EP1741003A2 - Films optiques et procedes de fabrication de ces derniers - Google Patents

Films optiques et procedes de fabrication de ces derniers

Info

Publication number
EP1741003A2
EP1741003A2 EP05744565A EP05744565A EP1741003A2 EP 1741003 A2 EP1741003 A2 EP 1741003A2 EP 05744565 A EP05744565 A EP 05744565A EP 05744565 A EP05744565 A EP 05744565A EP 1741003 A2 EP1741003 A2 EP 1741003A2
Authority
EP
European Patent Office
Prior art keywords
article
layer
less
continuous layer
nanolaminate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP05744565A
Other languages
German (de)
English (en)
Other versions
EP1741003A4 (fr
Inventor
Jian Jim Wang
Xuegong Deng
Anguel N. Nikolov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polarization Solutions LLC
Original Assignee
Nanoopto Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/866,416 external-priority patent/US20050275944A1/en
Application filed by Nanoopto Corp filed Critical Nanoopto Corp
Publication of EP1741003A2 publication Critical patent/EP1741003A2/fr
Publication of EP1741003A4 publication Critical patent/EP1741003A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1347Arrangement of liquid crystal layers or cells in which the final condition of one light beam is achieved by the addition of the effects of two or more layers or cells
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/06Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29DPRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00Producing optical elements, e.g. lenses or prisms
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3083Birefringent or phase retarding elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation

Definitions

  • forming the plurality of monolayers of the second material comprises depositing a monolayer of a precursor and exposing the monolayer of the precursor to a reagent to provide a monolayer of the second material.
  • the reagent can chemically react with the precursor to form the second material.
  • the reagent can oxidize the precursor to form the second material.
  • Depositing the monolayer of the precursor can include introducing a first gas comprising the precursor into a chamber housing the article. A pressure of the first gas in the chamber can be about 0.01 to about 100 Torr while the monolayer of the precursor is deposited.
  • Exposing the monolayer of the precursor to the reagent can include introducing a second gas comprising the reagent into the chamber.
  • is between about 400 nm and about 700 nm (e.g., between about 510 nm and about 570 nm).
  • the continuous layer has an optical retardation of about 4 nm or more for light of wavelength ⁇ propagating through the continuous layer along an axis, wherein ⁇ is between about 400 nm and about 700 nm.
  • the article can include a second continuous layer including rows of a third material alternating with rows of a second nanolaminate material, wherein the second continuous layer is birefringent for light of wavelength ⁇ propagating through the second continuous layer along the axis.
  • A corresponding to Am + ⁇ 2 .
  • A is less than ⁇ , such as about 0.5 ⁇ or less (e.g., about 0.3 ⁇ or less, about 0.2 ⁇ or less, about 0.1 ⁇ or less, about 0.08 ⁇ or less, about 0.05 ⁇ or less, about 0.04 ⁇ or less, about 0.03 ⁇ or less, about 0.02 ⁇ or less, 0.01 ⁇ or less).
  • A is about 500 nm or less (e.g., about 300 nm or less, about 200 nm or less, about 100 nm or less, about 80 nm or less, about 60 nm or less, about 50 nm or less, about 40 nm or less).
  • retardation layer 110 is shown as having 19 portions, in general, the number of portions in a retardation layer may vary as desired. The number of portions depends on the period, ⁇ , and the area required by the retarder's end use application. In some embodiments, retardation layer 110 can have about 50 or more portions (e.g., about 100 or more portions, about 500 or more portions, about 1,000 or more portions, about 5,000 or more portions, about 10,000 or more portions, about 50,000 or more portions, about 100,000 or more portions, about 500,000 more portions). The thickness, d, of retardation layer 110 measured along the z-axis can vary as desired.
  • Deposition process parameters are controlled and synchronized by an electronic controller 399.
  • Electronic controller 399 is in communication with temperature controller 395; pump 340; and valves 352, 362, 372, 382, and 392.
  • Electronic controller 399 also includes a user interface, from which an operator can set deposition process parameters, monitor the deposition process, and otherwise interact with system 300. Referring to FIG.
  • the refractive index of the nanolaminate was estimated to be approximately 1.88 at 632 nm, as determined from measurements of a nanolaminate film similarly prepared on a flat glass substrate.
  • the retardation of an optical retarder was measured using an M-2000N ® Spectroscopic

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mathematical Physics (AREA)
  • Biophysics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Polarising Elements (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

L'invention concerne des films à usage optique, des articles contenant lesdits films, des procédés de fabrication desdits films ainsi que des systèmes qui utilisent lesdits films.
EP05744565A 2004-04-15 2005-04-08 Films optiques et procedes de fabrication de ces derniers Withdrawn EP1741003A4 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US56289004P 2004-04-15 2004-04-15
US10/866,416 US20050275944A1 (en) 2004-06-11 2004-06-11 Optical films and methods of making the same
PCT/US2005/011860 WO2005101112A2 (fr) 2004-04-15 2005-04-08 Films optiques et procedes de fabrication de ces derniers

Publications (2)

Publication Number Publication Date
EP1741003A2 true EP1741003A2 (fr) 2007-01-10
EP1741003A4 EP1741003A4 (fr) 2009-11-11

Family

ID=35150603

Family Applications (1)

Application Number Title Priority Date Filing Date
EP05744565A Withdrawn EP1741003A4 (fr) 2004-04-15 2005-04-08 Films optiques et procedes de fabrication de ces derniers

Country Status (4)

Country Link
EP (1) EP1741003A4 (fr)
JP (1) JP4778958B2 (fr)
KR (1) KR20070034992A (fr)
WO (1) WO2005101112A2 (fr)

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US8164721B2 (en) 2003-12-11 2012-04-24 Tan Kim L Grating trim retarders
US20050275944A1 (en) * 2004-06-11 2005-12-15 Wang Jian J Optical films and methods of making the same
US7630133B2 (en) 2004-12-06 2009-12-08 Moxtek, Inc. Inorganic, dielectric, grid polarizer and non-zero order diffraction grating
JP5933910B2 (ja) * 2006-08-15 2016-06-15 ポラリゼーション ソリューションズ エルエルシー 偏光子薄膜及びこの製作方法
US8755113B2 (en) 2006-08-31 2014-06-17 Moxtek, Inc. Durable, inorganic, absorptive, ultra-violet, grid polarizer
KR100808204B1 (ko) 2007-04-10 2008-03-03 엘지전자 주식회사 드럼세탁기
JP5424730B2 (ja) * 2009-06-12 2014-02-26 三菱電機株式会社 光学フィルタの製造方法
US8913321B2 (en) 2010-09-21 2014-12-16 Moxtek, Inc. Fine pitch grid polarizer
US8611007B2 (en) 2010-09-21 2013-12-17 Moxtek, Inc. Fine pitch wire grid polarizer
US8913320B2 (en) 2011-05-17 2014-12-16 Moxtek, Inc. Wire grid polarizer with bordered sections
US8873144B2 (en) 2011-05-17 2014-10-28 Moxtek, Inc. Wire grid polarizer with multiple functionality sections
US8922890B2 (en) 2012-03-21 2014-12-30 Moxtek, Inc. Polarizer edge rib modification
CN103529507B (zh) * 2012-07-06 2016-05-25 三菱电机株式会社 偏振光相位差板以及激光加工机
JP6274916B2 (ja) * 2014-03-10 2018-02-07 キヤノン株式会社 偏光情報取得ユニットを有する撮像装置
KR101944440B1 (ko) * 2016-03-23 2019-01-31 한국과학기술원 3 차원 나노구조체를 이용한 초박막형 위상차 필름, 및 이를 포함하는 디스플레이 디바이스
JPWO2017195810A1 (ja) * 2016-05-11 2019-03-07 Scivax株式会社 位相差素子、位相差素子製造方法および光学部材
JP6981074B2 (ja) * 2017-07-25 2021-12-15 Agc株式会社 光学素子
JP7165029B2 (ja) * 2017-12-05 2022-11-02 信越化学工業株式会社 反射防止積層膜、反射防止積層膜の形成方法、及び眼鏡型ディスプレイ
WO2019203926A1 (fr) * 2018-04-16 2019-10-24 Applied Materials, Inc. Éléments optiques à empilements multiples utilisant une liaison temporaire et permanente
CN108417719B (zh) * 2018-05-04 2021-08-24 苏州宝澜环保科技有限公司 一种硅基核壳结构光伏电池及其制备方法
WO2019239926A1 (fr) 2018-06-12 2019-12-19 ウシオ電機株式会社 Élément, dispositif et procédé de polarisation du vide ultraviolet, et procédé d'alignement
JP6825610B2 (ja) 2018-10-02 2021-02-03 セイコーエプソン株式会社 偏光素子、液晶装置、および電子機器
WO2020210425A1 (fr) * 2019-04-11 2020-10-15 Applied Materials, Inc. Formation de motifs sur des dispositifs optiques à profondeurs multiples
KR102265168B1 (ko) * 2019-12-30 2021-06-14 백석대학교산학협력단 스트라이프 구조를 이용한 자외선 차단용 자동차 썬팅 필름 및 썬팅 장치
CN114509838B (zh) * 2022-01-05 2023-11-14 中国科学院苏州纳米技术与纳米仿生研究所 氮化镓基激光器及其内氮化镓纳米超结构的制备方法
JP2025077363A (ja) * 2023-11-06 2025-05-19 ウシオ電機株式会社 反射型位相差構造体およびその製造方法

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Also Published As

Publication number Publication date
JP4778958B2 (ja) 2011-09-21
WO2005101112A2 (fr) 2005-10-27
JP2007532977A (ja) 2007-11-15
EP1741003A4 (fr) 2009-11-11
KR20070034992A (ko) 2007-03-29
WO2005101112A3 (fr) 2007-02-08

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