EP1505663A1 - Actionneur piezo-electrique et tete a jet d'encre - Google Patents

Actionneur piezo-electrique et tete a jet d'encre Download PDF

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Publication number
EP1505663A1
EP1505663A1 EP03725789A EP03725789A EP1505663A1 EP 1505663 A1 EP1505663 A1 EP 1505663A1 EP 03725789 A EP03725789 A EP 03725789A EP 03725789 A EP03725789 A EP 03725789A EP 1505663 A1 EP1505663 A1 EP 1505663A1
Authority
EP
European Patent Office
Prior art keywords
piezoelectric
orientation
layer
piezoelectric actuator
bottom electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03725789A
Other languages
German (de)
English (en)
Other versions
EP1505663A4 (fr
Inventor
Takamitsu c/o SEIKO EPSON CORPORATION HIGUCHI
Setsuya c/o SEIKO EPSON CORPORATION IWASHITA
Koji c/o SEIKO EPSON CORPORATION SUMI
Masami c/o Seiko Epson Corporation Murai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of EP1505663A1 publication Critical patent/EP1505663A1/fr
Publication of EP1505663A4 publication Critical patent/EP1505663A4/fr
Withdrawn legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14201—Structure of print heads with piezoelectric elements
    • B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/079—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing using intermediate layers, e.g. for growth control
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
    • H10N30/2047—Membrane type
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/704—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings
    • H10N30/706—Piezoelectric or electrostrictive devices based on piezoelectric or electrostrictive films or coatings characterised by the underlying bases, e.g. substrates
    • H10N30/708—Intermediate layers, e.g. barrier, adhesion or growth control buffer layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/87—Electrodes or interconnections, e.g. leads or terminals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01—Embodiments of or processes related to ink-jet heads
    • B41J2202/03—Specific materials used
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/87—Electrodes or interconnections, e.g. leads or terminals
    • H10N30/877—Conductive materials
    • H10N30/878—Conductive materials the principal material being non-metallic, e.g. oxide or carbon based

Definitions

  • the piezoelectric actuator of the present invention may be applied not only as the liquid jetting head described above, but as various other actuators such as a precision positioning mechanism such as an STM, a cell manipulator, a probe for an ultrasound diagnostic device, an ultrasonic motor, and a small bimor pump.
  • a precision positioning mechanism such as an STM, a cell manipulator, a probe for an ultrasound diagnostic device, an ultrasonic motor, and a small bimor pump.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
EP20030725789 2002-05-15 2003-05-15 Actionneur piezo-electrique et tete a jet d'encre Withdrawn EP1505663A4 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002140558 2002-05-15
JP2002140558 2002-05-15
PCT/JP2003/006074 WO2003098714A1 (fr) 2002-05-15 2003-05-15 Actionneur piezo-electrique et tête à jet d'encre

Publications (2)

Publication Number Publication Date
EP1505663A1 true EP1505663A1 (fr) 2005-02-09
EP1505663A4 EP1505663A4 (fr) 2009-08-19

Family

ID=29544929

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20030725789 Withdrawn EP1505663A4 (fr) 2002-05-15 2003-05-15 Actionneur piezo-electrique et tete a jet d'encre

Country Status (5)

Country Link
US (1) US7279823B2 (fr)
EP (1) EP1505663A4 (fr)
JP (1) JP4432776B2 (fr)
CN (1) CN100421275C (fr)
WO (1) WO2003098714A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1677368A3 (fr) * 2004-12-28 2007-07-11 Seiko Epson Corporation Composants piézoélectriques comportant des couches conductrices en perovskite
EP1396877B1 (fr) * 2002-09-05 2008-11-26 Seiko Epson Corporation Substrat pour dispositifs électroniques, son procédé de fabrication, et disposif électronique

Families Citing this family (40)

* Cited by examiner, † Cited by third party
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JP2004281742A (ja) * 2003-03-17 2004-10-07 Japan Science & Technology Agency 半導体素子、半導体センサーおよび半導体記憶素子
US7411339B2 (en) * 2003-11-28 2008-08-12 Seiko Epson Corporation Manufacturing method of actuator device and liquid jet apparatus provided with actuator device formed by manufacturing method of the same
JP4717344B2 (ja) * 2003-12-10 2011-07-06 キヤノン株式会社 誘電体薄膜素子、圧電アクチュエータおよび液体吐出ヘッド
JP5013035B2 (ja) * 2003-12-11 2012-08-29 セイコーエプソン株式会社 誘電体膜の製造方法及び液体噴射ヘッドの製造方法
JP4192794B2 (ja) 2004-01-26 2008-12-10 セイコーエプソン株式会社 圧電素子、圧電アクチュエーター、インクジェット式記録ヘッド、インクジェットプリンター、表面弾性波素子、周波数フィルタ、発振器、電子回路、薄膜圧電共振器、及び電子機器
TWI253392B (en) * 2004-03-29 2006-04-21 Canon Kk Dielectric member, piezoelectric member, ink jet head, ink jet recording apparatus and producing method for ink jet recording apparatus
US7235917B2 (en) * 2004-08-10 2007-06-26 Canon Kabushiki Kaisha Piezoelectric member element and liquid discharge head comprising element thereof
JP2006093042A (ja) * 2004-09-27 2006-04-06 Seiko Epson Corp 強誘電体薄膜形成用組成物及び強誘電体薄膜並びに液体噴射ヘッド
KR100639918B1 (ko) 2004-12-16 2006-11-01 한국전자통신연구원 Ｍｅｍｓ 액츄에이터
JP4793568B2 (ja) * 2005-07-08 2011-10-12 セイコーエプソン株式会社 アクチュエータ装置、液体噴射ヘッド及び液体噴射装置
JP2009542285A (ja) * 2006-06-28 2009-12-03 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 高速マイクロジェット状の流体を供給する装置および方法
JP2010238856A (ja) * 2009-03-31 2010-10-21 Tdk Corp 圧電体素子及びジャイロセンサ
JP5585209B2 (ja) 2009-05-28 2014-09-10 株式会社リコー 電気機械変換素子の製造方法、該製造方法により製造した電気機械変換素子、液滴吐出ヘッド及び液滴吐出装置
JP5110052B2 (ja) * 2009-07-24 2012-12-26 セイコーエプソン株式会社 アクチュエータ装置及び液体噴射ヘッド並びに液体噴射装置
JP2011061117A (ja) * 2009-09-14 2011-03-24 Seiko Epson Corp 圧電素子、圧電アクチュエーター、液体噴射ヘッドおよび液体噴射装置
JP5660288B2 (ja) * 2010-01-05 2015-01-28 セイコーエプソン株式会社 液体噴射ヘッド、液体噴射装置及び圧電素子並びに液体噴射ヘッドの製造方法
JP5423414B2 (ja) * 2010-01-15 2014-02-19 株式会社リコー 電気機械変換膜の製造方法、電気機械変換膜、電気機械変換膜群、電気機械変換素子の製造方法、電気機械変換素子、電気機械変換素子群、液体吐出ヘッド、液体吐出装置、画像形成装置
JP5526810B2 (ja) 2010-01-28 2014-06-18 株式会社リコー ゾルゲル液、電気−機械変換素子、液体吐出ヘッド及びインクジェット記録装置
JP2012059770A (ja) * 2010-09-06 2012-03-22 Seiko Epson Corp 圧電素子、液滴噴射ヘッドおよび液滴噴射装置ならびにそれらの製造方法
WO2012036103A1 (fr) * 2010-09-15 2012-03-22 Ricoh Company, Ltd. Dispositif transducteur électromécanique et son procédé de fabrication, et tête et appareil de décharge de gouttelettes liquides
JP2012256756A (ja) 2011-06-09 2012-12-27 Ricoh Co Ltd 電気−機械変換膜の形成方法、電気−機械変換膜、電気−機械変換素子、液体吐出ヘッドおよび画像形成装置
CN102983772A (zh) * 2011-09-05 2013-03-20 研能科技股份有限公司 驱动电路及其所适用的压电致动泵
US9761785B2 (en) 2011-10-17 2017-09-12 The United States Of America As Represented By The Secretary Of The Army Stylo-epitaxial piezoelectric and ferroelectric devices and method of manufacturing
US8866367B2 (en) 2011-10-17 2014-10-21 The United States Of America As Represented By The Secretary Of The Army Thermally oxidized seed layers for the production of {001} textured electrodes and PZT devices and method of making
JP2014198398A (ja) * 2013-03-29 2014-10-23 セイコーエプソン株式会社 流路ユニット、液体吐出ヘッド、液体吐出装置、流路ユニットの製造方法
JP5761540B2 (ja) 2013-06-28 2015-08-12 セイコーエプソン株式会社 圧電材料、圧電素子、液体噴射ヘッド、液体噴射装置、超音波センサー、圧電モーター及び発電装置
JP5754660B2 (ja) * 2013-06-28 2015-07-29 セイコーエプソン株式会社 圧電材料、圧電素子、液体噴射ヘッド、液体噴射装置、超音波センサー、圧電モーター及び発電装置
JP2015038953A (ja) 2013-06-28 2015-02-26 セイコーエプソン株式会社 圧電材料、圧電素子、液体噴射ヘッド、液体噴射装置、超音波センサー、圧電モーター及び発電装置
JP6287121B2 (ja) 2013-11-28 2018-03-07 株式会社リコー 電気−機械変換膜の製造方法、電気−機械変換素子、液体吐出ヘッド、インクジェット記録装置
JP6244865B2 (ja) * 2013-12-09 2017-12-13 船井電機株式会社 振動ミラー素子
JP6442860B2 (ja) 2014-04-23 2018-12-26 株式会社リコー 前駆体ゾルゲル溶液、電気機械変換素子、液滴吐出ヘッド、及びインクジェット記録装置
EP3240055B1 (fr) 2014-12-26 2021-06-23 Seiko Epson Corporation Matériau piézoélectrique et son procédé de fabrication, élément piézoélectrique, et dispositif utilisant un élément piézoélectrique
WO2017083150A1 (fr) * 2015-11-13 2017-05-18 IQE, plc Structures de couches destinées à des filtres rf fabriqués à l'aide d'oxydes de terres rares et de nitrure d'aluminium épitaxial
US11495670B2 (en) 2016-09-22 2022-11-08 Iqe Plc Integrated epitaxial metal electrodes
KR102400476B1 (ko) 2016-09-22 2022-05-20 아이큐이, 피엘씨 집적된 에피택셜 금속 전극
US10418457B2 (en) 2016-09-22 2019-09-17 Iqe Plc Metal electrode with tunable work functions
JP6910631B2 (ja) * 2016-11-15 2021-07-28 アドバンストマテリアルテクノロジーズ株式会社 膜構造体及びその製造方法
JP6881790B2 (ja) * 2017-05-26 2021-06-02 アドバンストマテリアルテクノロジーズ株式会社 膜構造体及びその製造方法
JP7210253B2 (ja) * 2018-12-06 2023-01-23 株式会社堀場エステック 流体制御弁
CN120191128A (zh) * 2023-12-22 2025-06-24 苏州众行汇创科技有限公司 液体喷出头及包含其的液体喷吐装置

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5179070A (en) * 1988-04-30 1993-01-12 Sumitomo Electric Industries, Ltd. Semiconductor substrate having a superconducting thin film with a buffer layer in between
US5529981A (en) * 1992-03-05 1996-06-25 Holloway; Alex Process and apparatus for preparing biaxially textured materials using anisotropy in the paramagnetic susceptibility
US5270298A (en) * 1992-03-05 1993-12-14 Bell Communications Research, Inc. Cubic metal oxide thin film epitaxially grown on silicon
JP2001509312A (ja) 1997-01-28 2001-07-10 ザ ペンステート リサーチファウンデーション 超音波変換器のためのリラクサー強誘電体単結晶
JP3472087B2 (ja) * 1997-06-30 2003-12-02 Ｔｄｋ株式会社 膜構造体、電子デバイス、記録媒体および酸化物導電性薄膜の製造方法
US5889289A (en) * 1997-08-28 1999-03-30 The United States Of America As Represented By The Secretary Of The Navy High temperature superconductor/insulator composite thin films with Josephson coupled grains
JP4006562B2 (ja) * 2000-02-21 2007-11-14 セイコーエプソン株式会社 圧電体素子、インクジェット式記録ヘッド及びこれらの製造方法並びにインクジェットプリンタ
JP3796394B2 (ja) * 2000-06-21 2006-07-12 キヤノン株式会社 圧電素子の製造方法および液体噴射記録ヘッドの製造方法
JP3817729B2 (ja) * 2001-11-08 2006-09-06 セイコーエプソン株式会社 圧電アクチュエータ及び液体吐出ヘッド
JP4228569B2 (ja) * 2001-11-28 2009-02-25 セイコーエプソン株式会社 電子デバイス用基板の製造方法及び電子デバイスの製造方法
JP2003179279A (ja) * 2001-12-10 2003-06-27 Seiko Epson Corp 圧電アクチュエータ及びインクジェット式記録ヘッド
GB0218261D0 (en) * 2002-08-06 2002-09-11 Charterhouse Therapeutics Ltd Improvements in pharmaceutically useful compounds

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1396877B1 (fr) * 2002-09-05 2008-11-26 Seiko Epson Corporation Substrat pour dispositifs électroniques, son procédé de fabrication, et disposif électronique
EP1677368A3 (fr) * 2004-12-28 2007-07-11 Seiko Epson Corporation Composants piézoélectriques comportant des couches conductrices en perovskite
US7622850B2 (en) 2004-12-28 2009-11-24 Seiko Epson Corporation Piezoelectric device, piezoelectric actuator, piezoelectric pump, inkjet recording head, inkjet printer, surface acoustic wave device, thin-film piezoelectric resonator, frequency filter, oscillator, electronic circuit, and electronic instrument

Also Published As

Publication number Publication date
CN1579025A (zh) 2005-02-09
EP1505663A4 (fr) 2009-08-19
JPWO2003098714A1 (ja) 2005-09-22
CN100421275C (zh) 2008-09-24
JP4432776B2 (ja) 2010-03-17
WO2003098714A1 (fr) 2003-11-27
US7279823B2 (en) 2007-10-09
US20050179342A1 (en) 2005-08-18

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