EP2587313A3 - Optikmesssystem und Verfahren zum Messen kritischer Abmessungen von Nanostrukturen - Google Patents

Optikmesssystem und Verfahren zum Messen kritischer Abmessungen von Nanostrukturen Download PDF

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Publication number
EP2587313A3
EP2587313A3 EP20120189262 EP12189262A EP2587313A3 EP 2587313 A3 EP2587313 A3 EP 2587313A3 EP 20120189262 EP20120189262 EP 20120189262 EP 12189262 A EP12189262 A EP 12189262A EP 2587313 A3 EP2587313 A3 EP 2587313A3
Authority
EP
European Patent Office
Prior art keywords
image
optical
measurement system
module
optical measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP20120189262
Other languages
English (en)
French (fr)
Other versions
EP2587313B1 (de
EP2587313A2 (de
Inventor
Sergey Koptyaev
Maxim Ryabko
Michael Rychagov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from RU2011142372/28A external-priority patent/RU2481555C1/ru
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of EP2587313A2 publication Critical patent/EP2587313A2/de
Publication of EP2587313A3 publication Critical patent/EP2587313A3/de
Application granted granted Critical
Publication of EP2587313B1 publication Critical patent/EP2587313B1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
    • G02B21/365—Control or image processing arrangements for digital or video microscopes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N7/00—Television systems
    • H04N7/18—Closed-circuit television [CCTV] systems, i.e. systems in which the video signal is not broadcast
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/88—Manufacture, treatment, or detection of nanostructure with arrangement, process, or apparatus for testing
    • Y10S977/881—Microscopy or spectroscopy, e.g. sem, tem

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Microscoopes, Condenser (AREA)
  • Length Measuring Devices By Optical Means (AREA)
EP12189262.4A 2011-10-20 2012-10-19 Optikmesssystem und Verfahren zum Messen kritischer Abmessungen von Nanostrukturen Active EP2587313B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
RU2011142372/28A RU2481555C1 (ru) 2011-10-20 2011-10-20 Оптическая измерительная система и способ измерения критического размера наноструктур на плоской поверхности
KR1020120085388A KR101928439B1 (ko) 2011-10-20 2012-08-03 나노구조의 ｃｄ에 대한 광학 측정 시스템 및 측정 방법

Publications (3)

Publication Number Publication Date
EP2587313A2 EP2587313A2 (de) 2013-05-01
EP2587313A3 true EP2587313A3 (de) 2015-01-14
EP2587313B1 EP2587313B1 (de) 2016-05-11

Family

ID=47471462

Family Applications (1)

Application Number Title Priority Date Filing Date
EP12189262.4A Active EP2587313B1 (de) 2011-10-20 2012-10-19 Optikmesssystem und Verfahren zum Messen kritischer Abmessungen von Nanostrukturen

Country Status (2)

Country Link
US (1) US9360662B2 (de)
EP (1) EP2587313B1 (de)

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* Cited by examiner, † Cited by third party
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CZ2013919A3 (cs) * 2013-11-21 2014-12-03 ÄŚeskĂ© vysokĂ© uÄŤenĂ­ technickĂ© v Praze - fakulta stavebnĂ­ Zařízení pro měření rozlišovací schopnosti mikroskopových objektivů
WO2015080480A1 (ko) * 2013-11-29 2015-06-04 (주)넥스틴 웨이퍼 영상 검사 장치
RU2560245C1 (ru) * 2014-03-26 2015-08-20 Самсунг Электроникс Ко., Лтд. Способ мультиспектральной визуализации и устройство для измерения критического размера наноструктур
US9400254B2 (en) 2014-03-26 2016-07-26 Samsung Electronics Co., Ltd. Method and device for measuring critical dimension of nanostructure
RU2582484C1 (ru) * 2014-11-10 2016-04-27 Самсунг Электроникс Ко., Лтд. Оптическая измерительная система и способ количественного измерения критического размера для наноразмерных объектов
US10983440B2 (en) * 2016-05-23 2021-04-20 Asml Netherlands B.V. Selection of substrate measurement recipes
US10731979B2 (en) 2018-01-12 2020-08-04 Applied Materials Israel Ltd. Method for monitoring nanometric structures
KR102674578B1 (ko) * 2019-08-06 2024-06-12 삼성디스플레이 주식회사 포토 레지스트 패턴의 임계 치수 검사 방법
KR102825815B1 (ko) * 2020-06-18 2025-06-27 삼성전자주식회사 스루-포커스 이미지 기반 계측 장치, 그것의 동작 방법, 및 그 동작을 실행하는 컴퓨팅 장치
CN113420260B (zh) * 2021-07-01 2022-10-28 深圳市埃芯半导体科技有限公司 一种半导体尺寸的测量计算方法、装置及计算机存储介质
CN120609551B (zh) * 2025-08-12 2025-10-31 苏州矽行半导体技术有限公司 一种明场显微成像像质检测系统

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US20020136992A1 (en) * 2001-03-26 2002-09-26 Chung-Peng Ho Method for patterning resist
WO2007095090A2 (en) * 2006-02-10 2007-08-23 Monogen, Inc. Method and apparatus and computer program product for collecting digital image data from microscope media-based specimens

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US6774991B1 (en) 1999-05-27 2004-08-10 Inspex Incorporated Method and apparatus for inspecting a patterned semiconductor wafer
JP3691404B2 (ja) 2001-02-28 2005-09-07 株式会社日立国際電気 微小寸法測定装置
US7037659B2 (en) * 2002-01-31 2006-05-02 Nimblegen Systems Inc. Apparatus for constructing DNA probes having a prismatic and kaleidoscopic light homogenizer
US6992765B2 (en) * 2002-10-11 2006-01-31 Intralase Corp. Method and system for determining the alignment of a surface of a material in relation to a laser beam
US6934929B2 (en) 2003-01-13 2005-08-23 Lsi Logic Corporation Method for improving OPC modeling
JP4254469B2 (ja) * 2003-05-23 2009-04-15 日本ビクター株式会社 光ピックアップ装置及び光記録媒体駆動装置
US7061623B2 (en) 2003-08-25 2006-06-13 Spectel Research Corporation Interferometric back focal plane scatterometry with Koehler illumination
KR100574963B1 (ko) 2003-12-29 2006-04-28 삼성전자주식회사 파장가변 레이저 장치를 구비한 광학적 임계치수 측정장치및 그 측정장치를 이용한 임계치수 측정방법
JP4166166B2 (ja) * 2004-02-02 2008-10-15 株式会社東芝 露光投影像予測システム及び露光投影像予測方法
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US20020136992A1 (en) * 2001-03-26 2002-09-26 Chung-Peng Ho Method for patterning resist
WO2007095090A2 (en) * 2006-02-10 2007-08-23 Monogen, Inc. Method and apparatus and computer program product for collecting digital image data from microscope media-based specimens

Non-Patent Citations (1)

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Title
ATTOTA RAVIKIRAN ET AL: "Through-focus scanning optical microscopy", SCANNING MICROSCOPIES 2011: ADVANCED MICROSCOPY TECHNOLOGIES FOR DEFENSE, HOMELAND SECURITY, FORENSIC, LIFE, ENVIRONMENTAL, AND INDUSTRIAL SCIENCES, SPIE, 1000 20TH ST. BELLINGHAM WA 98225-6705 USA, vol. 8036, no. 1, 13 May 2011 (2011-05-13), pages 1 - 9, XP060014894, DOI: 10.1117/12.884706 *

Also Published As

Publication number Publication date
EP2587313B1 (de) 2016-05-11
US20130107030A1 (en) 2013-05-02
EP2587313A2 (de) 2013-05-01
US9360662B2 (en) 2016-06-07

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