JP3569279B2 - Ｆ２ガス発生装置及びｆ２ガス発生方法並びにｆ２ガス - Google Patents

Ｆ２ガス発生装置及びｆ２ガス発生方法並びにｆ２ガス Download PDF

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Publication number: JP3569279B2
Authority: JP; Japan
Prior art keywords: gas; preparation system; water; gas generating; generating
Prior art date: 2001-12-17
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

JP2003553033A

Other languages

English (en)

Japanese (ja)

Other versions

JPWO2003052167A1 (ja

Inventor

哲朗東城

次郎平岩

仁竹林

良臣多田

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Toyo Tanso Co Ltd

Original Assignee

Toyo Tanso Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-12-17

Filing date

2002-12-09

Publication date

2004-09-22

2002-12-09 Application filed by Toyo Tanso Co Ltd filed Critical Toyo Tanso Co Ltd

2004-09-22 Application granted granted Critical

2004-09-22 Publication of JP3569279B2 publication Critical patent/JP3569279B2/ja

2005-04-28 Publication of JPWO2003052167A1 publication Critical patent/JPWO2003052167A1/ja

2022-12-09 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

238000000034 method Methods 0.000 title claims description 11
239000007789 gas Substances 0.000 claims description 151
238000002360 preparation method Methods 0.000 claims description 52
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 36
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 27
239000001301 oxygen Substances 0.000 claims description 27
229910052760 oxygen Inorganic materials 0.000 claims description 27
239000011261 inert gas Substances 0.000 claims description 19
238000005868 electrolysis reaction Methods 0.000 claims description 12
POHFBTRVASILTB-UHFFFAOYSA-M potassium;fluoride;dihydrofluoride Chemical compound F.F.[F-].[K+] POHFBTRVASILTB-UHFFFAOYSA-M 0.000 claims description 12
239000013078 crystal Substances 0.000 claims description 7
238000010438 heat treatment Methods 0.000 claims description 6
238000001816 cooling Methods 0.000 claims description 3
238000007872 degassing Methods 0.000 claims description 3
229910052731 fluorine Inorganic materials 0.000 claims description 3
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 13
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
229910052799 carbon Inorganic materials 0.000 description 9
238000010926 purge Methods 0.000 description 9
230000005611 electricity Effects 0.000 description 8
238000004817 gas chromatography Methods 0.000 description 7
230000010355 oscillation Effects 0.000 description 6
229910004261 CaF 2 Inorganic materials 0.000 description 5
230000000052 comparative effect Effects 0.000 description 5
238000002425 crystallisation Methods 0.000 description 5
230000008025 crystallization Effects 0.000 description 5
238000004455 differential thermal analysis Methods 0.000 description 5
239000004065 semiconductor Substances 0.000 description 5
238000004381 surface treatment Methods 0.000 description 5
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
238000006243 chemical reaction Methods 0.000 description 3
239000000498 cooling water Substances 0.000 description 3
238000004519 manufacturing process Methods 0.000 description 3
238000002156 mixing Methods 0.000 description 3
YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
229910000792 Monel Inorganic materials 0.000 description 2
238000007796 conventional method Methods 0.000 description 2
238000003795 desorption Methods 0.000 description 2
239000011737 fluorine Substances 0.000 description 2
239000012535 impurity Substances 0.000 description 2
229910052742 iron Inorganic materials 0.000 description 2
239000000203 mixture Substances 0.000 description 2
229910052759 nickel Inorganic materials 0.000 description 2
239000002994 raw material Substances 0.000 description 2
PPFMPOUQEOXUNI-UHFFFAOYSA-N F.[Ne] Chemical compound F.[Ne] PPFMPOUQEOXUNI-UHFFFAOYSA-N 0.000 description 1
VZPPHXVFMVZRTE-UHFFFAOYSA-N [Kr]F Chemical compound [Kr]F VZPPHXVFMVZRTE-UHFFFAOYSA-N 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 description 1
238000003287 bathing Methods 0.000 description 1
238000004140 cleaning Methods 0.000 description 1
238000000354 decomposition reaction Methods 0.000 description 1
238000010586 diagram Methods 0.000 description 1
238000001312 dry etching Methods 0.000 description 1
238000001035 drying Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000004880 explosion Methods 0.000 description 1
239000001257 hydrogen Substances 0.000 description 1
229910052739 hydrogen Inorganic materials 0.000 description 1
239000011810 insulating material Substances 0.000 description 1
230000003993 interaction Effects 0.000 description 1
239000002184 metal Substances 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002808 molecular sieve Substances 0.000 description 1
QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 1
229910001120 nichrome Inorganic materials 0.000 description 1
238000005192 partition Methods 0.000 description 1
238000000059 patterning Methods 0.000 description 1
150000003839 salts Chemical class 0.000 description 1
238000007789 sealing Methods 0.000 description 1
URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
238000007711 solidification Methods 0.000 description 1
230000008023 solidification Effects 0.000 description 1
238000001179 sorption measurement Methods 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
238000002411 thermogravimetry Methods 0.000 description 1

Images

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/245—Fluorine; Compounds thereof
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/02—Process control or regulation
- C25B15/021—Process control or regulation of heating or cooling
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
- C25B15/085—Removing impurities

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Automation & Control Theory (AREA)
Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

JP2003553033A 2001-12-17 2002-12-09 Ｆ２ガス発生装置及びｆ２ガス発生方法並びにｆ２ガス Expired - Fee Related JP3569279B2 (ja)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP2001382722		2001-12-17
JP2001382722		2001-12-17
PCT/JP2002/012868 WO2003052167A1 (en)	2001-12-17	2002-12-09	Apparatus for generating f2 gas and method for generating f2 gas, and f2 gas

Publications (2)

Publication Number	Publication Date
JP3569279B2 true JP3569279B2 (ja)	2004-09-22
JPWO2003052167A1 JPWO2003052167A1 (ja)	2005-04-28

Family

ID=19187509

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2003553033A Expired - Fee Related JP3569279B2 (ja)	2001-12-17	2002-12-09	Ｆ２ガス発生装置及びｆ２ガス発生方法並びにｆ２ガス

Country Status (8)

Country	Link
US (1)	US20050006248A1 (de)
EP (1)	EP1457586A4 (de)
JP (1)	JP3569279B2 (de)
KR (1)	KR100712345B1 (de)
CN (1)	CN1327032C (de)
AU (1)	AU2002349510A1 (de)
TW (1)	TW593774B (de)
WO (1)	WO2003052167A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2013540964A (ja) *	2010-09-16	2013-11-07	ソルヴェイ（ソシエテアノニム）	フッ化水素供給装置

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3569277B1 (ja) *	2003-05-28	2004-09-22	東洋炭素株式会社	ガス発生装置の電流制御方法及び電流制御装置
FR2927635B1 (fr) *	2008-02-14	2010-06-25	Snecma Propulsion Solide	Membrane de separation pour installation d'electrolyse
JP5584904B2 (ja) *	2008-03-11	2014-09-10	東洋炭素株式会社	フッ素ガス発生装置
JP2011058015A (ja) *	2009-09-07	2011-03-24	Toyo Tanso Kk	電解装置
JP5375673B2 (ja) *	2010-03-01	2013-12-25	セントラル硝子株式会社	フッ素ガス生成装置
TWI586842B (zh) *	2010-09-15	2017-06-11	首威公司	氟之製造工廠及使用彼之方法
JP5906742B2 (ja) *	2012-01-05	2016-04-20	セントラル硝子株式会社	フッ素ガス生成装置
US12188135B2 (en) *	2018-10-24	2025-01-07	Resonac Corporation	Fluorine gas production device
KR102803535B1 (ko) *	2024-04-15	2025-06-10	황영준	수전해혼합가스와 촉매생성기체연료를 혼합한 터빈 원동기 융복합 발전시스템

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1570004A (en) *	1976-10-19	1980-06-25	British Nuclear Fuels Ltd	Electrolytic production of fluorine
JPS5867877A (ja) *	1981-10-20	1983-04-22	Asahi Glass Co Ltd	弗素の製造方法
CA2071235C (en) *	1991-07-26	2004-10-19	Gerald L. Bauer	Anodic electrode for electrochemical fluorine cell
GB9300956D0 (en) *	1993-01-19	1993-03-10	British Nuclear Fuels Plc	Dehydration of mixtures
US5628894A (en) *	1995-10-17	1997-05-13	Florida Scientific Laboratories, Inc.	Nitrogen trifluoride process
US6113769A (en) *	1997-11-21	2000-09-05	International Business Machines Corporation	Apparatus to monitor and add plating solution of plating baths and controlling quality of deposited metal
JP2000313981A (ja) *	1999-04-27	2000-11-14	Toyo Tanso Kk	フッ素電解用炭素電極
TWI247051B (en) *	2000-04-07	2006-01-11	Toyo Tanso Co	Apparatus for generating fluorine gas
KR100633870B1 (ko) *	2001-06-29	2006-10-13	쇼와 덴코 가부시키가이샤	고순도 불소 가스, 그의 제조 방법 및 용도

2002
- 2002-12-09 AU AU2002349510A patent/AU2002349510A1/en not_active Abandoned
- 2002-12-09 US US10/497,158 patent/US20050006248A1/en not_active Abandoned
- 2002-12-09 KR KR1020047007949A patent/KR100712345B1/ko not_active Expired - Fee Related
- 2002-12-09 EP EP02783802A patent/EP1457586A4/de not_active Ceased
- 2002-12-09 CN CNB02825158XA patent/CN1327032C/zh not_active Expired - Fee Related
- 2002-12-09 JP JP2003553033A patent/JP3569279B2/ja not_active Expired - Fee Related
- 2002-12-09 WO PCT/JP2002/012868 patent/WO2003052167A1/ja not_active Ceased
- 2002-12-12 TW TW091136005A patent/TW593774B/zh not_active IP Right Cessation

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2013540964A (ja) *	2010-09-16	2013-11-07	ソルヴェイ（ソシエテアノニム）	フッ化水素供給装置
KR101914799B1 (ko) *	2010-09-16	2018-11-02	솔베이(소시에떼아노님)	불화수소 공급 유닛

Also Published As

Publication number	Publication date
TW200301316A (en)	2003-07-01
EP1457586A4 (de)	2005-07-13
TW593774B (en)	2004-06-21
EP1457586A1 (de)	2004-09-15
KR100712345B1 (ko)	2007-05-02
WO2003052167A1 (en)	2003-06-26
AU2002349510A1 (en)	2003-06-30
CN1604970A (zh)	2005-04-06
JPWO2003052167A1 (ja)	2005-04-28
KR20040062648A (ko)	2004-07-07
US20050006248A1 (en)	2005-01-13
CN1327032C (zh)	2007-07-18

Legal Events

Date	Code	Title	Description
2004-06-03	TRDD	Decision of grant or rejection written
2004-06-09	A01	Written decision to grant a patent or to grant a registration (utility model)	Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20040608
2004-06-24	A61	First payment of annual fees (during grant procedure)	Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20040617
2004-06-25	R150	Certificate of patent or registration of utility model	Free format text: JAPANESE INTERMEDIATE CODE: R150
2007-01-16	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250
2007-12-25	FPAY	Renewal fee payment (event date is renewal date of database)	Free format text: PAYMENT UNTIL: 20090625 Year of fee payment: 5
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2013-05-21	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250
2014-06-25	LAPS	Cancellation because of no payment of annual fees

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