EP3358043A4 - Elektrode zur erzeugung von chlor und verfahren zur herstellung davon - Google Patents

Elektrode zur erzeugung von chlor und verfahren zur herstellung davon Download PDF

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Publication number
EP3358043A4
EP3358043A4 EP16851508.8A EP16851508A EP3358043A4 EP 3358043 A4 EP3358043 A4 EP 3358043A4 EP 16851508 A EP16851508 A EP 16851508A EP 3358043 A4 EP3358043 A4 EP 3358043A4
Authority
EP
European Patent Office
Prior art keywords
electrode
manufacturing same
generating chlorine
chlorine
generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP16851508.8A
Other languages
English (en)
French (fr)
Other versions
EP3358043A1 (de
Inventor
Satoshi Hatano
Hiroki Higobashi
Satoshi KAKUI
Kouichi SODA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Soda Co Ltd
Original Assignee
Osaka Soda Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Soda Co Ltd filed Critical Osaka Soda Co Ltd
Publication of EP3358043A1 publication Critical patent/EP3358043A1/de
Publication of EP3358043A4 publication Critical patent/EP3358043A4/de
Withdrawn legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/04—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225—Deposition of multilayers of inorganic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
    • C23C18/1266—Particles formed in situ
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/26—Chlorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
    • C25B11/053—Electrodes comprising one or more electrocatalytic coatings on a substrate characterised by multilayer electrocatalytic coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Nanotechnology (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Catalysts (AREA)
EP16851508.8A 2015-09-28 2016-09-27 Elektrode zur erzeugung von chlor und verfahren zur herstellung davon Withdrawn EP3358043A4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015190314 2015-09-28
PCT/JP2016/078404 WO2017057337A1 (ja) 2015-09-28 2016-09-27 塩素発生用電極およびその製造方法

Publications (2)

Publication Number Publication Date
EP3358043A1 EP3358043A1 (de) 2018-08-08
EP3358043A4 true EP3358043A4 (de) 2019-06-26

Family

ID=58423826

Family Applications (1)

Application Number Title Priority Date Filing Date
EP16851508.8A Withdrawn EP3358043A4 (de) 2015-09-28 2016-09-27 Elektrode zur erzeugung von chlor und verfahren zur herstellung davon

Country Status (5)

Country Link
EP (1) EP3358043A4 (de)
JP (1) JP7073104B2 (de)
KR (1) KR20180058702A (de)
CN (1) CN107949663A (de)
WO (1) WO2017057337A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190022333A (ko) * 2017-08-23 2019-03-06 주식회사 엘지화학 전기분해용 양극 및 이의 제조방법
KR102355824B1 (ko) * 2018-12-27 2022-01-26 코웨이 주식회사 팔라듐, 이리듐 및 탄탈럼으로 구성된 전극용 촉매층 및 상기 전극용 촉매가 코팅된 살균수 생성 모듈
KR102214152B1 (ko) * 2019-04-29 2021-02-09 포항공과대학교 산학협력단 선박평형수 처리시설의 부식방지를 위한 고선택성 M/Ru 염소 발생반응 촉매
JP7706693B2 (ja) * 2021-08-31 2025-07-14 株式会社大阪ソーダ 塩素発生用電極およびその製造方法
KR102648323B1 (ko) * 2021-12-13 2024-03-14 경북대학교 산학협력단 선박평형수 전기분해용 Pt-Ru-Ti 촉매 전극
JP2023095833A (ja) * 2021-12-24 2023-07-06 石福金属興業株式会社 塩素発生用電極
JP2024010642A (ja) * 2022-07-12 2024-01-24 石福金属興業株式会社 塩素発生用電極

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51116182A (en) * 1975-04-04 1976-10-13 Tdk Corp An electrode
US4005004A (en) * 1974-09-27 1977-01-25 Asahi Kasei Kogyo Kabushiki Kaisha Electrode coating consisting of a solid solution of a noble metal oxide, titanium oxide, and zirconium oxide
JPS5518503A (en) * 1978-07-21 1980-02-08 Japan Carlit Co Ltd:The Electrode for electrolytic manufacturing hypochlorite
US4443317A (en) * 1981-10-08 1984-04-17 Tdk Electronics Co., Ltd. Electrode for electrolysis and process for its production
US5622613A (en) * 1994-10-05 1997-04-22 Chlorine Engineers Corp., Ltd. Electrolytic method for manufacturing hypochlorite
JP3319880B2 (ja) * 1994-07-22 2002-09-03 クロリンエンジニアズ株式会社 次亜塩素酸塩製造用の陽極およびその製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3227718A1 (de) 1982-07-24 1984-01-26 Erno Raumfahrttechnik Gmbh, 2800 Bremen Niedertemperaturwaermespeicher, insbesondere fuer gewaechshaeuser
US6572758B2 (en) * 2001-02-06 2003-06-03 United States Filter Corporation Electrode coating and method of use and preparation thereof
DE602005019105D1 (de) 2005-01-27 2010-03-11 Industrie De Nora Spa Hocheffizienter hypochloritanodenüberzug
JP4554542B2 (ja) 2006-03-09 2010-09-29 石福金属興業株式会社 電解用電極
JP4884333B2 (ja) 2007-08-24 2012-02-29 石福金属興業株式会社 電解用電極

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4005004A (en) * 1974-09-27 1977-01-25 Asahi Kasei Kogyo Kabushiki Kaisha Electrode coating consisting of a solid solution of a noble metal oxide, titanium oxide, and zirconium oxide
JPS51116182A (en) * 1975-04-04 1976-10-13 Tdk Corp An electrode
JPS5518503A (en) * 1978-07-21 1980-02-08 Japan Carlit Co Ltd:The Electrode for electrolytic manufacturing hypochlorite
US4443317A (en) * 1981-10-08 1984-04-17 Tdk Electronics Co., Ltd. Electrode for electrolysis and process for its production
JP3319880B2 (ja) * 1994-07-22 2002-09-03 クロリンエンジニアズ株式会社 次亜塩素酸塩製造用の陽極およびその製造方法
US5622613A (en) * 1994-10-05 1997-04-22 Chlorine Engineers Corp., Ltd. Electrolytic method for manufacturing hypochlorite

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2017057337A1 *

Also Published As

Publication number Publication date
JP7073104B2 (ja) 2022-05-23
KR20180058702A (ko) 2018-06-01
JPWO2017057337A1 (ja) 2018-07-19
EP3358043A1 (de) 2018-08-08
CN107949663A (zh) 2018-04-20
WO2017057337A1 (ja) 2017-04-06

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