EP1318524A2 - Röntgen-optisches System und Verfahren zur Abbildung einer Quelle - Google Patents
Röntgen-optisches System und Verfahren zur Abbildung einer Quelle Download PDFInfo
- Publication number
- EP1318524A2 EP1318524A2 EP02026625A EP02026625A EP1318524A2 EP 1318524 A2 EP1318524 A2 EP 1318524A2 EP 02026625 A EP02026625 A EP 02026625A EP 02026625 A EP02026625 A EP 02026625A EP 1318524 A2 EP1318524 A2 EP 1318524A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- ray
- mirrors
- source
- mirror
- reflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
Definitions
- the invention relates to an X-ray optical system with two X-ray mirrors for imaging an X-ray source on a target area.
- the basic mode of operation of a generic arrangement comprises two in a row concave X-ray mirrors that are set up so that the reflection plane of the first mirror perpendicular to the reflection plane of the second mirror stands.
- the one falling on the first mirror at a very flat angle X-rays are focused in a coordinate direction and then fall also at a flat angle to the second mirror, where they are in the second coordinate direction perpendicular to it is focused.
- the two concave X-ray mirrors can be cylindrical, elliptical or have parabolic curvature surfaces.
- Parabolic mirrors are in particular a parallelization of the incident X-rays possible.
- the acceptance angle of typical multilayer mirrors is in the range of 1 mrad and the usual focal lengths are in the range of a few centimeters.
- the electron focus of the X-ray source varies in a linear range from 10 ⁇ m to a few millimeters.
- the acceptance range of a mirror has a smallest linear dimension in a range around a few 10 ⁇ m and is typically strip-shaped.
- the usual X-ray samples on the other hand, have linear dimensions in the range from 100 ⁇ m to a few millimeters, typically several tenths of a millimeter.
- a main problem with the generic X-ray optical systems therefore lies in the relatively low of the mirror arrangement due to the Bragg conditions reflected the intensity of the focused X-ray radiation in relation to the theoretically possible yield due to the size of the radiating area of the x-ray source and on the other hand, the "need" for X-rays due to the area size of the sample to be examined.
- the object of the invention is an X-ray optical system with the features mentioned at the outset, with as much as possible minor and simple technical modifications without problems Increase the intensity of the focused X-ray radiation on the sample enabled with constant emission power of the X-ray source.
- this task is just as surprisingly simple how effective way solved by the x-ray mirror deviating from 90 ° are arranged such that they are tilted against one another in such a way that the combined acceptance range of the x-ray mirror to the shape of the X-ray source and / or the target area is adapted.
- the above object is also achieved solved in that the X-ray mirror deviates from 90 ° with a Deviation of the tilt angle of 90 ° in amount by at least 20 °, preferably tilted between 30 ° and 85 ° against each other are arranged.
- the combined acceptance range of the both mirrors also focus on the geometric shape of the electron and / or the sample.
- the tilting of the X-ray mirror according to the invention results in a considerable gain in intensity because of the combined acceptance range compared to the case of the 90 ° arrangement known from the prior art can be enlarged considerably (as shown in the figure below) Drawing becomes clear).
- the acceptance range is not from the electron focus of the source or the Target focus of the sample moves out.
- the invention does not only show its advantages unfolded in the field of X-ray optics, but also in the field of Neutron optics and with synchrotron radiation as the source is applicable.
- the mirrors used can be flat, cylindrical, spherical, be elliptical, parabolic or hyperbolic. It can Gradient mirrors are used, in which the Layer spacing varies laterally and / or in depth. But also can also single crystals or other X-ray or neutron optical elements can be used as a mirror.
- An embodiment of the invention is particularly preferred X-ray optical system in which at least one X-ray mirror is one Has multilayer structure. This allows a particularly high intensity of the reflected radiation.
- the tilt angle is of the two x-ray mirrors fixed. You can do this in advance set optical adjustment to a specific geometry "freeze".
- the tilt angle can also be variable. This allows several different geometries to be created adjust the overall arrangement.
- the X-ray mirrors are can be snapped into different positions when tilted. On In this way, a selection of predefined ones can be made Make problem adjustments in advance, with the individual Adjustment due to the grid not much adjustment effort must become.
- the X-ray mirror can also be continuous be tiltable against each other. This allows a completely free On-line optimization tailored to the special needs entirely realize different examination arrangements.
- the invention is the deviation of the tilt angle of 90 ° amount at least 3 °, preferably at least 10 °, particularly preferably between 30 ° and 85 °.
- the arrangement is exactly two X-ray mirrors (or neutron mirrors) intended.
- the X-ray mirror a tilted Kirkpatrick-Baez arrangement, as has been common for many decades.
- the X-ray mirror can form a tilted side-by-side arrangement like you is described in US-A 6,041,099 cited above.
- the x-ray mirror can form a tilted multiple corner arrangement.
- An untilted multiple-corner arrangement is, for example, from the US-A 6,014,423 known per se.
- the condition for the deviation of the Tilt angle of 90 ° according to the further aspect discussed above the invention then applies to pairs of adjacent x-ray mirrors.
- An X-ray spectrometer also falls within the scope of the present invention or an X-ray diffractometer or an X-ray microscope, each with an X-ray optical system as described above Art.
- the invention is shown in the drawing and is based on exemplary embodiments explained in more detail.
- Fig. 1 is a cross section through an X-ray mirror A is schematic shown on the radiation from an acceptance range ⁇ x in the focus of the Mirror A hits, which comes from a X-ray source, which is usually is also arranged in this focus.
- the acceptance angle for the Useful radiation, taking into account the Bragg condition from the X-ray mirror A is reflected is denoted by ⁇ in the drawing.
- Fig. 2a is an embodiment of a very schematically Arrangement according to the invention shown, in which two X-ray mirrors A, B tilted at an angle other than 90 ° are arranged.
- the two X-ray mirrors A, B shown are intended in shown embodiment each a parabolic or elliptical Have surface, the radius of curvature of the long or short Dashed line a (for mirror A) or b (for mirror B) follows.
- the focus of the first X-ray mirror A is x
- the focus of the second X-ray mirror B is denoted by y.
- FIG. 2b shows an enlarged section from FIG. 2a, with ⁇ x den Acceptance range of the x-ray source seen from x-ray mirror A. and ⁇ y the acceptance range of the X-ray source from the X-ray mirror B designate seen from.
- the area F is the intersection of both Acceptance ranges ⁇ x and ⁇ y.
- the dashed, white ellipse S is intended in shown example a commonly occurring form of an X-ray source represent.
- FIG. 3 schematically shows the division of the effective area F as the intersection of the two acceptance ranges ⁇ x and ⁇ y of the two X-ray mirrors A, B at the location of the X-ray source.
- the resulting parallelogram has a side length b, a long diagonal d 1 and a short diagonal d 2 .
- the drawing shows the angle of deviation ⁇ with respect to a tilt of the two X-ray mirrors A, B by 90 °.
- Fig. 4 finally represents the area F shown in Fig. 3 as a function of increasing angle deviation ⁇ from the angle 90 ° provided that the two acceptance ranges ⁇ x and ⁇ y with each other are equal and standardized to 1.
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Lenses (AREA)
Abstract
Description
- Fig. 1
- ein Prinzipschema für den Akzeptanzbereich von Nutzstrahlung aus einer Röntgenquelle im Fokus eines Röntgen-Spiegels;
- Fig. 2a
- den schematischen Aufbau einer Ausführungsform des erfindungsgemäßen Röntgen-optischen Systems;
- Fig. 2b
- einen vergrößerten Ausschnitt der Strahlungsverhältnisse im Fokus von Fig. 2a;
- Fig. 3
- die wirksame Fläche als Schnittmenge der Akzeptanzbereiche der beiden Spiegel gemäß Fig. 2b; und
- Fig. 4
- die wirksame Fläche F als Funktion des von 90° abweichenden Verkippungswinkels β.
Claims (10)
- Röntgen-optisches System mit zwei Röntgen-Spiegeln (A, B) zum Abbilden einer Röntgen-Quelle (S) auf einen Zielbereich,
dadurch gekennzeichnet, dass die Röntgen-Spiegel (A, B) abweichend von 90° derart gegeneinander verkippt angeordnet sind, dass der kombinierte Akzeptanzbereich der Röntgen-Spiegel (A, B) an die Form der Röntgen-Quelle (S) und/oder des Zielbereichs angepasst ist. - Röntgen-optisches System mit zwei Röntgen-Spiegeln (A, B) zum Abbilden einer Röntgen-Quelle (S) auf einen Zielbereich,
dadurch gekennzeichnet, dass die Röntgen-Spiegel (A, B) abweichend von 90° mit einer Abweichung β des Verkippungswinkels von 90° betragsmäßig um mindestens 20°, vorzugsweise zwischen 30° und 85° gegeneinander verkippt angeordnet sind. - Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass mindestens ein Röntgen-Spiegel (A, B) eine Multilayer-Struktur aufweist.
- Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Abweichung β des Verkippungswinkels von 90° betragsmäßig mindestens 3°, vorzugsweise mindestens 10°, besonders bevorzugt zwischen 30° und 85° beträgt.
- Vorrichtung nach einem der vorhergehenden Ansprüche, dadurch gekennzeichnet, dass die Röntgen-Spiegel (A, B) eine gegeneinander verkippte Kirkpatrick-Baez Anordnung bilden.
- Vorrichtung nach Anspruch 5, dadurch gekennzeichnet, dass die Röntgen-Spiegel (A, B) eine gegeneinander verkippte side-by-side Anordnung bilden.
- Vorrichtung nach einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, dass die Röntgen-Spiegel (A, B) eine gegeneinander verkippte Multiple-corner Anordnung bilden.
- Röntgen-Diffraktometer mit einem Röntgen-optischen System nach einem der vorhergehenden Ansprüche.
- Verfahren zum Abbilden einer Strahlungsquelle (S) für Röntgen- oder Neutronen-Strahlung auf einen Zielbereich, wobei die von der Quelle (S) emittierte Strahlung an einem ersten Röntgen- bzw. Neutronen-Spiegel (A) und anschließend an einem zweiten Spiegel (B) reflektiert wird,
dadurch gekennzeichnet, dass der Winkel zwischen der Ebene der ersten Reflexion und der Ebene der zweiten Reflexion derart abweichend von 90° verkippt eingestellt wird, dass der kombinierte Akzeptanzbereich F der ersten (Δx) und zweiten (Δy) Reflexion an die Form der Strahlungs-Quelle (S) und/oder des Zielbereichs angepasst ist. - Verfahren nach Anspruch 9, dadurch gekennzeichnet, dass der Verkippungswinkel zwischen der Ebene der ersten Reflexion und der Ebene der zweiten Reflexion während einer Datenaufnahmefolge (=Scan) erneut mindestens ein weiteres Mal angepasst wird.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10160472A DE10160472B4 (de) | 2001-12-08 | 2001-12-08 | Röntgen-optisches System und Verfahren zur Abbildung einer Strahlungsquelle |
| DE10160472 | 2001-12-08 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP1318524A2 true EP1318524A2 (de) | 2003-06-11 |
| EP1318524A3 EP1318524A3 (de) | 2007-07-04 |
| EP1318524B1 EP1318524B1 (de) | 2009-03-18 |
Family
ID=7708587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP02026625A Expired - Lifetime EP1318524B1 (de) | 2001-12-08 | 2002-11-29 | Röntgen-optisches System und Verfahren zur Abbildung einer Quelle |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6925147B2 (de) |
| EP (1) | EP1318524B1 (de) |
| DE (1) | DE10160472B4 (de) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1791135A2 (de) | 2005-11-25 | 2007-05-30 | Axo Dresden GmbH | Röntgen-Optisches-Element |
| US10153062B2 (en) | 2015-06-30 | 2018-12-11 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Illumination and imaging device for high-resolution X-ray microscopy with high photon energy |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7280634B2 (en) * | 2003-06-13 | 2007-10-09 | Osmic, Inc. | Beam conditioning system with sequential optic |
| US7920676B2 (en) * | 2007-05-04 | 2011-04-05 | Xradia, Inc. | CD-GISAXS system and method |
| DE102010062472A1 (de) | 2010-12-06 | 2012-06-06 | Bruker Axs Gmbh | Punkt-Strich-Konverter |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995031815A1 (en) | 1994-05-11 | 1995-11-23 | The Regents Of The University Of Colorado | Spherical mirror grazing incidence x-ray optics |
| US5615245A (en) | 1995-02-27 | 1997-03-25 | Japan Atomic Energy Research Institute | Monochromator for radiant X-rays |
| US6014423A (en) | 1998-02-19 | 2000-01-11 | Osmic, Inc. | Multiple corner Kirkpatrick-Baez beam conditioning optic assembly |
| US6049588A (en) | 1997-07-10 | 2000-04-11 | Focused X-Rays | X-ray collimator for lithography |
| US6282259B1 (en) | 1999-09-10 | 2001-08-28 | Rigaku/Msc, Inc. | X-ray mirror system providing enhanced signal concentration |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5259013A (en) * | 1991-12-17 | 1993-11-02 | The United States Of America As Represented By The Secretary Of Commerce | Hard x-ray magnification apparatus and method with submicrometer spatial resolution of images in more than one dimension |
| JPH06294899A (ja) * | 1993-04-09 | 1994-10-21 | Mc Sci:Kk | 湾曲全反射ミラーカメラ |
| US6167111A (en) * | 1997-07-02 | 2000-12-26 | Canon Kabushiki Kaisha | Exposure apparatus for synchrotron radiation lithography |
| US6041099A (en) * | 1998-02-19 | 2000-03-21 | Osmic, Inc. | Single corner kirkpatrick-baez beam conditioning optic assembly |
| JP3734366B2 (ja) * | 1998-03-20 | 2006-01-11 | 株式会社リガク | X線分析装置 |
| DE19833524B4 (de) * | 1998-07-25 | 2004-09-23 | Bruker Axs Gmbh | Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel |
| AU3474200A (en) * | 1999-01-26 | 2000-08-07 | Focused X-Rays Llc | X-ray interferometer |
| US6327335B1 (en) * | 1999-04-13 | 2001-12-04 | Vanderbilt University | Apparatus and method for three-dimensional imaging using a stationary monochromatic x-ray beam |
| US6606371B2 (en) * | 1999-12-20 | 2003-08-12 | Agere Systems Inc. | X-ray system |
-
2001
- 2001-12-08 DE DE10160472A patent/DE10160472B4/de not_active Expired - Fee Related
-
2002
- 2002-11-25 US US10/302,918 patent/US6925147B2/en not_active Expired - Lifetime
- 2002-11-29 EP EP02026625A patent/EP1318524B1/de not_active Expired - Lifetime
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995031815A1 (en) | 1994-05-11 | 1995-11-23 | The Regents Of The University Of Colorado | Spherical mirror grazing incidence x-ray optics |
| US5615245A (en) | 1995-02-27 | 1997-03-25 | Japan Atomic Energy Research Institute | Monochromator for radiant X-rays |
| US6049588A (en) | 1997-07-10 | 2000-04-11 | Focused X-Rays | X-ray collimator for lithography |
| US6014423A (en) | 1998-02-19 | 2000-01-11 | Osmic, Inc. | Multiple corner Kirkpatrick-Baez beam conditioning optic assembly |
| US6282259B1 (en) | 1999-09-10 | 2001-08-28 | Rigaku/Msc, Inc. | X-ray mirror system providing enhanced signal concentration |
Non-Patent Citations (2)
| Title |
|---|
| SAUNEUF ET AL.: "large field high resolution x-ray microscope for studying laser plasmas", REVIEW OF SCIENTIFIC INSTRUMENTS, vol. 68, no. 9, 1997 |
| VON J. UNDERWOOD, APPLIED OPTICS, vol. 25, no. 11, 1986 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1791135A2 (de) | 2005-11-25 | 2007-05-30 | Axo Dresden GmbH | Röntgen-Optisches-Element |
| EP1791135A3 (de) * | 2005-11-25 | 2010-03-10 | Axo Dresden GmbH | Röntgen-Optisches-Element |
| US10153062B2 (en) | 2015-06-30 | 2018-12-11 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Illumination and imaging device for high-resolution X-ray microscopy with high photon energy |
Also Published As
| Publication number | Publication date |
|---|---|
| DE10160472A1 (de) | 2003-06-26 |
| DE10160472B4 (de) | 2004-06-03 |
| US6925147B2 (en) | 2005-08-02 |
| EP1318524B1 (de) | 2009-03-18 |
| US20030108153A1 (en) | 2003-06-12 |
| EP1318524A3 (de) | 2007-07-04 |
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