JP7073104B2 - 塩素発生用電極およびその製造方法 - Google Patents

塩素発生用電極およびその製造方法 Download PDF

Info

Publication number
JP7073104B2
JP7073104B2 JP2017543417A JP2017543417A JP7073104B2 JP 7073104 B2 JP7073104 B2 JP 7073104B2 JP 2017543417 A JP2017543417 A JP 2017543417A JP 2017543417 A JP2017543417 A JP 2017543417A JP 7073104 B2 JP7073104 B2 JP 7073104B2
Authority
JP
Japan
Prior art keywords
catalyst layer
palladium
conductive substrate
chlorine
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2017543417A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2017057337A1 (ja
Inventor
聡 羽多野
弘喜 肥後橋
諭 角井
剛一 曽田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Soda Co Ltd
Original Assignee
Osaka Soda Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Soda Co Ltd filed Critical Osaka Soda Co Ltd
Publication of JPWO2017057337A1 publication Critical patent/JPWO2017057337A1/ja
Application granted granted Critical
Publication of JP7073104B2 publication Critical patent/JP7073104B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/04—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1225—Deposition of multilayers of inorganic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1262—Process of deposition of the inorganic material involving particles, e.g. carbon nanotubes [CNT], flakes
    • C23C18/1266—Particles formed in situ
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/26—Chlorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/052—Electrodes comprising one or more electrocatalytic coatings on a substrate
    • C25B11/053—Electrodes comprising one or more electrocatalytic coatings on a substrate characterised by multilayer electrocatalytic coatings
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Nanotechnology (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Catalysts (AREA)
JP2017543417A 2015-09-28 2016-09-27 塩素発生用電極およびその製造方法 Expired - Fee Related JP7073104B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2015190314 2015-09-28
JP2015190314 2015-09-28
PCT/JP2016/078404 WO2017057337A1 (ja) 2015-09-28 2016-09-27 塩素発生用電極およびその製造方法

Publications (2)

Publication Number Publication Date
JPWO2017057337A1 JPWO2017057337A1 (ja) 2018-07-19
JP7073104B2 true JP7073104B2 (ja) 2022-05-23

Family

ID=58423826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017543417A Expired - Fee Related JP7073104B2 (ja) 2015-09-28 2016-09-27 塩素発生用電極およびその製造方法

Country Status (5)

Country Link
EP (1) EP3358043A4 (de)
JP (1) JP7073104B2 (de)
KR (1) KR20180058702A (de)
CN (1) CN107949663A (de)
WO (1) WO2017057337A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190022333A (ko) * 2017-08-23 2019-03-06 주식회사 엘지화학 전기분해용 양극 및 이의 제조방법
KR102355824B1 (ko) * 2018-12-27 2022-01-26 코웨이 주식회사 팔라듐, 이리듐 및 탄탈럼으로 구성된 전극용 촉매층 및 상기 전극용 촉매가 코팅된 살균수 생성 모듈
KR102214152B1 (ko) * 2019-04-29 2021-02-09 포항공과대학교 산학협력단 선박평형수 처리시설의 부식방지를 위한 고선택성 M/Ru 염소 발생반응 촉매
JP7706693B2 (ja) * 2021-08-31 2025-07-14 株式会社大阪ソーダ 塩素発生用電極およびその製造方法
KR102648323B1 (ko) * 2021-12-13 2024-03-14 경북대학교 산학협력단 선박평형수 전기분해용 Pt-Ru-Ti 촉매 전극
JP2023095833A (ja) * 2021-12-24 2023-07-06 石福金属興業株式会社 塩素発生用電極
JP2024010642A (ja) * 2022-07-12 2024-01-24 石福金属興業株式会社 塩素発生用電極

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007239040A (ja) 2006-03-09 2007-09-20 Ishifuku Metal Ind Co Ltd 電解用電極
JP2009052069A (ja) 2007-08-24 2009-03-12 Ishifuku Metal Ind Co Ltd 電解用電極

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137877A (en) * 1974-09-27 1976-03-30 Asahi Chemical Ind Denkaiyodenkyoku oyobi sonoseizoho
JPS51116182A (en) * 1975-04-04 1976-10-13 Tdk Corp An electrode
JPS5518503A (en) * 1978-07-21 1980-02-08 Japan Carlit Co Ltd:The Electrode for electrolytic manufacturing hypochlorite
JPS5861286A (ja) * 1981-10-08 1983-04-12 Tdk Corp 電解用電極およびその製造方法
DE3227718A1 (de) 1982-07-24 1984-01-26 Erno Raumfahrttechnik Gmbh, 2800 Bremen Niedertemperaturwaermespeicher, insbesondere fuer gewaechshaeuser
JP3319880B2 (ja) * 1994-07-22 2002-09-03 クロリンエンジニアズ株式会社 次亜塩素酸塩製造用の陽極およびその製造方法
JP3319887B2 (ja) * 1994-10-05 2002-09-03 クロリンエンジニアズ株式会社 次亜塩素酸塩の製造方法
US6572758B2 (en) * 2001-02-06 2003-06-03 United States Filter Corporation Electrode coating and method of use and preparation thereof
AU2005325733B2 (en) 2005-01-27 2010-06-10 Industrie De Nora S.P.A. High efficiency hypochlorite anode coating

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007239040A (ja) 2006-03-09 2007-09-20 Ishifuku Metal Ind Co Ltd 電解用電極
JP2009052069A (ja) 2007-08-24 2009-03-12 Ishifuku Metal Ind Co Ltd 電解用電極

Also Published As

Publication number Publication date
KR20180058702A (ko) 2018-06-01
JPWO2017057337A1 (ja) 2018-07-19
CN107949663A (zh) 2018-04-20
WO2017057337A1 (ja) 2017-04-06
EP3358043A4 (de) 2019-06-26
EP3358043A1 (de) 2018-08-08

Similar Documents

Publication Publication Date Title
JP7073104B2 (ja) 塩素発生用電極およびその製造方法
CN101111631B (zh) 高效率次氯酸盐阳极涂层
CN1205359C (zh) 可用于电解水溶液的阴极
US11326266B2 (en) Electrode
KR20190022333A (ko) 전기분해용 양극 및 이의 제조방법
JP6920998B2 (ja) 塩素の電解発生のためのアノード
JP2011190534A (ja) 電極基体、それを用いた水溶液電気分解用陰極およびその製造方法
JP4986267B2 (ja) 電極製造方法
CN111670268A (zh) 用于电解氯化工艺的电极
JP2011202206A (ja) 不溶性電極及びその製造方法
US20070261968A1 (en) High efficiency hypochlorite anode coating
RU2660362C1 (ru) Катод для электролиза и способ его изготовления, и электролитическая ячейка для электролиза
CN104294311A (zh) 一种铂铱氧化物合金电极的制备方法
KR102576668B1 (ko) 전기분해용 전극
EA023083B1 (ru) Электрод для катодного выделения водорода в электролитическом процессе
JP7792416B2 (ja) 電気塩素化方法のための電解槽および自己洗浄型電気塩素化システム
JP7052130B1 (ja) 塩素発生用電極およびその製造方法
RU2425176C2 (ru) Способ получения электрода, электрод (варианты) и электролитическая ячейка (варианты)
RU2379380C2 (ru) Высокоэффективное анодное покрытие для получения гипохлорита
KR20130064280A (ko) 선박 밸러스트 수 전해살균용 불용성 전극 및 그 제조방법
JP2004360067A (ja) 電解用電極及びその製造方法
JP7706693B2 (ja) 塩素発生用電極およびその製造方法
KR20250109744A (ko) 염소 발생 전해용 양극

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20190808

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20200616

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200806

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20200908

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20201207

C60 Trial request (containing other claim documents, opposition documents)

Free format text: JAPANESE INTERMEDIATE CODE: C60

Effective date: 20201207

C11 Written invitation by the commissioner to file amendments

Free format text: JAPANESE INTERMEDIATE CODE: C11

Effective date: 20201222

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20210120

C21 Notice of transfer of a case for reconsideration by examiners before appeal proceedings

Free format text: JAPANESE INTERMEDIATE CODE: C21

Effective date: 20210126

A912 Re-examination (zenchi) completed and case transferred to appeal board

Free format text: JAPANESE INTERMEDIATE CODE: A912

Effective date: 20210226

C211 Notice of termination of reconsideration by examiners before appeal proceedings

Free format text: JAPANESE INTERMEDIATE CODE: C211

Effective date: 20210302

C22 Notice of designation (change) of administrative judge

Free format text: JAPANESE INTERMEDIATE CODE: C22

Effective date: 20210727

C22 Notice of designation (change) of administrative judge

Free format text: JAPANESE INTERMEDIATE CODE: C22

Effective date: 20211005

C13 Notice of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: C13

Effective date: 20211214

C141 Inquiry by the administrative judge

Free format text: JAPANESE INTERMEDIATE CODE: C141

Effective date: 20211214

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220203

C54 Written response to inquiry

Free format text: JAPANESE INTERMEDIATE CODE: C54

Effective date: 20220203

C23 Notice of termination of proceedings

Free format text: JAPANESE INTERMEDIATE CODE: C23

Effective date: 20220315

C03 Trial/appeal decision taken

Free format text: JAPANESE INTERMEDIATE CODE: C03

Effective date: 20220419

C30A Notification sent

Free format text: JAPANESE INTERMEDIATE CODE: C3012

Effective date: 20220419

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20220511

R150 Certificate of patent or registration of utility model

Ref document number: 7073104

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees