EP3118352A2 - Procede de revetement galvanique d'alliages tial - Google Patents

Procede de revetement galvanique d'alliages tial Download PDF

Info

Publication number: EP3118352A2
Authority: EP; European Patent Office
Prior art keywords: chemical; layer; stage; tial alloy; alloy
Prior art date: 2015-07-14
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

EP16170326.9A

Other languages

German (de)

English (en)

Other versions

EP3118352B1 (fr

EP3118352A3 (fr

Inventor

Sebastian Richter

Josef Linska

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

MTU Aero Engines AG

Original Assignee

MTU Aero Engines AG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2015-07-14

Filing date

2016-05-19

Publication date

2017-01-18

2016-05-19 Application filed by MTU Aero Engines AG filed Critical MTU Aero Engines AG

2017-01-18 Publication of EP3118352A2 publication Critical patent/EP3118352A2/fr

2017-04-05 Publication of EP3118352A3 publication Critical patent/EP3118352A3/fr

2019-03-27 Application granted granted Critical

2019-03-27 Publication of EP3118352B1 publication Critical patent/EP3118352B1/fr

Status Not-in-force legal-status Critical Current

2036-05-19 Anticipated expiration legal-status Critical

Links

238000000034 method Methods 0.000 title claims abstract description 27
238000000576 coating method Methods 0.000 title claims abstract description 20
239000011248 coating agent Substances 0.000 title claims abstract description 15
229910000838 Al alloy Inorganic materials 0.000 title description 2
229910045601 alloy Inorganic materials 0.000 claims abstract description 38
239000000956 alloy Substances 0.000 claims abstract description 38
229910010038 TiAl Inorganic materials 0.000 claims abstract description 37
239000000126 substance Substances 0.000 claims abstract description 21
238000004381 surface treatment Methods 0.000 claims abstract description 17
238000003754 machining Methods 0.000 claims abstract description 11
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 12
238000005554 pickling Methods 0.000 claims description 12
238000004140 cleaning Methods 0.000 claims description 11
239000000470 constituent Substances 0.000 claims description 11
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 11
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 10
229910017604 nitric acid Inorganic materials 0.000 claims description 10
238000012545 processing Methods 0.000 claims description 10
238000012993 chemical processing Methods 0.000 claims description 9
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 8
MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims description 7
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
239000000203 mixture Substances 0.000 claims description 6
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 5
238000005530 etching Methods 0.000 claims description 5
229910052750 molybdenum Inorganic materials 0.000 claims description 5
239000011733 molybdenum Substances 0.000 claims description 5
229910052758 niobium Inorganic materials 0.000 claims description 5
239000010955 niobium Substances 0.000 claims description 5
GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 5
230000004913 activation Effects 0.000 claims description 4
WIUHYQBOXHNHLG-UHFFFAOYSA-N acetic acid hydrofluoride Chemical compound F.C(C)(=O)O WIUHYQBOXHNHLG-UHFFFAOYSA-N 0.000 claims description 3
238000005229 chemical vapour deposition Methods 0.000 claims description 3
239000010941 cobalt Substances 0.000 claims description 3
229910017052 cobalt Inorganic materials 0.000 claims description 3
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
238000001035 drying Methods 0.000 claims description 3
238000004070 electrodeposition Methods 0.000 claims description 3
229910052759 nickel Inorganic materials 0.000 claims description 3
238000005240 physical vapour deposition Methods 0.000 claims description 3
229910001495 sodium tetrafluoroborate Inorganic materials 0.000 claims description 3
239000007921 spray Substances 0.000 claims description 2
238000007751 thermal spraying Methods 0.000 claims description 2
238000003466 welding Methods 0.000 claims description 2
238000005219 brazing Methods 0.000 claims 1
239000010410 layer Substances 0.000 description 23
229910052782 aluminium Inorganic materials 0.000 description 9
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 9
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
239000010936 titanium Substances 0.000 description 8
229910052719 titanium Inorganic materials 0.000 description 7
238000000151 deposition Methods 0.000 description 5
230000008021 deposition Effects 0.000 description 5
239000000463 material Substances 0.000 description 5
238000001878 scanning electron micrograph Methods 0.000 description 4
238000007788 roughening Methods 0.000 description 3
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
239000013543 active substance Substances 0.000 description 2
238000005275 alloying Methods 0.000 description 2
230000003628 erosive effect Effects 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
230000003647 oxidation Effects 0.000 description 2
238000007254 oxidation reaction Methods 0.000 description 2
238000002360 preparation method Methods 0.000 description 2
239000011241 protective layer Substances 0.000 description 2
238000000746 purification Methods 0.000 description 2
239000012720 thermal barrier coating Substances 0.000 description 2
QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
229910000967 As alloy Inorganic materials 0.000 description 1
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
229910001069 Ti alloy Inorganic materials 0.000 description 1
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
239000000853 adhesive Substances 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
229910052796 boron Inorganic materials 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
229910052729 chemical element Inorganic materials 0.000 description 1
238000003486 chemical etching Methods 0.000 description 1
238000001311 chemical methods and process Methods 0.000 description 1
229910052804 chromium Inorganic materials 0.000 description 1
239000011651 chromium Substances 0.000 description 1
238000010276 construction Methods 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000003792 electrolyte Substances 0.000 description 1
238000009713 electroplating Methods 0.000 description 1
230000007613 environmental effect Effects 0.000 description 1
239000007789 gas Substances 0.000 description 1
229910052735 hafnium Inorganic materials 0.000 description 1
VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
229910052738 indium Inorganic materials 0.000 description 1
239000004615 ingredient Substances 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
229910052748 manganese Inorganic materials 0.000 description 1
239000011572 manganese Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
238000010926 purge Methods 0.000 description 1
229910052710 silicon Inorganic materials 0.000 description 1
239000010703 silicon Substances 0.000 description 1
239000010802 sludge Substances 0.000 description 1
238000005476 soldering Methods 0.000 description 1
238000005507 spraying Methods 0.000 description 1
229910052720 vanadium Inorganic materials 0.000 description 1
LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
238000005406 washing Methods 0.000 description 1
229910052726 zirconium Inorganic materials 0.000 description 1

Images

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/38—Pretreatment of metallic surfaces to be electroplated of refractory metals or nickel
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
- C25D11/08—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/16—Pretreatment, e.g. desmutting
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
- C25D11/24—Chemical after-treatment
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/26—Anodisation of refractory metals or alloys based thereon
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/34—Pretreatment of metallic surfaces to be electroplated
- C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
- C25D5/44—Aluminium
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching

Definitions

the invention relates to a method for coating surfaces of TiAl alloys, in which at least one layer is electrodeposited onto the surface.
turbomachines such as stationary gas turbines or aircraft engines
TiAl alloys are increasingly used, which allow due to their low specific weight and high strength at the same time a more efficient operation of the turbomachine.
environmental conditions prevail in turbomachinery which require the application of additional protective layers such as erosion control layers, oxidation protection layers, thermal barrier coatings, and the like.
a galvanically deposited metal layer is often provided as the base layer or intermediate layer between the component surface and the coating.
TiAl alloys Similar to titanium alloys and aluminum alloys, which very rapidly form oxide layers due to their affinity of their main alloying constituents titanium and aluminum for oxygen, TiAl alloys often form very rapidly an oxide layer on the surface due to the main constituents titanium and aluminum, which galvanically deposits a metallic one Layer makes it difficult or impossible.
Mechanical surface roughening may result in unwanted deformation and damage to the surface area, and other processes, such as chemical processes, often fail to provide the necessary surface adhesion or roughness for subsequent electroplating.
a TiAl alloy is understood as meaning a material having as main constituents, that is to say constituents with the largest proportions in the alloy titanium and aluminum, both titanium and aluminum being able to represent the largest alloying constituent in the alloy.
it is a TiAl alloy that forms intermetallic phases, such as, for example, ⁇ ⁇ ⁇ Ti 3 Al and / or ⁇ - TiAl.
Such a TiAl alloy may contain a variety of different ingredients, but their concentration is less than titanium and / or aluminum.
the present invention can be used in a wide range of different compositions of the TiAl alloys, since the principal constituents titanium and aluminum and the structural constituents formed therefrom give the effect of the present invention, even if a large number of different Alloy constituents are present in smaller concentrations, in particular if each further chemical element in the alloy is contained per se in a concentration of less than or equal to 10 at.%, In particular less than or equal to 5 at.%, Preferably less than or equal to 3 at Aluminum and titanium form the rest.
the present invention can be used in so-called TNM alloys which denote a TiAl alloy containing niobium and / or molybdenum as alloy constituents, in particular in proportions of 0 to 3 at.% For molybdenum and 0 to 5 at.% Of niobium ,
a surface is formed which is formed from a TiAl alloy.
the surface of the TiAl alloy is subjected to at least two-stage surface treatment to form a roughened surface, wherein at least one stage comprises electrochemical processing and at least the second stage involves electroless chemical processing.
Electrochemical processing is understood here to mean the processing of the surface in the presence of a chemically active substance, such as an electrolyte, with simultaneous application of an electrical voltage (potential difference), in which the material to be processed is anodically oxidized and thus dissolved.
a chemically active substance such as an electrolyte
an electrical voltage potential difference
the two-step, different in the steps surface treatment can be a particularly good roughening of the surface for subsequent galvanic coating achieve, which in particular allows a good adhesion of the coating.
surfaces of a TiAl alloy having an average roughness or an average roughness depth of the order of magnitude of 1 to 20 ⁇ m, in particular 5 to 15 ⁇ m, can be produced with the two-stage surface treatment.
the electrochemical machining may form the first stage of the treatment, while in the second stage an electroless chemical processing is performed.
electrochemical surface treatment and a subsequent electroless chemical processing is a particularly effective surface treatment for achieving a roughness, which allows a particularly good adhesion of electrodeposited layers given.
an acetic acid-hydrofluoric acid solution can be used, which in particular can have a composition in which the mass concentration of the acetic acid is 800 to 900 g / l and the mass concentration of the hydrofluoric acid is 100-200 g / l.
Electroless chemical processing can be carried out by active pickling in a fluoroboric acid-sodium tetrafluoroborate solution.
a cleaning step with a compressed air cleaning and / or a washing with water spray can be carried out by means of a water gun, which can preferably be followed by a drying step.
chemical pickling of the TiAl surface, ie the surface of a TiAl alloy, with an ammonium bifluoride-containing nitric acid may additionally be carried out before the two-stage surface treatment.
the composition of the ammonium bifluoride-containing nitric acid may be such that the mass concentration of the nitric acid is in the range of 300 to 400 g / L, while the ammonium bifluoride may be present in a mass concentration of 50 to 80 g / L.
a chemical cleaning step may be performed which may be carried out with an alkaline cleaning solution.
a rinsing of the TiAl surface can be carried out with demineralized water.
the galvanic layer which can be deposited after the appropriate preparation of the TiAl surface, can be a nickel or cobalt layer which can be deposited with a layer thickness of at least 1 ⁇ m, preferably at least 5 ⁇ m or in particular at least 10 ⁇ m.
At least one second layer may be deposited, which may be deposited by various methods, such as electrodeposition, physical vapor deposition (PVD), chemical vapor deposition (CVD), thermal spraying , Welding, soldering and the like.
PVD physical vapor deposition
CVD chemical vapor deposition
thermal spraying welding
soldering soldering
a component made of a TNM alloy is subjected to a coating comprising 43 to 45 at.% Aluminum, 0.5 to 3 at.% Molybdenum, 0 to 4.0 at.% Niobium, in total 0 to 5 at % Vanadium, chromium, manganese and iron, in sum with 0 to 0.5 at.% Hafnium and zirconium, 0.1 to 1 at.% Carbon and 0.05 to 0.2 at.% Boron and 0 to 1 At.% Silicon.
the component which in this case is completely made of TiAl - Material is formed, but may only have a surface area of the TiAl - material, is first subjected to a chemical cleaning with an alkaline cleaning solution with the name TURCO 5948 DPM (protected trade name of Fa. Henkel).
chemical pickling is carried out in an ammonium bifluoride-containing nitric acid containing 350 g / l nitric acid and 60 g / l ammonium bifuoride.
the TiAl - containing surface is sprayed to remove the pickling sludge with compressed air or a jet of water from an air / water gun and then dried.
the surface is rinsed with demineralized water. Purge with demineralized water in addition to the other purification steps described, both after chemical cleaning and after chemical pickling and anodic etching.
the thus prepared TiAl component can be galvanically coated with a layer of nickel and / or cobalt which has a layer thickness of at least 5 ⁇ m.
thermal barrier coatings such as thermal barrier coatings, oxidation protection coatings, erosion control coatings, wear protection coatings, dimensional correction coatings can be deposited using a wide variety of processes.
the individual process steps do not have to be carried out immediately after one another, but after a purification step and a drying step, the process can be interrupted and then continue with the next processing step after a break again.
FIG. 1 shows a cross - section of a metallograph in a scanning electron micrograph, the lower part of the image showing the TNM base material (dark gray) and the upper part (light gray) the electrodeposited coating. It can be clearly seen that the interface has a rough structure that allows the galvanic coating and good adhesion of the deposited layer due.
FIGS. 2 and 3 show scanning electron micrographs of the surface of the TNM component before the deposition of the galvanic layer. Again, it can be seen that the surface has a pronounced structuring, which allows the subsequent electrodeposition of the layer and improves the adhesion of the galvanic layer.

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Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Mechanical Engineering (AREA)
General Chemical & Material Sciences (AREA)
Inorganic Chemistry (AREA)
Other Surface Treatments For Metallic Materials (AREA)
ing And Chemical Polishing (AREA)
Electroplating Methods And Accessories (AREA)
Chemically Coating (AREA)

EP16170326.9A 2015-07-14 2016-05-19 Procede de revetement galvanique d'alliages tial Not-in-force EP3118352B1 (fr)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE102015213162.9A DE102015213162A1 (de)	2015-07-14	2015-07-14	Verfahren zum galvanischen Beschichten von TiAl-Legierungen

Publications (3)

Publication Number	Publication Date
EP3118352A2 true EP3118352A2 (fr)	2017-01-18
EP3118352A3 EP3118352A3 (fr)	2017-04-05
EP3118352B1 EP3118352B1 (fr)	2019-03-27

Family

ID=56024170

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EP16170326.9A Not-in-force EP3118352B1 (fr)	2015-07-14	2016-05-19	Procede de revetement galvanique d'alliages tial

Country Status (3)

Country	Link
US (1)	US10081877B2 (fr)
EP (1)	EP3118352B1 (fr)
DE (1)	DE102015213162A1 (fr)

Cited By (1)

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Publication number	Priority date	Publication date	Assignee	Title
CN111621841A (zh) *	2020-05-21	2020-09-04	南京理工大学	一种基于TiAl单晶EBSD样品的电解抛光液及其电解方法

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EP3326746A1 (fr) *	2016-11-25	2018-05-30	Helmholtz-Zentrum Geesthacht Zentrum für Material- und Küstenforschung GmbH	Procédé pour assembler et/ou réparer des substrats d'alliages d'aluminure de titane
US20200032412A1 (en) *	2018-07-25	2020-01-30	The Boeing Company	Compositions and Methods for Activating Titanium Substrates
JP7108984B1 (ja)	2021-09-22	2022-07-29	哲男原田	チタン合金表面の酸化被膜の除去
FR3141187B1 (fr) *	2022-10-20	2025-07-18	Safran Aircraft Engines	Traitement chimique pour optimisation de l'usinage de barreau en TiAl

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- 2016-06-27 US US15/193,688 patent/US10081877B2/en active Active

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CN111621841B (zh) *	2020-05-21	2022-05-10	南京理工大学	一种基于TiAl单晶EBSD样品的电解抛光液及其电解方法

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Publication number	Publication date
US20170016132A1 (en)	2017-01-19
US10081877B2 (en)	2018-09-25
EP3118352B1 (fr)	2019-03-27
EP3118352A3 (fr)	2017-04-05
DE102015213162A1 (de)	2017-01-19

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