EP2507403A4 - Source de déposition linéaire - Google Patents

Source de déposition linéaire

Info

Publication number
EP2507403A4
EP2507403A4 EP10833708.0A EP10833708A EP2507403A4 EP 2507403 A4 EP2507403 A4 EP 2507403A4 EP 10833708 A EP10833708 A EP 10833708A EP 2507403 A4 EP2507403 A4 EP 2507403A4
Authority
EP
European Patent Office
Prior art keywords
deposition source
linear deposition
linear
source
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP10833708.0A
Other languages
German (de)
English (en)
Other versions
EP2507403A1 (fr
Inventor
Chad Conroy
Scott Wayne Priddy
Jacob A Dahlstrom
Rich Bresnahan
David William Gotthold
John Patrin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Veeco Instruments Inc
Original Assignee
Veeco Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/628,189 external-priority patent/US20100159132A1/en
Application filed by Veeco Instruments Inc filed Critical Veeco Instruments Inc
Priority claimed from PCT/US2010/039093 external-priority patent/WO2011065999A1/fr
Publication of EP2507403A1 publication Critical patent/EP2507403A1/fr
Publication of EP2507403A4 publication Critical patent/EP2507403A4/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
    • F16L59/00—Thermal insulation in general
    • F16L59/02—Shape or form of insulating materials, with or without coverings integral with the insulating materials
    • F16L59/029—Shape or form of insulating materials, with or without coverings integral with the insulating materials layered

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
EP10833708.0A 2009-11-30 2010-06-17 Source de déposition linéaire Withdrawn EP2507403A4 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/628,189 US20100159132A1 (en) 2008-12-18 2009-11-30 Linear Deposition Source
PCT/US2010/039093 WO2011065999A1 (fr) 2008-12-18 2010-06-17 Source de déposition linéaire

Publications (2)

Publication Number Publication Date
EP2507403A1 EP2507403A1 (fr) 2012-10-10
EP2507403A4 true EP2507403A4 (fr) 2013-10-23

Family

ID=44935927

Family Applications (2)

Application Number Title Priority Date Filing Date
EP10833708.0A Withdrawn EP2507403A4 (fr) 2009-11-30 2010-06-17 Source de déposition linéaire
EP10833707.2A Withdrawn EP2507402A4 (fr) 2009-11-30 2010-06-17 Source de déposition linéaire

Family Applications After (1)

Application Number Title Priority Date Filing Date
EP10833707.2A Withdrawn EP2507402A4 (fr) 2009-11-30 2010-06-17 Source de déposition linéaire

Country Status (4)

Country Link
EP (2) EP2507403A4 (fr)
KR (2) KR20120104559A (fr)
CN (2) CN102712993A (fr)
TW (2) TW201142055A (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102150436B1 (ko) * 2013-12-20 2020-09-01 엘지디스플레이 주식회사 증발원 및 이를 포함하는 증착 장치
DE102014007522A1 (de) * 2014-05-23 2015-11-26 Manz Ag Trägeranordnung für eine Verdampferquelle
KR102260617B1 (ko) * 2014-07-07 2021-06-07 (주)선익시스템 복수의 도가니가 장착된 증발원을 갖는 박막 증착장치
KR102260572B1 (ko) * 2014-07-07 2021-06-07 (주)선익시스템 복수의 증발원을 갖는 박막 증착장치
US20170159167A1 (en) * 2014-07-07 2017-06-08 Sunic System Ltd. Thin Film Deposition Apparatus Having Plurality of Crucibles
KR102260575B1 (ko) * 2014-07-07 2021-06-07 (주)선익시스템 복수의 증발원을 갖는 박막 증착장치
WO2017008838A1 (fr) * 2015-07-13 2017-01-19 Applied Materials, Inc. Source d'évaporation.
KR102369676B1 (ko) 2017-04-10 2022-03-04 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법
KR102761515B1 (ko) * 2019-02-27 2025-02-04 삼성디스플레이 주식회사 증착원 증발 장치 및 그 제조방법
WO2022002349A1 (fr) * 2020-06-29 2022-01-06 Applied Materials, Inc. Ensemble buse, source d'évaporation, système de dépôt et procédé de dépôt d'un matériau évaporé sur un substrat

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030054100A1 (en) * 2001-09-14 2003-03-20 Erten Eser Multiple-nozzle thermal evaporation source
EP1342808A1 (fr) * 2002-03-08 2003-09-10 Eastman Kodak Company Source allongée avec plusieurs ouvertures pour le dépôt thermique physique en phase vapeur, pour réaliser un dispositif organique émettant de la lumière
US20040255857A1 (en) * 2003-05-16 2004-12-23 Chow Peter P. Thin-film deposition evaporator
EP1632586A2 (fr) * 2004-08-24 2006-03-08 Tohoku Pioneer Corporation Source d'évaporation.
JP2007146219A (ja) * 2005-11-28 2007-06-14 Hitachi Zosen Corp 真空蒸着装置
US20090229524A1 (en) * 2006-07-03 2009-09-17 Yas Co., Ltd. Multiple Nozzle Evaporator for Vacuum Thermal Evaporation
WO2009134041A2 (fr) * 2008-04-29 2009-11-05 Sunic System. Ltd. Évaporateur et appareil de dépôt sous vide muni de celui-ci

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4401052A (en) * 1979-05-29 1983-08-30 The University Of Delaware Apparatus for continuous deposition by vacuum evaporation
US5141564A (en) * 1988-05-03 1992-08-25 The Boeing Company Mixed ternary heterojunction solar cell
DE69215930T2 (de) * 1991-03-06 1997-04-03 Oowada Carbon Kogyo Kk Mit Kohlefaser und anorganischer Faser armierter Kohlenstoffverbundwerkstoff
DE19848177A1 (de) * 1998-10-20 2000-04-27 Leybold Systems Gmbh Bedampfungsvorrichtung
US7194197B1 (en) * 2000-03-16 2007-03-20 Global Solar Energy, Inc. Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
DE10025628A1 (de) * 2000-05-24 2001-11-29 Sgl Carbon Ag Abwickelbare Bauteile aus Faserverbundwerkstoffen, Verfahren zu deren Herstellung und deren Verwendung
US20040076810A1 (en) * 2002-10-17 2004-04-22 Ucar Carbon Company Inc. Composite high temperature insulator
KR20060060994A (ko) * 2004-12-01 2006-06-07 삼성에스디아이 주식회사 증착 소스 및 이를 구비한 증착 장치
KR100671673B1 (ko) * 2005-03-09 2007-01-19 삼성에스디아이 주식회사 다중 진공증착장치 및 제어방법
JP4474324B2 (ja) * 2005-04-28 2010-06-02 パナソニック株式会社 成膜装置
JP4894193B2 (ja) * 2005-08-09 2012-03-14 ソニー株式会社 蒸着装置、および表示装置の製造システム
JP2007066564A (ja) * 2005-08-29 2007-03-15 Toshiba Matsushita Display Technology Co Ltd 有機ｅｌ表示装置の製造方法及び製造装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030054100A1 (en) * 2001-09-14 2003-03-20 Erten Eser Multiple-nozzle thermal evaporation source
EP1342808A1 (fr) * 2002-03-08 2003-09-10 Eastman Kodak Company Source allongée avec plusieurs ouvertures pour le dépôt thermique physique en phase vapeur, pour réaliser un dispositif organique émettant de la lumière
US20040255857A1 (en) * 2003-05-16 2004-12-23 Chow Peter P. Thin-film deposition evaporator
EP1632586A2 (fr) * 2004-08-24 2006-03-08 Tohoku Pioneer Corporation Source d'évaporation.
JP2007146219A (ja) * 2005-11-28 2007-06-14 Hitachi Zosen Corp 真空蒸着装置
US20090229524A1 (en) * 2006-07-03 2009-09-17 Yas Co., Ltd. Multiple Nozzle Evaporator for Vacuum Thermal Evaporation
WO2009134041A2 (fr) * 2008-04-29 2009-11-05 Sunic System. Ltd. Évaporateur et appareil de dépôt sous vide muni de celui-ci

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2011065999A1 *

Also Published As

Publication number Publication date
CN102712993A (zh) 2012-10-03
KR20120101425A (ko) 2012-09-13
EP2507402A1 (fr) 2012-10-10
CN102686765A (zh) 2012-09-19
KR20120104559A (ko) 2012-09-21
EP2507403A1 (fr) 2012-10-10
EP2507402A4 (fr) 2013-10-23
TW201118961A (en) 2011-06-01
TW201142055A (en) 2011-12-01

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Effective date: 20130924

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