EP1051365A1 - Verfahren zur erzeugung einer markierung in einem glaskörper - Google Patents
Verfahren zur erzeugung einer markierung in einem glaskörperInfo
- Publication number
- EP1051365A1 EP1051365A1 EP99964365A EP99964365A EP1051365A1 EP 1051365 A1 EP1051365 A1 EP 1051365A1 EP 99964365 A EP99964365 A EP 99964365A EP 99964365 A EP99964365 A EP 99964365A EP 1051365 A1 EP1051365 A1 EP 1051365A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- glass
- marking
- laser
- wavelength
- laser beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims abstract description 24
- 230000005540 biological transmission Effects 0.000 claims abstract description 12
- 230000008859 change Effects 0.000 claims description 7
- 238000002834 transmittance Methods 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- 230000035699 permeability Effects 0.000 claims description 3
- 230000005670 electromagnetic radiation Effects 0.000 claims description 2
- 230000005855 radiation Effects 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 210000004127 vitreous body Anatomy 0.000 description 5
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000002372 labelling Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
Definitions
- This invention relates to a method for producing an under-surface mark in a glass body having a transmission curve with a plateau area at wavelengths greater than that of X-rays, a laser beam being directed onto a surface of the body is able to penetrate the body to the predetermined depth of the marking and is further focused at the predetermined location of the marking within the glass and has such a power density that a marking in the location in the form of a material change which is characterized by a reduced permeability to electromagnetic radiation arises essentially without any change occurring on the surface of the body.
- EP 0 543 899 B1 discloses a method for producing a marking in a glass body in accordance with the preamble of claim 1.
- laser radiation with an energy density is used such that at the focus, that is, where the marking is to be made, the energy density is sufficient to bring about permanent changes within the body, which can be made of glass or another material become. It is described as advantageous if the energy density at the focus of the laser beams is at least 10 J / cm 2 , since this is approximately the threshold for the occurrence of localized ionization of the glass molecules.
- laser radiation with a wavelength of 1.06 ⁇ m is used for this.
- the disadvantage here is that, at this wavelength in the infrared range, the associated transmittance for glass lies in the plateau range of the transmission curve of the glass. This means that at this wavelength the transmission of the laser beams through the vitreous body is approximately maximum with a linear absorption behavior.
- a certain energy density threshold In order for the desired change in the glass to occur in the focus area of the laser beam - that is, the desired non-linear absorption behavior - a certain energy density threshold must be exceeded, as explained above.
- this energy density threshold is very sharp when the laser radiation is in the infrared range, so that there is an abrupt transition from linear absorption to the non-linear absorption causing the marking.
- the minimum distance of a marking in a glass body from the surface is about 1 mm, so that the glass body must have a total thickness of at least 3 mm to avoid the risk of breakage.
- the method according to the invention for structuring the glass interior has the advantage over the prior art that the laser radiation can be focused better owing to the shorter wavelengths used, and thus additional favorable conditions are created to keep the extent of the focus as small as possible.
- a wavelength is preferably selected for the laser radiation at which the transmittance is 60 to 95% of the plateau level.
- the laser radiation is generated by means of an Nd-YAG laser, for example using the third harmonic or the fourth harmonic.
- the wavelength will be in the UV range. It is important, of course, that the wavelength is chosen so that there is a partial permeability of the vitreous body, at which there is sufficient radiation intensity at the desired marking location.
- the single figure shows schematically a typical transmission curve of a common type of glass.
- the plateau region of the transmission curve is approximately formed by the transmission values which are given at the wavelengths greater than ⁇ 3 .
- laser radiation which, depending on the glass chosen in each case, has a wavelength which is less than ⁇ 3 , but at which the transmission is not negligibly low, which is the case in the figure for wavelengths greater than ⁇ 0 is.
- a preferred wavelength range is, for example, the range ⁇ i ⁇ ⁇ 2 .
- the invention can be carried out, for example, as follows: Ordinary glass BK 7 in the form of a plate with a thickness of 1 mm is irradiated with laser beams with a wavelength of 355 nm using an Nd-YAG laser. This is done in such a way that the laser beam is focused within the glass plate with the usual means, the focus being 0.5 mm below the surface of the glass plate.
- the laser is operated at a repetition rate of 5 kHz.
- the pulse duration is 100 ns, the power density in focus is approximately 500 MW / cm 2 .
- marking points that have a diameter of only 20 ⁇ m.
- the marking points are lined up with a distance of 5 ⁇ m to create an almost continuous line by overlapping.
- the power density used here in focus is significantly lower than the power density required in the known methods.
- the repetition rate may also be up to 10 kHz.
- quartz glass Suprasil 1 was processed under the same external process conditions.
- the transmission factor associated with the wavelength 355 nm lies in the plateau range with this quartz glass.
- such a fine structuring could not be achieved with the quartz glass as with the glass BK 7.
- the extent of the marking points on the quartz glass was significantly greater than on the BK7 glass.
- the markings produced by the method according to the invention can e.g. be provided for labeling or for decoration purposes.
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laser Beam Processing (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
- Lasers (AREA)
Description
Claims
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19855623A DE19855623C1 (de) | 1998-12-02 | 1998-12-02 | Verfahren zur Erzeugung einer Markierung in einem Glaskörper |
| DE19855623 | 1998-12-02 | ||
| PCT/DE1999/003719 WO2000032531A1 (de) | 1998-12-02 | 1999-11-23 | Verfahren zur erzeugung einer markierung in einem glaskörper |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1051365A1 true EP1051365A1 (de) | 2000-11-15 |
| EP1051365B1 EP1051365B1 (de) | 2002-06-05 |
Family
ID=7889753
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP99964365A Expired - Lifetime EP1051365B1 (de) | 1998-12-02 | 1999-11-23 | Verfahren zur erzeugung einer markierung in einem glaskörper |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6596966B1 (de) |
| EP (1) | EP1051365B1 (de) |
| JP (1) | JP2002531361A (de) |
| AT (1) | ATE218519T1 (de) |
| DE (2) | DE19855623C1 (de) |
| ES (1) | ES2177339T3 (de) |
| WO (1) | WO2000032531A1 (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013107996A1 (en) * | 2012-01-19 | 2013-07-25 | The University Of Dundee | An ion exchange substrate and metalized product and apparatus and method for production thereof |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10122335C1 (de) * | 2001-05-08 | 2002-07-25 | Schott Glas | Verfahren und Vorrichtung zum Markieren von Glas mit einem Laser |
| DE10137864B4 (de) * | 2001-08-02 | 2005-05-19 | Picorapid Technologie Gmbh | Substanzträger mit Markierung |
| RU2243102C2 (ru) * | 2001-11-12 | 2004-12-27 | ЗАО "ГруппСтайл" | Способ формирования изображений и устройство для его осуществления |
| KR20050094423A (ko) * | 2003-02-04 | 2005-09-27 | 아사히 가라스 가부시키가이샤 | 유리기판 표면의 이물 제거방법 |
| DE102005026038A1 (de) | 2005-06-03 | 2006-12-07 | Boraglas Gmbh | Verfahren zur Markierung von Objektoberflächen |
| DE102005025982B4 (de) * | 2005-06-03 | 2008-04-17 | Martin-Luther-Universität Halle-Wittenberg | Farbig strukturierte Low-E-Schichtsysteme und Verfahren zur Erzeugung der farbig strukturierten Low-E-Schichtsysteme sowie deren Verwendung |
| DE102005039430A1 (de) * | 2005-08-18 | 2007-02-22 | Oc Oerlikon Balzers Ag | Lasermarkierung nahe der Oberfläche bei innenbearbeiteten transparenten Körpern |
| US8541105B2 (en) | 2005-08-18 | 2013-09-24 | Oerlikon Trading Ag, Trubbach | Transparent substrates with dielectric layer having a marking below the surface of the transparent substrate |
| DE102005043516A1 (de) * | 2005-09-12 | 2007-03-15 | Boraglas Gmbh | Verfahren zur Herstellung farbiger Strukturen im Glas und dadurch hergestelltes Glas |
| DE102007028042B3 (de) | 2007-06-14 | 2008-08-07 | Universität Zu Lübeck | Verfahren zur Laserbearbeitung transparenter Materialien |
| DE102008004995B3 (de) * | 2008-01-17 | 2008-12-04 | Schott Ag | Lasermarkierte Glasscheiben und deren Verwendung als Beleuchtungselemente |
| US20100119808A1 (en) * | 2008-11-10 | 2010-05-13 | Xinghua Li | Method of making subsurface marks in glass |
| US9393382B2 (en) * | 2009-05-05 | 2016-07-19 | Robert W. Heck | High-flow tapered peripheral IV catheter with side outlets |
| EP2774587B1 (de) | 2010-01-08 | 2021-10-20 | AMO Development, LLC | System zur Modifizierung des Augengewebes und Intraokularlinsen |
| US10085886B2 (en) | 2010-01-08 | 2018-10-02 | Optimedica Corporation | Method and system for modifying eye tissue and intraocular lenses |
| DE102010037273A1 (de) | 2010-09-02 | 2012-03-08 | Schott Ag | Verfahren und Vorrichtung zum Markieren von Glas |
| US20130001237A1 (en) * | 2011-06-29 | 2013-01-03 | Marsh Dennis R | Glass Container Having Sub-Surface Wall Decoration and Method of Manufacture |
| EP2896458A1 (de) * | 2014-01-16 | 2015-07-22 | Euroimmun Medizinische Labordiagnostika AG | Transparenter 0bjektträger mit Kennzeichnung |
| DE102014205066A1 (de) | 2014-03-19 | 2015-10-08 | Schott Ag | Vorgespannter Glasartikel mit Laserinnengravur und Herstellverfahren |
| CA3025663A1 (en) | 2016-05-31 | 2017-12-07 | Corning Incorporated | Anti-counterfeiting measures for glass articles |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5175425A (en) * | 1987-06-15 | 1992-12-29 | Leuze Electronic Gmbh & Co. | Process for marking semiconductor surfaces |
| IL99170A0 (en) * | 1990-08-15 | 1992-07-15 | United Distillers Plc | Method and apparatus for sub-surface marking |
| US5248638A (en) * | 1992-04-06 | 1993-09-28 | Corning Incorporated | Yellow high silica glass |
| DE4321301A1 (de) * | 1992-07-06 | 1994-01-13 | Zeiss Carl Fa | Dünne Schicht aus Galliumoxid und Herstellverfahren dafür |
| DE4430710C1 (de) * | 1994-08-30 | 1996-05-02 | Jenaer Glaswerk Gmbh | Borsäurearmes Borosilikatglas und seine Verwendung |
| DE69625642T2 (de) * | 1995-05-23 | 2003-05-28 | Kyocera Corp., Kyoto | Methode zu Herstellung eines optischen Polarisators |
| US5557171A (en) * | 1995-06-15 | 1996-09-17 | Osram Sylvania Inc. | High intensity discharge lamp with ultra violet absorbing envelope |
| JP3395140B2 (ja) * | 1995-11-08 | 2003-04-07 | 住友重機械工業株式会社 | レーザマーキング方法 |
| JP3412416B2 (ja) * | 1996-10-03 | 2003-06-03 | ウシオ電機株式会社 | ガラスマーキング方法 |
| JPH10123357A (ja) * | 1996-10-24 | 1998-05-15 | Nippon Sheet Glass Co Ltd | 光導波路に対するレーザ加工方法 |
| JP3957010B2 (ja) * | 1997-06-04 | 2007-08-08 | 日本板硝子株式会社 | 微細孔を有するガラス基材 |
| DE19728766C1 (de) * | 1997-07-07 | 1998-12-17 | Schott Rohrglas Gmbh | Verwendung eines Verfahrens zur Herstellung einer Sollbruchstelle bei einem Glaskörper |
| US6392683B1 (en) * | 1997-09-26 | 2002-05-21 | Sumitomo Heavy Industries, Ltd. | Method for making marks in a transparent material by using a laser |
| JPH11119439A (ja) * | 1997-10-17 | 1999-04-30 | Hitachi Ltd | 液晶マスク式露光マーキング装置 |
| US6211526B1 (en) * | 1998-09-30 | 2001-04-03 | The United States Of America As Represented By The Secretary Of The Navy | Marking of materials using luminescent and optically stimulable glasses |
-
1998
- 1998-12-02 DE DE19855623A patent/DE19855623C1/de not_active Expired - Fee Related
-
1999
- 1999-11-23 DE DE59901616T patent/DE59901616D1/de not_active Expired - Fee Related
- 1999-11-23 WO PCT/DE1999/003719 patent/WO2000032531A1/de not_active Ceased
- 1999-11-23 AT AT99964365T patent/ATE218519T1/de not_active IP Right Cessation
- 1999-11-23 EP EP99964365A patent/EP1051365B1/de not_active Expired - Lifetime
- 1999-11-23 ES ES99964365T patent/ES2177339T3/es not_active Expired - Lifetime
- 1999-11-23 JP JP2000585177A patent/JP2002531361A/ja not_active Withdrawn
- 1999-11-23 US US09/601,443 patent/US6596966B1/en not_active Expired - Fee Related
Non-Patent Citations (1)
| Title |
|---|
| See references of WO0032531A1 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013107996A1 (en) * | 2012-01-19 | 2013-07-25 | The University Of Dundee | An ion exchange substrate and metalized product and apparatus and method for production thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| DE19855623C1 (de) | 2000-02-24 |
| WO2000032531A1 (de) | 2000-06-08 |
| DE59901616D1 (de) | 2002-07-11 |
| JP2002531361A (ja) | 2002-09-24 |
| ATE218519T1 (de) | 2002-06-15 |
| EP1051365B1 (de) | 2002-06-05 |
| ES2177339T3 (es) | 2002-12-01 |
| US6596966B1 (en) | 2003-07-22 |
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