EP1051365A1 - Procede pour produire une marque dans un corps en verre - Google Patents

Procede pour produire une marque dans un corps en verre

Info

Publication number
EP1051365A1
EP1051365A1 EP99964365A EP99964365A EP1051365A1 EP 1051365 A1 EP1051365 A1 EP 1051365A1 EP 99964365 A EP99964365 A EP 99964365A EP 99964365 A EP99964365 A EP 99964365A EP 1051365 A1 EP1051365 A1 EP 1051365A1
Authority
EP
European Patent Office
Prior art keywords
glass
marking
laser
wavelength
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP99964365A
Other languages
German (de)
English (en)
Other versions
EP1051365B1 (fr
Inventor
Jörg Kickelhain
Gennadij Kusnezow
Dieter Biere
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LPKF Laser and Electronics AG
Original Assignee
LPKF Laser and Electronics AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LPKF Laser and Electronics AG filed Critical LPKF Laser and Electronics AG
Publication of EP1051365A1 publication Critical patent/EP1051365A1/fr
Application granted granted Critical
Publication of EP1051365B1 publication Critical patent/EP1051365B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used

Definitions

  • This invention relates to a method for producing an under-surface mark in a glass body having a transmission curve with a plateau area at wavelengths greater than that of X-rays, a laser beam being directed onto a surface of the body is able to penetrate the body to the predetermined depth of the marking and is further focused at the predetermined location of the marking within the glass and has such a power density that a marking in the location in the form of a material change which is characterized by a reduced permeability to electromagnetic radiation arises essentially without any change occurring on the surface of the body.
  • EP 0 543 899 B1 discloses a method for producing a marking in a glass body in accordance with the preamble of claim 1.
  • laser radiation with an energy density is used such that at the focus, that is, where the marking is to be made, the energy density is sufficient to bring about permanent changes within the body, which can be made of glass or another material become. It is described as advantageous if the energy density at the focus of the laser beams is at least 10 J / cm 2 , since this is approximately the threshold for the occurrence of localized ionization of the glass molecules.
  • laser radiation with a wavelength of 1.06 ⁇ m is used for this.
  • the disadvantage here is that, at this wavelength in the infrared range, the associated transmittance for glass lies in the plateau range of the transmission curve of the glass. This means that at this wavelength the transmission of the laser beams through the vitreous body is approximately maximum with a linear absorption behavior.
  • a certain energy density threshold In order for the desired change in the glass to occur in the focus area of the laser beam - that is, the desired non-linear absorption behavior - a certain energy density threshold must be exceeded, as explained above.
  • this energy density threshold is very sharp when the laser radiation is in the infrared range, so that there is an abrupt transition from linear absorption to the non-linear absorption causing the marking.
  • the minimum distance of a marking in a glass body from the surface is about 1 mm, so that the glass body must have a total thickness of at least 3 mm to avoid the risk of breakage.
  • the method according to the invention for structuring the glass interior has the advantage over the prior art that the laser radiation can be focused better owing to the shorter wavelengths used, and thus additional favorable conditions are created to keep the extent of the focus as small as possible.
  • a wavelength is preferably selected for the laser radiation at which the transmittance is 60 to 95% of the plateau level.
  • the laser radiation is generated by means of an Nd-YAG laser, for example using the third harmonic or the fourth harmonic.
  • the wavelength will be in the UV range. It is important, of course, that the wavelength is chosen so that there is a partial permeability of the vitreous body, at which there is sufficient radiation intensity at the desired marking location.
  • the single figure shows schematically a typical transmission curve of a common type of glass.
  • the plateau region of the transmission curve is approximately formed by the transmission values which are given at the wavelengths greater than ⁇ 3 .
  • laser radiation which, depending on the glass chosen in each case, has a wavelength which is less than ⁇ 3 , but at which the transmission is not negligibly low, which is the case in the figure for wavelengths greater than ⁇ 0 is.
  • a preferred wavelength range is, for example, the range ⁇ i ⁇ ⁇ 2 .
  • the invention can be carried out, for example, as follows: Ordinary glass BK 7 in the form of a plate with a thickness of 1 mm is irradiated with laser beams with a wavelength of 355 nm using an Nd-YAG laser. This is done in such a way that the laser beam is focused within the glass plate with the usual means, the focus being 0.5 mm below the surface of the glass plate.
  • the laser is operated at a repetition rate of 5 kHz.
  • the pulse duration is 100 ns, the power density in focus is approximately 500 MW / cm 2 .
  • marking points that have a diameter of only 20 ⁇ m.
  • the marking points are lined up with a distance of 5 ⁇ m to create an almost continuous line by overlapping.
  • the power density used here in focus is significantly lower than the power density required in the known methods.
  • the repetition rate may also be up to 10 kHz.
  • quartz glass Suprasil 1 was processed under the same external process conditions.
  • the transmission factor associated with the wavelength 355 nm lies in the plateau range with this quartz glass.
  • such a fine structuring could not be achieved with the quartz glass as with the glass BK 7.
  • the extent of the marking points on the quartz glass was significantly greater than on the BK7 glass.
  • the markings produced by the method according to the invention can e.g. be provided for labeling or for decoration purposes.

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laser Beam Processing (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Compositions (AREA)
  • Lasers (AREA)
EP99964365A 1998-12-02 1999-11-23 Procede pour produire une marque dans un corps en verre Expired - Lifetime EP1051365B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19855623A DE19855623C1 (de) 1998-12-02 1998-12-02 Verfahren zur Erzeugung einer Markierung in einem Glaskörper
DE19855623 1998-12-02
PCT/DE1999/003719 WO2000032531A1 (fr) 1998-12-02 1999-11-23 Procede pour produire une marque dans un corps en verre

Publications (2)

Publication Number Publication Date
EP1051365A1 true EP1051365A1 (fr) 2000-11-15
EP1051365B1 EP1051365B1 (fr) 2002-06-05

Family

ID=7889753

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99964365A Expired - Lifetime EP1051365B1 (fr) 1998-12-02 1999-11-23 Procede pour produire une marque dans un corps en verre

Country Status (7)

Country Link
US (1) US6596966B1 (fr)
EP (1) EP1051365B1 (fr)
JP (1) JP2002531361A (fr)
AT (1) ATE218519T1 (fr)
DE (2) DE19855623C1 (fr)
ES (1) ES2177339T3 (fr)
WO (1) WO2000032531A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013107996A1 (fr) * 2012-01-19 2013-07-25 The University Of Dundee Substrat échangeur d'ions et produit métallisé et leurs appareil et procédé de production

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10122335C1 (de) * 2001-05-08 2002-07-25 Schott Glas Verfahren und Vorrichtung zum Markieren von Glas mit einem Laser
DE10137864B4 (de) * 2001-08-02 2005-05-19 Picorapid Technologie Gmbh Substanzträger mit Markierung
RU2243102C2 (ru) * 2001-11-12 2004-12-27 ЗАО "ГруппСтайл" Способ формирования изображений и устройство для его осуществления
KR20050094423A (ko) * 2003-02-04 2005-09-27 아사히 가라스 가부시키가이샤 유리기판 표면의 이물 제거방법
DE102005026038A1 (de) 2005-06-03 2006-12-07 Boraglas Gmbh Verfahren zur Markierung von Objektoberflächen
DE102005025982B4 (de) * 2005-06-03 2008-04-17 Martin-Luther-Universität Halle-Wittenberg Farbig strukturierte Low-E-Schichtsysteme und Verfahren zur Erzeugung der farbig strukturierten Low-E-Schichtsysteme sowie deren Verwendung
DE102005039430A1 (de) * 2005-08-18 2007-02-22 Oc Oerlikon Balzers Ag Lasermarkierung nahe der Oberfläche bei innenbearbeiteten transparenten Körpern
US8541105B2 (en) 2005-08-18 2013-09-24 Oerlikon Trading Ag, Trubbach Transparent substrates with dielectric layer having a marking below the surface of the transparent substrate
DE102005043516A1 (de) * 2005-09-12 2007-03-15 Boraglas Gmbh Verfahren zur Herstellung farbiger Strukturen im Glas und dadurch hergestelltes Glas
DE102007028042B3 (de) 2007-06-14 2008-08-07 Universität Zu Lübeck Verfahren zur Laserbearbeitung transparenter Materialien
DE102008004995B3 (de) * 2008-01-17 2008-12-04 Schott Ag Lasermarkierte Glasscheiben und deren Verwendung als Beleuchtungselemente
US20100119808A1 (en) * 2008-11-10 2010-05-13 Xinghua Li Method of making subsurface marks in glass
US9393382B2 (en) * 2009-05-05 2016-07-19 Robert W. Heck High-flow tapered peripheral IV catheter with side outlets
EP2774587B1 (fr) 2010-01-08 2021-10-20 AMO Development, LLC Système permettant de modifier un tissu oculaire et des lentilles intraoculaires
US10085886B2 (en) 2010-01-08 2018-10-02 Optimedica Corporation Method and system for modifying eye tissue and intraocular lenses
DE102010037273A1 (de) 2010-09-02 2012-03-08 Schott Ag Verfahren und Vorrichtung zum Markieren von Glas
US20130001237A1 (en) * 2011-06-29 2013-01-03 Marsh Dennis R Glass Container Having Sub-Surface Wall Decoration and Method of Manufacture
EP2896458A1 (fr) * 2014-01-16 2015-07-22 Euroimmun Medizinische Labordiagnostika AG Support d'objet transparent avec identification
DE102014205066A1 (de) 2014-03-19 2015-10-08 Schott Ag Vorgespannter Glasartikel mit Laserinnengravur und Herstellverfahren
CA3025663A1 (fr) 2016-05-31 2017-12-07 Corning Incorporated Mesures anti-contrefacon pour articles en verre

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US5175425A (en) * 1987-06-15 1992-12-29 Leuze Electronic Gmbh & Co. Process for marking semiconductor surfaces
IL99170A0 (en) * 1990-08-15 1992-07-15 United Distillers Plc Method and apparatus for sub-surface marking
US5248638A (en) * 1992-04-06 1993-09-28 Corning Incorporated Yellow high silica glass
DE4321301A1 (de) * 1992-07-06 1994-01-13 Zeiss Carl Fa Dünne Schicht aus Galliumoxid und Herstellverfahren dafür
DE4430710C1 (de) * 1994-08-30 1996-05-02 Jenaer Glaswerk Gmbh Borsäurearmes Borosilikatglas und seine Verwendung
DE69625642T2 (de) * 1995-05-23 2003-05-28 Kyocera Corp., Kyoto Methode zu Herstellung eines optischen Polarisators
US5557171A (en) * 1995-06-15 1996-09-17 Osram Sylvania Inc. High intensity discharge lamp with ultra violet absorbing envelope
JP3395140B2 (ja) * 1995-11-08 2003-04-07 住友重機械工業株式会社 レーザマーキング方法
JP3412416B2 (ja) * 1996-10-03 2003-06-03 ウシオ電機株式会社 ガラスマーキング方法
JPH10123357A (ja) * 1996-10-24 1998-05-15 Nippon Sheet Glass Co Ltd 光導波路に対するレーザ加工方法
JP3957010B2 (ja) * 1997-06-04 2007-08-08 日本板硝子株式会社 微細孔を有するガラス基材
DE19728766C1 (de) * 1997-07-07 1998-12-17 Schott Rohrglas Gmbh Verwendung eines Verfahrens zur Herstellung einer Sollbruchstelle bei einem Glaskörper
US6392683B1 (en) * 1997-09-26 2002-05-21 Sumitomo Heavy Industries, Ltd. Method for making marks in a transparent material by using a laser
JPH11119439A (ja) * 1997-10-17 1999-04-30 Hitachi Ltd 液晶マスク式露光マーキング装置
US6211526B1 (en) * 1998-09-30 2001-04-03 The United States Of America As Represented By The Secretary Of The Navy Marking of materials using luminescent and optically stimulable glasses

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO0032531A1 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013107996A1 (fr) * 2012-01-19 2013-07-25 The University Of Dundee Substrat échangeur d'ions et produit métallisé et leurs appareil et procédé de production

Also Published As

Publication number Publication date
DE19855623C1 (de) 2000-02-24
WO2000032531A1 (fr) 2000-06-08
DE59901616D1 (de) 2002-07-11
JP2002531361A (ja) 2002-09-24
ATE218519T1 (de) 2002-06-15
EP1051365B1 (fr) 2002-06-05
ES2177339T3 (es) 2002-12-01
US6596966B1 (en) 2003-07-22

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