EP2020672A3 - Hochfrequenzgenerator für Ionen- und Elektronenquellen - Google Patents

Hochfrequenzgenerator für Ionen- und Elektronenquellen Download PDF

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Publication number
EP2020672A3
EP2020672A3 EP08013495A EP08013495A EP2020672A3 EP 2020672 A3 EP2020672 A3 EP 2020672A3 EP 08013495 A EP08013495 A EP 08013495A EP 08013495 A EP08013495 A EP 08013495A EP 2020672 A3 EP2020672 A3 EP 2020672A3
Authority
EP
European Patent Office
Prior art keywords
frequency generator
coupling
resonant circuit
frequency
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP08013495A
Other languages
English (en)
French (fr)
Other versions
EP2020672B1 (de
EP2020672A2 (de
Inventor
Werner Kadrnoschka
Anton Lebeda
Johann Müller
Stefan Weis
Rainer Dr. Killinger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ArianeGroup GmbH
Original Assignee
Astrium GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Astrium GmbH filed Critical Astrium GmbH
Publication of EP2020672A2 publication Critical patent/EP2020672A2/de
Publication of EP2020672A3 publication Critical patent/EP2020672A3/de
Application granted granted Critical
Publication of EP2020672B1 publication Critical patent/EP2020672B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H1/00—Using plasma to produce a reactive propulsive thrust
    • F03H1/0006—Details applicable to different types of plasma thrusters
    • F03H1/0018—Arrangements or adaptations of power supply systems

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Plasma Technology (AREA)
  • Circuit Arrangements For Discharge Lamps (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

Die Erfindung beschreibt eine Vorrichtung zur Einkopplung von lonisationsenergie in eine induktiv oder induktiv-kapazitiv angeregte lonen- oder Elektronenquelle. Die erfindungsgemäße Vorrichtung umfasst folgende Merkmale: ein Entladungsgefäß (4) für ein zu ionisierendes Gas; eine um das Entladungsgefäß (4) gewickelte Koppelspule (5) zur Einspeisung einer zur Plasma-Anregung notwendigen Hochfrequenz-Energie; einen mit der Koppelspule (5) elektrisch gekoppelten Koppelkondensator (22); einen mit der Koppelspule elektrisch gekoppelten Hochfrequenzgenerator (16). Der Hochfrequenzgenerator (16) bildet zusammen mit dem zumindest einen Koppelkondensator (22) einen Resonanzkreis aus. Ferner weist der Hochfrequenzgenerator (16) eine PLL-Regelungsvorrichtung (34) zur automatischen Impedanzanpassung des Resonanzkreises auf, so dass der Resonanzkreis mit einer Resonanzfrequenz betreibbar ist.
EP08013495.0A 2007-08-02 2008-07-26 Hochfrequenzgenerator für Ionen- und Elektronenquellen Active EP2020672B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102007036592.8A DE102007036592B4 (de) 2007-08-02 2007-08-02 Hochfrequenzgenerator für Ionen- und Elektronenquellen

Publications (3)

Publication Number Publication Date
EP2020672A2 EP2020672A2 (de) 2009-02-04
EP2020672A3 true EP2020672A3 (de) 2010-11-10
EP2020672B1 EP2020672B1 (de) 2020-05-06

Family

ID=39944376

Family Applications (1)

Application Number Title Priority Date Filing Date
EP08013495.0A Active EP2020672B1 (de) 2007-08-02 2008-07-26 Hochfrequenzgenerator für Ionen- und Elektronenquellen

Country Status (4)

Country Link
US (1) US8294370B2 (de)
EP (1) EP2020672B1 (de)
DE (1) DE102007036592B4 (de)
RU (1) RU2461908C2 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011076404B4 (de) 2011-05-24 2014-06-26 TRUMPF Hüttinger GmbH + Co. KG Verfahren zur Impedanzanpassung der Ausgangsimpedanz einer Hochfrequenzleistungsversorgungsanordnung an die Impedanz einer Plasmalast und Hochfrequenzleistungsversorgungsanordnung
EP3340746B1 (de) 2016-12-22 2021-05-05 Technische Hochschule Mittelhessen Steuerungseinheit zur steuerung eines hochfrequenzgenerators
KR20180109351A (ko) * 2017-03-28 2018-10-08 엘에스산전 주식회사 비례공명 전류제어기
DE102017107177A1 (de) 2017-04-04 2018-10-04 Tesat-Spacecom Gmbh & Co. Kg Frequenzregelung für einen Frequenzgenerator eines Ionentriebwerks
RU2695541C1 (ru) * 2018-07-02 2019-07-24 Акционерное общество "Концерн "Созвзедие" Устройство ввода энергии в газоразрядную плазму
EP3754187B1 (de) 2019-06-18 2023-12-13 ThrustMe Hochfrequenzgenerator für eine plasmaquelle und verfahren zu dessen einstellung
DE102020106692A1 (de) 2020-03-11 2021-09-16 Analytik Jena Gmbh Generator für die Spektrometrie
CN111577564A (zh) * 2020-06-30 2020-08-25 中国人民解放军国防科技大学 单级复合双脉冲增强电离型感应式脉冲等离子体推力器
DE102020117402A1 (de) 2020-07-01 2022-01-05 Analytik Jena Gmbh Generator für die Spektrometrie
CN118092243B (zh) * 2024-01-26 2024-08-09 佛山市元粒宝智能电器科技有限公司 一种离子量输出控制电路及方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
DE19948229C1 (de) * 1999-10-07 2001-05-03 Daimler Chrysler Ag Hochfrequenz-Ionenquelle
US20030215373A1 (en) * 2002-05-20 2003-11-20 Reyzelman Leonid E. Method and apparatus for VHF plasma processing with load mismatch reliability and stability
US20070114945A1 (en) * 2005-11-21 2007-05-24 Mattaboni Paul J Inductively-coupled RF power source

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5965034A (en) * 1995-12-04 1999-10-12 Mc Electronics Co., Ltd. High frequency plasma process wherein the plasma is executed by an inductive structure in which the phase and anti-phase portion of the capacitive currents between the inductive structure and the plasma are balanced
US5824606A (en) * 1996-03-29 1998-10-20 Lam Research Corporation Methods and apparatuses for controlling phase difference in plasma processing systems
US5770922A (en) * 1996-07-22 1998-06-23 Eni Technologies, Inc. Baseband V-I probe
KR100542459B1 (ko) * 1999-03-09 2006-01-12 가부시끼가이샤 히다치 세이사꾸쇼 플라즈마처리장치 및 플라즈마처리방법
DE10215660B4 (de) * 2002-04-09 2008-01-17 Eads Space Transportation Gmbh Hochfrequenz-Elektronenquelle, insbesondere Neutralisator
JP4901094B2 (ja) * 2004-11-30 2012-03-21 株式会社Ｓｅｎ ビーム照射装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
DE19948229C1 (de) * 1999-10-07 2001-05-03 Daimler Chrysler Ag Hochfrequenz-Ionenquelle
US20030215373A1 (en) * 2002-05-20 2003-11-20 Reyzelman Leonid E. Method and apparatus for VHF plasma processing with load mismatch reliability and stability
US20070114945A1 (en) * 2005-11-21 2007-05-24 Mattaboni Paul J Inductively-coupled RF power source

Also Published As

Publication number Publication date
US20090058303A1 (en) 2009-03-05
EP2020672B1 (de) 2020-05-06
DE102007036592B4 (de) 2014-07-10
DE102007036592A1 (de) 2009-02-19
RU2461908C2 (ru) 2012-09-20
US8294370B2 (en) 2012-10-23
EP2020672A2 (de) 2009-02-04
RU2008131500A (ru) 2010-02-10

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