EP1143031A3 - Boruration au plasma - Google Patents

Boruration au plasma Download PDF

Info

Publication number
EP1143031A3
EP1143031A3 EP01110904A EP01110904A EP1143031A3 EP 1143031 A3 EP1143031 A3 EP 1143031A3 EP 01110904 A EP01110904 A EP 01110904A EP 01110904 A EP01110904 A EP 01110904A EP 1143031 A3 EP1143031 A3 EP 1143031A3
Authority
EP
European Patent Office
Prior art keywords
minimum
excited
specified
amount
medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP01110904A
Other languages
German (de)
English (en)
Other versions
EP1143031A2 (fr
Inventor
Emilio Dr. Rodriguez Cabeo
Günther LAUDIEN
Kyong-Tschong Rie
Swen Biemer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Volkswagen AG
Original Assignee
Volkswagen AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Volkswagen AG filed Critical Volkswagen AG
Publication of EP1143031A2 publication Critical patent/EP1143031A2/fr
Publication of EP1143031A3 publication Critical patent/EP1143031A3/fr
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C23C8/38—Treatment of ferrous surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Primary Cells (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Plasma Technology (AREA)
EP01110904A 1997-12-15 1998-12-11 Boruration au plasma Ceased EP1143031A3 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19755595 1997-12-15
DE19755595 1997-12-15
EP98965249A EP1044289B1 (fr) 1997-12-15 1998-12-11 Boruration au plasma

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
EP98965249A Division EP1044289B1 (fr) 1997-12-15 1998-12-11 Boruration au plasma

Publications (2)

Publication Number Publication Date
EP1143031A2 EP1143031A2 (fr) 2001-10-10
EP1143031A3 true EP1143031A3 (fr) 2004-04-28

Family

ID=7851902

Family Applications (2)

Application Number Title Priority Date Filing Date
EP01110904A Ceased EP1143031A3 (fr) 1997-12-15 1998-12-11 Boruration au plasma
EP98965249A Expired - Lifetime EP1044289B1 (fr) 1997-12-15 1998-12-11 Boruration au plasma

Family Applications After (1)

Application Number Title Priority Date Filing Date
EP98965249A Expired - Lifetime EP1044289B1 (fr) 1997-12-15 1998-12-11 Boruration au plasma

Country Status (8)

Country Link
US (1) US6783794B1 (fr)
EP (2) EP1143031A3 (fr)
JP (1) JP4588213B2 (fr)
KR (1) KR100583262B1 (fr)
CN (1) CN1198953C (fr)
AT (1) ATE215132T1 (fr)
DE (1) DE59803574D1 (fr)
WO (1) WO1999031291A2 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE524493C2 (sv) * 2002-02-25 2004-08-17 Telia Ab Uppskattningsenhet och metod för att bestämma positionen för en mobil station i ett mobilt kommunikationssystem
JP2009512778A (ja) * 2005-09-22 2009-03-26 スカフコ エンジニアリング アンド マニュファクチャリング， インコーポレイテッド プラズマホウ化方法
CA2649525A1 (fr) * 2006-04-20 2007-11-01 Habib Skaff Pieces mecaniques presentant une meilleure resistance a l'usure
US8012274B2 (en) * 2007-03-22 2011-09-06 Skaff Corporation Of America, Inc. Mechanical parts having increased wear-resistance
US8338317B2 (en) * 2011-04-06 2012-12-25 Infineon Technologies Ag Method for processing a semiconductor wafer or die, and particle deposition device
CN104233425B (zh) * 2014-09-29 2017-01-25 河海大学常州校区 微弧渗硼催化溶液和微弧渗硼溶液以及微弧渗硼方法
KR102084296B1 (ko) * 2016-12-15 2020-03-03 도쿄엘렉트론가부시키가이샤 성막 방법, 붕소 막 및 성막 장치

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677799A (en) * 1970-11-10 1972-07-18 Celanese Corp Vapor phase boron deposition by pulse discharge
US4406765A (en) * 1980-01-28 1983-09-27 Fuji Photo Film Co., Ltd. Apparatus and process for production of amorphous semiconductor
DE3322341A1 (de) * 1983-06-22 1985-01-03 Siegfried Dr.-Ing. 5135 Selfkant Strämke Verfahren und vorrichtung zur oberflaechenbehandlung von werkstuecken durch glimmentladung
DE4003623A1 (de) * 1990-02-07 1991-08-08 Kloeckner Ionon Verfahren zur steuerung einer anlage zur plasmabehandlung von werkstuecken
EP0603864A2 (fr) * 1992-12-23 1994-06-29 Hughes Aircraft Company Réglage de potential surfacique pendant le traitement par plasma de matériaux
FR2708624A1 (fr) * 1993-07-30 1995-02-10 Neuville Stephane Procédé de dépôt d'un revêtement protecteur à base de pseudo carbone diamant amorphe ou de carbure de silicium modifié.
EP0695813A2 (fr) * 1994-08-06 1996-02-07 ALD Vacuum Technologies GmbH Procédé pour la carburation de pièces carburables par des impulsions à plasma
WO1997027345A1 (fr) * 1996-01-25 1997-07-31 Elektroschmelzwerk Kempten Gmbh Procede pour produire des couches de borure resistantes a l'usure sur des surfaces de materiaux metalliques

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5118944A (ja) * 1974-08-07 1976-02-14 Suwa Seikosha Kk Kisohokaho
DE3908200C1 (fr) * 1989-03-14 1989-09-07 Degussa Ag, 6000 Frankfurt, De
US5286534A (en) * 1991-12-23 1994-02-15 Minnesota Mining And Manufacturing Company Process for plasma deposition of a carbon rich coating
US5354381A (en) * 1993-05-07 1994-10-11 Varian Associates, Inc. Plasma immersion ion implantation (PI3) apparatus
JPH07286254A (ja) * 1994-04-21 1995-10-31 Sumitomo Metal Ind Ltd 耐二次加工脆性に優れた鋼板およびその製造方法
JP3050361B2 (ja) * 1994-07-19 2000-06-12 株式会社ライムズ 金属部材のイオン窒化方法
US5578725A (en) 1995-01-30 1996-11-26 Regents Of The University Of Minnesota Delta opioid receptor antagonists
JPH0982495A (ja) * 1995-09-18 1997-03-28 Toshiba Corp プラズマ生成装置およびプラズマ生成方法
US6306225B1 (en) * 1996-01-25 2001-10-23 Bor Tec Gmbh Process for producing wear-resistant boride layers on metallic material surfaces
DE19629877C1 (de) * 1996-07-24 1997-03-27 Schott Glaswerke CVD-Verfahren und Vorrichtung zur Innenbeschichtung von Hohlkörpern
US5654043A (en) * 1996-10-10 1997-08-05 Eaton Corporation Pulsed plate plasma implantation system and method
US6101971A (en) * 1998-05-13 2000-08-15 Axcelis Technologies, Inc. Ion implantation control using charge collection, optical emission spectroscopy and mass analysis
US20040016402A1 (en) * 2002-07-26 2004-01-29 Walther Steven R. Methods and apparatus for monitoring plasma parameters in plasma doping systems

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677799A (en) * 1970-11-10 1972-07-18 Celanese Corp Vapor phase boron deposition by pulse discharge
US4406765A (en) * 1980-01-28 1983-09-27 Fuji Photo Film Co., Ltd. Apparatus and process for production of amorphous semiconductor
DE3322341A1 (de) * 1983-06-22 1985-01-03 Siegfried Dr.-Ing. 5135 Selfkant Strämke Verfahren und vorrichtung zur oberflaechenbehandlung von werkstuecken durch glimmentladung
DE4003623A1 (de) * 1990-02-07 1991-08-08 Kloeckner Ionon Verfahren zur steuerung einer anlage zur plasmabehandlung von werkstuecken
EP0603864A2 (fr) * 1992-12-23 1994-06-29 Hughes Aircraft Company Réglage de potential surfacique pendant le traitement par plasma de matériaux
FR2708624A1 (fr) * 1993-07-30 1995-02-10 Neuville Stephane Procédé de dépôt d'un revêtement protecteur à base de pseudo carbone diamant amorphe ou de carbure de silicium modifié.
EP0695813A2 (fr) * 1994-08-06 1996-02-07 ALD Vacuum Technologies GmbH Procédé pour la carburation de pièces carburables par des impulsions à plasma
WO1997027345A1 (fr) * 1996-01-25 1997-07-31 Elektroschmelzwerk Kempten Gmbh Procede pour produire des couches de borure resistantes a l'usure sur des surfaces de materiaux metalliques

Also Published As

Publication number Publication date
JP2002508448A (ja) 2002-03-19
WO1999031291A2 (fr) 1999-06-24
US6783794B1 (en) 2004-08-31
WO1999031291A3 (fr) 1999-09-10
EP1143031A2 (fr) 2001-10-10
EP1044289B1 (fr) 2002-03-27
JP4588213B2 (ja) 2010-11-24
KR100583262B1 (ko) 2006-05-25
EP1044289A2 (fr) 2000-10-18
DE59803574D1 (de) 2002-05-02
CN1282383A (zh) 2001-01-31
CN1198953C (zh) 2005-04-27
ATE215132T1 (de) 2002-04-15
KR20010033075A (ko) 2001-04-25

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