Classifications

• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B5/00—Optical elements other than lenses
  • G02B5/20—Filters
  • G02B5/28—Interference filters
  • G02B5/285—Interference filters comprising deposited thin solid films
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
  • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
  • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
  • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/0021—Reactive sputtering or evaporation
  • C23C14/0036—Reactive sputtering
  • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
  • C23C14/0078—Reactive sputtering by exposing the substrates to reactive gases intermittently by moving the substrates between spatially separate sputtering and reaction stations
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/02—Pretreatment of the material to be coated
  • C23C14/021—Cleaning or etching treatments
  • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/34—Sputtering
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
  • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
  • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
  • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
• • C—CHEMISTRY; METALLURGY
  • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
  • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
  • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
  • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
  • C23C28/42—Coatings including alternating layers following a pattern, a periodic or defined repetition characterized by the composition of the alternating layers
• • G02B1/105—
• • G—PHYSICS
  • G02—OPTICS
  • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
  • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
  • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
  • G02B1/14—Protective coatings, e.g. hard coatings
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2217/00—Coatings on glass
  • C03C2217/70—Properties of coatings
  • C03C2217/73—Anti-reflective coatings with specific characteristics
  • C03C2217/734—Anti-reflective coatings with specific characteristics comprising an alternation of high and low refractive indexes
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/10—Deposition methods
  • C03C2218/15—Deposition methods from the vapour phase
  • C03C2218/154—Deposition methods from the vapour phase by sputtering
  • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
• • C—CHEMISTRY; METALLURGY
  • C03—GLASS; MINERAL OR SLAG WOOL
  • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
  • C03C2218/00—Methods for coating glass
  • C03C2218/30—Aspects of methods for coating glass not covered above
  • C03C2218/32—After-treatment
  • C03C2218/322—Oxidation
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T428/00—Stock material or miscellaneous articles
  • Y10T428/12—All metal or with adjacent metals
  • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
  • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
  • Y10T428/12576—Boride, carbide or nitride component
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
  • Y10T428/00—Stock material or miscellaneous articles
  • Y10T428/12—All metal or with adjacent metals
  • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
  • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
  • Y10T428/12611—Oxide-containing component

Definitions

• the invention relates to a layer system with at least one metal oxide layer, the metal oxide comprising a titanium-aluminum oxide.
• the layer system has a high structural and. Temperature resistance, especially at operating temperatures of over 600 ° C and is particularly suitable for optical coatings, but is not limited to this.
• Optical layer systems in particular alternating layer systems, which are made up of alternately superimposed thin high and low refractive layers have been known for many years for a large number of applications. They act as a light interference film, the optical properties of which are determined by the choice of the material for the high or low refractive index layer and thus the corresponding refractive index, by the arrangement of the individual layers and by the choice of the individual layer thicknesses. The selection is made essentially using known optical
• Suitable starting materials for the production of such coatings for, for example, reflectors, mirrors, filters, lamps, IRC burners / lamps, etc. include Ti0 2 and Si0 2 .
• Thin layers of these materials are usually applied using CVD (Chemical Vapor Deposition), PVD (Physical Vapor Deposition) or Sol-Gel processes and are characterized by the fact that they are hard and chemically stable as well as a have a high refractive index difference.
• CVD Chemical Vapor Deposition
• PVD Physical Vapor Deposition
• Sol-Gel Sol-Gel processes
• DE 3227069 AI discloses an optical coating suitable for high temperatures, which consists of a Alternating layer system with Si0 2 as a low-refractive layer material and Ta 2 0 5 as a high-refractive layer material. This coating is resistant to high temperatures and is designed to improve the working efficiency of the coated object, in particular of halogen lamps.
• the object of the invention is to provide a coating which is essentially structurally stable at high operating temperatures and remains low or free from haze.
• the layer system according to the invention has at least one layer made of a metal oxide which comprises titanium-aluminum oxide.
• the individual layers of the layer system which are required, for example, to create a specific optical design of the layer system, are referred to below as functional layers.
• Functional layers made of titanium-aluminum oxide have a significantly higher temperature and structural stability than the known functional layers made of metal oxides. Since a functional layer comprising titanium-aluminum oxide inherently guarantees high temperature resistance, an additional interruption with an intermediate layer made of another metal oxide contributes to the fulfillment of the task in that it can be additionally stabilized, but mainly the mechanical and further improve the optical properties of functional layers comprising titanium aluminum oxide. To avoid optically undesirable influences
• the intermediate layer either choose the thickness or the refractive index of the intermediate layer so that it is not optically effective.
• such layers also have, for example, increased brilliance, an improvement in the desired optical parameters, such as reflectivity or transmittance, and increased scratch resistance.
• Another layer system according to the invention likewise consists at least of one functional layer from one
• a thickness of 50 nm remains, no crystallization behavior when exposed to high temperatures.
• a particular effect of the invention is the adjustability of the refractive index of the layer comprising titanium-aluminum oxide by adjusting the quantitative ratio of aluminum to titanium.
• the refractive index n can be varied in a range from 1.55 ⁇ n ⁇ 2.50. As the aluminum content increases, the refractive index n of the layer decreases. You can achieve this with only a small amount
• the adjustability of the refractive index of the layer comprising titanium aluminum oxide can be used particularly advantageously for adapting the refractive index of the functional layer to that of the intermediate layer or vice versa.
• Functional layers made of metal oxides with a refractive index n in the range of 1.55 n n 2,5 2.50 for example made of zirconium oxide or stabilized zirconium oxide, that by adding a stabilizer material such as Yttrium oxide etc. was stabilized, with n approx. 2.1
• an intermediate layer made of titanium-aluminum oxide without being influenced optically.
• the intermediate layers no longer have to have the small thicknesses, such as intermediate layers with a different refractive index, which must remain below a thickness at which they can be optically effective.
• intermediate layers with a different refractive index which must remain below a thickness at which they can be optically effective.
• the layer systems according to the invention can consist of a single functional layer as well as a layer system with several functional layers, preferably of an alternating layer system of high and low refractive index functional layers.
• the high refractive index functional layer comprises a titanium-aluminum oxide. It preferably consists of Ti ⁇ l ⁇ J ⁇ y with 0 ⁇ x ⁇ 1, preferably with 0.3 ⁇ x ⁇ 1, particularly advantageously with
• the low-index functional layer then comprises a silicon oxide, preferably silicon dioxide. Silicon dioxide is also resistant to high temperatures and has a low refractive index compared to titanium-aluminum oxide.
• the values of the layer thicknesses d p of the functional layers for applications of the layer system according to the invention in the near IR and visible range are then preferably 5 nm d d F 200 200 nm.
• Such layer systems for optical applications are for use in high-temperature ranges, ie at operating temperatures above 600 ° C, well suited.
• the high-index functional layers are also characterized by low-index. Interrupted intermediate layers and vice versa, it is particularly important in the case of optical layer systems that the intermediate layers interrupting the functional layers remain below a thickness at which they could become optically effective in the overall layer system.
• Useful thicknesses d z of the intermediate layers are then in the range of 0.3 nm ⁇ d z 10 10 nm, preferably in the range of 0.5 nm d d z 4,0 4.0 nm and particularly suitable in the range of 1.0 nm d d z 2,5 2.5 nm.
• the use and the number of intermediate layers should preferably be chosen such that the thickness dp of the partial layers resulting from the functional layer is approximately 20 nm d dp 250 250 nm.
• a reasonable layer thickness of functional layers to be interrupted is d p ⁇ 40 nm. It is particularly optimal for the procedural process if, in an alternating layer system made of high and low refractive index functional layers, the high refractive index functional layers are interrupted by intermediate layers made of the low refractive index layer material. There is also the possibility that the low-index functional layers are interrupted by intermediate layers made of the high-index layer material. It is not absolutely necessary to interrupt each functional layer.
• the intermediate layer it is not essential for the intermediate layer that it has a different refractive index than the functional layer, but that it is suitable for influencing the structure formation in the functional layer, so that high temperatures cannot cause any deterioration in the optical properties of the coating. It is therefore also possible for high-index functional layers, for example made of titanium oxide, to have high-index
• Sol-gel processes are also advantageously suitable for industrial production of the coating.
• PVD Physical Vapor Deposition
• the substrate materials can be very diverse and essentially depend on the area of application of the coated article. For use in the high temperature range, the associated temperature load must be taken into account. Metals, glass and glass ceramics as well as plastics come into consideration as substrate materials.
• the layer systems are used for the coating of reflectors, in particular for the coating of glass ceramic reflectors.
• excellent optical and mechanical properties of the reflectors can be achieved even with long and extreme temperature loads due to the structure and temperature stability of the coating.
• the layer systems are used according to the invention for the coating of lighting fixtures, in particular IRC lamps / burners.
• these coatings can be used to achieve excellent optical and mechanical properties of the lighting fixtures due to the structure and temperature stability of the coating under long and extreme temperature loads.
• the invention will be explained in more detail below on the basis of the exemplary embodiments and figures.
• Fig.l a layer system according to the invention for a reflector coating
• Fig. 2 the reflection behavior of the reflector at temperatures of 450 ° C, 650 ° C and 750 ° C
• Fig. 3 the diffractograms of titanium aluminum oxide layers with different refractive indices after tempering at 650 ° C and 850 ° C
• FIG. 1 shows an optical layer system according to the invention for a reflector.
• the reflector has a high
• the layer system is an alternating layer system and consists of 43 functional layers.
• the low-index functional layer is made of Si0 2 and the high-index functional layer is made of t U ⁇ O y .
• the individual functional layers were produced using the PICVD process. With this procedure.
• the person skilled in the art succeeds in controlling the aluminum content in a customary manner, so that the refractive index of the titanium-aluminum oxide layer could be set in a targeted manner.
• Reflectors produced in this way were then subjected to temperature loads of 450 ° C, '650 ° C and 750 ° C. The reflectors showed no turbidity after these temperature loads.
• FIG. 2 shows the reflection behavior of the reflectors under the various temperature loads mentioned above. Also when examining the reflection behavior of the reflector coating according to the invention, it could be shown that the high operating temperatures have a negligible effect on the reflection behavior, especially in the desired wavelength range of 370 nm ⁇ ⁇ 800 nm, the reflection behavior of the reflectors remains stable.
• the reflector described by way of example with a structure and temperature-stable coating according to the invention can be used in digital projectors, but is also for lighting purposes in high and
• Low voltage technology for example suitable for use in halogen lighting technology.
• substrates made of quartz glass were coated using the PICVD method, each with a Ti ⁇ l ⁇ O y individual layer (0 ⁇ x ⁇ 1) with a layer thickness of 500 nm.
• PICVD method PICVD method
• different proportions of aluminum and titanium were set in the coating process.
• the conditions in the layers were measured using EDX. The respective is from the measured proportions in at%
• Quantity ratio can be determined. The individual values for the proportions in at% titanium and aluminum, the associated quantitative ratio of Ti: Al and the corresponding refractive indices can be found in the overview in FIG. 4.
• the refractive index n of the layer is reduced.
• the coated substrates were then exposed to a temperature load of 650 ° C. or 850 ° C. for 1 hour.
• n 2.34 approaches for the formation of the anatase phase.
• even small amounts of aluminum are sufficient to prevent crystal formation under high temperature loads.
• both the crystallization of an amorphous layer in anatase at low temperatures and the recrystallization into the rutile phase at temperatures above 600 ° C. are prevented. All examined layers showed no signs of cloudiness.
• substrates coated with a single functional layer according to the invention can also be used for a wide variety of applications, preferably in the high-temperature range, since they remain structurally stable even under extreme temperature loads of more than 600 ° C. and have no cloudiness.
• the layer system consists of an alternating layer system of high and low refractive index functional layers. These interference layer systems typically consist of more than 30 functional layers.
• the temperature of the lamp bulb or burner can, under certain circumstances, be more than 1000 ° C.
• thermal load capacity of known alternating layer systems has hitherto been around 600 ° C., which was primarily due to the insufficient temperature stability of the highly refractive layer.
• the temperature stability of the IRC lamps / burners can be increased significantly above 600 ° C.

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• Chemical & Material Sciences (AREA)
• Engineering & Computer Science (AREA)
• Chemical Kinetics & Catalysis (AREA)
• Materials Engineering (AREA)
• Organic Chemistry (AREA)
• Mechanical Engineering (AREA)
• Metallurgy (AREA)
• Physics & Mathematics (AREA)
• General Chemical & Material Sciences (AREA)
• Geochemistry & Mineralogy (AREA)
• Life Sciences & Earth Sciences (AREA)
• Optics & Photonics (AREA)
• General Physics & Mathematics (AREA)
• Ceramic Engineering (AREA)
• Inorganic Chemistry (AREA)
• Physical Vapour Deposition (AREA)
• Surface Treatment Of Glass (AREA)
• Optical Elements Other Than Lenses (AREA)
• Laminated Bodies (AREA)
• Optical Filters (AREA)
• Application Of Or Painting With Fluid Materials (AREA)
• Chemical Treatment Of Metals (AREA)
• Formation And Processing Of Food Products (AREA)
• Chemically Coating (AREA)
• Chemical Vapour Deposition (AREA)

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Publications (1)

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• 2003
  • 2003-09-13 KR KR1020057004287A patent/KR100885083B1/ko not_active Expired - Fee Related
  • 2003-09-13 US US10/527,499 patent/US7641773B2/en not_active Expired - Fee Related
  • 2003-09-13 JP JP2004537082A patent/JP2005538255A/ja active Pending
  • 2003-09-13 EP EP03750543A patent/EP1546053A1/fr not_active Withdrawn
  • 2003-09-13 WO PCT/EP2003/010220 patent/WO2004026785A1/fr not_active Ceased
  • 2003-09-13 JP JP2004537083A patent/JP4268938B2/ja not_active Expired - Fee Related
  • 2003-09-13 EP EP03757837A patent/EP1537056A1/fr not_active Withdrawn
  • 2003-09-13 CN CNB038217848A patent/CN100465116C/zh not_active Expired - Fee Related
  • 2003-09-13 US US10/527,494 patent/US7713638B2/en not_active Expired - Fee Related
  • 2003-09-13 WO PCT/EP2003/010219 patent/WO2004026782A1/fr not_active Ceased
  • 2003-09-13 DE DE50309800T patent/DE50309800D1/de not_active Expired - Lifetime
  • 2003-09-13 JP JP2004537081A patent/JP2005538028A/ja active Pending
  • 2003-09-13 EP EP10004380A patent/EP2243751A3/fr not_active Ceased
  • 2003-09-13 AU AU2003273872A patent/AU2003273872A1/en not_active Abandoned
  • 2003-09-13 AT AT03757838T patent/ATE394353T1/de not_active IP Right Cessation
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