EP1457586A4 - Vorrichtung zur erzeugung von f2-gas und verfahren zur erzeugung von f2-gas sowie f2-gas - Google Patents

Vorrichtung zur erzeugung von f2-gas und verfahren zur erzeugung von f2-gas sowie f2-gas

Info

Publication number
EP1457586A4
EP1457586A4 EP02783802A EP02783802A EP1457586A4 EP 1457586 A4 EP1457586 A4 EP 1457586A4 EP 02783802 A EP02783802 A EP 02783802A EP 02783802 A EP02783802 A EP 02783802A EP 1457586 A4 EP1457586 A4 EP 1457586A4
Authority
EP
European Patent Office
Prior art keywords
gas
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
EP02783802A
Other languages
English (en)
French (fr)
Other versions
EP1457586A1 (de
Inventor
Tetsuro Tojo
Jiro Hiraiwa
Hitoshi Takebayashi
Yoshitomi Tada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Tanso Co Ltd
Original Assignee
Toyo Tanso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Tanso Co Ltd filed Critical Toyo Tanso Co Ltd
Publication of EP1457586A1 publication Critical patent/EP1457586A1/de
Publication of EP1457586A4 publication Critical patent/EP1457586A4/de
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/245—Fluorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation
    • C25B15/021—Process control or regulation of heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C25B15/085—Removing impurities

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
EP02783802A 2001-12-17 2002-12-09 Vorrichtung zur erzeugung von f2-gas und verfahren zur erzeugung von f2-gas sowie f2-gas Ceased EP1457586A4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001382722 2001-12-17
JP2001382722 2001-12-17
PCT/JP2002/012868 WO2003052167A1 (en) 2001-12-17 2002-12-09 Apparatus for generating f2 gas and method for generating f2 gas, and f2 gas

Publications (2)

Publication Number Publication Date
EP1457586A1 EP1457586A1 (de) 2004-09-15
EP1457586A4 true EP1457586A4 (de) 2005-07-13

Family

ID=19187509

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02783802A Ceased EP1457586A4 (de) 2001-12-17 2002-12-09 Vorrichtung zur erzeugung von f2-gas und verfahren zur erzeugung von f2-gas sowie f2-gas

Country Status (8)

Country Link
US (1) US20050006248A1 (de)
EP (1) EP1457586A4 (de)
JP (1) JP3569279B2 (de)
KR (1) KR100712345B1 (de)
CN (1) CN1327032C (de)
AU (1) AU2002349510A1 (de)
TW (1) TW593774B (de)
WO (1) WO2003052167A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3569277B1 (ja) * 2003-05-28 2004-09-22 東洋炭素株式会社 ガス発生装置の電流制御方法及び電流制御装置
FR2927635B1 (fr) * 2008-02-14 2010-06-25 Snecma Propulsion Solide Membrane de separation pour installation d'electrolyse
JP5584904B2 (ja) * 2008-03-11 2014-09-10 東洋炭素株式会社 フッ素ガス発生装置
JP2011058015A (ja) * 2009-09-07 2011-03-24 Toyo Tanso Kk 電解装置
JP5375673B2 (ja) * 2010-03-01 2013-12-25 セントラル硝子株式会社 フッ素ガス生成装置
TWI586842B (zh) * 2010-09-15 2017-06-11 首威公司 氟之製造工廠及使用彼之方法
TWI525042B (zh) * 2010-09-16 2016-03-11 首威公司 氟化氫供應單元
JP5906742B2 (ja) * 2012-01-05 2016-04-20 セントラル硝子株式会社 フッ素ガス生成装置
US12188135B2 (en) * 2018-10-24 2025-01-07 Resonac Corporation Fluorine gas production device
KR102803535B1 (ko) * 2024-04-15 2025-06-10 황영준 수전해혼합가스와 촉매생성기체연료를 혼합한 터빈 원동기 융복합 발전시스템

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1570004A (en) * 1976-10-19 1980-06-25 British Nuclear Fuels Ltd Electrolytic production of fluorine
JPS5867877A (ja) * 1981-10-20 1983-04-22 Asahi Glass Co Ltd 弗素の製造方法
CA2071235C (en) * 1991-07-26 2004-10-19 Gerald L. Bauer Anodic electrode for electrochemical fluorine cell
GB9300956D0 (en) * 1993-01-19 1993-03-10 British Nuclear Fuels Plc Dehydration of mixtures
US5628894A (en) * 1995-10-17 1997-05-13 Florida Scientific Laboratories, Inc. Nitrogen trifluoride process
US6113769A (en) * 1997-11-21 2000-09-05 International Business Machines Corporation Apparatus to monitor and add plating solution of plating baths and controlling quality of deposited metal
JP2000313981A (ja) * 1999-04-27 2000-11-14 Toyo Tanso Kk フッ素電解用炭素電極
US6818105B2 (en) * 2000-04-07 2004-11-16 Toyo Tanso Co., Ltd. Apparatus for generating fluorine gas
WO2003002454A2 (en) * 2001-06-29 2003-01-09 Showa Denko K. K. High-purity fluorine gas, production and use thereof, and method for analyzing trace impurities in high-purity fluorine gas

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
No further relevant documents disclosed *

Also Published As

Publication number Publication date
AU2002349510A1 (en) 2003-06-30
JPWO2003052167A1 (ja) 2005-04-28
CN1327032C (zh) 2007-07-18
TW593774B (en) 2004-06-21
JP3569279B2 (ja) 2004-09-22
TW200301316A (en) 2003-07-01
WO2003052167A1 (en) 2003-06-26
KR20040062648A (ko) 2004-07-07
CN1604970A (zh) 2005-04-06
EP1457586A1 (de) 2004-09-15
US20050006248A1 (en) 2005-01-13
KR100712345B1 (ko) 2007-05-02

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