EP2631637A2 - Verwendung von Kapazitäts- und Wirbelströmen zur Analyse eines Polykristalldiamanten - Google Patents

Verwendung von Kapazitäts- und Wirbelströmen zur Analyse eines Polykristalldiamanten Download PDF

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Publication number
EP2631637A2
EP2631637A2 EP13156139.1A EP13156139A EP2631637A2 EP 2631637 A2 EP2631637 A2 EP 2631637A2 EP 13156139 A EP13156139 A EP 13156139A EP 2631637 A2 EP2631637 A2 EP 2631637A2
Authority
EP
European Patent Office
Prior art keywords
leached
quality
polycrystalline structure
eddy current
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP13156139.1A
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English (en)
French (fr)
Inventor
William W. King
Federico Bellin
Vamsee Chintamaneni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varel International Ind LLC
Original Assignee
Varel International Ind LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varel International Ind LLC filed Critical Varel International Ind LLC
Publication of EP2631637A2 publication Critical patent/EP2631637A2/de
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/22—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/40—Grinding-materials

Definitions

  • FIG 2 is a schematic microstructural view of the PCD cutting table 110 of Figure 1 in accordance with the prior art.
  • the PCD cutting table 110 has diamond particles 210 bonded to other diamond particles 210, one or more interstitial spaces 212 formed between the diamond particles 210, and cobalt 214, or some other catalyst, deposited within one or more of the interstitial spaces 212.
  • the interstitial spaces 212, or voids are formed between the carbon-carbon bonds and are located between the diamond particles 210.
  • the diffusion of cobalt 214 into the diamond powder results in cobalt 214 being deposited within these interstitial spaces 212 that are formed within the PCD cutting table 110 during the sintering process.
  • Efforts have been made to slow the wear of the PCD cutting table 110 at these high temperatures. These efforts include performing a leaching process on the PCD cutting table 110, which removes some of the cobalt 214 from the interstitial spaces 212. These leaching processes, which includes, but is not limited to, an acid leaching process and/or an electrolytic leaching process, is known to persons having ordinary skill in the art and is not described herein for the sake of brevity. By removing some of the cobalt 214, or catalyst, from the PCD cutting table 110, the thermal degradation of the PCD structure is reduced.
  • the present invention is directed to a non-destructive method and apparatus for measuring the leaching depth within an ultra-hard polycrystalline structure and/or characterizing at least a portion of the ultra-hard polycrystalline structure, such as the ones used in forming polycrystalline diamond compact ("PDC") cutters, using at least capacitance and eddy current measurements.
  • PDC polycrystalline diamond compact
  • the description of exemplary embodiments is provided below in conjunction with a PDC cutter, alternate embodiments of the invention may be applicable to other types of polycrystalline structures including, but not limited to, PCBN cutters.
  • one or more portions of the methods described below is implemented using an electronic measuring device. For example, the capacitance is measured using a capacitance measuring device and the eddy current is measured using an eddy current measuring device.
  • the capacitance measuring device 410 is a multi-meter; however, other capacitance measuring devices known to people having ordinary skill in the art are used in one or more alternative exemplary embodiments.
  • the multi-meter 410 includes a positionable dial 412, a plurality of measurement settings 414, a display 416, a positive terminal 418, and a negative terminal 419.
  • the positionable dial 412 is rotatable in a clockwise and/or counterclockwise manner and is set to one of several available measurement settings 414.
  • the positionable dial 412 is set to a nanofaraday setting 415 so that the multi-meter 410 measures capacitance values.
  • the second wire 440 is fabricated using a copper wire or some other suitable conducting material or alloy known to people having ordinary skill in the art.
  • the second wire 440 also includes a non-conducting sheath (not shown) that surrounds the copper wire and extends from about one end of the copper wire to an opposing end of the cooper wire. The two ends of the copper wire are exposed and are not surrounded by the non-conducting sheath.
  • an insulating material also surrounds the copper wire and is disposed between the copper wire and the non-conducting sheath. The insulating material extends from about one end of the non-conducting sheath to an opposing end of the non-conducting sheath.
  • the base plate 554 also applies an upward load 555 onto the bottom surface 454 of the leached PDC cutter 300.
  • the upward load 555 is applied, the second conducting material 520 is deformed and adapted to the rough and very stiff bottom surface 454, thereby minimizing contact resistance between the second conducting material 520 and the bottom surface 454 and greatly improving the capacitance measurement consistency.
  • the downward load 553 is equal to the upward load 555.
  • the downward load 553 and the upward load 555 is about one hundred pounds; however, these loads 553, 555 range from about two pounds to about a critical load.
  • the critical load is a load at which the leached PDC cutter 300 is damaged when applied thereto.
  • leached PDC cutter 300 a different component, such as the PCD cutting table 310 alone or other component that includes another type of leached polycrystalline structure, is used in lieu of the leached PDC cutter 300. Additionally, although the description provided below has been provided with respect to the leached PDC cutter 300, a different component, such as a chemically cleaned leached PDC cutter (not shown), is used in lieu of the leached PDC cutter 300.
  • the leached depth 353 ( Figure 3 ) is determinable, either quantitatively and/or qualitatively, from the measured impedance amplitude and/or phase angle shift of the circuit 605. Further, the quality of leaching, i.e.
  • Figure 7C shows a graphical chart 790 depicting both the amplitude curves 710, 760 and the phase angle shift curves 715, 765 of Figures 7A and 7B for each of the shallow leached PDC cutters 705 and deep leached PDC cutters 755 using the same scale in accordance with an exemplary embodiment.
  • the impedance amplitude 702 for the shallow leached amplitude curves 710 is smaller than the impedance amplitude 702 for the deep leached amplitude curves 760.
  • the phase angle shift 704 for the shallow leached phase angle shift curves 715 is larger than the phase angle shift 704 for the deep leached phase angle shift curves 765.
  • Figure 10B is a partial view of the graphical chart 1000 of Figure 10A in accordance with an exemplary embodiment of the present invention.
  • the eddy current 1010 measured with the similar type component is fifty-five according to one exemplary embodiment.
  • the actual leaching depth 920 is obtained by finding a point 1060 along the second calibration curve 1005 where the eddy current 1010 is fifty-five.
  • the actual leaching depth 920 for the similar type component is seventy microns.
  • the upper and lower 95% confidence lines 1042 and 1044 it is determined that the actual leaching depth 920 ranges from about fifty microns to about ninety microns at a 95% confidence level.
  • the microstructural quality determination method 1100 proceeds to step 1150.
  • a first amount of data scattering is determined based upon the plurality of capacitance values for each of the leached components.
  • the first amount of data scattering for a leached component is determined by a differential between the highest measured capacitance and the lowest measured capacitance for that leached component and by statistical results of where each measured capacitance lies.
  • Clause 7 The method of any of clauses 1 to 6, wherein the one or more measured eddy current value comprises at least one of an impedance amplitude and a phase angle shift.
  • Clause 21 The method of any of clauses 17 to 20, further comprising mounting at least a portion of the leached components to a tool based upon the overall quality of the polycrystalline structure.

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Food Science & Technology (AREA)
  • Medicinal Chemistry (AREA)
  • Investigating Or Analyzing Materials By The Use Of Magnetic Means (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
EP13156139.1A 2012-02-21 2013-02-21 Verwendung von Kapazitäts- und Wirbelströmen zur Analyse eines Polykristalldiamanten Withdrawn EP2631637A2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/401,335 US20130214769A1 (en) 2012-02-21 2012-02-21 Use of Capacitance And Eddy Currents to Analyze Polycrystalline Diamond

Publications (1)

Publication Number Publication Date
EP2631637A2 true EP2631637A2 (de) 2013-08-28

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EP13156139.1A Withdrawn EP2631637A2 (de) 2012-02-21 2013-02-21 Verwendung von Kapazitäts- und Wirbelströmen zur Analyse eines Polykristalldiamanten

Country Status (4)

Country Link
US (1) US20130214769A1 (de)
EP (1) EP2631637A2 (de)
RU (1) RU2013107544A (de)
WO (1) WO2013126448A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9377428B2 (en) 2012-02-21 2016-06-28 Varel International Ind., L.P. Non-destructive leaching depth measurement using capacitance spectroscopy
US9128031B2 (en) 2012-02-21 2015-09-08 Varel International Ind., L.P. Method to improve the leaching process
US9423436B2 (en) 2012-02-21 2016-08-23 Varel International Ind., L.P. Method and apparatus to assess the thermal damage caused to a PCD cutter using capacitance spectroscopy
US9423370B2 (en) 2012-02-21 2016-08-23 Varel International Ind., L.P Use of capacitance to analyze polycrystalline diamond
EP3066482B1 (de) * 2013-11-06 2019-07-24 Varel International, Ind., L.P. Verfahren zur beurteilung der wärmeschäden eines schneiders mithilfe von kapazitätsspektroskopie
WO2015179091A1 (en) * 2014-05-23 2015-11-26 Varel International Ind., L.P. Non-destructive leaching depth measurement using capacitance spectroscopy
WO2016085449A1 (en) * 2014-11-24 2016-06-02 Halliburton Energy Services, Inc. Determining the leaching profile of a cutter on a drilling tool
US10254250B2 (en) * 2016-03-14 2019-04-09 Board Of Trustees Of Michigan State University Rotating current excitation with array magnetic sensors nondestructive testing probe for tube inspection

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US2755240A (en) * 1953-11-02 1956-07-17 Shawinigan Water And Power Com Electrolysis of titanium tetrachloride to produce titanium
US4290016A (en) * 1978-12-28 1981-09-15 Magnaflux Corporation Method and apparatus for establishing magnetization levels for magnetic particle testing or the like
US4255976A (en) * 1979-08-13 1981-03-17 Theodore P. Zoli, Jr. Apparatus and method for measuring the velocity of a moving dielectric material
JP3603640B2 (ja) * 1999-02-04 2004-12-22 松下電器産業株式会社 積層セラミックコンデンサのスクリーニング方法
JP2002148012A (ja) * 2000-11-08 2002-05-22 Ulvac Japan Ltd 膜厚測定装置及び膜厚測定方法
FI117941B (fi) * 2005-10-13 2007-04-30 Outokumpu Technology Oyj Menetelmä metallisulfidimineraalien liuottamiseksi
US7616734B1 (en) * 2006-05-09 2009-11-10 Smith International, Inc. Multi-step method of nondestructively measuring a region within an ultra-hard polycrystalline construction
WO2007140364A2 (en) * 2006-05-26 2007-12-06 Monitor110, Inc. Method for scoring changes to a webpage
CN101479561B (zh) * 2006-06-23 2011-04-06 Skf公司 振动和状态监控系统及其部件
US8080074B2 (en) * 2006-11-20 2011-12-20 Us Synthetic Corporation Polycrystalline diamond compacts, and related methods and applications
US20080290866A1 (en) * 2007-05-23 2008-11-27 Cuffe John M Method and apparatus for digital measurement of an eddy current signal
US8353371B2 (en) * 2009-11-25 2013-01-15 Us Synthetic Corporation Polycrystalline diamond compact including a substrate having a raised interfacial surface bonded to a leached polycrystalline diamond table, and applications therefor

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Publication number Publication date
RU2013107544A (ru) 2014-08-27
US20130214769A1 (en) 2013-08-22
WO2013126448A1 (en) 2013-08-29

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