EP2319947A1 - Kupferlegierungsmaterial für elektrische und elektronische bauteile sowie herstellungsverfahren dafür - Google Patents
Kupferlegierungsmaterial für elektrische und elektronische bauteile sowie herstellungsverfahren dafür Download PDFInfo
- Publication number
- EP2319947A1 EP2319947A1 EP09803032A EP09803032A EP2319947A1 EP 2319947 A1 EP2319947 A1 EP 2319947A1 EP 09803032 A EP09803032 A EP 09803032A EP 09803032 A EP09803032 A EP 09803032A EP 2319947 A1 EP2319947 A1 EP 2319947A1
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- EP
- European Patent Office
- Prior art keywords
- copper alloy
- alloy material
- mass
- heat treatment
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
- H01B1/023—Alloys based on aluminium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/06—Alloys based on copper with nickel or cobalt as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/10—Alloys based on copper with silicon as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/08—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
Definitions
- the present invention relates to a part for an electric/electronic equipment, for example, a connector, a terminal material, and the like. Especially, the present invention relates to a copper alloy material applicable to electric/electronic parts, such as a high-frequency relay and a switch, which are desired to be high in electrical conductivity, or to a connector, a terminal material, which are, for example, mounted in vehicles, and a lead frame.
- Corson copper for example, C70250
- Cxxxxx denotes types of copper alloys specified in CDA (Copper Development Association).
- a copper alloy which has an electrical conductivity higher than that of a conventional Corson copper, and a tensile strength and a bending property at the same level of those of the conventional Corson copper.
- a Cu-Co (cobalt)-Si (silicon) series alloy is attracting attention.
- This Cu-Co-Si series alloy is a precipitation strengthening type copper alloy utilizing an intermetallic compound between Co and Si.
- a connector or terminal having such a design concept is, in many cases, referred to as bellows (corrugated) bent connector or bellows bent terminal. That is, there is a strong demand for the mounting and installation of terminals or connectors that are bent in a complicated manner in small parts.
- the material of connectors and terminals to be used is becoming thinner concomitantly with the size reduction. This trend is furthered from the viewpoint of weight reduction and resource saving. Thin materials are demanded to have higher mechanical strength as compared with thick materials, in order to maintain the same contact pressure.
- Corson copper or titanium copper generally does not have an electrical conductivity of 50 %IACS or higher.
- materials having high electrical conductivity are generally excellent in the thermal conduction property as well, materials for the sockets or heat sinks of central processing units (CPU; integrated logic elements), which require heat emission properties, are also required to have high electrical conductivity.
- CPU central processing units
- modern hybrid cars or CPUs handling high speed processing are required to use materials having high electrical conductivity and high mechanical strength.
- Copper alloys which have mechanical strength, bending property and electrical conductivity (thermal conductivity) and use an intermetallic compound containing Co and Si, are increasingly attracting attention. Copper alloys essentially containing Co and Si are known as shown below.
- Patent Literature 1 is a copper alloy containing sulfur (S) as an essential constituent element, unlike the present invention, and the purpose of the technique is to enhance hot workability, unlike the present invention.
- Patent Literature 1 does not have any description on precipitates (particularly, a precipitate of Co and Si), does not clarify what the precipitate is like, and does not clearly describe a method of controlling these. Furthermore, the results of evaluating various properties such as mechanical strength and electrical conductivity required of electric/electronic parts are not described.
- Patent Literature 2 has a description that the precipitate of Co and Si is a Co 2 Si compound, but the details of the precipitate (such as particle size) or the controlling method is not clearly described.
- Patent Literature 3 also has a description that the precipitate of Co and Si is a Co 2 Si compound; however, the details of the precipitate (particle size and the like) or the controlling method is not clearly described, and the electrical conductivity is relatively low, such as 30 %IACS or less.
- Patent Literature 6 also has a description that the precipitate of Co and Si is a Co 2 Si compound, but the details of the precipitate (particle size and the like), the controlling method or the density is not clearly described. Furthermore, in regard to the production method, it is described that a heat treatment at 700°C to 1,050°C is carried out before the final rolling, but it is also described that the compound precipitated at this temperature is re-solid-dissolved (solution treatment temperature). Thus, it is not clearly described whether a precipitate of Co and Si is present after all. As a result, it is thought that the properties of the copper alloy are not satisfactory as the properties of a copper alloy for use in electrical/electronic parts where high electrical conductivity and high mechanical strength are required.
- R an inner bending radius of the material
- t a sheet thickness
- Patent Literatures 1 to 6 have matters that are not clearly discussed or that are described in a contradictory manner. Therefore, materials having high electrical conductivity and high mechanical strength cannot be obtained only based on the techniques disclosed in the patent literatures described above, and furthermore, materials that have satisfactory properties, including the stress relaxation resistance (creep resistance), cannot be obtained.
- the present invention is, first, contemplated for providing a copper alloy material suitable for connectors, terminal materials, relays, and the like, which is excellent in electrical conductivity and mechanical strength, and is also excellent in stress relaxation resistance.
- the present invention is, second, contemplated for providing a copper alloy material which is excellent in electrical conductivity, mechanical strength, solder wettability, solder adhesive strength, and bending property, and is suitable for the use in connectors, terminal materials, relays, and the like.
- the present invention is, third, contemplated for providing a copper alloy material which has the value of the grain size of a Cu-Co-Si series copper alloy controlled to a predetermined range, so as to satisfy all of high electrical conductivity, high mechanical strength, and satisfactory bending property.
- the inventors of the present invention found a particular suitable relationship that controls the size and density of the precipitate in connection with an attempt to obtain a copper alloy material having excellent electrical conductivity and mechanical strength as well as excellent stress relaxation resistance, and further conducted an investigation to finally complete the present invention. Furthermore, the inventors of the present invention conducted further investigations on the relationship between electrical conductivity, mechanical strength, bending property, solder wettability, and solder adhesive strength in a copper alloy material, in order to obtain a copper alloy material suitable for the use in electric/electronic parts where particularly high electrical conductivity and high mechanical strength are required, and thus completed the present invention.
- a second embodiment of the present invention means to include the copper alloy materials for electric/electronic parts described in the above items (7) to (9) and the method of producing a copper alloy material for electric/electronic parts described in the above item (10).
- a third embodiment of the present invention means to include the copper alloy materials described in the above items (11) to (14).
- the present invention means to include all of the above first, second, and third embodiments, unless otherwise specified.
- the stress relaxation ratio is measured by a cantilever method according to the Japan Copper and Brass Association Technical Standards "JCBA T309:2001 (provisional)".
- the material may be said to be a satisfactory material without a decrease in the contact pressure occurring when the copper alloy material is used in a connector.
- particle diameter (size) of the precipitate refers to an average particle size of the precipitate determined by a method that will be described below
- grain size refers to a value measured based on JIS-H0501 (cutting method) that will be described below.
- the first embodiment of the present invention can provide a copper alloy material favorable for the use in electric/electronic equipments, which is excellent in mechanical strength, conductivity, and stress relaxation resistance.
- the second embodiment of the present invention can provide a copper alloy material favorable for the use in electric/electronic equipments, which is high in mechanical strength and electrical conductivity, and is excellent in solder wettability, solder adhesive strength and bending property.
- the third embodiment of the present invention can provide a copper alloy material favorable for the use in electric/electronic equipments, which is excellent in mechanical strength, electrical conductivity, and bending property.
- the term "copper alloy material” means a product obtained after a copper alloy base material (herein, the copper alloy base material means a mixture of component elements of a copper alloy not having the concept of shape) is processed into a predetermined shape (for example, sheet, strip, foil, rod, or wire).
- the term "copper alloy of matrix” means a copper alloy not having the concept of shape.
- a sheet material and a strip material as a preferable specific examples of the copper alloy material, but the shape of the copper alloy material is not limited to the sheet material or the strip material.
- the essential additive elements are Co (cobalt) and Si (silicon).
- the addition amount of these elements is set at 0.5 to 2.0 mass% and the addition amount of Si at 0.1 to 0.5 mass%, because these elements form an intermetallic compound of Co 2 Si and contribute to precipitation strengthening, as mentioned above. If the content of Co is less than 0.5 mass%, since the precipitation strengthening degree is small, the target mechanical strength of 550 MPa cannot obtained.
- the content of Co is more than 2.0 mass%, the solution heat temperature becomes high, and the effect due to Co is saturated. Furthermore, from a stoichiometric proportion, the optimum addition ratio of the compound is Co/Si nearly equals to 4.2, and the addition amount of Si is set not to be much deviated from this value (specifically, to fall in the range of 3.5 ⁇ Co/Si ⁇ 4.8).
- a preferable addition amount of Co varies with the temperature, at which the recrystallization heat treatment is carried out.
- the addition amount of Co is preferably in the range from 0.5 to 1.2 mass%
- the addition amount of Co is preferably in the range of 1.0 to 2.0 mass%. This is determined from the grain size of the copper alloy that is the matrix of the copper alloy material that will be defined below.
- the temperature, at which the recrystallization heat treatment is carried out may be 800 to 1,025°C, and in the case where the addition amount of Co is 1.0 to 2.0 mass%, the temperature, at which the recrystallization heat treatment is carried out, can be set at 900 to 1,025°C.
- the grain size of the copper alloy that serves as the matrix of the copper alloy material is set in the range of 3 to 35 ⁇ m. This is because when the grain size is 3 ⁇ m or more, there is no risk that there would be mixed grains including unrecrystallization where insufficient recrystallized portions are observed, and bending property is enhanced. Furthermore, when the grain size is 35 ⁇ m or less, the grain boundary density is high, and the bending stress (loaded strain) can be sufficiently absorbed, thereby the bending property being enhanced.
- the grain size is preferably 3 to 20 ⁇ m, and more preferably 10 to 20 ⁇ m.
- the electrical conductivity of the copper alloy material is 50 %IACS or more.
- %IACS is a unit which indicates an electrical conductivity of a material and the term “IACS” is an abbreviation of "International Annealed Copper Standard”.
- This property is a property obtained preferably, for example, by setting the addition amount of Co or Si in the range described above, and precipitating the intermetallic compound of Co 2 Si, or the like.
- the electrical conductivity is more preferably 55 %IACS or more, and even more preferably 60 %IACS or more, and it is preferable that the electrical conductivity is as high as possible, but the upper limit is generally approximately 75 %IACS.
- the copper alloy material In order to enhance the electrical conductivity, it is preferable to cool the copper alloy material while keeping the cooling speed from the temperature of the aging heat treatment that precipitates the precipitate in the range of 20 to 100 K/hour (herein, the term “K” indicates “Kelvin” which represents an absolute temperature; hereinafter, the same applies), and to keep the cooling speed until the temperature reaches 300°C.
- K indicates "Kelvin” which represents an absolute temperature; hereinafter, the same applies
- the tensile strength of the copper alloy material is defined to be 550 MPa or more. This tensile strength is more preferably 600 MPa or more, and even more preferably 750 MPa or more, and it is preferable that the tensile strength is as high as possible, but the upper limit is generally approximately 900 MPa.
- the particle size (average particle size) of the precipitate composed of Co and Si is defined to be 5 to 50 nm.
- the particle size of the precipitate is 5 nm or more, a sufficient precipitate strengthening degree can be obtained. Furthermore, since this precipitate precipitates out coherently to the copper matrix and strengthens the material, when the particle size of the precipitate is 50 nm or less, the mechanical strength of the material is secured.
- the size of the precipitate is 10 to 30 nm, and more preferably 20 to 30 nm.
- the distribution density of the precipitate composed of Co and Si is defined to be 1 ⁇ 10 8 to 10 10 number/mm 2 .
- the stress relaxation ratio after a lapse of 1,000 hours in an air atmosphere at a temperature of 150°C is preferably less than 40%.
- the precipitation density is correlated with the addition amount of Co. When the addition amount of Co is adjusted to 0.5 mass% or more, even if the particle size of the precipitate is as fine (approximately 5 nm) as to an acceptable extent, the distribution density falls in the range described above.
- the addition amount of Co is 2.0 mass% or less, even if the particle size of the precipitate is as coarse (approximately 50 nm) as to an acceptable extent, the distribution density falls in the range mentioned above.
- the precipitation density is 1 ⁇ 10 8 to 8 ⁇ 10 8 number/mm 2 in the case where the addition amount of Co is 0.5 to 1.0 mass%, 5 ⁇ 10 8 to 7 ⁇ 10 9 number/mm 2 in the case where the addition amount of Co is 1.0 to 1.5 mass%, and 1 ⁇ 10 9 to 10 10 number/mm 2 in the case where the addition amount of Co is 1.5 to 2.0 mass%.
- the addition of Sn and Mg is effective in improving the stress relaxation resistance. Although the effect may be shown by individual addition of Sn and Mg, these elements exhibit the effect synergistically by adding them simultaneously.
- the addition amount of Sn and Mg is such that the addition amount of at least one kind of these elements is 0.1 mass% or more in total, the effect is markedly exhibited, and when the addition amount is 0.5 mass% or less in total, there is no adverse effect such as a decrease in electrical conductivity.
- the addition ratio is such that Sn/Mg ⁇ 1, the stress relaxation resistance tends to be further enhanced.
- Zn and Mn improve the property by solid solution strengthening.
- the addition amount of at least one kind thereof is adjusted to 0.1 to 0.5 mass% in total.
- the addition amount of Zn and Mn is preferably such that the addition amount of at least one of these elements is 0.2 to 0.4 mass% in total.
- Fe, Cr and Ni are elements that contribute to enhance the mechanical strength by being replaced with Co and forming a compound with Si.
- These elements also have an effect of making the grain size fine. Therefore, the addition amount of at least one kind of these elements (which may be any of the cases of individual elements, a combination of any two kinds of the elements, and a combination of all three kinds of the elements) is adjusted to the range from 0.1 to 1.0 mass% in total.
- the addition amount is 0.1 mass% or more, the effect due to the elements is noticeably exhibited, and when the addition amount is 1.0 mass% or less in total, there is no chance of causing crystallization during casting or forming an intermetallic compound that does not contribute to mechanical strength, and there is no adverse effect such as a decrease in electrical conductivity. Furthermore, these elements provide almost the same effect even if the elements are added in combination or added individually; however, when Ni is added, a remarkable effect of enhancing the mechanical strength is exhibited.
- the addition amount of Fe, Ni and Cr is preferably such that the addition amount of at least one kind of the elements is 0.5 to 0.8 mass% in total. Examples of inevitable impurities in the copper alloy material according to the first embodiment of the present invention include H, C, O, S and the like.
- the recrystallization heat treatment temperature prior to the final rolling is preferably set at 800 to 1,000°C in consideration of the effects of partial melting or deformation of the material. More preferably, the upper limit is lower than 950°C. This is because it is preferable to set the recrystallization heat treatment temperature at 800°C or higher in order to achieve sufficient solution and recrystallization of the above-mentioned elements such as Co, and when the recrystallization heat treatment temperature is 1,000°C or lower, the risk of generation of partial melting or shape deformation of the material is decreased.
- the recrystallization heat treatment is set at 800 to 900°C, and when the addition amount of Co is 1.0 to 1.5 mass%, the recrystallization heat treatment is set at 900 to 950°C (not including 950°C).
- the addition amount of Co is 1.5 mass% or more (2.0 mass% or less)
- This cooling speed means an average cooling speed from the temperature of high temperature heat treatment to 300°C.
- an aging heat treatment for forming a compound of Co and Si is carried out.
- the aging heat treatment may be carried out after the recrystallization heat treatment, or after a predetermined cold rolling is carried out.
- the condition for this aging heat treatment is such that in the case of conducting the aging heat treatment after the recrystallization heat treatment and before the final cold rolling, a condition of a temperature from 500 to 600°C and a time period from 1 to 4 hours is preferable, on the other hand, in the case of conducting the aging heat treatment after the final cold rolling and before the recrystallization heat treatment, a condition of a temperature from 450 to 550°C and a time period of 1 to 4 hours is preferable.
- the cooling speed after this aging heat treatment is set at 20 to 100 K/hour, in order that the cooling speed contributes to an enhancement of electrical conductivity.
- the temperature range, in which cooling is carried out at the cooling speed mentioned above, is preferably adjusted to the cooling range from the recrystallization heat treatment temperature to 300°C.
- the material temperature is lowered to below 300°C, the material may be rapidly cooled without any problem.
- the cooling speed after the aging heat treatment can be adjusted by controlling the temperature at a heating furnace.
- the rapid cooling can be conducted by taking out the subject from a heating zone of the heating furnace and subjecting the subject to forced air cooling or water quenching.
- a copper alloy ingot having a predetermined size is obtained by melting copper, cobalt, silicon, and the like, which are the raw materials of the target copper alloy, pouring the resultant melt alloy into a mold, followed by casting under cooling at a cooling speed from 10 to 30 K/sec.
- the ingot has, for example, a size of 30 mm in thickness, 100 mm in width, and 150 mm in length.
- this ingot is kept at a temperature from 930 to 1,050°C (preferably 950 to 1,050°C) for 30 minutes to 60 minutes, followed by working by hot rolling, and quenching by water cooling (rapid cooling) immediately, further followed by milling the rolled surface to remove an oxide layer on the surface, and cold rolling.
- 930 to 1,050°C preferably 950 to 1,050°C
- a recrystallization heat treatment is carried out for a certain time period in a salt bath (salt bath furnace) kept at a temperature of 800 to 1,025°C, followed by quenching by water cooling.
- the heat treatment is carried out by adjusting the temperature raising speed by interposing the subject between stainless steel plates having different plate thicknesses.
- a preferable temperature raising speed in this occasion is 10 to 300 K/sec at a temperature of 300°C or higher.
- a preferable cooling speed is 50 to 200 K/sec.
- an aging heat treatment is carried out at a temperature from 500 to 600°C for 1 to 4 hours.
- the temperature raising speed from room temperature to the highest temperature in that occasion is in the range from 5 to 50 K/min.
- temperature lowering cooling is carried out inside the furnace at a speed in the range from 20 to 100 K/minute until the temperature reaches 300°C, which is a temperature sufficiently lower than the temperature zone considered to affect the precipitation.
- the copper alloy material that has been subjected to the aging heat treatment is further subjected to a final cold rolling (finish rolling) at a working ratio from 0 to 40%, and thus a finish rolled material is obtained. It is not necessarily required to carry out the finish rolling.
- a working ratio of 0% means that the finish rolling is not carried out.
- the copper alloy material After completion of the aging heat treatment (in the case of conducting the finish rolling, after completion of the finish rolling), the copper alloy material is subjected to strain-relieving annealing, according to the necessity.
- Each of the recrystallization heat treatment, the aging heat treatment and the cold rolling may be repeated two or more times under the conditions described above, respectively, and the sequence of conducting these steps may be changed.
- the essential additive elements are Co (cobalt) and Si (silicon).
- the addition amounts of these elements are set at 0.5 to 2.0 mass% for Co and 0.1 to 0.5 mass% for Si, because when these elements form an intermetallic compound of Co 2 Si and contribute to precipitation strengthening, if the addition Co is set at 0.5 mass% or more, the precipitation strengthening degree becomes large, and therefore, the mechanical strength of the copper alloy material can be adjusted to 550 MPa or more and when the addition amount of Co is 2.0 mass% or less, the solution heat treatment temperature can be set in a proper range.
- the optimum addition ratio of the compound is Co/Si nearly equals to 4.2, and the addition amount of Si is set not to be much deviated from this value (specifically, to fall in the range of 3.5 ⁇ Co/Si ⁇ 4.8).
- a preferable addition amount of Co varies with the temperature, at which the recrystallization heat treatment is carried out.
- the addition amount of Co is preferably in the range from 0.5 to 1.2 mass%
- the addition amount of Co is preferably in the range from 1.0 to 2.0 mass%. This is determined from the grain size of the copper alloy that will be defined below.
- the reason for setting the grain size of the copper alloy of the matrix at 3 to 35 ⁇ m and the preferable range of the grain size in the second embodiment of the present invention, are the same as those mentioned in the first embodiment of the present invention.
- the electrical conductivity of the copper alloy material is 50 %IACS or more.
- the addition amount of Co or Si is set in the range described above and the intermetallic compound of Co 2 Si is precipitated. As a result, this property can be obtained.
- the electrical conductivity is more preferably 55 %IACS or more, and even more preferably 60 %IACS or more, and it is preferable the electrical conductivity is as high as possible, but the upper limit is generally approximately 75 %IACS.
- the tensile strength of the copper alloy material is defined to be 550 MPa or more.
- the tensile strength is more preferably 600 MPa or more, and even more preferably 750 MPa or more, and it is preferable that the tensile strength is as high as possible, but the upper limit is generally approximately 900 MPa.
- a preferable condition is such that cooling is performed at a speed of 10 to 80 K/hour (herein, the term “K” indicates “Kelvin” which represents an absolute temperature; hereinafter, the same applies) until the temperature of the copper alloy material reaches 300°C after the aging heat treatment.
- K indicates "Kelvin” which represents an absolute temperature; hereinafter, the same applies
- the speed of cooling from 300°C to room temperature may be carried out by that of air cooling (spontaneous cooling).
- the particle size (average particle size) of the precipitate composed of Co and Si is adjusted to 5 to 50 nm for the same reasons as those mentioned for the first embodiment of the present invention. If the particle size of the precipitate is large, there is a risk that the solder adhesiveness may be deteriorated, but when the particle size is in the range from 5 to 50 nm, the solder adhesiveness is excellent.
- the size of precipitate is 10 to 35 nm, more preferably 15 to 30 nm.
- the second embodiment of the present invention when Sn, Mg and Zn are added, the properties can be enhanced due to solid solution strengthening. Therefore, in the second embodiment of the present invention, at least one kind of Sn, Mg and Zn (which may be any of the cases of individual elements, a combination of any two kinds of elements, and a combination of all three kinds of the elements) is added in an amount from 0.1 to 1.0 mass% in total. The reason is because when the total addition amount of at least one kind of these elements is 0.1 mass% or more, the effect due to the elements is noticeably exhibited, and when the total addition amount is 1.0 mass% or less, there is no adverse effect such as a decrease in electrical conductivity.
- the total addition amount of at least one kind of these elements is preferably 0.2 to 0.4 mass%.
- Sn and Mg have an effect of improving the stress relaxation resistance (creep resistance), and when both of them are added, the effect of improvement is high.
- Mg has an effect of improving hot workability
- Zn has a marked effect of suppressing a change over time in the solder adhesiveness (deterioration property).
- the inevitable impurities in the copper alloy material of the second embodiment of the present invention include H, C, O, S, and the like which are the same as the inevitable impurities for the copper alloy material of the first embodiment.
- Fe, Cr and Ni are elements that contribute to enhance the mechanical strength by being replaced with Co to form a compound with Si, as in the first embodiment of the present invention. Preferable contents of these elements are also the same as those of the first embodiment of the present invention.
- the surface roughness is defined such that Ra is 0.2 ⁇ m or less and Rt is 2 ⁇ m or less.
- the copper alloy material according to the second embodiment of the present invention is excellent in solder wettability, and as a result, the solder adhesive strength becomes good.
- Ra and Rb are as small as possible, and preferably, Ra is 0.15 ⁇ m or less, while Rt is 1.5 or less, and more preferably Ra is 0.1 ⁇ m or less, while Rt is 1.0 or less.
- Ra and Rt are respectively measured based on JIS B 0601-2001.
- a copper alloy ingot is obtained by melting copper, cobalt, silicon, and the like, which are the raw materials of the target copper alloy, pouring the resultant melt alloy into a mold, followed by casting under cooling at a cooling speed from 10 to 30 K/sec.
- the ingot has, for example, a size of 30 mm in thickness, 100 mm in width, and 150 mm in length.
- this ingot is kept at a temperature from 930 to 1,050°C (preferably 950 to 1,050°C) for 30 minutes to 60 minutes, followed by working by hot rolling, and quenching by water cooling (rapid cooling) immediately, further followed by milling the rolled surface to remove an oxide layer on the surface, and cold rolling.
- 930 to 1,050°C preferably 950 to 1,050°C
- a recrystallization heat treatment is carried out for a certain time period in the salt bath (salt bath furnace) kept at a temperature of 800 to 1,025°C, followed by quenching by water cooling.
- the heat treatment is carried out by adjusting the temperature raising speed by interposing the subject between stainless steel plates having different plate thicknesses.
- a preferable temperature raising speed in this occasion is 10 to 300 K/sec at a temperature of 300°C or higher.
- a preferable cooling speed is 30 to 200 K/sec.
- the temperature raising speed from room temperature to the highest temperature in that occasion is in the range from 5 to 50 K/min.
- temperature lowering cooling is carried out inside the furnace at a speed in the range from 1 to 10 K/minute until the temperature reaches 300°C, which is a temperature sufficiently lower than the temperature zone considered to affect the precipitation.
- the material surface is washed with acid before the final cold rolling to thereby dissolve and remove copper oxide and the like that are present on the material surface, and then the material surface after the acid washing is grinded.
- the acid used in the acid dissolving include mixed dilutions of hydrochloric acid, nitric acid, phosphoric acid and hydrofluoric acid.
- the method of surface grinding after the acid washing can be carried out according to a conventional method. For example, it is preferable to grind 0.2 to 2 mm of both surfaces of the material by means of mechanical means or the like.
- the copper alloy material that has been subjected to the acid dissolving and the following grinding is further subjected to a final cold rolling at a working ratio from 0 to 40%, and thus a finish rolled material is obtained. It is not necessarily required to carry out the finish rolling.
- a working ratio of 0% means that the finish rolling is not carried out.
- the copper alloy material After completion of the aging heat treatment (in the case of conducting the finish rolling, after completion of the finish rolling), the copper alloy material is subjected to strain-relieving annealing, according to the necessity.
- Each of the recrystallization heat treatment, the aging heat treatment and the cold rolling may be repeated two or more times under the conditions described above, respectively, and the sequence of conducting these steps may be changed.
- the copper alloy material contains, as an essential additive element, Co (cobalt) in an amount of 0.7 to 2.0 mass%, and Si (silicon) in an amount in the range such that the mass ratio of Co to Si (Co/Si) is from 3 to 5 (preferably in the range from 0.1 to 0.5 mass%).
- the copper alloy material has an electrical conductivity of 60 %IACS or more and a tensile strength of 570 MPa or more, and the requirements of high electrical conductivity and high mechanical strength can be satisfied at a particularly high level.
- the electrical conductivity of the copper alloy material is set at 50 %IACS or higher.
- the electrical conductivity is more preferably 55 %IACS or more, and even more preferably 60 %IACS or more, and it is preferable that the electrical conductivity is as high as possible, but the upper limit is generally approximately 75 %IACS.
- the tensile strength of the copper alloy material is defined to be 550 MPa or more.
- the tensile strength is more preferably 600 MPa or more, and even more preferably 750 MPa or more, and it is preferable the tensile strength is as high as possible, but the upper limit is generally approximately 900 MPa.
- the arithmetic mean of the grain size of the copper alloy of the matrix is 3 to 20 ⁇ m and the standard deviation is 8 ⁇ m or less, it is useful for further enhancement of bending property.
- the standard deviation is as small as possible, and it is more preferable that the standard deviation of the grain size have a smaller value than that of the arithmetic mean of the grain size.
- the value, obtained by subtracting the standard deviation from the arithmetic mean of the grain size of the copper alloy of the matrix is more than 0 ⁇ m, and it is more preferable that the value, obtained by dividing the standard deviation by the arithmetic mean, is 0.65 or less, and furthermore preferably 0.4 or less.
- the lower limit of the value, obtained by dividing the standard deviation by the arithmetic mean is 0.2 or more, and if the value is smaller than this value, the properties are enhanced, but there is a tendency that the actual production become difficult.
- the measurement parameter used for determining the arithmetic mean and standard deviation of the grain size of the copper alloy of the matrix, at 100 or more, and it is more preferable to set the measurement parameters of the arithmetic mean and standard deviation to be of the same value.
- the value of R/t is preferably 0.5 or less; when the tensile strength is more than 650 MPa to 700 MPa, the value of R/t is preferably 1.0 or less; and when the tensile strength is more than 700 MPa, the value of R/t is preferably 1.5 or less.
- R/t means a result obtained by conducting a W bending test at a bending angle of 90° according to the "Standard test method of bend formability for sheets and strips of copper and copper alloys (JBMA T307)" of the Japan Copper and Brass Association Technical Standards and means a value obtained by subjecting a sheet material cut out in a direction perpendicular to rolling, to a bending test under the condition of a predetermined bending radius (R), determining the R value of the limit at which any crack (breakage) does not occur at the top, and normalizing the value by the sheet thickness (t). In general, a smaller value of R/t gives more satisfactory bending property. In the copper alloy material for electric/electronic parts of the present invention, it is preferable that the tensile strength and bending property (R/t) have the relationship described above. Furthermore, the lower limit of the bending property (R/t) is 0.
- Fe, Cr and Ni are elements that contribute to enhance the mechanical strength by being replaced with Co and forming a compound with Si.
- the addition amount of at least one kind of these elements (which may be any of the cases of individual elements, a combination of any two kinds of the elements, and a combination of all three kinds of the elements) is adjusted to the range from 0.01 to 1.0 mass% in total.
- the addition amount is 0.01 mass% or more, the effect due to the elements is noticeably exhibited, and when the addition amount is 1.0 mass% or less in total, there is no chance of causing crystallization during casting or forming an intermetallic compound that does not contribute to mechanical strength, and there is no adverse effect such as a decrease in electrical conductivity. Furthermore, these elements provide almost the same effect even if the elements are added in combination or added individually; however, when Ni is added, a remarkable effect of enhancing the mechanical strength is exhibited.
- the addition amount of Fe, Ni and Cr is preferably such that the addition amount of at least one kind of the elements is 0.05 to 0.9 mass% in total.
- Zr or Ti also provides almost the same effects as Fe, Ni and Cr, but Zr or Ti is prone to be oxidized, and when added in a large amount, crack may occur in a material during the production.
- the addition amount of Zr and Ti it is preferable to set the addition amount of at least one kind of these elements in the range from 0.01 to 0.1 mass% in total.
- Sn, Zn, Mg and Mn have a feature of being solid-dissolved in the copper matrix and strengthening the copper alloy material.
- the addition amount of at least one kind of these elements is 0.01 mass% or more in total, the effect due to these elements is exhibited, and when the addition amount is 1.0 mass% or less, the electrical conductivity is not decreased.
- a preferred addition amount is 0.05 to 0.2 mass% for at least one kind of these elements.
- the inevitable impurities in the copper alloy material of the third embodiment of the present invention include H, C, O, S, and the like which are the same as the inevitable impurities for the copper alloy material of the first or second embodiment.
- Zn also has an effect of enhancing solder adhesiveness
- Mn also has an effect of improving hot workability.
- the addition of Sn and Mg is effective in an improvement of the stress relaxation resistance.
- the same effect can also be obtained by adding Sn and Mg individually, but when the elements are added simultaneously, these elements exhibit the effect synergistically.
- the addition amount of at least one kind of these elements is 0.1 mass% or more in total, the effect due to the element is exhibited.
- the addition amount is 1.0 mass% or less, the electrical conductivity of the copper alloy material is not decreased, and an electrical conductivity of 50 %IACS or more is secured.
- the addition ratio of Sn and Mg where Sn/Mg ⁇ 1, the stress relaxation resistance is further enhanced.
- a copper alloy ingot is obtained by melting copper, cobalt, silicon, and the like, which are the raw materials of the target copper alloy, pouring the resultant melt alloy into a mold, followed working by casting under cooling at a cooling speed from 10 to 30 K/sec (herein, the term “K” indicates “Kelvin” which represents an absolute temperature; hereinafter, the same applies), to obtain the ingot having a size of 160 mm in width, 30 mm in thickness, and 180 mm in length.
- the thus-obtained ingot is kept at a temperature of 900 to 1,000°C for 30 minutes to 60 minutes, followed by working by hot rolling to be a thickness 12 mm, and quenching by water cooling (rapid cooling) immediately, further, in order to remove an oxide layer on the surface, followed by face-milling to reduce approximately 1 mm of the rolled surfaces to be a thickness approximately 10 mm and cold rolling to be a thickness approximately 0.1 to 0.3 mm.
- a recrystallization heat treatment is carried out for a certain time period (30 seconds, in this case) in the salt bath (salt bath furnace) kept at a temperature of 800 to 1,025°C, followed by quenching by water cooling.
- the heat treatment is carried out by adjusting the temperature raising speed by interposing the subject between stainless steel plates having different plate thicknesses.
- a preferable temperature raising speed in this occasion is 10 to 300 K/sec at a temperature of 300°C or higher.
- a preferable cooling speed is 30 to 200 K/sec.
- an aging heat treatment is carried out at a temperature of 525°C for 120 minutes.
- the temperature raising speed from room temperature to the highest temperature in that occasion is in the range from 3 to 25 K/min.
- temperature lowering cooling is carried out inside the furnace at a speed in the range from 1 to 2 K/minute until the temperature reaches 300°C, which is a temperature sufficiently lower than the temperature zone considered to affect the precipitation.
- the copper alloy material that has been subjected to the aging heat treatment is further subjected to a final cold rolling at a working ratio from 0 to 40% (the upper limit is preferably 20%), and thus a finish rolled material is obtained. It is not necessarily required to carry out the finish rolling.
- a working ratio of 0% means that the finish rolling is not carried out.
- the copper alloy material After completion of the aging heat treatment (in the case of conducting the finish rolling, after completion of the finish rolling), the copper alloy material is subjected to strain-relieving annealing, according to the necessity.
- Each of the recrystallization heat treatment and the aging heat treatment may be repeated two or more times under the conditions described above.
- the grain size of grains and the distribution thereof are determined based on the recrystallization heat treatment and aging heat treatment. In order to change the grain size of grains and the distribution thereof, it is effective to control the temperature raising speed, the temperature at which the subject is kept during heat treatment, and cooling speed, in the recrystallization heat treatment and aging heat treatment.
- the grain size of the grains and the distribution thereof can also be changed by adjusting the addition amount of Co and Si. Furthermore, when elements other than Cu, Co and Si are added, the precipitate other than the grains can be dispersed within the copper alloy, and thereby the grain size of the grains and the distribution thereof can be changed.
- the copper alloy material of the third embodiment of the present invention In order to satisfy all of high electrical conductivity, high mechanical strength and good bending property, it is required of the copper alloy material of the third embodiment of the present invention to have an arithmetic mean of the grain size from 3 ⁇ m to 20 ⁇ m, and to have a standard deviation of 8 ⁇ m or less. It is preferable that the standard deviation is as small as possible, and it is more preferable that the standard deviation of the grain size have a smaller value than that of the arithmetic mean of the grain size.
- the bending stress loaded strain
- the additive elements or production conditions are appropriately adjusted so as to satisfy the conditions of the arithmetic mean and standard deviation of the grain size.
- the arithmetic mean of the grain size is less than 3 ⁇ m, unrecrystallized regions remain, which are directly related to the deterioration of bending property.
- the standard deviation of the grain size has a smaller value than that of the arithmetic mean of the grain size, and it is more preferable that the standard deviation is 3 ⁇ m or more.
- the value, obtained by subtracting the standard deviation from the arithmetic mean of the grain size of the copper alloy of the matrix is more than 0 ⁇ m, and it is more preferable that the value, obtained by dividing the standard deviation by the arithmetic mean, is 0.65 or less, and furthermore preferably 0.4 or less.
- the lower limit of the value, obtained by dividing the standard deviation by the arithmetic mean is 0.2 or more.
- the temperature raising speed in the recrystallization heat treatment will be explained. If the temperature raising speed is too slow, the heating treatment is overdone, and coarsening of the precipitate or crystallized product occurs, and there is a risk of causing a decrease in mechanical strength. Furthermore, there is a risk that coarsening of grains due to overheating may occur. On the other hand, if the temperature raising speed is too fast, the production yield of the precipitate that prevents the coarsening of grains is decreased, and thus there is a risk that the coarsening of grains may occur. For this reason, a preferable temperature raising speed is as described above.
- the recrystallization heat treatment temperature it is also effective to adjust the temperature by the addition amount of Co.
- the addition amount of Co is less than 1 mass%, it is preferable to set the temperature at which the subject is kept during the recrystallization heat treatment at a temperature from 850°C to lower than 900°C, and when the addition amount of Co is 1 mass% or more, it is preferable to set the temperature at which the subject is kept during the recrystallization heat treatment at a temperature from 900°C to lower than 1,000°C.
- a copper alloy material for an electric/electronic part having a composition comprising Co 0.5 to 2.0 mass% and Si 0.1 to 0.5 mass%, with the balance of Cu and inevitable impurities, wherein a copper alloy of a matrix has a grain size of 3 to 35 ⁇ m, wherein a precipitate composed of Co and Si has a particle size of 5 to 50 nm, wherein a surface roughness as the copper alloy material is such that Ra is 0.2 ⁇ m or less and Rt is 2 ⁇ m or less, and wherein the copper alloy material has a tensile strength of 550 MPa or more and an electrical conductivity of 50 %IACS or more.
- a method of producing a copper alloy material for an electric/electronic part comprising the steps of:
- the thus-obtained ingots were kept at a temperature from 930 to 970°C for 0.5 to 1.0 hour, followed by hot rolling to produce hot rolled sheets with a sheet thickness t 12 mm.
- the sheets were subjected to a recrystallization heat treatment at a temperature from 700°C to 1,025°C.
- the thus-prepared materials were subjected to any one of the following two processes, to produce final products.
- Process A recrystallization heat treatment - aging heat treatment (at a temperature from 500 to 600°C for 1 to 4 hours) - cold working (5 to 25%) *Then, according to the necessity, strain-relieving annealing was conducted at a temperature from 300 to 400°C for 1 to 2 hours.
- Process B recrystallization heat treatment - cold rolling (working ratio: 5 to 25%) - aging heat treatment (at a temperature from 450 to 550°C for 1 to 4 hours)
- a test piece was cut out from the test material in a direction perpendicular to the rolling direction into a size of width 10 mm and length 35 mm.
- the resultant test piece was W-bent (Bad-way bent) at 90° at six levels of a bending radius R which was 0 to 0.5 (mm), with a bending axis being parallel to the rolling direction. Whether cracks were occurred or not at the bent portion, was observed with the naked eye through observation with an optical microscope of 50 times magnification, and the bent sites were observed with a scanning electron microscope to examine whether cracks were observed or not.
- R/t in Table 1 R represents the bending radius, and t represents the sheet thickness. A smaller value of this ratio represents a better bending property.
- a copper alloy material having a value of R/t of 2.5 or less is regarded as a copper alloy material having a good bending property.
- the value of R/t is 2 or less.
- SEM scanning electron microscope
- mixed grain means a texture, in which both recrystallized portion and unrecrystallized portion (rolling work residue) are present in mixture, and in the case of mixed grain, the particle size was not measured. It is said that if the unrecrystallized portion is present, bending property is deteriorated. Thus, the mixed grain is an undesirable texture.
- the cooling speed during the period of cooling from the temperature at the time of aging heat treatment to 300°C, was adjusted by controlling the temperature at the heating furnace.
- the subject was taken out from the heating zone of the heating furnace and was subjected to forced air cooling or water quenching.
- the size of the precipitate was evaluated by using a transmission electron microscope (TEM). Since it is difficult to observe the precipitate in the final product under the influence of strain due to work, an observation of the texture of the material after the aging heat treatment was carried out.
- a test piece for TEM was cut out from any site of the heat treated material, and electro-polishing (by a twin jet electro-polishing apparatus) was carried out at a temperature in the range of -20 to -25°C by using a methanol solution of nitric acid (20%), to obtain a test piece for observation.
- each test material was subjected to a stress of 80% with 0.2% proof strength for 1,000 hours at a temperature of 150°C according to JIS Z2241 by the cantilever method based on the Japan Copper and Brass Association Technical Standards "JCBA T309:2001 (provisional)", the permanent deflection displacement after a lapse of time with respect to the initial deflection displacement was measured in three test materials, and the proportion (%) of the permanent deflection displacement after a lapse of time with respect to the initial deflection displacement of each of the test materials was determined and the average value of the proportions was calculated as the stress relaxation ratio.
- SRR stress relaxation ratio
- Examples are shown in Table 1 and Table 2, respectively.
- Table 2 italic letters represent the number or the like outside the range defined in the first embodiment of the present invention.
- Examples 21 to 24 in Table 2 are reference examples related to the cooling speed, and the test materials were subjected to forced air cooling immediately after the completion of aging heat treatment.
- the examples in Table 1 satisfied all of mechanical strength, electrical conductivity, solder wettability, solder adhesive strength and bending property with a proper balance. On the contrary, in the examples shown in Table 2, at least one of the properties among mechanical strength, electrical conductivity, solder wettability, solder adhesive strength and bending property was not practical.
- Examples 21 to 24 for the production method in Table 2 a tendency of having decreased electrical conductivity was observed, as compared with those examples in which the addition amount of Co or tensile strength is almost the same as that of each of the examples shown in Table 1.
- O oxygen
- Cu alloy to which Si is added there are many known literatures, in which O (oxygen) content in a raw material or a material is restricted.
- O oxygen
- the sheets were subjected to a recrystallization heat treatment at a temperature from 700°C to 1,025°C.
- the materials after the recrystallization heat treatment were subjected to the following process, and thus test materials which were in the form of final products were produced.
- the particle size of the precipitate was evaluated by using the transmission electron microscope (TEM). Since the final product is affected by strain due to work, an observation of the texture of the material after the aging heat treatment was carried out.
- a test piece for TEM was cut out from any site of the heat treated material, and electro-polishing (by a twin jet electro-polishing apparatus) was carried out at a temperature in the range of -20 to -25°C by using a methanol solution of nitric acid (20%), to obtain a test piece for observation. Then, an observation was conducted at an accelerating voltage of 300 kV, the incidence direction of an electron beam was adjusted in the vicinity of (001), and 3 sheets of photographs were arbitrarily taken at a magnification of 100,000 times. An average particle size of the precipitates (the number of precipitates is approximately 100) were determined using the photographs.
- test piece It is based on JIS C 600068-2-54.
- the size of a test piece was 10x25 mm, and the 10-mm width side of the test piece was immersed into a prepared solder bath of Pb-free solder (Sn-3.0Ag-0.5Cu).
- Pb-free solder Sn-3.0Ag-0.5Cu
- the condition in this case was such that a test of immersing the test piece down to 10 mm at an immersion speed of 10 mm/sec was carried out using a rosin-based R100-40 as a flux.
- the temperature of the solder bath was controlled to 245°C ( ⁇ 2°C).
- test material having a wetting time of 2 seconds or less was rated as “good (o)”; the test material having a wetting time of 3 seconds or less as “acceptable ( ⁇ )”; and the test material having a wetting time of longer than 3 seconds as “poor (x).
- solder adhesive strength was carried out by the following method.
- Pb-free solder (Sn-3.0Ag-0.5Cu) was used as the solder kind, and a material was subjected in advance to electrolytic degreasing and washing with a 10% sulfuric acid solution for approximately one minute, followed by sufficient drying. Thereafter, the material was cut to a size of 25 mm ⁇ 25 mm, and the solder with ⁇ 6 mm was placed on one of the surfaces of the copper alloy material used as the test piece using an instrument for exclusive use, to thereby fix an EF line (a steel wire coated with pure copper: copper-coated steel wire) with ⁇ 1 mm. This state is shown in Fig. 1 .
- reference numeral 1 represents an EF line
- reference numeral 2 represents solder
- reference numeral 3 represents a test piece.
- the material having the EF line fixed thereon, was left to stand for 500 hours in an atmospheric high temperature bath at 150°C to simulate an acceleration test, and then the material was spontaneously cooled to room temperature. After cooling, the tensile test was carried out 5 times as described above, and an average value was determined.
- the change over time in the peeling strength was determined by the following formula (1).
- Ratio of change over time Peeling strength after 500 hours / initial peeling strength ⁇ 100 % .
- ratio of change over time ⁇ 50% was rated as “excellent (oo)”; ratio of change over time ⁇ 30% was rated as “good (o)”; ratio of change over time ⁇ 10% was rated as “acceptable ( ⁇ )”; and ratio of change over time of ⁇ 10% was rated as “poor (x)”.
- Table 3 Examples are presented in Table 3 and Table 4, respectively.
- Table 3 italic letters represent the number or the like outside the range defined in the second embodiment of the present invention.
- the examples described in Table 1 satisfied all of mechanical strength, electrical conductivity, solder wettability, solder adhesive strength, and bending property, with a good balance, and it was found that the examples are favorable as copper alloy materials for electric/electronic parts where high electrical conductivity and high mechanical strength are particularly required. On the contrary, it was found that, in the examples described in Table 2, at least one item among mechanical strength, electrical conductivity, solder wettability, solder adhesive strength, and bending property, was not suitable for copper alloy materials for electric/electronic parts.
- the sheets were subjected to a recrystallization heat treatment at a temperature from 800°C to 1,025°C.
- the temperature of the recrystallization heat treatment was varied as described in Table 5 and Table 6, in accordance with the addition amount of Co or the like.
- the materials after the recrystallization heat treatment were subjected to the following two processes, and test materials corresponding to final products were produced.
- Process A recrystallization heat treatment - aging heat treatment (at a temperature of 525°C for 2 hours) - cold working (0 to 20%) *Then, according to the necessity, strain-relieving annealing was conducted at a temperature from 300 to 400°C for 1 to 2 hours.
- Process B recrystallization heat treatment - cold rolling (0 to 20%) - aging heat treatment (at a temperature of 525°C for 2 hours)
- Evaluation results for the alloy properties of the copper alloy materials are shown in Table 5, and the evaluation results for the mechanical strength and bending property of the copper alloy materials are shown in Table 6.
- Table 6 shows, for some of the examples of Table 5, the evaluation results obtained in the case where the alloy composition (Nos. 101 and 102) and/or the production method (Nos. 203 to 208) were outside the ranges defined in the third embodiment of the present invention, together with the evaluations including the bending property of some of the examples shown in Table 5.
- a. tensile strength, b. measurement of electrical conductivity, and c. bending property were measured in the same manner as the example 1.
- SEM scanning electron microscope
- the grain size of one grain was measured by the same technique as that used for the measurement of grain size, and the standard deviation of the grain size was determined, with the measurement parameter set at 200.
- the examples according to the third embodiment of the present invention satisfied all of mechanical strength, electrical conductivity and bending property with a good balance. Specifically, when the electrical conductivity was 60 %IACS or more and the tensile strength was 570 MPa to 650 MPa, the value of R/t was 0.5 or less; when the electrical conductivity was 60 %IACS or more and the tensile strength was more than 650 MPa to 700 MPa, the value of R/t was 1.0 or less; and when the electrical conductivity was 60 %IACS or more and the tensile strength was more than 700 MPa, the value of R/t was 1.5 or less. On the contrary, the examples that were not conforming to the third embodiment of the present invention showed results that did not satisfy the values described above.
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Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008197672 | 2008-07-31 | ||
| JP2008197677 | 2008-07-31 | ||
| JP2008202468 | 2008-08-05 | ||
| PCT/JP2009/063616 WO2010013790A1 (ja) | 2008-07-31 | 2009-07-30 | 電気電子部品用銅合金材料とその製造方法 |
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| Publication Number | Publication Date |
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| EP2319947A1 true EP2319947A1 (de) | 2011-05-11 |
| EP2319947A4 EP2319947A4 (de) | 2011-11-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| EP09803032A Withdrawn EP2319947A4 (de) | 2008-07-31 | 2009-07-30 | Kupferlegierungsmaterial für elektrische und elektronische bauteile sowie herstellungsverfahren dafür |
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| Country | Link |
|---|---|
| US (1) | US20110186192A1 (de) |
| EP (1) | EP2319947A4 (de) |
| JP (1) | JP5224415B2 (de) |
| KR (1) | KR101570555B1 (de) |
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| WO (1) | WO2010013790A1 (de) |
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| EP2778240A4 (de) * | 2011-11-07 | 2015-07-08 | Mitsubishi Materials Corp | Kupferlegierung für elektronische vorrichtungen, verfahren zur herstellung der kupferlegierung für elektronische vorrichtungen, kupferlegierung und kunststoffarbeitsmaterial für elektronische vorrichtungen und bauteil für elektronische vorrichtungen |
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Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6187838A (ja) | 1984-10-03 | 1986-05-06 | Kobe Steel Ltd | 熱間加工性の優れた銅合金 |
| JPS63307232A (ja) | 1987-06-04 | 1988-12-14 | Sumitomo Metal Mining Co Ltd | 銅合金 |
| JPH02129326A (ja) | 1988-11-08 | 1990-05-17 | Sumitomo Metal Mining Co Ltd | 高力銅合金 |
| JPH02277735A (ja) | 1989-04-20 | 1990-11-14 | Sumitomo Metal Mining Co Ltd | リードフレーム用銅合金 |
| JP3408021B2 (ja) * | 1995-06-30 | 2003-05-19 | 古河電気工業株式会社 | 電子電気部品用銅合金およびその製造方法 |
| US6529178B1 (en) | 1997-02-17 | 2003-03-04 | Seiko Epson Corporation | Current-driven emissive display device, method for driving the same, and method for manufacturing the same |
| JPH1112714A (ja) * | 1997-06-25 | 1999-01-19 | Dowa Mining Co Ltd | ダイレクトボンディング性及びはんだ付け性に優れた銅および銅基合金とその製造方法 |
| JP4378502B2 (ja) * | 2004-02-25 | 2009-12-09 | Dowaメタルテック株式会社 | 半導体装置用の放熱板およびその製造法 |
| CN101124345B (zh) * | 2005-03-02 | 2011-02-09 | 古河电气工业株式会社 | 铜合金及其制造方法 |
| JP3838521B1 (ja) * | 2005-12-27 | 2006-10-25 | 株式会社神戸製鋼所 | 高強度および優れた曲げ加工性を備えた銅合金およびその製造方法 |
| CN1908777A (zh) | 2005-08-05 | 2007-02-07 | 精工爱普生株式会社 | 液晶装置、电子光学装置、投影仪及微型器件 |
| JP2007169765A (ja) * | 2005-12-26 | 2007-07-05 | Furukawa Electric Co Ltd:The | 銅合金とその製造方法 |
| JP5247010B2 (ja) * | 2006-06-30 | 2013-07-24 | Jx日鉱日石金属株式会社 | 高強度で曲げ加工性に優れたCu−Zn系合金 |
| JP4943095B2 (ja) * | 2006-08-30 | 2012-05-30 | 三菱電機株式会社 | 銅合金及びその製造方法 |
| JP5085908B2 (ja) | 2006-10-03 | 2012-11-28 | Jx日鉱日石金属株式会社 | 電子材料用銅合金及びその製造方法 |
| JP2008202468A (ja) | 2007-02-19 | 2008-09-04 | Toyota Motor Corp | エンジンシステムの出力収束値算出装置 |
| JP2008266787A (ja) * | 2007-03-28 | 2008-11-06 | Furukawa Electric Co Ltd:The | 銅合金材およびその製造方法 |
| EP2248921A4 (de) * | 2008-01-31 | 2011-03-16 | Furukawa Electric Co Ltd | Kupferlegierungswerkstoff für elektrisches/elektronisches bauteil und verfahren zur herstellung des kupferlegierungswerkstoffs |
-
2009
- 2009-07-30 JP JP2010507743A patent/JP5224415B2/ja active Active
- 2009-07-30 CN CN2009801303117A patent/CN102112639A/zh active Pending
- 2009-07-30 EP EP09803032A patent/EP2319947A4/de not_active Withdrawn
- 2009-07-30 KR KR1020117003772A patent/KR101570555B1/ko not_active Expired - Fee Related
- 2009-07-30 WO PCT/JP2009/063616 patent/WO2010013790A1/ja not_active Ceased
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- 2011-01-28 US US13/016,260 patent/US20110186192A1/en not_active Abandoned
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| US9499885B2 (en) | 2010-04-14 | 2016-11-22 | Jx Nippon Mining & Metals Corporation | Cu—Si—Co alloy for electronic materials, and method for producing same |
| US10032536B2 (en) | 2010-05-14 | 2018-07-24 | Mitsubishi Materials Corporation | Copper alloy for electronic device, method for producing copper alloy for electronic device, and copper alloy rolled material for electronic device |
| US10056165B2 (en) | 2010-05-14 | 2018-08-21 | Mitsubishi Materials Corporation | Copper alloy for electronic device, method for producing copper alloy for electronic device, and copper alloy rolled material for electronic device |
| US9587299B2 (en) | 2011-10-28 | 2017-03-07 | Mitsubishi Materials Corporation | Copper alloy for electronic equipment, method for producing copper alloy for electronic equipment, rolled copper alloy material for electronic equipment, and part for electronic equipment |
| EP2778240A4 (de) * | 2011-11-07 | 2015-07-08 | Mitsubishi Materials Corp | Kupferlegierung für elektronische vorrichtungen, verfahren zur herstellung der kupferlegierung für elektronische vorrichtungen, kupferlegierung und kunststoffarbeitsmaterial für elektronische vorrichtungen und bauteil für elektronische vorrichtungen |
| US10153063B2 (en) | 2011-11-07 | 2018-12-11 | Mitsubishi Materials Corporation | Copper alloy for electronic devices, method of manufacturing copper alloy for electronic devices, copper alloy plastic working material for electronic devices, and component for electronic devices |
| US10458003B2 (en) | 2011-11-14 | 2019-10-29 | Mitsubishi Materials Corporation | Copper alloy and copper alloy forming material |
| KR20140056003A (ko) * | 2012-10-31 | 2014-05-09 | 도와 메탈테크 가부시키가이샤 | Cu-Ni-Co-Sⅰ계 구리 합금 판재 및 이의 제조법 |
| EP2728025A3 (de) * | 2012-10-31 | 2017-11-01 | Dowa Metaltech Co., Ltd. | Cu-Ni-Co-Si-basiertes Kupferlegierungsfolienmaterial und Herstellungsverfahren dafür |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102112639A (zh) | 2011-06-29 |
| JPWO2010013790A1 (ja) | 2012-01-12 |
| US20110186192A1 (en) | 2011-08-04 |
| JP5224415B2 (ja) | 2013-07-03 |
| KR101570555B1 (ko) | 2015-11-19 |
| KR20110038143A (ko) | 2011-04-13 |
| WO2010013790A1 (ja) | 2010-02-04 |
| EP2319947A4 (de) | 2011-11-23 |
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