EP1010228B1 - Schutzvorrichtung gegen transiente spannungen und verfahren zu deren herstellung - Google Patents
Schutzvorrichtung gegen transiente spannungen und verfahren zu deren herstellung Download PDFInfo
- Publication number
- EP1010228B1 EP1010228B1 EP97948374A EP97948374A EP1010228B1 EP 1010228 B1 EP1010228 B1 EP 1010228B1 EP 97948374 A EP97948374 A EP 97948374A EP 97948374 A EP97948374 A EP 97948374A EP 1010228 B1 EP1010228 B1 EP 1010228B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- gap
- conductive
- substrate
- voltage protection
- transient voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000001052 transient effect Effects 0.000 title claims abstract description 39
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 45
- 239000000919 ceramic Substances 0.000 claims abstract description 15
- 239000011521 glass Substances 0.000 claims abstract description 13
- 229920000642 polymer Polymers 0.000 claims abstract description 3
- 238000011109 contamination Methods 0.000 claims abstract 2
- 239000004020 conductor Substances 0.000 claims description 51
- 239000000463 material Substances 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 20
- 239000002131 composite material Substances 0.000 claims description 4
- 238000000926 separation method Methods 0.000 claims 1
- 229910003460 diamond Inorganic materials 0.000 description 9
- 239000010432 diamond Substances 0.000 description 9
- 238000001465 metallisation Methods 0.000 description 9
- 229910010293 ceramic material Inorganic materials 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052839 forsterite Inorganic materials 0.000 description 3
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 230000001629 suppression Effects 0.000 description 3
- 238000009472 formulation Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T4/00—Overvoltage arresters using spark gaps
- H01T4/08—Overvoltage arresters using spark gaps structurally associated with protected apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01T—SPARK GAPS; OVERVOLTAGE ARRESTERS USING SPARK GAPS; SPARKING PLUGS; CORONA DEVICES; GENERATING IONS TO BE INTRODUCED INTO NON-ENCLOSED GASES
- H01T21/00—Apparatus or processes specially adapted for the manufacture or maintenance of spark gaps or sparking plugs
Definitions
- Transient voltage protection devices were developed in response to the need to protect the ever-expanding number of electronic devices upon which today's technological society depends from high voltages. Electrical transient voltages can be created by, for example, electrostatic discharge or transients propagated by human contact. Examples of electrical equipment which typically employ transient voltage protection equipment include, telecommunications systems, computer systems and control systems.
- variable impedance material having a variable impedance which interconnects, for example, a signal conductor with a ground conductor.
- the variable impedance material exhibits a relatively high resistance (referred to herein as the "off-state") when the voltage and/or current passing through the signal conductor is within a specified range, during which time the signal conductor is ungrounded.
- variable impedance material and the transient voltage protection device generally
- the electrical characteristics of the variable impedance material will change such that the material exhibits a relatively low impedance (referred to herein as the "on-state").
- the pulse or transient voltage experienced by the signal conductor will be shunted to the ground conductor, and the voltage associated with the pulse will be clamped at a relatively low value for the duration of the pulse. In this way, the circuitry associated with the signal conductor is protected.
- variable impedance material will recover after the voltage or current pulse has passed and return to its high impedance state.
- the signal conductor and associated circuitry can continue normal operation shortly after the pulse has ended.
- variable impedance materials also sometimes referred to as “overstress responsive compositions”
- These materials can, for example, be fabricated as a mixture of conductive and/or semiconductive particles suspended as a matrix within a binding material, which can, for example, be an insulative resin.
- a binding material which can, for example, be an insulative resin.
- Numerous examples of these types of materials can be found in the patent literature including U.S. Patent Nos. 5,393,596 and 5,260,848 to Childers, U.S. Patent Nos. 4,977,357 and 5,068,634 to Shrier and U.S. Patent No. 5,294,374 to Martinez.
- U.S. Patent No. 5,278,535 to Xu et al. describes an electrical overstress pulse protection device which employs a variable impedance material.
- Xu et al. provide a thin flexible laminate for overlay application on the pins of a connector.
- the laminate includes an electrically insulating substrate, a conductive lamina of apertured pin receiving pads, a separate ground strip adjacent the pads, and an electrically insulating cover.
- An electrical overstress pulse responsive composite material is positioned such that it bridges the pads and the ground strip.
- This patent to Xu et al. uses conventional semiconductor fabrication techniques to create the pulse protection device including forming the substrate from a conventional resin material, e.g., of the type typically used for substrates of printed circuit boards.
- Xu et al. describe forming the conductive elements using etching techniques, which are also well known in the semiconductor fabrication. While these techniques may be appropriate when working with thin film metal conductors, Applicants have determined that other techniques and materials are more desirable when manufacturing signal and ground conductive elements having a greater thickness, e.g., on the order of 0.5-1.0 mils (0.0127 mm to 0.0254 mm), or more.
- US-A-3 676 742 discloses a transient overvoltage protection device comprising a substrate with conductive lines thereon for connecting electrical components and with a spark gap which is filled with air or glass.
- US-A-4 586 105 discloses a high-voltage protection device with a tape-covered spark gap of 2.5 to 15 mils (0.0635 to 0.381 mm) between the discharge points.
- the precision of the gap dimensions are important to producing a commercially desirable product.
- the precision of the gap dimensions are significant because the electrical characteristics of the device, e.g., the trigger voltage, clamp voltage and current density, are, in part, determined by the size and shape of the gap.
- a method for fabricating a transient voltage protection device including, for example, a ground conductor and at least one other conductor comprises the steps of: providing a substrate; forming a conductive layer on the substrate; and dicing the conductive layer on the substrate to create a gap which separates the conductive layer into at least the ground conductor and the at least one other conductor.
- the substrate can be formed from a ceramic material or non-ceramic materials such as FR-4. If a ceramic material is used for the substrate, then it is preferable that such a ceramic material have a density of less than about 3.8 gms/cm 3 . For example, forsterite and calcium borosilicate are two such ceramic materials. Dicing to create the gap can be accomplished, for example, using a diamond dicing saw having, for example, diamond particles of preferably no more than 5 microns in size.
- a device comprises a ceramic substrate having a density of less than about 3.8 gms/cm 3 , a ground conductor and at least one other conductor formed on the ceramic substrate such that they are substantially co-planar and are separated from one another by a gap; and a variable impedance material disposed within the gap and in contact with both the ground conductor and the at least one other conductor.
- the ceramic substrate will preferably have a bulk density of less than 3.5 gms/cm 3 and optimally a density of less than 3.0 gms/cm 3 .
- Applicants have identified forsterite (2MgSiO 2 ) having a bulk density of 2.8 gms/cm 3 and calcium borosilicate, having a bulk density of 2.5 gms/cm 3 as materials which are well suited for substrates according to the present invention.
- forsterite (2MgSiO 2 ) having a bulk density of 2.8 gms/cm 3
- calcium borosilicate having a bulk density of 2.5 gms/cm 3 as materials which are well suited for substrates according to the present invention.
- Figure 1 shows a discrete transient voltage protection element, i.e., a transient voltage protection element which can be used as part of a circuit board, however other applications of the present invention are contemplated, e.g., using transient voltage protection devices according to the present invention as part of a connector.
- the discrete transient voltage protection element includes a substrate 10 on which two conductors 12 and 14 are formed.
- conductor 12 is the ground conductor
- conductor 14 is a signal or power carrying conductor.
- a gap 16 is formed between conductors 12 and 14.
- FIG. 1A illustrates the gap as extending to the surface of substrate 10
- preferred embodiments of the present invention include extending the gap into the substrate.
- the electrical characteristics of the transient voltage protection element will depend, in part, on the precision with which gap 16 is formed.
- precision of the depth, width and uniformity of edges 18 and 20 referred to herein as "edge acuity" associated with gap 16 is carefully controlled by way of the techniques described below.
- Figure 1B illustrates the discrete transient voltage protection element of Figure 1A, wherein a variable impedance material 22 fills the gap 16.
- a variable impedance material 22 fills the gap 16.
- any known variable impedance material may be used, including those described in the above-mentioned patents, as well as those fabricated from dielectric polymers, glass, ceramic or composites thereof. These materials may, for example, include or be mixed with conductive and/or semiconductive particles in order to provide the desired electrical characteristics.
- a currently preferred variable impedance material is that manufactured by SurgX Corporation and identified by SurgX as Formulation #F1-6B.
- transient voltage protection devices a method for manufacturing transient voltage protection devices will now be described with respect to Figures 2A-2F. Many such devices can be fabricated on a single wafer. The process begins by selecting a suitable material for the substrate wafer 30. Although illustrated as a rectangle for simplicity in Figure 2A, those skilled in the art will appreciate that the shape of the wafer provided by a wafer manufacturer may vary and can, for example, be circular.
- a ceramic or glass-based material is preferred for substrate 30.
- the present invention contemplates any and all ceramic materials and glass-based materials, it has been found that certain ceramics and glass-based materials are optimal from a manufacturing point of view.
- ceramic and glass-based materials should be selected which have a sufficiently low density that a diamond dicing saw can create the gap (1) with sufficient edge acuity and (2) without wearing out the saw so rapidly as to be economically unfeasible.
- preferable ceramics and/or glass-based materials will have a density of less than 3.8 gms/cm 3 . preferably less than 3.5 gms/cm 3 and optimally a density of less than 3.0 gms/cm 3 .
- forsterite (2MgSiO 2 ) having a bulk density of 2.8 gms/cm 3 and calcium borosilicate, having a bulk density of 2.5 gms/cm 3 as materials which are well suited for substrates according to the present invention.
- any ceramic e.g., a material within the ternary MgO-Al 2 O 3 -SiO 2 system or other materials having similar properties, or glass composite having a sufficiently low bulk density and being otherwise amenable to dicing can be used as a substrate in accordance with the present invention.
- the next step is to pattern the substrate with metallization.
- the metallization can take the form of elongated lines 32 spaced apart on substrate 30 by areas 34.
- the metallization lines 32 can be formed by silk screening silver palladium onto the substrate 30.
- other conductive materials could be used including, for example, copper, gold, nickel, etc.
- the width and thickness of the lines 32 can be chosen based on the capabilities desired for the discrete transient voltage protection elements to be created. According to one exemplary embodiment, Applicants have found that a width of about 0.040 inches (1.016 mm) and a thickness of between 0.5 - 1.0 mils (0.0127-0.0254 mm), provide good performance, however those skilled in the art will appreciate that these values are purely for illustration herein.
- the dicing operations are performed to both form the gaps between the conductors and singulate the substrate wafer 30 into its individual discrete transient voltage protection devices.
- Applicants have selected dicing over other techniques which could be used to form the gap between the conductors, e.g., cutting the gap with a laser, for its precision with respect to gap width, depth and edge acuity. Details of diamond dicing techniques which can be used to cut the gaps and singulate the wafer substrate 30 are provided below.
- a single discrete device cut from portion 36 of wafer substrate 30 is blown-up as Figure 2C.
- This device was cut from wafer substrate 30 by dicing horizontally across the wafer substrate 30 along the areas 34 and vertically across metallization 32. By dicing a gap 40 completely through metallization 32 and partially through the wafer substrate 30 and two separate conductors 42 and 44 are formed, one of which can be grounded when attached to a printed circuit board (not shown).
- the gap 40 can be diced so as to have any desired width, for example, between 0.5 and 3.0 mils (0.0127 and 0.0762 mm), preferably between 0.8 and 1.1 mils (0.0203 and 0.02794 mm) and most preferably about 1 mil (0.0254 mm).
- a conductive material 46 for example, between 0.5 and 3.0 mils (0.0127 and 0.0762 mm), preferably between 0.8 and 1.1 mils (0.0203 and 0.02794 mm) and most preferably about 1 mil (0.0254 mm).
- the device can then be terminated by capping each end with a conductive material 46.
- variable impedance material 48 As mentioned above, any known variable impedance material can be used, however the currently preferred material is available from SurgX Corporation and is identified as their formulation #F1-6B.
- a circular portion of the variable impedance material 48 can be applied to bridge the gap 40 and have an approximately circular footprint thereon of approximately 0.050 inches (1.27 mm).
- the variable impedance material 48 is forced into the gap 40 using a syringe so that the material substantially completely fills gap 40.
- the gap 40 can be diced below the surface of the substrate wafer 30.
- the gap can extend about 0.005 inches (0.127 mm) beyond the metallization into the substrate wafer 30.
- Dicing is the preferred technique for forming the gap between the conductors into which the variable impedance material is introduced due to the precision with which the gap can thus be manufactured, amongst other reasons. Dicing involves applying a compressive force to a material such that it chips away to form an opening. Thus, in order to obtain a gap with sufficient precision in terms of width, depth and edge acuity, the parameters of the dicing operation should be carefully controlled. According to exemplary embodiments of the present invention, a diamond dicing saw is used as illustrated in Figure 3.
- the saw includes a saw hub 50 and a spindle 52 on which the saw blade 54 is rotatably mounted.
- a hubless saw can be used.
- the saw blade 54 can, for example be 1 mil (0.0254 mm) thick and is, preferably, electroplated with a solution of nickel and diamond particles.
- the size of the diamond particles affects the size of the chips and, thus, the edge acuity. Accordingly, Applicants have found that the diamond particles should preferably be 5 microns or less. Other dicing parameters will also impact the precision of the gap.
- the exposure ("E" in Figure 3) of the blade 54 beyond the hub 50 should be minimized to avoid blade wobble and associated inaccuracies in the gap width.
- the feed speed of the substrate through the saw and the spindle speed of the blade should also be considered as will be appreciated by those skilled in the art.
- the connector-related device will be used to permit at least one connector pin to pass through a through-hole in the device, at least one ground pin passing through at least one ground through-hole in the device, and the ground through-hole(s) in the device will be electrically isolated from the other through-hole(s) until an over-voltage condition is experienced.
- the ground through-hole(s) in the device will be electrically isolated from the other through-hole(s) until an over-voltage condition is experienced.
- FIG 4A depicts a transient voltage protection device for an RJ-11 type connector according to an exemplary embodiment of the present invention.
- a ceramic or glass-based substrate 60 has a metallization layer 62 screened thereon as described above.
- the conductors are patterned to provide for through-holes which will mate with the pins of an RJ-11 type connector when the device is attached thereto.
- two gaps 64 and 66 are diced through the metallization layer 62 and partially through the substrate 60. This has the affect of separating the six conductive portions surrounding the through-hole areas from a central conductive "bus" 68.
- a conductive material 70 is disposed between the conductor surrounding through-hole area (i.e,. the through-hole for the ground pin of the RJ-11 connector) and the conductive "bus" 68.
- This establishes conductive "bus" 68 as a grounded plane which is proximate each of the conductors associated with the other through-hole areas.
- FIG 4D An alternative embodiment is illustrated in Figure 4D, wherein the pins, e.g., pin 67, mate with saddles, e.g., saddle 69, formed in the ceramic substrate 60.
- the pins can be soldered to the metallized surfaces of the saddles, as represented by solder patch 71.
- variable impedance material 74 is deposited over the area including the gaps 66 and 64 and forced into the gap to provide an over-voltage responsive electrical connection between the conductive "bus" 68 and each of the conductors 76-84, each of which will be associated with a corresponding pin of the RJ-11 connector to which the device is attached.
- an encapsulating material 86 can be provided to cover the variable impedance material 74 to, for example, protect the variable impedance material and prevent electrical charges from other circuitry from being applied across the variable impedance material.
- the through-holes can be made in the area 72 and within conductors 76-84 by drilling, laser micromachining or other methods recognized by those skilled in the art.
- the size of the through-holes will depend on the diameter of the leads extending from the particular connector.
- the through-hole hole diameter can range from 20 mils to 40 mils (0.508 mm to 1.016 mm), but more typically are 30 mils (0.762 mm) in diameter.
- the device 88 illustrated in Figure 4E, as well as other exemplary embodiments wherein the transient voltage suppression device is intended to be used in connection with a connector having pins or leads, can then be mounted in mating relationship with the pins or leads and the substrate can be affixed to the connector body using solder or other adhering techniques.
- Figure 5 is a graph of current through, and voltage across, a device constructed in accordance with the present invention as illustrated and described with respect to Figures 2A-2D.
- a 1000-4-2 standard 8 kV pulse as specified by the Electrotechnical Commission (IEC).
- This standard pulse is intended to simulate the pulse which would be applied to electrical circuitry by the discharge of static electricity associated with a human body.
- the upper waveform (I) represents the current conducted by the transient voltage suppression device, which flows into ground, while the lower waveform depicts the voltage across the device during the test.
- the device triggered (i.e., entered its on-state) at 188 V.
- the pulse was clamped at 41.3 V and peak current was 42.8 A.
- devices constructed in accordance with the present invention can be seen from Figure 5 to rapidly limit the transient voltage to a value which is substantially less than that of the prospective pulse value.
- devices constructed in accordance with the present invention exhibit relatively low leakage current and low capacitance.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Emergency Protection Circuit Devices (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Structure Of Printed Boards (AREA)
Claims (4)
- Verfahren zur Herstellung einer Vorrichtung zum Schutz vor transienten Spannungen, mit den Schritten:(a) Ausbilden von leitenden Leitungen (32) auf einem Scheibensubstrat (30), wobei die Leitungen Leitungswege zwischen elektronischen Komponenten bilden;(b) Ausbilden eines Spalts (16, 40) von 3 mil (0,0762 mm) oder weniger in mindestens einer der Leitungen (32) durch Trennen der Leitung mit einer Säge oder einem Laser, so daß zwei durch den Spalt (16, 40) getrennte Leiter (42, 44) ausgebildet werden;(c) Überziehen des Spalts (16, 40), um eine Kontamination des Luftraums im Spalt zu verhindern, oder Füllen des Spalts mit einem impedanzvariablen Material (48), z. B. einem sauberen ungefüllten Polymer oder Glas oder Keramik oder von Verbundstoffen daraus;(d) Sägen des Substrats (30), wobei das Substrat in einzelne Einheiten zum Schutz vor transienten Spannungen getrennt wird, die jeweils zwei durch den Spalt getrennte Leiter (42, 44) aufweisen;(e) Abdecken der Enden (46) jedes Leiters (42, 44) der einzelnen Einheiten zum Schutz vor transienten Spannungen mit leitendem Material, so daß die elektrische Trennung der Leiter durch den Spalt erhalten bleibt.
- Verfahren nach Anspruch 1, wobei der Spalt kleiner als etwa 1 mil (0,0254 mm) ist.
- Vorrichtung zum Schutz vor transienten Überspannungen mit:(a) einem Substrat (60) mit einer leitenden Schicht (62) mit zwei Spalten (64, 66), die einen mittigen leitenden Bus (68) zwischen sich definieren, und leitenden Abschnitten (76 bis 84) auf beiden Seiten des mittigen leitenden Busses (68), die so bemessen sind, daß sie mit den Verbinderanschlußstiften oder Leitungen (67) ineinandergreifen, wobei(b) die Spalte (64, 66) dafür angepaßt sind, den leitenden Bus (68) von den leitenden Abschnitten (76 bis 84) mit Durchgangslöchern (72) oder Schalen (69) für die Anschlußstifte oder Leitungen des Verbinders zu trennen, und(c) die Spalte (64, 66) mit einem impedanzvariablen Material (74) gefüllt sind, um eine überspannungsempfindliche elektrische Verbindung zwischen dem leitenden Bus (68) und jedem der leitenden Abschnitte (76 bis 84) herzustellen.
- Vorrichtung nach Anspruch 3, wobei die Breite der Spalte (64, 66) kleiner ist als 1 mil (0,0254 mm).
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US3131796P | 1996-11-19 | 1996-11-19 | |
| US31317P | 1996-11-19 | ||
| PCT/US1997/021117 WO1998023018A1 (en) | 1996-11-19 | 1997-11-19 | A transient voltage protection device and method of making same |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP1010228A4 EP1010228A4 (de) | 2000-06-21 |
| EP1010228A1 EP1010228A1 (de) | 2000-06-21 |
| EP1010228B1 true EP1010228B1 (de) | 2007-02-28 |
Family
ID=21858784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP97948374A Expired - Lifetime EP1010228B1 (de) | 1996-11-19 | 1997-11-19 | Schutzvorrichtung gegen transiente spannungen und verfahren zu deren herstellung |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1010228B1 (de) |
| JP (1) | JP4397972B2 (de) |
| AT (1) | ATE355645T1 (de) |
| AU (1) | AU5445998A (de) |
| DE (1) | DE69737424T2 (de) |
| WO (1) | WO1998023018A1 (de) |
Families Citing this family (55)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001514845A (ja) | 1997-09-05 | 2001-09-18 | ターゲティッド ジェネティクス コーポレイション | 組換えaavベクターの高力価ヘルパーなし調製物を生成するための方法 |
| US6566118B1 (en) | 1997-09-05 | 2003-05-20 | Targeted Genetics Corporation | Methods for generating high titer helper-free preparations of released recombinant AAV vectors |
| US6995006B2 (en) | 1997-09-05 | 2006-02-07 | Targeted Genetics Corporation | Methods for generating high titer helper-free preparations of released recombinant AAV vectors |
| DK1930418T3 (da) | 1998-09-04 | 2015-07-13 | Genzyme Corp | Fremgangsmåder til frembringelse af hjælperfri præparater med høj titer af frigjorte rekombinante AAV-vektorer |
| JP3491551B2 (ja) | 1999-02-16 | 2004-01-26 | 三菱マテリアル株式会社 | マイクロギャップの形成方法 |
| WO2001017320A1 (en) | 1999-08-27 | 2001-03-08 | Lex Kosowsky | Current carrying structure using voltage switchable dielectric material |
| US7695644B2 (en) | 1999-08-27 | 2010-04-13 | Shocking Technologies, Inc. | Device applications for voltage switchable dielectric material having high aspect ratio particles |
| US7825491B2 (en) | 2005-11-22 | 2010-11-02 | Shocking Technologies, Inc. | Light-emitting device using voltage switchable dielectric material |
| US7221287B2 (en) | 2002-03-05 | 2007-05-22 | Triangle Software Llc | Three-dimensional traffic report |
| US7610145B2 (en) | 2003-07-25 | 2009-10-27 | Triangle Software Llc | System and method for determining recommended departure time |
| US7612976B2 (en) * | 2005-07-21 | 2009-11-03 | Cooper Technologies Company | Transient voltage protection circuit boards and manufacturing methods |
| CN101496167A (zh) | 2005-11-22 | 2009-07-29 | 肖克科技有限公司 | 用于过电压保护的包括电压可变换材料的半导体器件 |
| US7981325B2 (en) | 2006-07-29 | 2011-07-19 | Shocking Technologies, Inc. | Electronic device for voltage switchable dielectric material having high aspect ratio particles |
| JP2010521058A (ja) | 2006-09-24 | 2010-06-17 | ショッキング テクノロジーズ,インコーポレイテッド | ステップ電圧応答を有する電圧切り換え可能な誘電体材料の組成及び該誘電体材料の製造方法 |
| CN101536275B (zh) * | 2006-10-31 | 2012-05-30 | 松下电器产业株式会社 | 防静电部件及其制造方法 |
| US7793236B2 (en) | 2007-06-13 | 2010-09-07 | Shocking Technologies, Inc. | System and method for including protective voltage switchable dielectric material in the design or simulation of substrate devices |
| US8206614B2 (en) | 2008-01-18 | 2012-06-26 | Shocking Technologies, Inc. | Voltage switchable dielectric material having bonded particle constituents |
| US8203421B2 (en) | 2008-04-14 | 2012-06-19 | Shocking Technologies, Inc. | Substrate device or package using embedded layer of voltage switchable dielectric material in a vertical switching configuration |
| EP2342722A2 (de) | 2008-09-30 | 2011-07-13 | Shocking Technologies Inc | Spannungsumschaltbares dielektrisches material mit leitenden kernhüllepartikeln |
| US9208931B2 (en) | 2008-09-30 | 2015-12-08 | Littelfuse, Inc. | Voltage switchable dielectric material containing conductor-on-conductor core shelled particles |
| US8362871B2 (en) | 2008-11-05 | 2013-01-29 | Shocking Technologies, Inc. | Geometric and electric field considerations for including transient protective material in substrate devices |
| US8272123B2 (en) | 2009-01-27 | 2012-09-25 | Shocking Technologies, Inc. | Substrates having voltage switchable dielectric materials |
| US8399773B2 (en) | 2009-01-27 | 2013-03-19 | Shocking Technologies, Inc. | Substrates having voltage switchable dielectric materials |
| US9046924B2 (en) | 2009-03-04 | 2015-06-02 | Pelmorex Canada Inc. | Gesture based interaction with traffic data |
| US8619072B2 (en) | 2009-03-04 | 2013-12-31 | Triangle Software Llc | Controlling a three-dimensional virtual broadcast presentation |
| US8982116B2 (en) | 2009-03-04 | 2015-03-17 | Pelmorex Canada Inc. | Touch screen based interaction with traffic data |
| US8968606B2 (en) | 2009-03-26 | 2015-03-03 | Littelfuse, Inc. | Components having voltage switchable dielectric materials |
| US9053844B2 (en) | 2009-09-09 | 2015-06-09 | Littelfuse, Inc. | Geometric configuration or alignment of protective material in a gap structure for electrical devices |
| US9082622B2 (en) | 2010-02-26 | 2015-07-14 | Littelfuse, Inc. | Circuit elements comprising ferroic materials |
| US9320135B2 (en) | 2010-02-26 | 2016-04-19 | Littelfuse, Inc. | Electric discharge protection for surface mounted and embedded components |
| US9224728B2 (en) | 2010-02-26 | 2015-12-29 | Littelfuse, Inc. | Embedded protection against spurious electrical events |
| CA2839866C (en) | 2011-05-18 | 2021-04-13 | Triangle Software Llc | System for providing traffic data and driving efficiency data |
| CA2883973C (en) | 2012-01-27 | 2021-02-23 | Edgar Rojas | Estimating time travel distributions on signalized arterials |
| KR101771726B1 (ko) * | 2012-06-18 | 2017-08-25 | 삼성전기주식회사 | 정전기 방지 소자 및 이를 포함하는 복합 전자 부품 |
| US10223909B2 (en) | 2012-10-18 | 2019-03-05 | Uber Technologies, Inc. | Estimating time travel distributions on signalized arterials |
| AU2014251099B2 (en) | 2013-04-08 | 2019-01-17 | The University Of Kansas | Chimeric adeno-associated virus/ bocavirus parvovirus vector |
| CN105377039A (zh) | 2013-05-15 | 2016-03-02 | 明尼苏达大学董事会 | 腺相关病毒介导的基因向中枢神经系统转移 |
| HK1256341A1 (zh) | 2015-05-15 | 2019-09-20 | 明尼苏达大学董事会 | 用於治疗性递送到中枢神经系统的腺相关物 |
| WO2017139381A1 (en) | 2016-02-08 | 2017-08-17 | University Of Iowa Research Foundation | Methods to produce chimeric adeno-associated virus/bocavirus parvovirus |
| EP3541946A1 (de) | 2016-11-15 | 2019-09-25 | Regents Of The University Of Minnesota | Verfahren zur verbesserung der neurologischen funktion bei mpsi und mpsii und anderen neurologischen erkrankungen |
| US11142775B2 (en) | 2017-01-13 | 2021-10-12 | University Of Iowa Research Foundation | Bocaparvovirus small noncoding RNA and uses thereof |
| US20220241436A1 (en) | 2019-04-15 | 2022-08-04 | University Of Iowa Research Foundation | Compositions and methods for treatment of cystic fibrosis |
| EP3955970A1 (de) | 2019-04-15 | 2022-02-23 | University Of Iowa Research Foundation | Verfahren und zusammensetzungen zur transgenexpression |
| WO2021072115A1 (en) | 2019-10-08 | 2021-04-15 | Regents Of The University Of Minnesota | Crispr-mediated human genome editing with vectors |
| US20230242941A1 (en) | 2020-06-30 | 2023-08-03 | Eric Yuen | Methods and compositions for administering recombinant viral vectors |
| US20230374483A1 (en) | 2020-07-08 | 2023-11-23 | Regents Of The University Of Minnesota | Modified hexosaminidase and uses thereof |
| WO2022047201A1 (en) | 2020-08-27 | 2022-03-03 | University Of Iowa Research Foundation | Gene knock-out for treatment of glaucoma |
| WO2022170082A1 (en) | 2021-02-05 | 2022-08-11 | Regents Of The University Of Minnesota | Methods for preventing cardiac or skeletal defects in diseases including mucopolysaccharidoses |
| US20240115738A1 (en) | 2021-04-15 | 2024-04-11 | Spirovant Sciences, Inc. | Methods and compositions for treatment of cystic fibrosis |
| WO2024086747A1 (en) | 2022-10-19 | 2024-04-25 | Affinia Therapeutics Inc. | Recombinant aavs with improved tropism and specificity |
| WO2024092171A1 (en) | 2022-10-26 | 2024-05-02 | University Of Iowa Research Foundation | Method to deliver large genes using virus and a dna recombination system |
| WO2024238807A2 (en) | 2023-05-16 | 2024-11-21 | Affinia Therapeutics Inc. | Recombinant aavs with improved tropism and specificity |
| TW202548023A (zh) | 2024-03-14 | 2025-12-16 | 美商雅菲納治療公司 | 用於生產重組腺相關病毒的質體系統 |
| WO2025227063A1 (en) | 2024-04-26 | 2025-10-30 | Affinia Therapeutics Inc. | Recombinant aavs with improved tropism and specificity |
| WO2025235491A1 (en) | 2024-05-07 | 2025-11-13 | Affinia Therapeutics Inc. | Recombinant aav for treatment of cardiac diseases |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3676742A (en) * | 1971-05-24 | 1972-07-11 | Signetics Corp | Means including a spark gap for protecting an integrated circuit from electrical discharge |
| US4586105A (en) * | 1985-08-02 | 1986-04-29 | General Motors Corporation | High voltage protection device with a tape covered spark gap |
| JPH07176693A (ja) * | 1993-12-17 | 1995-07-14 | Fujitsu Ltd | 入力保護回路 |
-
1997
- 1997-11-19 AU AU54459/98A patent/AU5445998A/en not_active Abandoned
- 1997-11-19 AT AT97948374T patent/ATE355645T1/de not_active IP Right Cessation
- 1997-11-19 JP JP52383498A patent/JP4397972B2/ja not_active Expired - Lifetime
- 1997-11-19 WO PCT/US1997/021117 patent/WO1998023018A1/en not_active Ceased
- 1997-11-19 DE DE69737424T patent/DE69737424T2/de not_active Expired - Lifetime
- 1997-11-19 EP EP97948374A patent/EP1010228B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE69737424T2 (de) | 2007-06-21 |
| JP4397972B2 (ja) | 2010-01-13 |
| EP1010228A4 (de) | 2000-06-21 |
| ATE355645T1 (de) | 2006-03-15 |
| WO1998023018A1 (en) | 1998-05-28 |
| EP1010228A1 (de) | 2000-06-21 |
| DE69737424D1 (de) | 2007-04-12 |
| JP2001504635A (ja) | 2001-04-03 |
| AU5445998A (en) | 1998-06-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1010228B1 (de) | Schutzvorrichtung gegen transiente spannungen und verfahren zu deren herstellung | |
| US6160695A (en) | Transient voltage protection device with ceramic substrate | |
| US8310799B2 (en) | Transient voltage protection device, material, and manufacturing methods | |
| EP0879470B1 (de) | Überspannungsschutzanordnung und herstellungsverfahren | |
| US6172590B1 (en) | Over-voltage protection device and method for making same | |
| US6693508B2 (en) | Protection of electrical devices with voltage variable materials | |
| CN101226798B (zh) | 瞬态电压保护电路板及制造方法 | |
| WO1997026665A9 (en) | Over-voltage protection device and method for making same | |
| JPWO2008053717A1 (ja) | 静電気対策部品とその製造方法 | |
| JP5206415B2 (ja) | 静電気対策部品およびその製造方法 | |
| JP2009152348A (ja) | 静電気対策部品 | |
| EP0815577B1 (de) | Schmelzbarer widerstand für fehlerstrom und verfahren dafür | |
| KR100495129B1 (ko) | 도선을 이용한 표면실장형 전기장치 제조방법 | |
| JP2008147271A (ja) | 静電気対策部品およびその製造方法 | |
| JP2009147315A (ja) | 静電気対策部品 | |
| KR20000010040A (ko) | 정전기 방전 보호를 갖는 회로보드 | |
| JP2008172130A (ja) | 静電気対策部品およびその製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| 17P | Request for examination filed |
Effective date: 19990618 |
|
| A4 | Supplementary search report drawn up and despatched |
Effective date: 19990715 |
|
| AK | Designated contracting states |
Kind code of ref document: A4 Designated state(s): AT BE CH DE DK ES FI FR GB IE IT LI LU NL PT SE Kind code of ref document: A1 Designated state(s): AT BE CH DE DK ES FI FR GB IE IT LI LU NL PT SE |
|
| 17Q | First examination report despatched |
Effective date: 20050513 |
|
| GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
| GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
| GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
| AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE CH DE DK ES FI FR GB IE IT LI LU NL PT SE |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070228 Ref country code: LI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070228 Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070228 Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070228 Ref country code: CH Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070228 Ref country code: BE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070228 Ref country code: AT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070228 |
|
| REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D |
|
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
| REF | Corresponds to: |
Ref document number: 69737424 Country of ref document: DE Date of ref document: 20070412 Kind code of ref document: P |
|
| REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070531 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070608 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070730 |
|
| NLV1 | Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act | ||
| REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
| EN | Fr: translation not filed | ||
| PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
| 26N | No opposition filed |
Effective date: 20071129 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070228 Ref country code: FR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20071019 |
|
| GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20071119 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20071119 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070228 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20071119 |
|
| PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20071119 |
|
| PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20161123 Year of fee payment: 20 |
|
| REG | Reference to a national code |
Ref country code: DE Ref legal event code: R071 Ref document number: 69737424 Country of ref document: DE |