOYSA-N 1-benzylpyrrolidine-3,4-diol Chemical compound C1C(O)C(O)CN1CC1=CC=CC=C1 QJRIUWQPJVPYSO-UHFFFAOYSA-N 0.000 description 13
- 239000007789 gas Substances 0.000 description 13
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical class CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 10
- 239000010453 quartz Substances 0.000 description 10
- 239000011541 reaction mixture Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 9
- CHQMHPLRPQMAMX-UHFFFAOYSA-L sodium persulfate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)OOS([O-])(=O)=O CHQMHPLRPQMAMX-UHFFFAOYSA-L 0.000 description 9
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 8
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 8
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 8
- 238000000605 extraction Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 150000003461 sulfonyl halides Chemical class 0.000 description 8
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 239000000543 intermediate Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- RJWBTWIBUIGANW-UHFFFAOYSA-N 4-chlorobenzenesulfonic acid Chemical class OS(=O)(=O)C1=CC=C(Cl)C=C1 RJWBTWIBUIGANW-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- XKXHCNPAFAXVRZ-UHFFFAOYSA-N benzylazanium;chloride Chemical compound [Cl-].[NH3+]CC1=CC=CC=C1 XKXHCNPAFAXVRZ-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000000706 filtrate Substances 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000012038 nucleophile Substances 0.000 description 6
- 125000001424 substituent group Chemical group 0.000 description 6
- ORTVZLZNOYNASJ-UPHRSURJSA-N (z)-but-2-ene-1,4-diol Chemical compound OC\C=C/CO ORTVZLZNOYNASJ-UPHRSURJSA-N 0.000 description 5
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 5
- 239000012359 Methanesulfonyl chloride Substances 0.000 description 5
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 5
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 5
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 5
- ARVLMMHZCLLMKZ-UHFFFAOYSA-N 1-benzyl-4-(benzylamino)pyrrolidin-3-ol Chemical compound C1C(NCC=2C=CC=CC=2)C(O)CN1CC1=CC=CC=C1 ARVLMMHZCLLMKZ-UHFFFAOYSA-N 0.000 description 4
- ZZBLMCUYQQVQEW-UHFFFAOYSA-N 1-benzyl-4-methoxypyrrolidin-3-ol Chemical compound C1C(O)C(OC)CN1CC1=CC=CC=C1 ZZBLMCUYQQVQEW-UHFFFAOYSA-N 0.000 description 4
- LIKWMDGAWXCECN-UHFFFAOYSA-N 2,4,6-trimethylbenzenesulfonic acid;dihydrate Chemical compound O.O.CC1=CC(C)=C(S(O)(=O)=O)C(C)=C1 LIKWMDGAWXCECN-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 239000007810 chemical reaction solvent Substances 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 229940098779 methanesulfonic acid Drugs 0.000 description 4
- DVSDBMFJEQPWNO-UHFFFAOYSA-N methyllithium Chemical compound C[Li] DVSDBMFJEQPWNO-UHFFFAOYSA-N 0.000 description 4
- 239000012285 osmium tetroxide Substances 0.000 description 4
- 229910000489 osmium tetroxide Inorganic materials 0.000 description 4
- NHKJPPKXDNZFBJ-UHFFFAOYSA-N phenyllithium Chemical compound [Li]C1=CC=CC=C1 NHKJPPKXDNZFBJ-UHFFFAOYSA-N 0.000 description 4
- 239000012286 potassium permanganate Substances 0.000 description 4
- OKBMCNHOEMXPTM-UHFFFAOYSA-M potassium peroxymonosulfate Chemical compound [K+].OOS([O-])(=O)=O OKBMCNHOEMXPTM-UHFFFAOYSA-M 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 3
- FQDIANVAWVHZIR-UPHRSURJSA-N (z)-1,4-dichlorobut-2-ene Chemical compound ClC\C=C/CCl FQDIANVAWVHZIR-UPHRSURJSA-N 0.000 description 3
- MSKCJNTXRKUESN-UHFFFAOYSA-N 1-(2-methylphenyl)-2,5-dihydropyrrole Chemical compound CC1=CC=CC=C1N1CC=CC1 MSKCJNTXRKUESN-UHFFFAOYSA-N 0.000 description 3
- BVLXDLJWNDAFTD-UHFFFAOYSA-N 1-benzyl-4-(diethylamino)pyrrolidin-3-ol Chemical compound C1C(O)C(N(CC)CC)CN1CC1=CC=CC=C1 BVLXDLJWNDAFTD-UHFFFAOYSA-N 0.000 description 3
- NTDFIGIMQABQLD-UHFFFAOYSA-N 1-benzyl-4-methylpyrrolidin-3-ol Chemical compound C1C(O)C(C)CN1CC1=CC=CC=C1 NTDFIGIMQABQLD-UHFFFAOYSA-N 0.000 description 3
- FMWDUHCZUFOGIQ-UHFFFAOYSA-N 1-benzyl-4-methylsulfanylpyrrolidin-3-ol Chemical compound C1C(O)C(SC)CN1CC1=CC=CC=C1 FMWDUHCZUFOGIQ-UHFFFAOYSA-N 0.000 description 3
- UIWLXOCYASIRRA-UHFFFAOYSA-N 1-benzyl-4-phenylpyrrolidin-3-ol Chemical compound C1C(C=2C=CC=CC=2)C(O)CN1CC1=CC=CC=C1 UIWLXOCYASIRRA-UHFFFAOYSA-N 0.000 description 3
- ISMZSSJQUUXTEI-UHFFFAOYSA-N 1-benzyl-4-phenylsulfanylpyrrolidin-3-ol Chemical compound C1C(SC=2C=CC=CC=2)C(O)CN1CC1=CC=CC=C1 ISMZSSJQUUXTEI-UHFFFAOYSA-N 0.000 description 3
- MKLOLLWXCNJJKG-UHFFFAOYSA-N 1-cyclohexyl-2,5-dihydropyrrole Chemical compound C1C=CCN1C1CCCCC1 MKLOLLWXCNJJKG-UHFFFAOYSA-N 0.000 description 3
- MYCAMTFGWHEUMX-UHFFFAOYSA-N 1-phenyl-2,5-dihydropyrrole Chemical compound C1C=CCN1C1=CC=CC=C1 MYCAMTFGWHEUMX-UHFFFAOYSA-N 0.000 description 3
- 0 CC1=C(*)CN(*)C1 Chemical compound CC1=C(*)CN(*)C1 0.000 description 3
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 3
- AFBPFSWMIHJQDM-UHFFFAOYSA-N N-methyl-N-phenylamine Natural products CNC1=CC=CC=C1 AFBPFSWMIHJQDM-UHFFFAOYSA-N 0.000 description 3
- 229910004882 Na2S2O8 Inorganic materials 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 238000006735 epoxidation reaction Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 description 3
- YYROPELSRYBVMQ-UHFFFAOYSA-N p-toluenesulfonyl chloride Substances CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 150000003460 sulfonic acids Chemical class 0.000 description 3
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical class ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- FHPJYVGGEACEGE-UHFFFAOYSA-N 1-benzyl-3-methyl-2,5-dihydropyrrole Chemical compound C1C(C)=CCN1CC1=CC=CC=C1 FHPJYVGGEACEGE-UHFFFAOYSA-N 0.000 description 2
- YQMXOIAIYXXXEE-UHFFFAOYSA-N 1-benzylpyrrolidin-3-ol Chemical class C1C(O)CCN1CC1=CC=CC=C1 YQMXOIAIYXXXEE-UHFFFAOYSA-N 0.000 description 2
- KQWGEEGZUJGVJZ-UHFFFAOYSA-N 1-butyl-2,5-dihydropyrrole Chemical compound CCCCN1CC=CC1 KQWGEEGZUJGVJZ-UHFFFAOYSA-N 0.000 description 2
- 125000001894 2,4,6-trinitrophenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1[N+]([O-])=O)[N+]([O-])=O)[N+]([O-])=O 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- ASVKKRLMJCWVQF-UHFFFAOYSA-N 3-buten-1-amine Chemical compound NCCC=C ASVKKRLMJCWVQF-UHFFFAOYSA-N 0.000 description 2
- FZSRJTMTNBARDY-UHFFFAOYSA-N 4-(benzylamino)pyrrolidin-3-ol Chemical class OC1CNCC1NCC1=CC=CC=C1 FZSRJTMTNBARDY-UHFFFAOYSA-N 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- BWLUMTFWVZZZND-UHFFFAOYSA-N Dibenzylamine Chemical compound C=1C=CC=CC=1CNCC1=CC=CC=C1 BWLUMTFWVZZZND-UHFFFAOYSA-N 0.000 description 2
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 2
- AHVYPIQETPWLSZ-UHFFFAOYSA-N N-methyl-pyrrolidine Natural products CN1CC=CC1 AHVYPIQETPWLSZ-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- SBFSEMVZXZCBEC-UHFFFAOYSA-N azane;sulfooxy hydrogen sulfate Chemical class [NH4+].OS(=O)(=O)OOS([O-])(=O)=O SBFSEMVZXZCBEC-UHFFFAOYSA-N 0.000 description 2
- 150000008107 benzenesulfonic acids Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
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- QYXCCSPTSVLBFX-UHFFFAOYSA-L benzyl(tributyl)azanium oxido sulfate Chemical compound CCCC[N+](CCCC)(CCCC)CC1=CC=CC=C1.CCCC[N+](CCCC)(CCCC)CC1=CC=CC=C1.[O-]OS(=O)(=O)[O-] QYXCCSPTSVLBFX-UHFFFAOYSA-L 0.000 description 1
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- QTKHMSDCZMJYLU-UHFFFAOYSA-M benzyl(triethyl)azanium;sulfooxy sulfate Chemical compound OS(=O)(=O)OOS([O-])(=O)=O.CC[N+](CC)(CC)CC1=CC=CC=C1 QTKHMSDCZMJYLU-UHFFFAOYSA-M 0.000 description 1
- YOUGRGFIHBUKRS-UHFFFAOYSA-N benzyl(trimethyl)azanium Chemical compound C[N+](C)(C)CC1=CC=CC=C1 YOUGRGFIHBUKRS-UHFFFAOYSA-N 0.000 description 1
- ATUVPJCUOBRWNU-UHFFFAOYSA-L benzyl(trimethyl)azanium oxido sulfate Chemical compound C[N+](C)(C)CC1=CC=CC=C1.C[N+](C)(C)CC1=CC=CC=C1.[O-]OS(=O)(=O)[O-] ATUVPJCUOBRWNU-UHFFFAOYSA-L 0.000 description 1
- UBHRYMIXXZDOOU-UHFFFAOYSA-L benzyl(trimethyl)azanium;sulfonatooxy sulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O.C[N+](C)(C)CC1=CC=CC=C1.C[N+](C)(C)CC1=CC=CC=C1 UBHRYMIXXZDOOU-UHFFFAOYSA-L 0.000 description 1
- JIPYGDNGVBVBHU-UHFFFAOYSA-M benzyl(trimethyl)azanium;sulfooxy sulfate Chemical compound OS(=O)(=O)OOS([O-])(=O)=O.C[N+](C)(C)CC1=CC=CC=C1 JIPYGDNGVBVBHU-UHFFFAOYSA-M 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
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- 231100000357 carcinogen Toxicity 0.000 description 1
- 239000003183 carcinogenic agent Substances 0.000 description 1
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- 238000010924 continuous production Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- WJYHCYBNUJVCEH-UHFFFAOYSA-N cyclohexane;ethoxyethane Chemical compound CCOCC.C1CCCCC1 WJYHCYBNUJVCEH-UHFFFAOYSA-N 0.000 description 1
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- MJWVCJUSRGLHFO-UHFFFAOYSA-N cyclohexanesulfonyl chloride Chemical compound ClS(=O)(=O)C1CCCCC1 MJWVCJUSRGLHFO-UHFFFAOYSA-N 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- DLTBAYKGXREKMW-UHFFFAOYSA-N cyclopropanesulfonic acid Chemical class OS(=O)(=O)C1CC1 DLTBAYKGXREKMW-UHFFFAOYSA-N 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 229910052805 deuterium Inorganic materials 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- YMGGAHMANIOXGP-UHFFFAOYSA-L disodium;oxido sulfate Chemical compound [Na+].[Na+].[O-]OS([O-])(=O)=O YMGGAHMANIOXGP-UHFFFAOYSA-L 0.000 description 1
- DGJUONISEWDPFO-UHFFFAOYSA-N dodecyl(triethyl)azanium Chemical compound CCCCCCCCCCCC[N+](CC)(CC)CC DGJUONISEWDPFO-UHFFFAOYSA-N 0.000 description 1
- PEBGVDAZNZXAMG-UHFFFAOYSA-L dodecyl(triethyl)azanium oxido sulfate Chemical compound CCCCCCCCCCCC[N+](CC)(CC)CC.CCCCCCCCCCCC[N+](CC)(CC)CC.[O-]OS(=O)(=O)[O-] PEBGVDAZNZXAMG-UHFFFAOYSA-L 0.000 description 1
- KEYLCARHACQDPU-UHFFFAOYSA-L dodecyl(triethyl)azanium;sulfonatooxy sulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O.CCCCCCCCCCCC[N+](CC)(CC)CC.CCCCCCCCCCCC[N+](CC)(CC)CC KEYLCARHACQDPU-UHFFFAOYSA-L 0.000 description 1
- QEGHUQLHHXKKJW-UHFFFAOYSA-M dodecyl(triethyl)azanium;sulfooxy sulfate Chemical compound OS(=O)(=O)OOS([O-])(=O)=O.CCCCCCCCCCCC[N+](CC)(CC)CC QEGHUQLHHXKKJW-UHFFFAOYSA-M 0.000 description 1
- LSMBCIUIICRQHJ-UHFFFAOYSA-L dodecyl(trimethyl)azanium oxido sulfate Chemical compound CCCCCCCCCCCC[N+](C)(C)C.CCCCCCCCCCCC[N+](C)(C)C.[O-]OS(=O)(=O)[O-] LSMBCIUIICRQHJ-UHFFFAOYSA-L 0.000 description 1
- RQZKPSZFEWAGNG-UHFFFAOYSA-L dodecyl(trimethyl)azanium;sulfonatooxy sulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O.CCCCCCCCCCCC[N+](C)(C)C.CCCCCCCCCCCC[N+](C)(C)C RQZKPSZFEWAGNG-UHFFFAOYSA-L 0.000 description 1
- QLRBALZXXZNZIM-UHFFFAOYSA-M dodecyl(trimethyl)azanium;sulfooxy sulfate Chemical compound OS(=O)(=O)OOS([O-])(=O)=O.CCCCCCCCCCCC[N+](C)(C)C QLRBALZXXZNZIM-UHFFFAOYSA-M 0.000 description 1
- VICYBMUVWHJEFT-UHFFFAOYSA-N dodecyltrimethylammonium ion Chemical compound CCCCCCCCCCCC[N+](C)(C)C VICYBMUVWHJEFT-UHFFFAOYSA-N 0.000 description 1
- CCIVGXIOQKPBKL-UHFFFAOYSA-N ethanesulfonic acid Chemical class CCS(O)(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-N 0.000 description 1
- FRYHCSODNHYDPU-UHFFFAOYSA-N ethanesulfonyl chloride Chemical compound CCS(Cl)(=O)=O FRYHCSODNHYDPU-UHFFFAOYSA-N 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- SMPKCRWIYOLZDO-UHFFFAOYSA-N methyl 2-[3-chloro-4-(2,5-dihydropyrrol-1-yl)phenyl]propanoate Chemical compound ClC1=CC(C(C)C(=O)OC)=CC=C1N1CC=CC1 SMPKCRWIYOLZDO-UHFFFAOYSA-N 0.000 description 1
- DFIKXHYZVPQMFV-UHFFFAOYSA-N methyl 2-[3-chloro-4-(3,4-dihydroxypyrrolidin-1-yl)phenyl]propanoate Chemical compound ClC1=CC(C(C)C(=O)OC)=CC=C1N1CC(O)C(O)C1 DFIKXHYZVPQMFV-UHFFFAOYSA-N 0.000 description 1
- HMQIVOSMKKQAJS-UHFFFAOYSA-N methyl 2-[3-chloro-4-(3-hydroxy-4-methoxypyrrolidin-1-yl)phenyl]propanoate Chemical compound C1C(O)C(OC)CN1C1=CC=C(C(C)C(=O)OC)C=C1Cl HMQIVOSMKKQAJS-UHFFFAOYSA-N 0.000 description 1
- XGLKNPVIJSGFPX-UHFFFAOYSA-N methyl 2-[3-chloro-4-(6-oxa-3-azabicyclo[3.1.0]hexan-3-yl)phenyl]propanoate Chemical compound ClC1=CC(C(C)C(=O)OC)=CC=C1N1CC2OC2C1 XGLKNPVIJSGFPX-UHFFFAOYSA-N 0.000 description 1
- JLSKMCVAXKTDNN-UHFFFAOYSA-N methyl 2-[4-(3-amino-4-hydroxypyrrolidin-1-yl)-3-chlorophenyl]propanoate Chemical compound ClC1=CC(C(C)C(=O)OC)=CC=C1N1CC(O)C(N)C1 JLSKMCVAXKTDNN-UHFFFAOYSA-N 0.000 description 1
- BCBSNLSQUZKCJH-UHFFFAOYSA-N methyl 2-[4-[3-(benzylamino)-4-hydroxypyrrolidin-1-yl]-3-chlorophenyl]propanoate Chemical compound ClC1=CC(C(C)C(=O)OC)=CC=C1N1CC(NCC=2C=CC=CC=2)C(O)C1 BCBSNLSQUZKCJH-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- GUAWMXYQZKVRCW-UHFFFAOYSA-N n,2-dimethylaniline Chemical compound CNC1=CC=CC=C1C GUAWMXYQZKVRCW-UHFFFAOYSA-N 0.000 description 1
- MXHTZQSKTCCMFG-UHFFFAOYSA-N n,n-dibenzyl-1-phenylmethanamine Chemical compound C=1C=CC=CC=1CN(CC=1C=CC=CC=1)CC1=CC=CC=C1 MXHTZQSKTCCMFG-UHFFFAOYSA-N 0.000 description 1
- XWEDAOHUHOHFPJ-UHFFFAOYSA-N n-bromo-n-methylaniline Chemical compound CN(Br)C1=CC=CC=C1 XWEDAOHUHOHFPJ-UHFFFAOYSA-N 0.000 description 1
- JBCRGRUAARPEFD-UHFFFAOYSA-N n-chloro-n-methylaniline Chemical compound CN(Cl)C1=CC=CC=C1 JBCRGRUAARPEFD-UHFFFAOYSA-N 0.000 description 1
- RIWRFSMVIUAEBX-UHFFFAOYSA-N n-methyl-1-phenylmethanamine Chemical compound CNCC1=CC=CC=C1 RIWRFSMVIUAEBX-UHFFFAOYSA-N 0.000 description 1
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 1
- DASJFYAPNPUBGG-UHFFFAOYSA-N naphthalene-1-sulfonyl chloride Chemical compound C1=CC=C2C(S(=O)(=O)Cl)=CC=CC2=C1 DASJFYAPNPUBGG-UHFFFAOYSA-N 0.000 description 1
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- LPBCIMBVKXCOII-UHFFFAOYSA-L oxido sulfate tetrabenzylazanium Chemical compound C1=CC=C(C=C1)C[N+](CC2=CC=CC=C2)(CC3=CC=CC=C3)CC4=CC=CC=C4.C1=CC=C(C=C1)C[N+](CC2=CC=CC=C2)(CC3=CC=CC=C3)CC4=CC=CC=C4.[O-]OS(=O)(=O)[O-] LPBCIMBVKXCOII-UHFFFAOYSA-L 0.000 description 1
- FPTZMIKJHGLEHJ-UHFFFAOYSA-N oxido sulfate tetradecylazanium Chemical compound CCCCCCCCCCCCCC[NH3+].CCCCCCCCCCCCCC[NH3+].[O-]OS(=O)(=O)[O-] FPTZMIKJHGLEHJ-UHFFFAOYSA-N 0.000 description 1
- QVCYIXBMWVWTIV-UHFFFAOYSA-L oxido sulfate tetradodecylazanium Chemical compound CCCCCCCCCCCC[N+](CCCCCCCCCCCC)(CCCCCCCCCCCC)CCCCCCCCCCCC.CCCCCCCCCCCC[N+](CCCCCCCCCCCC)(CCCCCCCCCCCC)CCCCCCCCCCCC.[O-]OS(=O)(=O)[O-] QVCYIXBMWVWTIV-UHFFFAOYSA-L 0.000 description 1
- OUTJBZOLVNVOCN-UHFFFAOYSA-L oxido sulfate tetraethylazanium Chemical compound S(=O)(=O)(O[O-])[O-].C(C)[N+](CC)(CC)CC.C(C)[N+](CC)(CC)CC OUTJBZOLVNVOCN-UHFFFAOYSA-L 0.000 description 1
- RSOMMXOWQGGXKX-UHFFFAOYSA-L oxido sulfate tetrahexylazanium Chemical compound CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC.CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC.[O-]OS(=O)(=O)[O-] RSOMMXOWQGGXKX-UHFFFAOYSA-L 0.000 description 1
- LNUCWBOJGXCWJI-UHFFFAOYSA-L oxido sulfate tetrapropylazanium Chemical compound CCC[N+](CCC)(CCC)CCC.CCC[N+](CCC)(CCC)CCC.[O-]OS(=O)(=O)[O-] LNUCWBOJGXCWJI-UHFFFAOYSA-L 0.000 description 1
- AENSXLNDMRQIEX-UHFFFAOYSA-L oxido sulfate;tetrabutylazanium Chemical compound [O-]OS([O-])(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC AENSXLNDMRQIEX-UHFFFAOYSA-L 0.000 description 1
- WZSHRZJERDUBFD-UHFFFAOYSA-L oxido sulfate;tetramethylazanium Chemical compound C[N+](C)(C)C.C[N+](C)(C)C.[O-]OS([O-])(=O)=O WZSHRZJERDUBFD-UHFFFAOYSA-L 0.000 description 1
- 125000005491 p-nitrobenzenesulfonic acid group Chemical class 0.000 description 1
- 125000005489 p-toluenesulfonic acid group Chemical class 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-N peroxydisulfuric acid Chemical compound OS(=O)(=O)OOS(O)(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-N 0.000 description 1
- FHHJDRFHHWUPDG-UHFFFAOYSA-N peroxysulfuric acid Chemical compound OOS(O)(=O)=O FHHJDRFHHWUPDG-UHFFFAOYSA-N 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- NIXKBAZVOQAHGC-UHFFFAOYSA-N phenylmethanesulfonic acid Chemical class OS(=O)(=O)CC1=CC=CC=C1 NIXKBAZVOQAHGC-UHFFFAOYSA-N 0.000 description 1
- OAHKWDDSKCRNFE-UHFFFAOYSA-N phenylmethanesulfonyl chloride Chemical compound ClS(=O)(=O)CC1=CC=CC=C1 OAHKWDDSKCRNFE-UHFFFAOYSA-N 0.000 description 1
- UYWQUFXKFGHYNT-UHFFFAOYSA-N phenylmethyl ester of formic acid Natural products O=COCC1=CC=CC=C1 UYWQUFXKFGHYNT-UHFFFAOYSA-N 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- PIDSZXPFGCURGN-UHFFFAOYSA-N pirprofen Chemical compound ClC1=CC(C(C(O)=O)C)=CC=C1N1CC=CC1 PIDSZXPFGCURGN-UHFFFAOYSA-N 0.000 description 1
- CHKVPAROMQMJNQ-UHFFFAOYSA-M potassium bisulfate Chemical compound [K+].OS([O-])(=O)=O CHKVPAROMQMJNQ-UHFFFAOYSA-M 0.000 description 1
- 229910000343 potassium bisulfate Inorganic materials 0.000 description 1
- USHAGKDGDHPEEY-UHFFFAOYSA-L potassium persulfate Chemical compound [K+].[K+].[O-]S(=O)(=O)OOS([O-])(=O)=O USHAGKDGDHPEEY-UHFFFAOYSA-L 0.000 description 1
- 235000019394 potassium persulphate Nutrition 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- HDMGAZBPFLDBCX-UHFFFAOYSA-M potassium;sulfooxy sulfate Chemical compound [K+].OS(=O)(=O)OOS([O-])(=O)=O HDMGAZBPFLDBCX-UHFFFAOYSA-M 0.000 description 1
- DRINJBFRTLBHNF-UHFFFAOYSA-N propane-2-sulfonyl chloride Chemical compound CC(C)S(Cl)(=O)=O DRINJBFRTLBHNF-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- NVNCDKRLZXDLMP-UHFFFAOYSA-M sodium;sulfooxy sulfate Chemical compound [Na+].OS(=O)(=O)OOS([O-])(=O)=O NVNCDKRLZXDLMP-UHFFFAOYSA-M 0.000 description 1
- NVBFHJWHLNUMCV-UHFFFAOYSA-N sulfamide Chemical class NS(N)(=O)=O NVBFHJWHLNUMCV-UHFFFAOYSA-N 0.000 description 1
- JCZLPCCEHFSWOT-UHFFFAOYSA-L sulfonatooxy sulfate;tetrabenzylazanium Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O.C=1C=CC=CC=1C[N+](CC=1C=CC=CC=1)(CC=1C=CC=CC=1)CC1=CC=CC=C1.C=1C=CC=CC=1C[N+](CC=1C=CC=CC=1)(CC=1C=CC=CC=1)CC1=CC=CC=C1 JCZLPCCEHFSWOT-UHFFFAOYSA-L 0.000 description 1
- WTEHZLSBCPFRHB-UHFFFAOYSA-L sulfonatooxy sulfate;tetrabutylazanium Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC WTEHZLSBCPFRHB-UHFFFAOYSA-L 0.000 description 1
- VSMHXCXEBAAPAG-UHFFFAOYSA-N sulfonatooxy sulfate;tetradecylazanium Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O.CCCCCCCCCCCCCC[NH3+].CCCCCCCCCCCCCC[NH3+] VSMHXCXEBAAPAG-UHFFFAOYSA-N 0.000 description 1
- JUFZNBVJEWKVJC-UHFFFAOYSA-L sulfonatooxy sulfate;tetradodecylazanium Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O.CCCCCCCCCCCC[N+](CCCCCCCCCCCC)(CCCCCCCCCCCC)CCCCCCCCCCCC.CCCCCCCCCCCC[N+](CCCCCCCCCCCC)(CCCCCCCCCCCC)CCCCCCCCCCCC JUFZNBVJEWKVJC-UHFFFAOYSA-L 0.000 description 1
- ZIMANNVVVKGGMB-UHFFFAOYSA-L sulfonatooxy sulfate;tetraethylazanium Chemical compound CC[N+](CC)(CC)CC.CC[N+](CC)(CC)CC.[O-]S(=O)(=O)OOS([O-])(=O)=O ZIMANNVVVKGGMB-UHFFFAOYSA-L 0.000 description 1
- NZZPQQNNRDFFLA-UHFFFAOYSA-L sulfonatooxy sulfate;tetrahexylazanium Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O.CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC.CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC NZZPQQNNRDFFLA-UHFFFAOYSA-L 0.000 description 1
- HWMYZPJHPLBSHZ-UHFFFAOYSA-L sulfonatooxy sulfate;tetramethylazanium Chemical compound C[N+](C)(C)C.C[N+](C)(C)C.[O-]S(=O)(=O)OOS([O-])(=O)=O HWMYZPJHPLBSHZ-UHFFFAOYSA-L 0.000 description 1
- LWCNTZHZSNISEK-UHFFFAOYSA-L sulfonatooxy sulfate;tetrapropylazanium Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O.CCC[N+](CCC)(CCC)CCC.CCC[N+](CCC)(CCC)CCC LWCNTZHZSNISEK-UHFFFAOYSA-L 0.000 description 1
- GHVXKLWQKRZTAS-UHFFFAOYSA-M sulfooxy sulfate;tetrabenzylazanium Chemical compound OS(=O)(=O)OOS([O-])(=O)=O.C=1C=CC=CC=1C[N+](CC=1C=CC=CC=1)(CC=1C=CC=CC=1)CC1=CC=CC=C1 GHVXKLWQKRZTAS-UHFFFAOYSA-M 0.000 description 1
- PRHOWEGOQDNHGE-UHFFFAOYSA-M sulfooxy sulfate;tetrabutylazanium Chemical compound OS(=O)(=O)OOS([O-])(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC PRHOWEGOQDNHGE-UHFFFAOYSA-M 0.000 description 1
- CNIRFJYXRJHDGY-UHFFFAOYSA-N sulfooxy sulfate;tetradecylazanium Chemical compound OS(=O)(=O)OOS([O-])(=O)=O.CCCCCCCCCCCCCC[NH3+] CNIRFJYXRJHDGY-UHFFFAOYSA-N 0.000 description 1
- MXNJDICZXQVQAB-UHFFFAOYSA-M sulfooxy sulfate;tetradodecylazanium Chemical compound OS(=O)(=O)OOS([O-])(=O)=O.CCCCCCCCCCCC[N+](CCCCCCCCCCCC)(CCCCCCCCCCCC)CCCCCCCCCCCC MXNJDICZXQVQAB-UHFFFAOYSA-M 0.000 description 1
- RRGQKINGJFNMQB-UHFFFAOYSA-M sulfooxy sulfate;tetraethylazanium Chemical compound CC[N+](CC)(CC)CC.OS(=O)(=O)OOS([O-])(=O)=O RRGQKINGJFNMQB-UHFFFAOYSA-M 0.000 description 1
- MEPBFPWDABJEEJ-UHFFFAOYSA-M sulfooxy sulfate;tetrahexylazanium Chemical compound OS(=O)(=O)OOS([O-])(=O)=O.CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC MEPBFPWDABJEEJ-UHFFFAOYSA-M 0.000 description 1
- BRPPTSXBOFPBPT-UHFFFAOYSA-M sulfooxy sulfate;tetramethylazanium Chemical compound C[N+](C)(C)C.OS(=O)(=O)OOS([O-])(=O)=O BRPPTSXBOFPBPT-UHFFFAOYSA-M 0.000 description 1
- FYOWCWIRKVIKOJ-UHFFFAOYSA-M sulfooxy sulfate;tetrapropylazanium Chemical compound OS(=O)(=O)OOS([O-])(=O)=O.CCC[N+](CCC)(CCC)CCC FYOWCWIRKVIKOJ-UHFFFAOYSA-M 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 1
- OSWMMVUHYHQYCV-UHFFFAOYSA-N tetrabenzylazanium Chemical compound C=1C=CC=CC=1C[N+](CC=1C=CC=CC=1)(CC=1C=CC=CC=1)CC1=CC=CC=C1 OSWMMVUHYHQYCV-UHFFFAOYSA-N 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- UOBBAWATEUXIQF-UHFFFAOYSA-N tetradodecylazanium Chemical compound CCCCCCCCCCCC[N+](CCCCCCCCCCCC)(CCCCCCCCCCCC)CCCCCCCCCCCC UOBBAWATEUXIQF-UHFFFAOYSA-N 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- DTIFFPXSSXFQCJ-UHFFFAOYSA-N tetrahexylazanium Chemical compound CCCCCC[N+](CCCCCC)(CCCCCC)CCCCCC DTIFFPXSSXFQCJ-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- OSBSFAARYOCBHB-UHFFFAOYSA-N tetrapropylammonium Chemical compound CCC[N+](CCC)(CCC)CCC OSBSFAARYOCBHB-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- VYGSFTVYZHNGBU-UHFFFAOYSA-N trichloromethanesulfonic acid Chemical class OS(=O)(=O)C(Cl)(Cl)Cl VYGSFTVYZHNGBU-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical class OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- GRGCWBWNLSTIEN-UHFFFAOYSA-N trifluoromethanesulfonyl chloride Chemical compound FC(F)(F)S(Cl)(=O)=O GRGCWBWNLSTIEN-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
- C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
- C07D491/04—Ortho-condensed systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/04—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D207/10—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/12—Oxygen or sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/04—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D207/10—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/14—Nitrogen atoms not forming part of a nitro radical
Definitions
- the present invention relates to methods of producing pyrrolidine derivatives and addresses the problem of providing simple and efficient industrial production of pyrrolidine derivatives such as epoxypyrrolidines and pyrrolidinols. These pyrrolidine derivatives are important and useful synthetic intermediates for pharmaceuticals, and can be transformed to several kinds of pyrrolidine derivatives.
- the present invention provides a novel method of preparing pyrrolidine derivatives such as 3,4-epoxypyrrolidines, 3-pyrrolidinols, and the like, in a novel, simple and efficient procedure.
- the invention allows a one-pot synthesis of pyrrolidine derivatives such as 3,4-epoxypyrrolidines and 3-pyrrolidinols from 3-pyrrolines by oxidation with a peroxide in the presence of an acid.
- pyrrolidine compounds are important and useful synthetic intermediates for synthesis of pharmaceuticals, and can be transformed into several kinds of pyrrolidine derivatives.
- the invention provides a method for preparing a pyrrolidine derivative such as a 3,4-epoxypyrrolidine or 3-pyrrolidinol, by reacting a 3-pyrroline with at least one peroxide in the presence of at least one acid. Oxidation of the 3-pyrroline having formula (3) may be accelerated using ultraviolet irradiation, if desired.
- the 3-pyrrolidinol is of formula (1): wherein R 1 is a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, or aralkyl group; R 2 and R 3 each represent a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, or aralkyl group, and Nu is a hydroxyl group (OH), an alkoxyl group (OR), or an amino group (NRR'). Optionally there may be functional groups on the nitrogen atom and/or pyrrolidine ring.
- the 3-pyrrolidinols include, but are not limited to, 3,4-dihydroxypyrrolidines, such as 3,4-dihydroxypyrrolidine, 1-methyl-3,4-dihydroxypyrrolidine, 1-cyclohexyl-3,4-dihydroxypyrrolidine, 1-benzyl-3,4-dihydroxypyrrolidine, 1-phenyl-3,4-dihydroxypyrrolidine, 2-[3-chloro-4-(3,4-dihydroxypyrrolidin-1-yl)phenyl]propionic acid, methyl 2-[3-chloro-4-(3,4-dihydroxypyrrolidin-1-yl)phenyl]propionate, and the like.
- 3,4-dihydroxypyrrolidines such as 3,4-dihydroxypyrrolidine, 1-methyl-3,4-dihydroxypyrrolidine, 1-cyclohexyl-3,4-dihydroxypyrrolidine, 1-benzyl-3,4-dihydroxypyrrolidine, 1-phenyl-3,4-di
- 3-pyrrolidinols include, but are not limited to, 4-amino-3-pyrrolidinols such as 4-amino-3-pyrrolidinol, 1-methyl-4-amino-3-pyrrolidinol, 1-cyclohexyl-4-amino-3-pyrrolidinol, 1-benzyl-4-amino-3-pyrrolidinol, 1-phenyl-4-amino-3-pyrrolidinol, 2-[3-chloro-4-(4-amino-3-hydroxypyrrolidin-1-yl)phenyl]propionic acid, methyl 2-[3-chloro-4-(4-amino-3-hydroxypyrrolidin-1-yl)phenyl]propionate; 4-benzylamino-3-pyrrolidinols such as 4-benzylamino-3-pyrrolidinol, 1-methyl-4-benzylamino-3-pyrrolidinol, 1-cyclohexyl-4-benzyla
- the 3,4-epoxypyrrolidine is of the formula (2): wherein R 1 is a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, or aralkyl group; R 2 and R 3 each represent a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, or aralkyl group.
- R 1 is a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, or aralkyl group
- R 2 and R 3 each represent a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, or aralkyl group.
- the 3,4-epoxypyrrolidines include, but are not limited to 3,4-epoxypyrrolidine, 1-methyl-3,4-epoxypyrrolidine, 1-cyclohexyl-3, 4-epoxypyrrolidine, 1-benzyl-3,4-epoxypyrrolidine, 1-phenyl-3,4-epoxypyrrolidine, 2-[3-chloro-4-(3,4-epoxypyrrolidin-1-yl)phenyl]propionic acid, methyl 2-[3-chloro-4-(3,4-epoxypyrrolidin-1-yl)phenyl]propionate, and the like.
- the 3-pyrroline is of formula (3): wherein R 1 is a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, or aralkyl group; R 2 and R 3 each represent a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, or aralkyl group.
- the 3-pyrrolines include, but are not limited to 3-pyrroline, 1-methyl-3-pyrroline, 1-ethyl-3-pyrroline, 1-propyl-3-pyrroline, 1-cyclohexyl-3-pyrroline, 1-trichloromethyl-3-pyrroline, 1-phenyl-3-pyrroline, 1-tolyl-3-pyrroline, 1-benzyl-3-pyrroline, 2-[3-chloro-4-(3-pyrrolin-1-yl)phenyl]propionic acid, methyl 2-[3-chloro-4-(3-pyrrolin-1-yl)phenyl]propionate, and the like.
- 3-pyrroline, 1-benzyl-3-pyrroline, 1-cyclohexyl-3-pyrroline are preferred. Most preferred are 1-benzyl-3-pyrroline and 1-cyclohexyl-3-pyrroline.
- Preferable acids used in the process for oxidation of the 3-pyrroline are compounds whose formula contains a sulfur atom (S), such as sulfuric acid or sulfonic acids having formula (11).
- Formula (11) is represented by: R 14 SO 3 H (11) wherein R 14 represents a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, alalkyl group which can be optionally substituted by a halogen, a cyano group (CN), a nitro group (NO 2 ), a hydroxyl group (OH), an alkoxyl group (OR), a silyl group (SiR 3 ), a carboxyl group (CO 2 H), an alkoxycarbonyl group (CO 2 R), and/or an acyl group (COR).
- R 14 represents a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, alalkyl group which can be optionally substituted by a halogen, a cyan
- sulfonic acids having formula (11) can be classified under four sulfonic acids: alkylsulfonic acids, cycloalkylsulfonic acids, arylsulfonic acids, and aralkylsulfonic acids.
- alkylsulfonic acids include, but are not limited to methanesulfonic acids, trifluoromethanesulfonic acids, trichloromethanesulfonic acids, ethanesulfonic acids, and the like.
- Suitable cycloalkylsulfonic acids include, but are not limited to, cyclopropanesulfonic acids, cyclohexanesulfonic acids, and the like.
- Suitable arylsulfonic acids include, but are not limited to, benzenesulfonic acids, o-, m-, p-fluorobenzenesulfonic acids, o-, m-, p-chlorobenzenesulfonic acids, o-, m-, p-nitrobenzenesulfonic acids, o-, m-, p-cyanobenzenesulfonic acids, o-, m-, p-toluenesulfonic acids, mesitylenesulfonic acids, naphthaleneulfonic acids, and the like.
- Suitable aralkylsulfonic acids include, but are not limited to, benzylsulfonic acids, o-, m-, p-fluorobenzylsulfonic acids, o-, m-, p-chlorobenzylsulfonic acids, o-, m-, p-nitrobenzylsulfonic acids, o-, m-, p-cyanobenzylsulfonic acids, and the like.
- sulfuric acid methanesulfonic acids, benzenesulfonic acids, p-chlorobenzenesulfonic acids are preferred.
- sulfuric acid is most preferably used.
- the preferable amount of acid used is in the range of about 1.0 - 3.0 mole acid to about 1.0 moles 3-pyrrolines having formula (3) can be used efficiently and economically.
- Peroxides used in the oxidation of the 3-pyrrolines of formula (3) may be peroxymonosulfuric acids, or their salts (peroxymonosulfates) having formula (4), peroxydisulfuric acids, or their salts (peroxydisulfates) having formula (5).
- Formula (6) is represented by: wherein R 4 - R 7 represent hydrogen, a C 1 - C 20 alkyl group, a cycloalkyl group, an aryl group, or an alalkyl group.
- Peroxymonosulfuric acid, salts (peroxymonosulfates) or peroxydisulfuric acid, salts (peroxydisulfates) are preferable.
- Metal peroxymonosulfates include, but are not limited to, sodium peroxymonosulfate (Na 2 SO 5 ), potassium peroxymonosulfate (K 2 SO 5 ), barium peroxymonosulfate (BaSO 5 ), rubidium peroxymonosulfate (RbSO 5 ), and the like.
- Metal peroxyhydrogenmonosulfates include, but are not limited to, sodium peroxyhydrogenmonosulfate (NaHSO 5 ), potassium peroxyhydrogenmonosulfate (KHSO 5 ), and the like.
- Ammonium peroxymonosulfates include, but are not limited to, ammonium peroxymonosulfate ((NH 4 ) 2 SO 5 ), tetramethylammonium peroxymonosulfate ((Me 4 N) 2 SO 5 ), tetraethylammonium peroxymonosulfate ((Et 4 N) 2 SO 5 ), tetrapropylammonium peroxymonosulfate ((Pr 4 N) 2 SO 5 ), tetrabutylammonium peroxymonosulfate ((Bu 4 N) 2 SO 5 ), tetrahexylammonium peroxymonosulfate, tetradecylammonium peroxymonosulfate, tetralaurylammonium peroxymonosulfate, tetrabenzylammonium peroxymonosulfate ((Bn 4 N) 2 SO 5 ), benzyltrimethylammoni
- Ammonium peroxyhydrogenmonosulfates include, but are not limited to, ammonium peroxyhydrogenmonosulfate ((NH 4 )HSO 5 ), tetramethylammonium peroxyhydrogenmonosulfate ((Me 4 N)HSO 5 ), tetraethylammonium peroxyhydrogenmonosulfate ((Et 4 N)HSO 5 ), tetrapropylammonium peroxyhydrogenmonosulfate ((Pr 4 N)HSO 5 ), tetrabutylammonium peroxyhydrogenmonosulfate ((Bu 4 N)HSO 5 ), tetrahexylammonium peroxyhydrogenmonosulfate, tetradecylammonium peroxyhydrogenmonosulfate, tetralaurylammonium peroxyhydrogenmonosulfate, tetrabenzylammonium peroxyhydrogenmonosulfate
- Metal peroxydisulfates include, but are not limited to, sodium peroxydisulfate (Na 2 S 2 O 8 ), potassium peroxydisulfate (K 2 S 2 O 8 ), barium peroxydisulfate (BaS 2 O 8 ), rubidium peroxydisulfate (RbS 2 O 8 ), and the like.
- Metal peroxyhydrogendisulfates include, but are not limited to, sodium peroxyhydrogendisulfate (NaHS 2 O 8 ), potassium peroxyhydrogendisulfate (KHS 2 O 8 ), and the like.
- Ammonium peroxydisulfates include, but are not limited to, ammonium peroxydisulfate ((NH 4 ) 2 S 2 O 8 ), tetramethylammonium peroxydisulfate ((Me 4 N) 2 S 2 O 8 ), tetraethylammonium peroxydisulfate ((Et 4 N) 2 S 2 O 8 ), tetrapropylammonium peroxydisulfate ((Pr 4 N) 2 S 2 O 8 ), tetrabutylammonium peroxydisulfate ((Bu 4 N) 2 S 2 O 8 ), tetrahexylammonium peroxydisulfate, tetradecylammonium peroxydisulfate, tetralaurylammonium peroxydisulfate, tetrabenzylammonium peroxydisulfate ((Bn 4 N) 2 S 2 O 8 ), benzyltrimethyl
- Ammonium peroxyhydrogendisulfates include, but are not limited to, ammonium peroxyhydrogendisulfate ((NH 4 )HS 2 O 8 ), tetramethylammonium peroxyhydrogendisulfate ((Me 4 N)HS 2 O 8 ), tetraethylammonium peroxyhydrogendisulfate ((Et 4 N)HS 2 O 8 ), tetrapropylammonium peroxyhydrogendisulfate ((Pr 4 N)HS 2 O 8 ), tetrabutylammonium peroxyhydrogendisulfate ((Bu 4 N)HS 2 O 8 ), tetrahexylammonium peroxyhydrogendisulfate, tetradecylammonium peroxyhydrogendisulfate, tetralaurylammonium peroxyhydrogendisulfate, tetrabenzylammonium peroxyhydrogendisulfate ((Bn 4
- the preferable peroxymonosulfate is potassium peroxyhydrogenmonosulfate (KHSO 5 )
- KHSO 5 potassium peroxyhydrogenmonosulfate
- Na 2 S 2 O 8 sodium peroxydisulfate
- ammonium peroxydisulfate (NH 4 ) 2 S 2 O 8 ) are the preferred peroxydisulfates.
- the oxidation can be performed either with peroxysulfates alone or with a peroxysulfate mixture.
- Suitable amounts of peroxides are in the range of about 1.0 - 2.0 moles of peroxides to 1.0 mole of 3-pyrrolines having formula (3) and can be preferably used efficiently and economically.
- the substituent group Nu in formula (1) derives from nucleophiles of water, alcohols, amines, and the like.
- Alcohols include, but are not limited to, methanol (MeOH), ethanol (EtOH), propanol (PrOH), butanol (BuOH), hexanol, cyclohexanol, phenol (PhOH), chlorophenol, dichlorophenol, trichlorophenol, catechol, ethylene glycol, diethylene glycol, and the like.
- Amines include, but are not limited to, ammonia (NH 3 ), methylamine (MeNH 2 ), ethylamine (EtNH 2 ), propylamine (PrNH 2 ), butylamine (BuNH 2 ), cyclohexylamine, allylamine, homoallylamine, benzylamine (BnNH 2 ), aniline (PhNH 2 ), chloroaniline, bromoaniline, o-, m-, p-toluidine, dimethylamine (Me 2 NH), diethylamine (Et 2 NH), dipropylamine (Pr 2 NH), dibutylamine (Bu 2 NH), dicyclohexylamine, diallylamine, bis(homoallyl)amine, dibenzylamine (Bn 2 NH), N-methylaniline, N-methylchloroaniline, N-methylbromoaniline, benzylmethylamine (BnMeNH), and the like.
- nucleophiles can be added to the solution either before or after oxidation, so that the one-pot procedure may proceed continuously without isolating the intermediates to obtain the corresponding products, 3-pyrrolidinols.
- these nucleophiles are not necessary, and can be used as inactive solvents by controlling the reaction temperature.
- the oxidation of 3-pyrrolines having formula (3) may be accelerated using ultraviolet light.
- Lamps with wave length from the ultraviolet to the visible light range (200nm - 400nm) can be selected for the irradiation of 3-pyrrolines.
- such lamps include an Argon Resonance Lamp, a Flash UV (Ultra Violet) Lamp, an Ultra High Pressure Hg (mercury) Lamp, a High Pressure Hg (mercury) Lamp, a Low Pressure Hg (mercury) Lamp, a Deuterium Lamp, a Xe (xenon) Lamp, a W (tungsten) Lamp, a Metal Halide Lamp, and the like.
- a High Pressure Hg (mercury) Lamp and a Xe (xenon) Lamp are preferable.
- the reaction system can be changed freely by changing the irradiation time, the irradiation strength or by omitting the irradiation.
- reaction solvents may be freely selected in the oxidation process.
- suitable reaction solvents include, but are not limited to, water, methanol, ethanol, propanol, acetone, methylethylkotone, methylisobutylketone, ethyl acetate, methyl propionate, hexane, cyclohexane, benzene, toluene, chloroform, dichloromethane, dichloroethane, tetrahydrofuran, diethyl ether, diisopropyl ether, ethylene glycol, diethylene glycol, and the like. Either only one kind of solvent may be used, or mixtures of solvents may be used. Alternatively, the solvents can be omitted. With regard to combining the above solvents with the nucleophiles from which substituent group Nu in formula (1) derives, they can be made active and/or inactive by controlling the reaction temperature.
- the reaction temperature will depend on the time required for completing the oxidation. In general, the reaction may be conducted at about 0 - 100°C . In particular, the reaction temperature is about 0 - 30°C for obtaining 3,4-epoxypyrrolidines and is about 30 - 100°C for obtaining 3-pyrrolidinols.
- 3-pyrrolines having formula (3) may be produced by reacting cis-2-butene derivatives having formula (7) with at least one primary amine having formula (8). This reaction allows cyclization of cis-2-butene derivatives of formula (7) and the formation of 3-pyrrolines of formula (3).
- Cis-2-butene derivatives of formula (7) may be produced from cis-2-butene-1,4-diols of formula (9) by reacting the cis-2-butene-1,4-diols of formula (9) with a halogenation reagent in the presence of at least one base.
- R 10 ⁇ NH 2 (8) which are used for preparing 3-pyrrolines, include, but are not limited to, alkyl groups, such as methyl, ethyl, n-, iso-propyl, n-, i-, t-butyl, trifluoromethyl, and the like; cycloalkyl groups, such as cyclohexyl and the like; alkenyl groups, such as vinyl, allyl, methallyl, homoallyl, and the like; aryl groups, such as phenyl, fluorophenyl, difluorophenyl, trifluorophenyl, chlorophenyl, dichlorophenyl, trichlorophenyl, bromophenyl, dibromophenyl, tribromophenyl, nitrophenyl, dinitrophenyl, trinitrophenyl, cyanophenyl, dicyanophenyl, dicyanophenyl, dicyanophenyl,
- Primary amines include, but are not limited to, methylamine, ethylamine, n-, i-propylamine, n-, i-, t-butylamine, cyclohexylamine, allylamine, allylamine, homoallylamine, benzylamine, aniline, chloroaniline, bromoaniline, toluidine and the like.
- cyclohexylamine, benzylamine, and aniline are preferable.
- Suitable amounts of amines are in the range of about 3.0 - 5.0 moles amines to 1.0 mole of cis-2-butene derivatives having formula (7) and can be preferably used efficiently and economically.
- Formula (7) is represented by: wherein R 8 and R 9 are independently hydrogen (H) or a C 1 - C 10 alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group which can be optionally substituted, A 1 and A 2 are independently halogens or sulfonyloxy groups.
- Formula (9) is represented by: wherein R 11 and R 12 are independently hydrogen (H) or a C 1 - C 10 alkyl group, a cycloalkyl group, an aryl group, an aralkyl group which can be optionally substituted.
- Tertiary amines are the preferred bases. Tertiary amines include, but are not limited to, triethylamine, tripropylamine, tributylamine, tribenzylamine, N, N'-dimethylaniline, N, N'-dimethyltoluidine, pyridine, 4-(N, N'-dimethylamino)pyridine, and the like.
- the amount of bases used is in the range of about 2.0 - 3.0 moles of base to 1.0 mole of cis-2-butene-1,4-diols of formula (9). More preferably the amount of base used is in the range of about 2.0 - 2.2 moles of base and can be used efficiently and economically.
- the substituent group, A 3 , in the sulfonyl halides of formula (10) which are used as halogenation reagents in the first process include halogens such as Cl, Br, and I.
- Formula (10) is represented by: R 13 SO 2 A 3 (10) wherein R 13 represents a C 1 - C 10 alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group optionally substituted; and A 3 is a halogen.
- R 13 represents a C 1 - C 10 alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group optionally substituted
- a 3 is a halogen.
- sulfonyl chlorides are preferable.
- the substituent groups R 13 in the sulfonyl halides, which are used for preparing cis-2-butene derivatives of formula (7) or 3-pyrrolines of formula (3) include, but are not limited to alkyl groups, such as methyl, ethyl, n-, iso-propyl, n-, i-, t-butyl, trifluoromethyl, and the like; cycloalkyl groups, such as cyclohexyl and the like; alkenyl groups, such as vinyl, allyl, methallyl, homoallyl, and the like; aryl groups, such as phenyl, fluorophenyl, difluorophenyl, trifluorophenyl, chlorophenyl, dichlorophenyl, trichlorophenyl, bromophenyl, dibromophenyl, tribromophenyl, nitrophenyl, dinitrophenyl, trinitrophenyl,
- the sulfonyl chlorides include, but are not limited to, methanesulfonyl chloride, ethanesulfonyl chloride, n-, i-propanesulfonyl chloride, n-, i-, t-butanesulfonyl chloride, cyclohexanesulfonyl chloride, trifluoromethanesulfonyl chloride, benzenesulfonyl chloride, o-, m-, p-chlorobenzenesulfonyl chloride, o-, m- p-toluenesulfonyl chloride, naphthalenesulfonyl chloride, benzylsulfonyl chloride, and the like.
- the amount of sulfonyl halides used is in the range of about 2.0 - 3.0 moles of base to 1.0 mole cis-2-butene-1,4-diols of formula (9). Preferably, the amount is about 2.0 - 2.2 moles of sulfonyl halides is used for efficiency and economy.
- Reaction solvents may be selected freely in the preparation process of cis-2-butene derivatives or 3-pyrrolines.
- acetone, methylethylkotone, methylisobutylketone, ethyl acetate, methyl propionate, hexane, cyclohexane, benzene, toluene, chloroform, dichloromethane, dichloroethane, carbon tetrachloride, tetrahydrofuran, diethyl ether, diisopropyl ether, and the like are suitable reaction solvents. Either one kind of solvent, mixtures thereof, or no solvents can be used.
- the temperature depends on the time for completing this cyclization reaction. Generally, the temperature is about 0 to 15°C when sulfonyl halides of formula (10) are added to the reaction mixture. Following addition of the sulfonyl halides, the reaction may be performed at about ambient temperature to 60°C with stirring of the solution. Although the temperature in the second stage depends on the reactivity of primary amines of formula (8), the temperature range may be about room temperature to about 100°C.
- the two processes of the previous stage can be conducted to the next stage continuously without isolating intermediates. If one needs to isolate the products (intermediates), one has only to conduct simple operations such as filtration, extraction, and so on. "Conducting the two processes of the previous stage to the next stage continuously without isolating intermediates” refers to a one-pot reaction, advancing to the next reaction without transferring the solution to the another reactor.
- the cis-2-butene derivative solution contains the following compounds, wherein R 8 and R 9 are independently hydrogen (H) or a C 1 - C 10 alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group which can be optionally substituted; R 13 represents a C 1 - C 10 alkyl group, a cycloalkyl group, an aryl group, an aralkyl group optionally substituted; and A 3 is a halogen, or if the oxidation solution contains the following two compounds: wherein R 1 is a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, aralkyl group, optionally substituted; R 2 and R 3 each independently represent a C 1 - C 10 alkyl group, cycloalkyl group, aryl group, or aralkyl group, optionally substituted, and Nu is a hydroxyl group (OH), alkoxyl group
- Processing after continuous reaction only involves simple operations such as filtration, extraction, and so on.
- the following methods may be freely selected: (1) after direct addition and reaction of primary amines to the solution Process (A), both tertiary amine salts and primary amine salts are removed; (2) after removing tertiary amine salts from the solution Process (A), the addition and reaction of primary amines is performed followed by removal of primary amine salts.
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Claims (10)
- Méthode de production d'un dérivé de pyrrolidine de la formule (1) ou de la formule (2), par oxydation d'un composé de formule (3):
où la formule (1) est : dans laquelle R1 est un groupe aralkyle, groupe cycloalkyle, groupe aryle, ou groupe alkyle C1 - C10; R2 et R3 représentent chacun indépendamment un groupe aralkyle, groupe cycloalkyle, groupe aryle ou groupe alkyle C1-C10 et Nu est sélectionné parmi un groupe hydroxyle, un groupe alcoxyle et un groupe amino;
et où la formule (2) est une époxypyrrolidine: dans laquelle R1, R2 et R3 sont tels que définis ci-dessus; et où la formule (3) est: dans laquelle R1, R2 et R3 sont tels que définis ci-dessus; laquelle méthode comprend l'étape d'oxyder un composé de formule (3) avec un peroxyde en présence d'un milieu acide. - Méthode selon la revendication 1 où le dérivé de pyrrolidine est une 3,4-époxypyrrolidine de formule (2) produite à une température d'environ 0 à 30°C.
- Méthode selon la revendication 1 où le dérivé de pyrrolidine est une 3,4-dihydroxypyrrolidine de la formule (1) dans laquelle Nu est un groupe hydroxy, et où l'oxydation est entreprise à une température d'environ 30 à 100°C en présence d'eau.
- Méthode selon la revendication 1, où un 4-amino-3-pyrrolidinol, dans lequel Nu de la formule (1) est un groupe amino, est obtenu par oxydation de 3-pyrroline avec au moins un peroxyde en présence d'au moins un acide à environ 0 à 30°C et ensuite réaction avec au moins une amine en présence d'eau à environ 30 à 100°C.
- Méthode selon la revendication 1, où un 4-alcoxy-3-pyrrolidinol, dans lequel Nu de la formule (1) est un groupe alcoxy, est obtenu par oxydation de 3-pyrroline avec au moins un peroxyde en présence d'au moins un acide à environ 0 à 30°C, et ensuite réaction avec au moins un alcool à environ 30 à 100°C.
- Méthode selon l'une quelconque des revendications 1 à 5, où le peroxyde est sélectionné parmi des acides peroxymonosulfuriques, des peroxymonosulfates de la formule (4):
MxHy(SO5)z (4)
où M est des métaux alcalins, des métaux alcalinoterreux, des éléments de 3A dans la table périodique, ou des groupes ammonium de formule (6); et chacun de x, y et z sont des entiers de 0 - 3, à condition que la relation x + y = 2z soit satisfaite, et
des acides peroxydisulfurique et des péroxydisulfates de la formule (5):
MxHy(S2O8)z (5)
où M est des métaux alcalins, des métaux alcalinoterreux, des éléments de 3A dans la table périodique, ou des groupes ammonium ayant la formule (6): où R4, R5, R6 et R7 représentent chacun indépendamment hydrogène, un groupe alkyle, groupe cycloalkyle, groupe aryle ou groupe aralkyle C1 - C10.
et chacun de x, y et z sont des entiers de 0 - 3, à condition que la relation x + y = 2z soit satisfaite. - Méthode selon l'une quelconque des revendications 1 à 6 où la 3-pyrroline est oxydée avec un peroxyde en présence de l'acide par photo-irradiation.
- Méthode selon l'une quelconque des revendications 1 à 7, où la 3-pyrroline est synthétisée par cyclisation entre des dérivés cis-2-butène de formule (7):
où R8 et R9 sont chacun indépendamment hydrogène, ou un groupe alkyle, groupe cycloalkyle, groupe aryle, ou groupe alkyle C1 - C10; et A1 et A2 sont chacun indépendamment halogène ou un groupe sulfonyloxy; et
des amines primaires de la formule (8):
R10-NH2 (8)
où, R10 est un groupe aralkyle, groupe cycloalkyle, groupe aryle ou groupe alkyle C1 - C10. - Méthode selon la revendication 8 où le dérivé cis-2-butène de la formule (7) est synthétisé à partir de cis-2-butène-1,4-diols de la formule (9):
où R11 et R12 sont chacun indépendamment hydrogène ou un groupe aralkyle, groupe cycloalkyle, groupe aryle, ou groupe alkyle C1 - C10. - Méthode selon la revendication 9, où le dérivé cis-2-butène est synthétisé par réaction de cis-2-butène-1,4-diols de la formule (9) avec au moins un réactif d'halogénation en présence d'au moins une base.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25430498A JP4314597B2 (ja) | 1998-09-08 | 1998-09-08 | N−置換−3−ピロリン化合物の製造法 |
| JP25430498 | 1998-09-08 | ||
| JP33989398 | 1998-11-30 | ||
| JP33989398 | 1998-11-30 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP0985664A2 EP0985664A2 (fr) | 2000-03-15 |
| EP0985664A3 EP0985664A3 (fr) | 2000-05-10 |
| EP0985664B1 true EP0985664B1 (fr) | 2004-03-31 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP99307113A Expired - Lifetime EP0985664B1 (fr) | 1998-09-08 | 1999-09-07 | Procédé de préparation de dérivés de pyrrolidine |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6130338A (fr) |
| EP (1) | EP0985664B1 (fr) |
| AT (1) | ATE263149T1 (fr) |
| CA (1) | CA2281393A1 (fr) |
| DE (1) | DE69915951T2 (fr) |
| ES (1) | ES2218955T3 (fr) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6130338A (en) | 1998-09-08 | 2000-10-10 | Toray Industries, Inc. | Method of producing pyrrolidine derivatives |
| DE10201458A1 (de) | 2001-04-11 | 2002-10-17 | Adelbert Bacher | Intermediate und Enzyme des Mevalonat-unabhängigen Isoprenoidbiosyntheseweg |
| JP2005206526A (ja) * | 2004-01-23 | 2005-08-04 | Toray Fine Chemicals Co Ltd | 1−ベンジル−3,4−エポキシピロリジン誘導体の製造方法 |
| US10383894B2 (en) * | 2010-03-17 | 2019-08-20 | Lutran Industries, Inc. | Human medicinal treatment using salt of peroxymonosulfuric acid |
| CN113307757B (zh) * | 2021-05-26 | 2022-04-29 | 南京德克瑞医药化工有限公司 | 一种医药中间体n-苄基-3-吡咯啉的制备方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1929237A1 (de) * | 1968-06-12 | 1969-12-18 | Sankyo Co | Verfahren zur Herstellung von N-Acyl-3,4-epoxy-pyrrolidin-Derivaten |
| US3691198A (en) * | 1970-12-21 | 1972-09-12 | Cpc International Inc | Synthesis of 1-substituted-3-halopyrrolidines |
| JPS566971B2 (fr) * | 1973-02-12 | 1981-02-14 | ||
| US4175099A (en) * | 1975-03-07 | 1979-11-20 | Exxon Research & Engineering Co. | Separation and recovery of ethylbenzene from C8 aromatic mixtures using rubidium-X sieves |
| US4230718A (en) * | 1979-01-09 | 1980-10-28 | A. H. Robins Company, Inc. | 1-Substituted-3,4-epoxypyrrolidines |
| US4605799A (en) * | 1980-08-13 | 1986-08-12 | Toray Industries, Inc. | Process for separating a halogenated toluene isomer |
| JPS59199642A (ja) * | 1983-04-28 | 1984-11-12 | Toray Ind Inc | 2,6−ジクロルトルエンの分離方法 |
| JPH06239808A (ja) * | 1993-02-15 | 1994-08-30 | Toray Ind Inc | 2−メチル−3−ニトロベンゾトリフルオライドの分離方法 |
| US5453560A (en) * | 1994-05-20 | 1995-09-26 | Uop | Process for adsorptive separation of ethylbenzene from aromatic hydrocarbons |
| US6130338A (en) | 1998-09-08 | 2000-10-10 | Toray Industries, Inc. | Method of producing pyrrolidine derivatives |
-
1999
- 1999-09-03 US US09/390,160 patent/US6130338A/en not_active Expired - Fee Related
- 1999-09-07 CA CA002281393A patent/CA2281393A1/fr not_active Abandoned
- 1999-09-07 ES ES99307113T patent/ES2218955T3/es not_active Expired - Lifetime
- 1999-09-07 EP EP99307113A patent/EP0985664B1/fr not_active Expired - Lifetime
- 1999-09-07 DE DE69915951T patent/DE69915951T2/de not_active Expired - Lifetime
- 1999-09-07 AT AT99307113T patent/ATE263149T1/de not_active IP Right Cessation
-
2000
- 2000-04-26 US US09/558,798 patent/US6479668B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| CA2281393A1 (fr) | 2000-03-08 |
| EP0985664A3 (fr) | 2000-05-10 |
| DE69915951T2 (de) | 2005-01-20 |
| US6479668B1 (en) | 2002-11-12 |
| US6130338A (en) | 2000-10-10 |
| DE69915951D1 (de) | 2004-05-06 |
| ATE263149T1 (de) | 2004-04-15 |
| ES2218955T3 (es) | 2004-11-16 |
| EP0985664A2 (fr) | 2000-03-15 |
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