EP1741003A4 - Optische filme und herstellungsverfahren dafür - Google Patents

Optische filme und herstellungsverfahren dafür

Info

Publication number
EP1741003A4
EP1741003A4 EP05744565A EP05744565A EP1741003A4 EP 1741003 A4 EP1741003 A4 EP 1741003A4 EP 05744565 A EP05744565 A EP 05744565A EP 05744565 A EP05744565 A EP 05744565A EP 1741003 A4 EP1741003 A4 EP 1741003A4
Authority
EP
European Patent Office
Prior art keywords
making
methods
same
optical films
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP05744565A
Other languages
English (en)
French (fr)
Other versions
EP1741003A2 (de
Inventor
Jian Jim Wang
Xuegong Deng
Anguel N Nikolov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polarization Solutions LLC
Original Assignee
API Nanofabrication and Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/866,416 external-priority patent/US20050275944A1/en
Application filed by API Nanofabrication and Research Corp filed Critical API Nanofabrication and Research Corp
Publication of EP1741003A2 publication Critical patent/EP1741003A2/de
Publication of EP1741003A4 publication Critical patent/EP1741003A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1347—Arrangement of liquid crystal layers or cells in which the final condition of one light beam is achieved by the addition of the effects of two or more layers or cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363—Birefringent elements, e.g. for optical compensation

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mathematical Physics (AREA)
  • Biophysics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Polarising Elements (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
EP05744565A 2004-04-15 2005-04-08 Optische filme und herstellungsverfahren dafür Withdrawn EP1741003A4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US56289004P 2004-04-15 2004-04-15
US10/866,416 US20050275944A1 (en) 2004-06-11 2004-06-11 Optical films and methods of making the same
PCT/US2005/011860 WO2005101112A2 (en) 2004-04-15 2005-04-08 Optical films and methods of making the same

Publications (2)

Publication Number Publication Date
EP1741003A2 EP1741003A2 (de) 2007-01-10
EP1741003A4 true EP1741003A4 (de) 2009-11-11

Family

ID=35150603

Family Applications (1)

Application Number Title Priority Date Filing Date
EP05744565A Withdrawn EP1741003A4 (de) 2004-04-15 2005-04-08 Optische filme und herstellungsverfahren dafür

Country Status (4)

Country Link
EP (1) EP1741003A4 (de)
JP (1) JP4778958B2 (de)
KR (1) KR20070034992A (de)
WO (1) WO2005101112A2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8164721B2 (en) 2003-12-11 2012-04-24 Tan Kim L Grating trim retarders
US20050275944A1 (en) * 2004-06-11 2005-12-15 Wang Jian J Optical films and methods of making the same
US7630133B2 (en) 2004-12-06 2009-12-08 Moxtek, Inc. Inorganic, dielectric, grid polarizer and non-zero order diffraction grating
JP5933910B2 (ja) * 2006-08-15 2016-06-15 ポラリゼーション ソリューションズ エルエルシー 偏光子薄膜及びこの製作方法
US8755113B2 (en) 2006-08-31 2014-06-17 Moxtek, Inc. Durable, inorganic, absorptive, ultra-violet, grid polarizer
KR100808204B1 (ko) 2007-04-10 2008-03-03 엘지전자 주식회사 드럼세탁기
JP5424730B2 (ja) * 2009-06-12 2014-02-26 三菱電機株式会社 光学フィルタの製造方法
US8913321B2 (en) 2010-09-21 2014-12-16 Moxtek, Inc. Fine pitch grid polarizer
US8611007B2 (en) 2010-09-21 2013-12-17 Moxtek, Inc. Fine pitch wire grid polarizer
US8913320B2 (en) 2011-05-17 2014-12-16 Moxtek, Inc. Wire grid polarizer with bordered sections
US8873144B2 (en) 2011-05-17 2014-10-28 Moxtek, Inc. Wire grid polarizer with multiple functionality sections
US8922890B2 (en) 2012-03-21 2014-12-30 Moxtek, Inc. Polarizer edge rib modification
CN103529507B (zh) * 2012-07-06 2016-05-25 三菱电机株式会社 偏振光相位差板以及激光加工机
JP6274916B2 (ja) * 2014-03-10 2018-02-07 キヤノン株式会社 偏光情報取得ユニットを有する撮像装置
KR101944440B1 (ko) * 2016-03-23 2019-01-31 한국과학기술원 3 차원 나노구조체를 이용한 초박막형 위상차 필름, 및 이를 포함하는 디스플레이 디바이스
JPWO2017195810A1 (ja) * 2016-05-11 2019-03-07 Ｓｃｉｖａｘ株式会社 位相差素子、位相差素子製造方法および光学部材
JP6981074B2 (ja) * 2017-07-25 2021-12-15 Ａｇｃ株式会社 光学素子
JP7165029B2 (ja) * 2017-12-05 2022-11-02 信越化学工業株式会社 反射防止積層膜、反射防止積層膜の形成方法、及び眼鏡型ディスプレイ
WO2019203926A1 (en) * 2018-04-16 2019-10-24 Applied Materials, Inc. Multi stack optical elements using temporary and permanent bonding
CN108417719B (zh) * 2018-05-04 2021-08-24 苏州宝澜环保科技有限公司 一种硅基核壳结构光伏电池及其制备方法
WO2019239926A1 (ja) 2018-06-12 2019-12-19 ウシオ電機株式会社 真空紫外光偏光素子、真空紫外光偏光装置、真空紫外光偏光方法及び配向方法
JP6825610B2 (ja) 2018-10-02 2021-02-03 セイコーエプソン株式会社 偏光素子、液晶装置、および電子機器
WO2020210425A1 (en) * 2019-04-11 2020-10-15 Applied Materials, Inc. Patterning of multi-depth optical devices
KR102265168B1 (ko) * 2019-12-30 2021-06-14 백석대학교산학협력단 스트라이프 구조를 이용한 자외선 차단용 자동차 썬팅 필름 및 썬팅 장치
CN114509838B (zh) * 2022-01-05 2023-11-14 中国科学院苏州纳米技术与纳米仿生研究所 氮化镓基激光器及其内氮化镓纳米超结构的制备方法
JP2025077363A (ja) * 2023-11-06 2025-05-19 ウシオ電機株式会社 反射型位相差構造体およびその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4915463A (en) * 1988-10-18 1990-04-10 The United States Of America As Represented By The Department Of Energy Multilayer diffraction grating
EP0582986A2 (de) * 1992-08-10 1994-02-16 Canon Kabushiki Kaisha Halbleitervorrichtung und Herstellungsverfahren

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IT1017022B (it) * 1974-07-02 1977-07-20 Marazzi Ceramica Impianto automatico perfezionato per l essiccazione e la monocot tura rapida di piastrelle cerami che
DE3412958A1 (de) * 1984-04-06 1985-10-17 Dr. Johannes Heidenhain Gmbh, 8225 Traunreut Phasengitter
JPH02230203A (ja) * 1989-03-03 1990-09-12 Nippon Telegr & Teleph Corp <Ntt> 偏光子
US5119231A (en) * 1990-06-15 1992-06-02 Honeywell Inc. Hybrid diffractive optical filter
US5245471A (en) * 1991-06-14 1993-09-14 Tdk Corporation Polarizers, polarizer-equipped optical elements, and method of manufacturing the same
JP3320507B2 (ja) * 1993-06-18 2002-09-03 ティーディーケイ株式会社 回折格子型偏光子とその製造方法
JPH0990122A (ja) * 1995-09-28 1997-04-04 Kyocera Corp グリッド型偏光子の製造方法
JP3654553B2 (ja) * 1997-06-19 2005-06-02 株式会社リコー 光学素子
TW460758B (en) * 1998-05-14 2001-10-21 Holographic Lithography System A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material
JP2000284117A (ja) * 1999-03-30 2000-10-13 Fuji Elelctrochem Co Ltd グリッド偏光子及びその製造方法
TW515032B (en) * 1999-10-06 2002-12-21 Samsung Electronics Co Ltd Method of forming thin film using atomic layer deposition method
US6893500B2 (en) * 2000-05-25 2005-05-17 Atomic Telecom Method of constructing optical filters by atomic layer control for next generation dense wavelength division multiplexer
US6813077B2 (en) * 2001-06-19 2004-11-02 Corning Incorporated Method for fabricating an integrated optical isolator and a novel wire grid structure
JP2003066229A (ja) * 2001-08-28 2003-03-05 Kyocera Corp 縞状偏光子
JP3898597B2 (ja) * 2002-08-19 2007-03-28 信越化学工業株式会社 偏光子および偏光子の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4915463A (en) * 1988-10-18 1990-04-10 The United States Of America As Represented By The Department Of Energy Multilayer diffraction grating
EP0582986A2 (de) * 1992-08-10 1994-02-16 Canon Kabushiki Kaisha Halbleitervorrichtung und Herstellungsverfahren

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
No further relevant documents disclosed *

Also Published As

Publication number Publication date
JP4778958B2 (ja) 2011-09-21
WO2005101112A2 (en) 2005-10-27
JP2007532977A (ja) 2007-11-15
EP1741003A2 (de) 2007-01-10
KR20070034992A (ko) 2007-03-29
WO2005101112A3 (en) 2007-02-08

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Owner name: API NANOFABRICATION AND RESEARCH CORP.

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Owner name: ABRAXIS BIOSENSORS, LLC

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