Classifications

• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B5/00—Optical elements other than lenses
  • G02B5/20—Filters
  • G02B5/28—Interference filters
  • G02B5/285—Interference filters comprising deposited thin solid films
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
  • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/0021—Reactive sputtering or evaporation
  • C23C14/0036—Reactive sputtering
  • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
  • C23C14/0078—Reactive sputtering by exposing the substrates to reactive gases intermittently by moving the substrates between spatially separate sputtering and reaction stations
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/02—Pretreatment of the material to be coated
  • C23C14/021—Cleaning or etching treatments
  • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/34—Sputtering
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
  • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
  • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
• • G02B1/105—
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
  • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
  • G02B1/14—Protective coatings, e.g. hard coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/73—Anti-reflective coatings with specific characteristics
  • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/15—Deposition methods from the vapour phase
  • C03C2218/154—Deposition methods from the vapour phase by sputtering
  • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/30—Aspects of methods for coating glass not covered above
  • C03C2218/32—After-treatment
  • C03C2218/322—Oxidation
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T428/00—Stock material or miscellaneous articles
  • Y10T428/12—All metal or with adjacent metals
  • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
  • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
  • Y10T428/12576—Boride, carbide or nitride component
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T428/00—Stock material or miscellaneous articles
  • Y10T428/12—All metal or with adjacent metals
  • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
  • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
  • Y10T428/12611—Oxide-containing component

Definitions

• the invention relates to a coated object, comprising a substrate and at least one functional layer with an optical function and / or protective function, as well as methods for producing such an object and its uses.
• reflectors have an operating temperature of around 400 to 500 ° C
• hobs have an operating temperature of up to 800 ° C.
• amorphously applied layers change.
• the layers undergo a phase change with increasing temperatures, very much to the detriment of the functioning of the coated objects.
• the phase change takes place, for example, in Ti0 2 from the amorphous phase to the crystalline anatase phase and further from the anatase phase to the rutile phase.
• This phase change is accompanied by a volume shrinkage, which has an extremely negative effect on the overall layer package. Due to the volume shrinkage, micro-cracks form within the layer.
• reflectors for example, they then scatter the incident radiation, as a result of which the maximum achievable reflected luminous flux is reduced.
• the reflectance of the coating is also reduced.
• the surface structure of the individual layers also changes, which can have further negative consequences such as (partial) delamination in alternating layer systems.
• Crystallization behavior depends on the one hand on the temperature, but on the other hand also on the layer thickness of the individual layers. Crystallization is more likely to occur the thicker the respective layers are and the more - they are heated.
• the optical design specifies a specific layer structure, i.e. a precisely defined sequence of the physical layer thicknesses d in the alternating layer package, the values for applications in the visible spectral range can typically be up to 200 nm.
• the corresponding optical layer thicknesses n-d are of the order of magnitude of ⁇ / 4 (n: refractive index, ⁇ : light wavelength).
• the hard coatings described herein are suitable for applications in the ambient temperature range, however, change their properties at high temperatures, such as are customary for example in cooking surfaces, which makes them for use at high temperatures' unsuitable.
• a protective layer for cooking surfaces requires materials that are temperature-resistant up to 800 ° C and that can withstand the high thermo-mechanical stresses that occur between the glass ceramic and protective layer.
• Glass ceramic plate has become known as a cooking surface, which is provided with a transparent scratch protection layer, which, among other things. can be formed by a layer of hard material.
• the materials for this transparent layer include Metal oxides such as aluminum oxide, zirconium oxide, yttrium oxide,
• the deposition of the materials can e.g. by means of the SOL GEL technique, the CVD process, in particular the PICVD process and sputtering.
• the layers are typically deposited amorphously or in a partially crystalline structure.
• Such layers can experience adverse changes in prolonged use in the hot areas or in the event of maximum thermal stress. So you can in these areas discolor the layers by thermally induced compacting or cloud them by crystallization, with the result that the hot areas become optically conspicuous.
• roughening on a scale of 1 - 1000 nm can occur. The roughening itself can be an optical one
• Rough and porous surfaces get dirty quickly and are difficult to clean. In addition, they are not optically clearly transparent, but are highly scattering and are not suitable for applications with optically appealing surfaces.
• the invention is therefore based on the object of providing coated objects of the type mentioned at the outset as inexpensively as possible and of high quality, the coating also being used Operating temperatures above 350 ° C is structurally stable and their optical and / or mechanical properties can be further improved.
• At least one functional layer of the coated object has at least one intermediate layer, the intermediate layer being very thin in relation to the functional layer.
• Layer is with a layer thickness d 2 ⁇ 10 nm and the intermediate layer interrupts the morphology of the functional layer, so that the disadvantages of the prior art no longer occur.
• Functional layers are layers which fulfill an optical function (ie, by the choice of the refractive index and the layer thickness, these layers have a function with regard to their effect on the radiation within a certain range of the electromagnetic spectrum) and / or a protective function with regard to the substrate, for example before thermal, chemical or mechanical effects.
• the intermediate layer can interrupt the morphology of such a functional layer at least once in such a way that the sub-layers T s of the functional layer remain below a predetermined layer thickness, in which a phase change, for example from that amorphous in the anastase crystalline phase or from the anastase in the rutile crystalline phase, the functional layer no longer occurs.
• the thin intermediate layers positively change the morphology, for example of functional layers known per se, with regard to their temperature resistance, without adversely affecting their original functions.
• This makes it possible also structural and make temperature stable and also to use in high temperature ranges, for example, amorphous functional layers or functional layers in thermally labile crystalline phases with advantageous mechanical and 'optical properties.
• the intermediate layer can interrupt the morphology of such a functional layer at least once, so that partial layers T s are formed.
• the interruption has the effect that laterally closely connected, vertically coherent, dense columns are formed in the functional layer, which show essentially no tendency to widen.
• the intermediate layers mainly influence the morphology of the crystalline layers in such a way that crystal orientations are suppressed by means of the intermediate layers, which have a tendency to widen as the layer grows, so that the functional layers are very dense and have very smooth surfaces. This enables crystalline layers with high temperature resistance to have optically high-quality properties to lend and provide very dense, scratch-resistant and temperature-resistant layers.
• the functional layer can contain an oxide, nitride, carbide, fluoride, chloride, selenide, telluride or sulfide and / or can be associated with one or more of the following elements Li (lithium), Be (beryllium), Na
• the functional layer can also be made of a pure material of the above. mentioned elements or from mixed systems of oxide and / or nitride and / or carbide and / or fluoride and / or chloride and / or selenide and / or telluride and / or sulfide compounds of
• Elements consist, for example, of mixed systems with at least one metal oxide and / or metal nitride and / or metal carbide and / or metal oxonitride and / or metal carbonitride and / or metal oxocarbonitride.
• the aforementioned mixing systems can have several metallic ones
• Contain components for example made of titanium-aluminum oxide.
• the coatings can consist of only one functional layer or of several different functional layers. The choice of materials and material combinations, the structure and composition of the individual functional layers is essentially determined by the requirements for the layer.
• the intermediate layers can also be those for the functional layers mentioned above. Contain elements, connections and mixing systems.
• Intermediate layer has a different chemical composition and / or a different morphology than the functional layer to be interrupted.
• the layer thicknesses are in the
• Optical functional layers are optically active layers, i.e. these have a function. with regard to their effect on the radiation within a certain range of the electromagnetic spectrum.
• an optical functional layer can be created by using very thin intermediate layers Influencing the reflection behavior can be shared and is structurally stable even at higher temperatures.
• the thickness of a partial layer can easily be set by a person skilled in the art on the basis of a few experiments. It depends on the one hand on the material of the optical functional layer, and on the other hand on the temperature load to be expected of the layer during use.
• the layer thicknesses of the partial layers T s that result from the division of an optical functional layer should be 10 to 70 nm, preferably 20 to 45 nm. If a one-time interruption of the functional layer does not produce a satisfactory effect due to the excessive layer thickness of the partial layers or for some other reason, several intermediate layers are used.
• Partial layers do not have to have the same layer thickness, but can have different layer thicknesses, i.e. be constructed asymmetrically.
• the function of an individual optical functional layer is largely determined only by the total thickness of its sub-layers. As soon as the
• Sub-layers have the (small) thickness required for the desired application, a further reduction in the layer thickness of the sub-layers by interposing further intermediate layers no longer leads to any significant improvement. Layer thicknesses of
• Partial layers in the range of 45 to 70 nm should be used for objects that are exposed to thermal stress around 350 ° C. In the layer thickness range from 20 to 45 nm, the properties do not deteriorate even at very high temperatures above 350 ° C.
• Functional layers should be from 0.3 to 10 nm, preferably range from 1 to 3 nm, particularly preferably from 1.5 to 2.5 nm. These parameters ensure that the intermediate layer only influences the morphology of the layer, but not the optical design. Below 0.3 nm the intermediate layer has hardly any effect, above 10 nm the intermediate layer can become optically active.
• the principle of the interruption of the functional layers by intermediate layers can be applied to any material combinations of the functional layers.
• low-index functional layers with intermediate layers made of the high-index material can be broken down and high-index functional layers with intermediate layers made of the low-index material can be broken down.
• this procedure is not absolutely necessary, it only makes sense from a procedural point of view. It is therefore also possible for the high-index functional layer to be replaced by another high-index one
• Intermediate layer is interrupted, for example a titanium oxide functional layer by a titanium aluminum oxide intermediate layer.
• Metal oxides are mainly suitable as the material for optical functional layers, titanium oxide, titanium-aluminum oxide and zirconium oxide in a temperature-stable crystal phase are particularly suitable for the high-index functional layers and silicon oxide in particular for the low-index functional layers.
• Another advantageous aspect of the invention is that, for example, in the case of optically applied crystals Functional layers by interrupting them with intermediate layers whose surface quality can be significantly improved.
• Surface quality can be significantly improved.
• Temperature resistance is achieved surfaces with increased brilliance and improved 'optical properties and an increased resistance to mechanical stresses.
• Additional functional layers made of metal for example for surface coatings of components, in particular carrier elements of litographic processes, can advantageously be formed by intermediate layers made of metal oxides, in particular metal oxides of the same.
• Metal are interrupted. For example, by interrupting chrome
• the object to be coated can be either a metal or a dielectric substrate, ie a glass, a glass ceramic or a composite.
• a plastic can also be used as the substrate, which is stable under the application temperatures, such as COC (cyclo-olefin copolymers), PES (polyether sulfone), PEI
• the invention further relates to the use of an article coated in this way, the articles are particularly suitable for use under high thermal loads.
• Coated articles of this type are typically used for optical elements. These can be reflectors, lenses, filters, prisms and mirrors. Also are lighting fixtures for digital
• the optical elements can also be used for the UV wavelength range and for the IR wavelength range. It can also be used as a display for monitors and display devices if the substrate and the layer materials are selected accordingly.
• “Scratch-resistant layers” their layer thicknesses are typically in the range from 100 to 20,000 nm, preferably between 500 to 10,000 nm and - particularly preferably between 1,500 and 5,000 nm.
• the thickness of a partial layer can also be easily adjusted by a person skilled in the art using a few experiments. It depends primarily on the material of the protective layer.
• the layer thicknesses of the partial layers resulting from the division of such a functional layer by the intermediate layer should be 30 to 500 nm, preferably 100 to 250 nm. If a one-time interruption of the functional layer does not produce a satisfactory effect due to the excessive layer thickness of the partial layers or for any other reason, several will be used
• the resulting partial layers do not have to have the same layer thickness, but can have different layer thicknesses, ie they have an asymmetrical structure.
• the intermediate layers in the protective layers must be very thin layers in relation to the functional layer and are in the range from 0.3 to 10 nm, preferably in the range from 1 to 5 nm.
• Restrictions by means of intermediate layers restrict the lateral expansion of the columns to regions below 1 ⁇ m, preferably to below 200 nm, as a result of which the layers become very dense.
• Suitable materials of such functional layers as protective layers, in particular for transparent protective layers are silicon nitride and metal oxides, in particular zirconium oxide in a temperature-stable crystal phase, for example stabilized with yttrium
• Zirconia Zirconium nitride, silicon oxide or titanium-aluminum oxide, for example, are used for interrupting intermediate layers.
• the object to be coated can be either a glass, a glass ceramic or a composite.
• other suitable materials can also serve as a substrate for the coated article according to the invention.
• the invention further relates to the use of an article coated in this way, the articles being particularly suitable for use under high thermal loads.
• Coated objects of this Art are typically used as hobs for hobs.
• Another coated article according to the invention comprising a substrate with at least one
• Functional layer is designed such that at least one functional layer has at least one intermediate layer different from the functional layer, the intermediate layer having the same refractive index as the functional layer and the intermediate layer interrupting the morphology of the functional layer.
• the interruption of the functional layer with an intermediate layer which is necessary here, in principle has the same effect on the morphology of the functional layer as described above, but no longer has to have the small thickness of less than 10 nm. Since the intermediate layer has the same refractive index as the functional layer, it cannot change its optical function. This is especially true for using transparent functional layers
• Transparent functional layers with protective functions and / or optical functional layers consist primarily of metal oxides.
• the interruption with an intermediate layer which has the same refractive index is preferably achieved by means of intermediate layers made of suitable metal oxides with at least two metallic components, the quantitative ratio of the components being adjustable and a specific refractive index being adjustable.
• functional layers made of metal oxides are interrupted with at least two metallic components with intermediate layers made of a metal oxide.
• a possible and suitable embodiment is, for example, the interruption of zirconium oxide functional layers with titanium-aluminum oxide intermediate layers and vice versa.
• the refractive index of zirconium oxide is approximately 2.1 and the refractive index of titanium-aluminum oxide can be varied in a range from approximately 1.55 to 2.50 by setting aluminum to titanium.
• the refractive index of the titanium-aluminum oxide layer can be adapted to the refractive index of the zirconium oxide layer by means of a targeted quantitative ratio of the two metallic components.
• CVD chemical vapor deposition
• PVD physical vapor deposition
• the three main techniques of CVD are thermal CVD, plasma CVD and laser CVD. They differ in the type of excitation and splitting of the chemical pre-compounds (precursors), which act as vaporizable transport agents for components of the layer materials.
• One of the variants of the plasma CVD is advantageous for producing the object described at the outset, particularly in the production of amorphous functional layers, namely the plasma-assisted chemical vapor deposition (PACND), the plasma-enhanced chemical vapor deposition (PECVD). ., and particularly advantageously the Plasma-Impulse-Chemical-Vapor-Deposition (PICVD).
• the layer deposition takes place discontinuously in a plasma excited by pulsed microwave radiation.
• a targeted layer structure of the respective functional layers and the intermediate layer is controlled via the number of pulse cycles.
• the smallest layer thickness, which is deposited in exactly one pulse cycle can be set to 0.1 to 0.3 nm per pulse.
• the manufacturing effort depends on the total package thickness and not on the number of different layers.
• the changeover time in PICVD from shift to shift is approx. 10 milliseconds. This is an economically particularly advantageous process, since in other production processes the production effort increases with the number of different layers, so the cost of production is the number of layers.
• Physical vapor deposition processes with high energy inputs are particularly suitable for generating crystalline layer morphologies.
• Magnetron sputtering systems enable high coating rates in the ' , low pressure range with relatively low substrate heating and are also easy to control in the process parameters.
• Sputtering processes are particularly suitable for the production of layers from mixing systems, in which a simultaneous sputtering with two sputtering sources (co-sputtering) which are equipped with different target materials can take place.
• FIG. 1 the cross section through a coated substrate with symmetrical division of functional layers
• FIG. 2 the cross section through a coated substrate with asymmetrical division of functional layers
• Figure 1 shows the cross section of a particularly preferred embodiment of the coated according to the invention
• Substrate (1) The layer (2) applied directly to the substrate represents a functional layer B which does not contain any inventive elements in its dimensions. This is followed by the functional layer A (3), which is divided by the intermediate layer (4) into the sub-layers T s (3a and 3b).
• a further functional layer B can be applied to the divided functional layer A. This layering should take place until the desired effect of the coating is achieved.
• FIG. 2 shows a further embodiment in which the functional layer A (3) is divided asymmetrically into sub-layers T s (3c and 3d). Furthermore, FIG. 2 shows the possibility of dividing functional layer A several times, in this example into sub-layers T s (3e, 3f, 3g).
• Table 1 25 layers on the substrate without intermediate layers.
• Table 2 45 layers on the substrate with intermediate layers.
• the graphic shown in FIG. 3 shows the spectral behavior of the reflector without intermediate layers (Table 1) as a dashed line and the spectral behavior of the reflector with intermediate layers (Table 2) as a solid line. As can be seen, they do

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