EP2092092A1 - Verfahren zur zuschneidung der oberflächentopographie eines nanokristallinen oder amorphen metalls oder einer nanokristallinen oder amorphen legierung und mithilfe dieser verfahren hergestellte artikel - Google Patents
Verfahren zur zuschneidung der oberflächentopographie eines nanokristallinen oder amorphen metalls oder einer nanokristallinen oder amorphen legierung und mithilfe dieser verfahren hergestellte artikelInfo
- Publication number
- EP2092092A1 EP2092092A1 EP07875205A EP07875205A EP2092092A1 EP 2092092 A1 EP2092092 A1 EP 2092092A1 EP 07875205 A EP07875205 A EP 07875205A EP 07875205 A EP07875205 A EP 07875205A EP 2092092 A1 EP2092092 A1 EP 2092092A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- etching
- electrochemically
- workpiece
- achieve
- topography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000012876 topography Methods 0.000 title claims abstract description 137
- 238000000034 method Methods 0.000 title claims abstract description 103
- 229910045601 alloy Inorganic materials 0.000 title abstract description 75
- 239000000956 alloy Substances 0.000 title abstract description 75
- 239000005300 metallic glass Substances 0.000 title abstract description 42
- 238000005530 etching Methods 0.000 claims abstract description 273
- 238000000151 deposition Methods 0.000 claims abstract description 155
- 230000008021 deposition Effects 0.000 claims abstract description 92
- 229910052751 metal Inorganic materials 0.000 claims abstract description 51
- 239000002184 metal Substances 0.000 claims abstract description 51
- 238000004070 electrodeposition Methods 0.000 claims abstract description 45
- 238000009826 distribution Methods 0.000 claims abstract description 44
- 229910052709 silver Inorganic materials 0.000 claims abstract description 13
- 239000004332 silver Substances 0.000 claims abstract description 13
- 230000001747 exhibiting effect Effects 0.000 claims description 50
- 238000004519 manufacturing process Methods 0.000 claims description 37
- 239000002707 nanocrystalline material Substances 0.000 claims description 36
- 230000002441 reversible effect Effects 0.000 claims description 22
- 238000000576 coating method Methods 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 19
- 239000007787 solid Substances 0.000 claims description 16
- 210000003041 ligament Anatomy 0.000 claims description 13
- 238000005204 segregation Methods 0.000 claims description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 12
- 230000000694 effects Effects 0.000 claims description 12
- 239000011248 coating agent Substances 0.000 claims description 10
- 229910052721 tungsten Inorganic materials 0.000 claims description 10
- 230000001050 lubricating effect Effects 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 8
- 239000012530 fluid Substances 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 230000001788 irregular Effects 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 238000012545 processing Methods 0.000 abstract description 17
- 238000002310 reflectometry Methods 0.000 abstract description 6
- 230000002596 correlated effect Effects 0.000 abstract description 4
- 238000007747 plating Methods 0.000 abstract description 4
- 238000001228 spectrum Methods 0.000 abstract 1
- 230000008569 process Effects 0.000 description 25
- 239000012071 phase Substances 0.000 description 23
- 150000002739 metals Chemical class 0.000 description 14
- 238000001878 scanning electron micrograph Methods 0.000 description 12
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 11
- 229910052804 chromium Inorganic materials 0.000 description 11
- 239000011651 chromium Substances 0.000 description 11
- 239000000543 intermediate Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- 229910001080 W alloy Inorganic materials 0.000 description 7
- 230000001276 controlling effect Effects 0.000 description 7
- 230000000875 corresponding effect Effects 0.000 description 7
- MOWMLACGTDMJRV-UHFFFAOYSA-N nickel tungsten Chemical compound [Ni].[W] MOWMLACGTDMJRV-UHFFFAOYSA-N 0.000 description 6
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 5
- 239000003086 colorant Substances 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 239000007943 implant Substances 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 238000003672 processing method Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000037361 pathway Effects 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910003296 Ni-Mo Inorganic materials 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910002056 binary alloy Inorganic materials 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000005757 colony formation Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000004049 embossing Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 230000013011 mating Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000003701 mechanical milling Methods 0.000 description 2
- DDTIGTPWGISMKL-UHFFFAOYSA-N molybdenum nickel Chemical group [Ni].[Mo] DDTIGTPWGISMKL-UHFFFAOYSA-N 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000001947 vapour-phase growth Methods 0.000 description 2
- 229910000967 As alloy Inorganic materials 0.000 description 1
- 229910020515 Co—W Inorganic materials 0.000 description 1
- 229910004803 Na2 WO4.2H2 O Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- -1 Sodium tungstate hexahydrate Chemical class 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000012072 active phase Substances 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000004071 biological effect Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- XLYOFNOQVPJJNP-ZSJDYOACSA-N heavy water Substances [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 1
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 238000004439 roughness measurement Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 238000005480 shot peening Methods 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- 229960000999 sodium citrate dihydrate Drugs 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- 238000003325 tomography Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 235000019263 trisodium citrate Nutrition 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H9/00—Machining specially adapted for treating particular metal objects or for obtaining special effects or results on metal objects
- B23H9/008—Surface roughening or texturing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/619—Amorphous layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/08—Etching of refractory metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/14—Etching locally
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US85906706P | 2006-11-15 | 2006-11-15 | |
| PCT/US2007/023939 WO2009035444A1 (en) | 2006-11-15 | 2007-11-14 | Methods for tailoring the surface topography of a nanocrystalline or amorphous metal or alloy and articles formed by such methods |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP2092092A1 true EP2092092A1 (de) | 2009-08-26 |
Family
ID=39941858
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP07875205A Withdrawn EP2092092A1 (de) | 2006-11-15 | 2007-11-14 | Verfahren zur zuschneidung der oberflächentopographie eines nanokristallinen oder amorphen metalls oder einer nanokristallinen oder amorphen legierung und mithilfe dieser verfahren hergestellte artikel |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20100282613A1 (de) |
| EP (1) | EP2092092A1 (de) |
| WO (1) | WO2009035444A1 (de) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2006420A1 (de) * | 2007-06-22 | 2008-12-24 | Danmarks Tekniske Universitet - DTU | Mikroporöse Schicht zur Minderung der Reibung bei Metallverformungsprozessen |
| US9011706B2 (en) * | 2008-12-16 | 2015-04-21 | City University Of Hong Kong | Method of making foraminous microstructures |
| US9522387B2 (en) * | 2012-06-15 | 2016-12-20 | Lawrence Livermore National Security, Llc | Highly active thermally stable nanoporous gold catalyst |
| US9004240B2 (en) | 2013-02-27 | 2015-04-14 | Integran Technologies Inc. | Friction liner |
| US9518335B2 (en) * | 2014-01-02 | 2016-12-13 | City University Of Hong Kong | Method of fabricating improved porous metallic material and resulting structure thereof |
| US9840789B2 (en) | 2014-01-20 | 2017-12-12 | City University Of Hong Kong | Etching in the presence of alternating voltage profile and resulting porous structure |
| DE102014005941A1 (de) * | 2014-04-24 | 2015-11-12 | Te Connectivity Germany Gmbh | Verfahren zum Herstellen eines elektrischen Kontaktelements zur Vermeidung von Zinnwhiskerbildung, und Kontaktelement |
| US10199630B2 (en) * | 2015-08-21 | 2019-02-05 | TOP Battery Co., Ltd | Electrode terminal, electro-chemical device and electro-chemical device comprising same |
| EP3438330B9 (de) | 2017-08-03 | 2024-08-14 | Groz-Beckert KG | Textilmaschinenwerkzeugteil und verfahren zur herstellung eines textilwerkzeugs |
| CN107815720B (zh) * | 2017-09-15 | 2020-04-17 | 广东工业大学 | 一种自支撑还原氧化石墨烯涂层及其制备方法和应用 |
| DK3460102T3 (da) * | 2017-09-21 | 2020-07-13 | Hymeth Aps | Fremgangsmåde til fremstilling af en elektrokatalysator |
| US11492723B2 (en) * | 2019-11-05 | 2022-11-08 | Cilag Gmbh International | Electrolyte solutions for electropolishing of nitinol needles |
| CN114921823B (zh) * | 2021-02-01 | 2024-07-19 | 芜湖美的厨卫电器制造有限公司 | 一种镀层的制备方法、应用该制备方法的电极、家电设备 |
| JP2025502245A (ja) * | 2022-01-14 | 2025-01-24 | エヴォロー インコーポレイテッド | 水電解器のための拡縮可能な（ｓｃａｌａｂｌｅ）電極流れ場およびそれを高速で製造する方法 |
| CN115094460B (zh) * | 2022-07-19 | 2023-08-29 | 同济大学 | 一种碱性电解槽用镍基复合电极及其制备方法 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2260296A (en) * | 1939-09-29 | 1941-10-28 | Bell Telephone Labor Inc | Electrical filter |
| JPS5242134B2 (de) * | 1972-12-30 | 1977-10-22 | ||
| GB1487485A (en) * | 1974-02-05 | 1977-09-28 | Siemens Ag | Method of forming a catalytic layer |
| US4437956A (en) * | 1982-05-19 | 1984-03-20 | The United States Of America As Represented By The United States Department Of Energy | Method for preparing surfaces of metal composites having a brittle phase for plating |
| US4461680A (en) * | 1983-12-30 | 1984-07-24 | The United States Of America As Represented By The Secretary Of Commerce | Process and bath for electroplating nickel-chromium alloys |
| US4977038A (en) * | 1989-04-14 | 1990-12-11 | Karl Sieradzki | Micro- and nano-porous metallic structures |
| US5433797A (en) * | 1992-11-30 | 1995-07-18 | Queen's University | Nanocrystalline metals |
| US5389226A (en) * | 1992-12-17 | 1995-02-14 | Amorphous Technologies International, Inc. | Electrodeposition of nickel-tungsten amorphous and microcrystalline coatings |
| US5616432A (en) * | 1994-06-14 | 1997-04-01 | Ovonic Battery Company, Inc. | Electrochemical hydrogen storage alloys and batteries fabricated from Mg containing base alloys |
| US6080504A (en) * | 1998-11-02 | 2000-06-27 | Faraday Technology, Inc. | Electrodeposition of catalytic metals using pulsed electric fields |
| US20060118425A1 (en) * | 2000-04-19 | 2006-06-08 | Basol Bulent M | Process to minimize and/or eliminate conductive material coating over the top surface of a patterned substrate |
| DE10039596C2 (de) * | 2000-08-12 | 2003-03-27 | Omg Ag & Co Kg | Geträgerte Metallmembran, Verfahren zu ihrer Herstellung und Verwendung |
| US6558231B1 (en) * | 2000-10-17 | 2003-05-06 | Faraday Technology Marketing Goup, Llc | Sequential electromachining and electropolishing of metals and the like using modulated electric fields |
| WO2004005193A2 (en) * | 2002-07-03 | 2004-01-15 | Xintek, Inc. | Fabrication and activation processes for nanostructure composite field emission cathodes |
| DE10326788B4 (de) * | 2003-06-13 | 2005-05-25 | Robert Bosch Gmbh | Kontaktoberflächen für elektrische Kontakte und Verfahren zur Herstellung |
| KR20050074283A (ko) * | 2004-12-27 | 2005-07-18 | 진텍, 인크. | 나노구조 복합체 전계 방출 음극에 대한 제조 및 활성화방법 |
| US7758708B2 (en) * | 2006-07-31 | 2010-07-20 | The Governors Of The University Of Alberta | Nanocomposite films |
-
2007
- 2007-11-14 EP EP07875205A patent/EP2092092A1/de not_active Withdrawn
- 2007-11-14 WO PCT/US2007/023939 patent/WO2009035444A1/en not_active Ceased
- 2007-11-15 US US11/985,569 patent/US20100282613A1/en not_active Abandoned
Non-Patent Citations (1)
| Title |
|---|
| See references of WO2009035444A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2009035444A1 (en) | 2009-03-19 |
| US20100282613A1 (en) | 2010-11-11 |
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