EP1741003A2 - Films optiques et procedes de fabrication de ces derniers - Google Patents
Films optiques et procedes de fabrication de ces derniersInfo
- Publication number
- EP1741003A2 EP1741003A2 EP05744565A EP05744565A EP1741003A2 EP 1741003 A2 EP1741003 A2 EP 1741003A2 EP 05744565 A EP05744565 A EP 05744565A EP 05744565 A EP05744565 A EP 05744565A EP 1741003 A2 EP1741003 A2 EP 1741003A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- article
- layer
- less
- continuous layer
- nanolaminate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1347—Arrangement of liquid crystal layers or cells in which the final condition of one light beam is achieved by the addition of the effects of two or more layers or cells
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/13363—Birefringent elements, e.g. for optical compensation
Definitions
- forming the plurality of monolayers of the second material comprises depositing a monolayer of a precursor and exposing the monolayer of the precursor to a reagent to provide a monolayer of the second material.
- the reagent can chemically react with the precursor to form the second material.
- the reagent can oxidize the precursor to form the second material.
- Depositing the monolayer of the precursor can include introducing a first gas comprising the precursor into a chamber housing the article. A pressure of the first gas in the chamber can be about 0.01 to about 100 Torr while the monolayer of the precursor is deposited.
- Exposing the monolayer of the precursor to the reagent can include introducing a second gas comprising the reagent into the chamber.
- ⁇ is between about 400 nm and about 700 nm (e.g., between about 510 nm and about 570 nm).
- the continuous layer has an optical retardation of about 4 nm or more for light of wavelength ⁇ propagating through the continuous layer along an axis, wherein ⁇ is between about 400 nm and about 700 nm.
- the article can include a second continuous layer including rows of a third material alternating with rows of a second nanolaminate material, wherein the second continuous layer is birefringent for light of wavelength ⁇ propagating through the second continuous layer along the axis.
- A corresponding to Am + ⁇ 2 .
- A is less than ⁇ , such as about 0.5 ⁇ or less (e.g., about 0.3 ⁇ or less, about 0.2 ⁇ or less, about 0.1 ⁇ or less, about 0.08 ⁇ or less, about 0.05 ⁇ or less, about 0.04 ⁇ or less, about 0.03 ⁇ or less, about 0.02 ⁇ or less, 0.01 ⁇ or less).
- A is about 500 nm or less (e.g., about 300 nm or less, about 200 nm or less, about 100 nm or less, about 80 nm or less, about 60 nm or less, about 50 nm or less, about 40 nm or less).
- retardation layer 110 is shown as having 19 portions, in general, the number of portions in a retardation layer may vary as desired. The number of portions depends on the period, ⁇ , and the area required by the retarder's end use application. In some embodiments, retardation layer 110 can have about 50 or more portions (e.g., about 100 or more portions, about 500 or more portions, about 1,000 or more portions, about 5,000 or more portions, about 10,000 or more portions, about 50,000 or more portions, about 100,000 or more portions, about 500,000 more portions). The thickness, d, of retardation layer 110 measured along the z-axis can vary as desired.
- Deposition process parameters are controlled and synchronized by an electronic controller 399.
- Electronic controller 399 is in communication with temperature controller 395; pump 340; and valves 352, 362, 372, 382, and 392.
- Electronic controller 399 also includes a user interface, from which an operator can set deposition process parameters, monitor the deposition process, and otherwise interact with system 300. Referring to FIG.
- the refractive index of the nanolaminate was estimated to be approximately 1.88 at 632 nm, as determined from measurements of a nanolaminate film similarly prepared on a flat glass substrate.
- the retardation of an optical retarder was measured using an M-2000N ® Spectroscopic
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mathematical Physics (AREA)
- Biophysics (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Polarising Elements (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US56289004P | 2004-04-15 | 2004-04-15 | |
| US10/866,416 US20050275944A1 (en) | 2004-06-11 | 2004-06-11 | Optical films and methods of making the same |
| PCT/US2005/011860 WO2005101112A2 (fr) | 2004-04-15 | 2005-04-08 | Films optiques et procedes de fabrication de ces derniers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1741003A2 true EP1741003A2 (fr) | 2007-01-10 |
| EP1741003A4 EP1741003A4 (fr) | 2009-11-11 |
Family
ID=35150603
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP05744565A Withdrawn EP1741003A4 (fr) | 2004-04-15 | 2005-04-08 | Films optiques et procedes de fabrication de ces derniers |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1741003A4 (fr) |
| JP (1) | JP4778958B2 (fr) |
| KR (1) | KR20070034992A (fr) |
| WO (1) | WO2005101112A2 (fr) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8164721B2 (en) | 2003-12-11 | 2012-04-24 | Tan Kim L | Grating trim retarders |
| US20050275944A1 (en) * | 2004-06-11 | 2005-12-15 | Wang Jian J | Optical films and methods of making the same |
| US7630133B2 (en) | 2004-12-06 | 2009-12-08 | Moxtek, Inc. | Inorganic, dielectric, grid polarizer and non-zero order diffraction grating |
| JP5933910B2 (ja) * | 2006-08-15 | 2016-06-15 | ポラリゼーション ソリューションズ エルエルシー | 偏光子薄膜及びこの製作方法 |
| US8755113B2 (en) | 2006-08-31 | 2014-06-17 | Moxtek, Inc. | Durable, inorganic, absorptive, ultra-violet, grid polarizer |
| KR100808204B1 (ko) | 2007-04-10 | 2008-03-03 | 엘지전자 주식회사 | 드럼세탁기 |
| JP5424730B2 (ja) * | 2009-06-12 | 2014-02-26 | 三菱電機株式会社 | 光学フィルタの製造方法 |
| US8913321B2 (en) | 2010-09-21 | 2014-12-16 | Moxtek, Inc. | Fine pitch grid polarizer |
| US8611007B2 (en) | 2010-09-21 | 2013-12-17 | Moxtek, Inc. | Fine pitch wire grid polarizer |
| US8913320B2 (en) | 2011-05-17 | 2014-12-16 | Moxtek, Inc. | Wire grid polarizer with bordered sections |
| US8873144B2 (en) | 2011-05-17 | 2014-10-28 | Moxtek, Inc. | Wire grid polarizer with multiple functionality sections |
| US8922890B2 (en) | 2012-03-21 | 2014-12-30 | Moxtek, Inc. | Polarizer edge rib modification |
| CN103529507B (zh) * | 2012-07-06 | 2016-05-25 | 三菱电机株式会社 | 偏振光相位差板以及激光加工机 |
| JP6274916B2 (ja) * | 2014-03-10 | 2018-02-07 | キヤノン株式会社 | 偏光情報取得ユニットを有する撮像装置 |
| KR101944440B1 (ko) * | 2016-03-23 | 2019-01-31 | 한국과학기술원 | 3 차원 나노구조체를 이용한 초박막형 위상차 필름, 및 이를 포함하는 디스플레이 디바이스 |
| JPWO2017195810A1 (ja) * | 2016-05-11 | 2019-03-07 | Scivax株式会社 | 位相差素子、位相差素子製造方法および光学部材 |
| JP6981074B2 (ja) * | 2017-07-25 | 2021-12-15 | Agc株式会社 | 光学素子 |
| JP7165029B2 (ja) * | 2017-12-05 | 2022-11-02 | 信越化学工業株式会社 | 反射防止積層膜、反射防止積層膜の形成方法、及び眼鏡型ディスプレイ |
| WO2019203926A1 (fr) * | 2018-04-16 | 2019-10-24 | Applied Materials, Inc. | Éléments optiques à empilements multiples utilisant une liaison temporaire et permanente |
| CN108417719B (zh) * | 2018-05-04 | 2021-08-24 | 苏州宝澜环保科技有限公司 | 一种硅基核壳结构光伏电池及其制备方法 |
| WO2019239926A1 (fr) | 2018-06-12 | 2019-12-19 | ウシオ電機株式会社 | Élément, dispositif et procédé de polarisation du vide ultraviolet, et procédé d'alignement |
| JP6825610B2 (ja) | 2018-10-02 | 2021-02-03 | セイコーエプソン株式会社 | 偏光素子、液晶装置、および電子機器 |
| WO2020210425A1 (fr) * | 2019-04-11 | 2020-10-15 | Applied Materials, Inc. | Formation de motifs sur des dispositifs optiques à profondeurs multiples |
| KR102265168B1 (ko) * | 2019-12-30 | 2021-06-14 | 백석대학교산학협력단 | 스트라이프 구조를 이용한 자외선 차단용 자동차 썬팅 필름 및 썬팅 장치 |
| CN114509838B (zh) * | 2022-01-05 | 2023-11-14 | 中国科学院苏州纳米技术与纳米仿生研究所 | 氮化镓基激光器及其内氮化镓纳米超结构的制备方法 |
| JP2025077363A (ja) * | 2023-11-06 | 2025-05-19 | ウシオ電機株式会社 | 反射型位相差構造体およびその製造方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1017022B (it) * | 1974-07-02 | 1977-07-20 | Marazzi Ceramica | Impianto automatico perfezionato per l essiccazione e la monocot tura rapida di piastrelle cerami che |
| DE3412958A1 (de) * | 1984-04-06 | 1985-10-17 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Phasengitter |
| US4915463A (en) * | 1988-10-18 | 1990-04-10 | The United States Of America As Represented By The Department Of Energy | Multilayer diffraction grating |
| JPH02230203A (ja) * | 1989-03-03 | 1990-09-12 | Nippon Telegr & Teleph Corp <Ntt> | 偏光子 |
| US5119231A (en) * | 1990-06-15 | 1992-06-02 | Honeywell Inc. | Hybrid diffractive optical filter |
| US5245471A (en) * | 1991-06-14 | 1993-09-14 | Tdk Corporation | Polarizers, polarizer-equipped optical elements, and method of manufacturing the same |
| DE69323127T2 (de) * | 1992-08-10 | 1999-07-22 | Canon K.K., Tokio/Tokyo | Halbleitervorrichtung und Herstellungsverfahren |
| JP3320507B2 (ja) * | 1993-06-18 | 2002-09-03 | ティーディーケイ株式会社 | 回折格子型偏光子とその製造方法 |
| JPH0990122A (ja) * | 1995-09-28 | 1997-04-04 | Kyocera Corp | グリッド型偏光子の製造方法 |
| JP3654553B2 (ja) * | 1997-06-19 | 2005-06-02 | 株式会社リコー | 光学素子 |
| TW460758B (en) * | 1998-05-14 | 2001-10-21 | Holographic Lithography System | A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material |
| JP2000284117A (ja) * | 1999-03-30 | 2000-10-13 | Fuji Elelctrochem Co Ltd | グリッド偏光子及びその製造方法 |
| TW515032B (en) * | 1999-10-06 | 2002-12-21 | Samsung Electronics Co Ltd | Method of forming thin film using atomic layer deposition method |
| US6893500B2 (en) * | 2000-05-25 | 2005-05-17 | Atomic Telecom | Method of constructing optical filters by atomic layer control for next generation dense wavelength division multiplexer |
| US6813077B2 (en) * | 2001-06-19 | 2004-11-02 | Corning Incorporated | Method for fabricating an integrated optical isolator and a novel wire grid structure |
| JP2003066229A (ja) * | 2001-08-28 | 2003-03-05 | Kyocera Corp | 縞状偏光子 |
| JP3898597B2 (ja) * | 2002-08-19 | 2007-03-28 | 信越化学工業株式会社 | 偏光子および偏光子の製造方法 |
-
2005
- 2005-04-08 EP EP05744565A patent/EP1741003A4/fr not_active Withdrawn
- 2005-04-08 WO PCT/US2005/011860 patent/WO2005101112A2/fr not_active Ceased
- 2005-04-08 JP JP2007508397A patent/JP4778958B2/ja not_active Expired - Lifetime
-
2006
- 2006-11-08 KR KR1020067023383A patent/KR20070034992A/ko not_active Ceased
Non-Patent Citations (2)
| Title |
|---|
| No further relevant documents disclosed * |
| See also references of WO2005101112A2 * |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4778958B2 (ja) | 2011-09-21 |
| WO2005101112A2 (fr) | 2005-10-27 |
| JP2007532977A (ja) | 2007-11-15 |
| EP1741003A4 (fr) | 2009-11-11 |
| KR20070034992A (ko) | 2007-03-29 |
| WO2005101112A3 (fr) | 2007-02-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
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| 17P | Request for examination filed |
Effective date: 20061019 |
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| AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU MC NL PL PT RO SE SI SK TR |
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| AX | Request for extension of the european patent |
Extension state: AL BA HR LV MK YU |
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| PUAK | Availability of information related to the publication of the international search report |
Free format text: ORIGINAL CODE: 0009015 |
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| RIC1 | Information provided on ipc code assigned before grant |
Ipc: B05D 5/06 20060101ALI20070226BHEP Ipc: G02B 5/30 20060101ALI20070226BHEP Ipc: G02B 5/18 20060101AFI20070226BHEP |
|
| DAX | Request for extension of the european patent (deleted) | ||
| RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: API NANOFABRICATION AND RESEARCH CORP. |
|
| A4 | Supplementary search report drawn up and despatched |
Effective date: 20091014 |
|
| 17Q | First examination report despatched |
Effective date: 20100305 |
|
| RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: ABRAXIS BIOSENSORS, LLC |
|
| RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: POLARIZATION SOLUTIONS, LLC |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
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| 18D | Application deemed to be withdrawn |
Effective date: 20160427 |