EP1641721A2 - Mit dielektrischer schicht beschichtetes substrat und anlage zu dessen herstellung - Google Patents

Mit dielektrischer schicht beschichtetes substrat und anlage zu dessen herstellung

Info

Publication number
EP1641721A2
EP1641721A2 EP04767497A EP04767497A EP1641721A2 EP 1641721 A2 EP1641721 A2 EP 1641721A2 EP 04767497 A EP04767497 A EP 04767497A EP 04767497 A EP04767497 A EP 04767497A EP 1641721 A2 EP1641721 A2 EP 1641721A2
Authority
EP
European Patent Office
Prior art keywords
substrate
ion beam
layer
dielectric layer
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04767497A
Other languages
English (en)
French (fr)
Inventor
Carole Baubet
Klaus Fischer
Marcus Loergen
Jean-Christophe Giron
Nicolas Nadaud
Eric Mattman
Jean-Paul Rousseau
Alfred Hofrichter
Manfred Jansen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Publication of EP1641721A2 publication Critical patent/EP1641721A2/de
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
    • B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
    • B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
    • B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
    • B32B17/10165—Functional features of the laminated safety glass or glazing
    • B32B17/10174—Coatings of a metallic or dielectric material on a constituent layer of glass or polymer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/225—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2456—Coating containing TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3613—Coatings of type glass/inorganic compound/metal/inorganic compound/metal/other
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3618—Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3626—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer one layer at least containing a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3652—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the coating stack containing at least one sacrificial layer to protect the metal from oxidation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C03C17/366—Low-emissivity or solar control coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0026—Activation or excitation of reactive gases outside the coating chamber
    • C23C14/0031—Bombardment of substrates by reactive ion beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
    • C23C14/0052—Bombardment of substrates by reactive ion beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering
    • C23C14/3442—Applying energy to the substrate during sputtering using an ion beam
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5826—Treatment with charged particles
    • C23C14/5833—Ion beam bombardment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/28—Other inorganic materials
    • C03C2217/281—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/78—Coatings specially designed to be durable, e.g. scratch-resistant
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/155—Deposition methods from the vapour phase by sputtering by reactive sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20—Constructional details
    • H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J2211/44—Optical arrangements or shielding arrangements, e.g. filters or lenses
    • H01J2211/446—Electromagnetic shielding means; Antistatic means

Definitions

  • ion sources have been developed which are better compatible with a sputtering layer deposition method, by solving in particular the problem of convergence of the particle beams and by improving the adequacy between the size and the geometry of one part from the cathode and the other from the ion source.
  • linear source are described in particular in documents US 6,214,183 or US 6,454,910.
  • Document WO 02/46491 describes the use of a source of this type for producing a functional layer of silver oxide by sputtering from a silver target with bombardment by a beam of oxygen ions.
  • the ion beam is used to densify the silver material and transform it into a layer containing silver oxide.
  • the silver oxide layer is able to absorb and / or significantly reflect UV.
  • the object of the present invention is to remedy the drawbacks of the prior art and to provide new thin-layer materials capable of
  • the invention is based on the fact that it is possible to deposit thin layers of dielectric, in particular oxide and / or nitride with exposure to an ion beam by controlling the conditions so that the material of the final layer has an index
  • the dielectric layer can be made of oxide of at least one element among silicon, zinc, tantalum, titanium, tin, aluminum, zirconium, niobium, indium, cerium, Tungsten. .
  • ITO indium tin oxide
  • the layer can be obtained from a cathode of a doped metal, that is to say containing a minority element: by way of illustration, it is common to use zinc cathodes containing a minor proportion of a other metal such as aluminum or gallium.
  • zinc oxide is understood to mean a zinc oxide which may contain a minor proportion of another metal. The same is true for the other oxides mentioned.
  • a layer of zinc oxide deposited according to the invention has a refractive index capable of being adjusted to a value less than or equal to
  • the position of the ion source (s) is preferably optimized so that the maximum density of sprayed particles from the target is juxtaposed with the ion beam (s).
  • an oxygen ion beam is created with a very predominant oxygen atmosphere, in particular at 100% oxygen at the ion source, while the atmosphere at the spray cathode is preferably composed of 100% argon.
  • Example 3 This example is carried out under the same deposition conditions as those of reference example 3, except that a linear ion source is placed in the spraying chamber and is used to create simultaneously with the spraying a beam of ion during the production of the zinc oxide-based layer, with a source atmosphere composed of 100% oxygen. The source is tilted so as to direct the beam towards the substrate at an angle of 30 ° and is positioned at a distance of approximately 14 cm from the substrate.
  • These modified deposition conditions make it possible to produce a layer of zinc oxide having an index and a density substantially identical to those obtained with Example 1.
  • Reference example 4 A stack having the following thicknesses (in nanometers) is produced on a glass substrate, corresponding to the stack marketed by the company SAINT GOBAIN GLASS FRANCE under the brand Planistar:
  • the atmosphere at the source is made up of 100% oxygen.
  • the source is tilted so as to direct the beam towards the substrate at an angle of 30 ° and is positioned at a distance of approximately 14 cm from the substrate.
  • the energy of the ion beam is for each passage of the order of 3000 eV.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Joining Of Glass To Other Materials (AREA)
  • Laminated Bodies (AREA)
  • Photovoltaic Devices (AREA)
  • Surface Treatment Of Optical Elements (AREA)
EP04767497A 2003-06-27 2004-06-28 Mit dielektrischer schicht beschichtetes substrat und anlage zu dessen herstellung Withdrawn EP1641721A2 (de)

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FR0307847A FR2856677B1 (fr) 2003-06-27 2003-06-27 Substrat revetu d'une couche dielectrique et procede pour sa fabrication
PCT/FR2004/001652 WO2005000759A2 (fr) 2003-06-27 2004-06-28 Substrat revetu d’une couche dielectrique et procede et installation pour sa fabrication

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EP04767496A Withdrawn EP1641720A2 (de) 2003-06-27 2004-06-28 Mit dielektrischer schicht beschichtetes substrat und anlage zu dessen herstellung

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US (3) US7820017B2 (de)
EP (2) EP1641721A2 (de)
JP (4) JP5026786B2 (de)
KR (2) KR101172019B1 (de)
CN (2) CN1845882A (de)
EA (2) EA012048B1 (de)
FR (1) FR2856677B1 (de)
WO (2) WO2005000758A2 (de)
ZA (2) ZA200510376B (de)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2856677B1 (fr) * 2003-06-27 2006-12-01 Saint Gobain Substrat revetu d'une couche dielectrique et procede pour sa fabrication
WO2005063646A1 (en) 2003-12-22 2005-07-14 Cardinal Cg Company Graded photocatalytic coatings
WO2006017311A1 (en) 2004-07-12 2006-02-16 Cardinal Cg Company Low-maintenance coatings
US7267748B2 (en) 2004-10-19 2007-09-11 Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique S.A. Method of making coated article having IR reflecting layer with predetermined target-substrate distance
FR2892409B1 (fr) * 2005-10-25 2007-12-14 Saint Gobain Procede de traitement d'un substrat
EP2013150B1 (de) 2006-04-11 2018-02-28 Cardinal CG Company Fotokatalytische beschichtungen mit verbesserten wartungsarmen eigenschaften
WO2007124291A2 (en) 2006-04-19 2007-11-01 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
EA200601832A1 (ru) * 2006-08-16 2008-02-28 Владимир Яковлевич ШИРИПОВ Способ ионной обработки поверхности диэлектрика и устройство для осуществления способа
PL1975274T3 (pl) 2007-03-14 2012-10-31 Fraunhofer Ges Forschung Sposób wytwarzania izolujących cieplnie, silnie przezroczystych systemów warstwowych oraz system warstwowy wytworzony według tego sposobu
JP5007973B2 (ja) * 2007-04-03 2012-08-22 独立行政法人産業技術総合研究所 薄膜製造方法
US7820309B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
CN101469404B (zh) * 2007-12-27 2012-09-19 鸿富锦精密工业（深圳）有限公司 镀膜方法
JP5145109B2 (ja) * 2008-04-25 2013-02-13 株式会社フジクラ 多結晶薄膜の製造方法及び酸化物超電導導体の製造方法
GB0909235D0 (en) 2009-05-29 2009-07-15 Pilkington Group Ltd Process for manufacturing a coated glass article
FR2950878B1 (fr) 2009-10-01 2011-10-21 Saint Gobain Procede de depot de couche mince
US10000411B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
CA2786872A1 (en) 2010-01-16 2011-07-21 Cardinal Cg Company High quality emission control coatings, emission control glazings, and production methods
US10000965B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductive coating technology
US10060180B2 (en) 2010-01-16 2018-08-28 Cardinal Cg Company Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology
US11155493B2 (en) 2010-01-16 2021-10-26 Cardinal Cg Company Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods
US9862640B2 (en) 2010-01-16 2018-01-09 Cardinal Cg Company Tin oxide overcoat indium tin oxide coatings, coated glazings, and production methods
JP5747318B2 (ja) * 2010-12-03 2015-07-15 国立大学法人 名古屋工業大学 薄膜共振子
US8574728B2 (en) 2011-03-15 2013-11-05 Kennametal Inc. Aluminum oxynitride coated article and method of making the same
US8611044B2 (en) 2011-06-02 2013-12-17 International Business Machines Corporation Magnetic head having separate protection for read transducers and write transducers
US8611043B2 (en) 2011-06-02 2013-12-17 International Business Machines Corporation Magnetic head having polycrystalline coating
CN102381844B (zh) * 2011-07-26 2013-08-07 西安工程大学 采用化学沉淀法对空心玻璃微珠进行改性的方法
DK2609955T3 (da) 2011-12-27 2020-08-17 Dentsply Ih Ab Katetersamling med genlukkelig åbning
US8837082B2 (en) 2012-04-27 2014-09-16 International Business Machines Corporation Magnetic recording head having quilted-type coating
US9036297B2 (en) 2012-08-31 2015-05-19 International Business Machines Corporation Magnetic recording head having protected reader sensors and near zero recession writer poles
US8780496B2 (en) 2012-09-21 2014-07-15 International Business Machines Corporation Device such as magnetic head having hardened dielectric portions
US20140170434A1 (en) * 2012-12-14 2014-06-19 Intermolecular Inc. Two Layer Ag Process For Low Emissivity Coatings
US9365450B2 (en) * 2012-12-27 2016-06-14 Intermolecular, Inc. Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance
JP6103193B2 (ja) * 2013-01-09 2017-03-29 旭硝子株式会社 複層ガラス
US9017809B2 (en) 2013-01-25 2015-04-28 Kennametal Inc. Coatings for cutting tools
US9138864B2 (en) 2013-01-25 2015-09-22 Kennametal Inc. Green colored refractory coatings for cutting tools
TWI582255B (zh) * 2013-08-14 2017-05-11 光洋應用材料科技股份有限公司 用於光儲存媒體的介電濺鍍靶材及介電層
US9427808B2 (en) 2013-08-30 2016-08-30 Kennametal Inc. Refractory coatings for cutting tools
US20150093500A1 (en) * 2013-09-30 2015-04-02 Intermolecular, Inc. Corrosion-Resistant Silver Coatings with Improved Adhesion to III-V Materials
US9368370B2 (en) * 2014-03-14 2016-06-14 Applied Materials, Inc. Temperature ramping using gas distribution plate heat
FR3045033B1 (fr) * 2015-12-09 2020-12-11 Saint Gobain Procede et installation pour l'obtention d'un vitrage colore
RU2637044C2 (ru) * 2016-04-15 2017-11-29 Закрытое Акционерное Общество "Светлана - Оптоэлектроника" Способ получения покрытия на основе оксида индия и олова
EP3541762B1 (de) 2016-11-17 2022-03-02 Cardinal CG Company Statisch-dissipative beschichtungstechnologie
US10472274B2 (en) * 2017-07-17 2019-11-12 Guardian Europe S.A.R.L. Coated article having ceramic paint modified surface(s), and/or associated methods
US11028012B2 (en) 2018-10-31 2021-06-08 Cardinal Cg Company Low solar heat gain coatings, laminated glass assemblies, and methods of producing same
RU2713008C9 (ru) * 2019-10-16 2020-08-05 Общество с ограниченной ответственностью "АГНИ-К" Способ азотирования оксидных соединений, находящихся в твердой фазе
WO2025250341A1 (en) * 2024-05-30 2025-12-04 Corning Incorporated System and method for application of electro-optical film stacks on substrates without breaking vacuum
FR3165450A1 (fr) 2024-08-06 2026-02-13 Saint Gobain Glass France Procede de depot d’un empilement de couches minces a l’aide d’un faisceau d’ions, utilisation d’un faisceau d’ions et substrat obtenu

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3522143A (en) 1966-08-18 1970-07-28 Libbey Owens Ford Co Phototropic units
DE7316334U (de) 1973-04-30 1973-08-23 Jenaer Glaswerk Schott & Gen Lichtdurchlaessiger phototroper verbundkoerper
US4488780A (en) * 1981-12-07 1984-12-18 Rockwell International Corporation Method of producing a color change in a chemically coupled color-changing display
US4691077A (en) * 1985-05-13 1987-09-01 Mobil Solar Energy Corporation Antireflection coatings for silicon solar cells
US4654067A (en) * 1986-01-28 1987-03-31 Ford Motor Company Method for making an electrically heatable windshield
JPS63196106U (de) * 1987-01-20 1988-12-16
JPS6429627U (de) * 1987-08-13 1989-02-22
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
US5239406A (en) * 1988-02-12 1993-08-24 Donnelly Corporation Near-infrared reflecting, ultraviolet protected, safety protected, electrochromic vehicular glazing
FR2634754B1 (fr) 1988-07-27 1992-08-21 Saint Gobain Vitrage Vitrage feuillete a couche electro-conductrice
US4923289A (en) 1988-10-05 1990-05-08 Ford Motor Company Electrochromic devices having a gradient of color intensities
JPH036373A (ja) * 1989-06-02 1991-01-11 Sanyo Electric Co Ltd 超平滑化薄膜の製法
JP2744069B2 (ja) * 1989-06-06 1998-04-28 三洋電機株式会社 薄膜の形成方法
JP2986813B2 (ja) 1989-09-29 1999-12-06 日産自動車株式会社 フォトクロミック感光着色領域を有する合わせガラス
US5532062A (en) * 1990-07-05 1996-07-02 Asahi Glass Company Ltd. Low emissivity film
US5419969A (en) * 1990-07-05 1995-05-30 Asahi Glass Company Ltd. Low emissivity film
US5187496A (en) * 1990-10-29 1993-02-16 Xerox Corporation Flexible electrographic imaging member
GB9225270D0 (en) * 1992-12-03 1993-01-27 Gec Ferranti Defence Syst Depositing different materials on a substrate
FR2699164B1 (fr) * 1992-12-11 1995-02-24 Saint Gobain Vitrage Int Procédé de traitement de couches minces à base d'oxyde ou de nitrure métallique.
JP3115142B2 (ja) 1993-01-13 2000-12-04 株式会社リコー 昇華型熱転写受像体
US5548475A (en) * 1993-11-15 1996-08-20 Sharp Kabushiki Kaisha Dielectric thin film device
JP3438377B2 (ja) * 1995-02-22 2003-08-18 石川島播磨重工業株式会社 イオンシャワードーピング装置
EP0739001B1 (de) * 1995-04-17 2001-02-21 Read-Rite Corporation Bildung eines isolierenden dünnen Filmes durch eine Vielzahl von Ionenstrahlen
US5682788A (en) 1995-07-12 1997-11-04 Netzer; Yishay Differential windshield capacitive moisture sensor
US5770321A (en) * 1995-11-02 1998-06-23 Guardian Industries Corp. Neutral, high visible, durable low-e glass coating system and insulating glass units made therefrom
EP0785299A1 (de) * 1996-01-19 1997-07-23 Murata Manufacturing Co., Ltd. Dünnmetallschicht und Verfahren zu ihrer Herstellung, akustische Oberflächenwellen anordnung enthaltend diese Schicht und Verfahren zu ihrer Herstellung
JP3265227B2 (ja) * 1996-05-15 2002-03-11 株式会社半導体エネルギー研究所 ドーピング装置およびドーピング処理方法
US6231999B1 (en) * 1996-06-21 2001-05-15 Cardinal Ig Company Heat temperable transparent coated glass article
US5981076A (en) * 1996-12-09 1999-11-09 3M Innovative Properties Company UV protected syndiotactic polystyrene overlay films
US6190511B1 (en) * 1997-03-13 2001-02-20 David T. Wei Method and apparatus for ion beam sputter deposition of thin films
US20020155299A1 (en) * 1997-03-14 2002-10-24 Harris Caroline S. Photo-induced hydrophilic article and method of making same
US6284360B1 (en) * 1997-09-30 2001-09-04 3M Innovative Properties Company Sealant composition, article including same, and method of using same
DE19808795C2 (de) 1998-03-03 2001-02-22 Sekurit Saint Gobain Deutsch Wärmestrahlen reflektierendes Schichtsystem für transparente Substrate
JPH11307987A (ja) * 1998-04-16 1999-11-05 Nippon Sheet Glass Co Ltd 電磁波フィルタ
US6086727A (en) * 1998-06-05 2000-07-11 International Business Machines Corporation Method and apparatus to improve the properties of ion beam deposited films in an ion beam sputtering system
US6002208A (en) * 1998-07-02 1999-12-14 Advanced Ion Technology, Inc. Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ion-emitting slit
JP2000294980A (ja) * 1999-04-06 2000-10-20 Nippon Sheet Glass Co Ltd 透光性電磁波フィルタおよびその製造方法
US6808606B2 (en) * 1999-05-03 2004-10-26 Guardian Industries Corp. Method of manufacturing window using ion beam milling of glass substrate(s)
US6375790B1 (en) * 1999-07-19 2002-04-23 Epion Corporation Adaptive GCIB for smoothing surfaces
US6596399B2 (en) * 2000-12-04 2003-07-22 Guardian Industries Corp. UV absorbing/reflecting silver oxide layer, and method of making same
US6607980B2 (en) * 2001-02-12 2003-08-19 Symetrix Corporation Rapid-temperature pulsing anneal method at low temperature for fabricating layered superlattice materials and making electronic devices including same
AUPR515301A0 (en) * 2001-05-22 2001-06-14 Commonwealth Scientific And Industrial Research Organisation Process and apparatus for producing crystalline thin film buffer layers and structures having biaxial texture
US6809066B2 (en) * 2001-07-30 2004-10-26 The Regents Of The University Of California Ion texturing methods and articles
US6500676B1 (en) * 2001-08-20 2002-12-31 Honeywell International Inc. Methods and apparatus for depositing magnetic films
FR2829723B1 (fr) * 2001-09-14 2004-02-20 Saint Gobain Vitrage de securite fonctionnalise
US7335153B2 (en) * 2001-12-28 2008-02-26 Bio Array Solutions Ltd. Arrays of microparticles and methods of preparation thereof
FR2856677B1 (fr) * 2003-06-27 2006-12-01 Saint Gobain Substrat revetu d'une couche dielectrique et procede pour sa fabrication

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2005000759A2 *

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EA200600113A1 (ru) 2006-06-30
JP5026786B2 (ja) 2012-09-19
EA200600112A1 (ru) 2006-06-30
FR2856677B1 (fr) 2006-12-01
US7820017B2 (en) 2010-10-26
JP2011241481A (ja) 2011-12-01
ZA200510416B (en) 2006-12-27
KR20060026448A (ko) 2006-03-23
WO2005000758A3 (fr) 2005-10-13
US20060275612A1 (en) 2006-12-07
WO2005000759A3 (fr) 2006-04-20
CN1845882A (zh) 2006-10-11
EP1641720A2 (de) 2006-04-05
FR2856677A1 (fr) 2004-12-31
KR20060036403A (ko) 2006-04-28
WO2005000759A2 (fr) 2005-01-06
EA011247B1 (ru) 2009-02-27
EA012048B1 (ru) 2009-08-28
KR101343437B1 (ko) 2014-03-04
CN1842500A (zh) 2006-10-04
JP2007519817A (ja) 2007-07-19
JP2011241480A (ja) 2011-12-01
JP2007516341A (ja) 2007-06-21
US20060234064A1 (en) 2006-10-19
KR101172019B1 (ko) 2012-08-08
US20110056825A1 (en) 2011-03-10
ZA200510376B (en) 2006-12-27
WO2005000758A2 (fr) 2005-01-06

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