EP4004990A4 - Structures, dispositifs et systèmes de résonateur à ondes acoustiques de volume (baw) - Google Patents
Structures, dispositifs et systèmes de résonateur à ondes acoustiques de volume (baw) Download PDFInfo
- Publication number
- EP4004990A4 EP4004990A4 EP20847470.0A EP20847470A EP4004990A4 EP 4004990 A4 EP4004990 A4 EP 4004990A4 EP 20847470 A EP20847470 A EP 20847470A EP 4004990 A4 EP4004990 A4 EP 4004990A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- baw
- systems
- devices
- acoustic wave
- resonator structures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/175—Acoustic mirrors
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02244—Details of microelectro-mechanical resonators
- H03H9/02259—Driving or detection means
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02015—Characteristics of piezoelectric layers, e.g. cutting angles
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02062—Details relating to the vibration mode
- H03H9/0207—Details relating to the vibration mode the vibration mode being harmonic
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02062—Details relating to the vibration mode
- H03H9/02078—Details relating to the vibration mode the vibration mode being overmoded
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02102—Means for compensation or elimination of undesirable effects of temperature influence
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/0211—Means for compensation or elimination of undesirable effects of reflections
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02118—Means for compensation or elimination of undesirable effects of lateral leakage between adjacent resonators
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02157—Dimensional parameters, e.g. ratio between two dimension parameters, length, width or thickness
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H9/125—Driving means, e.g. electrodes, coils
- H03H9/13—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials
- H03H9/131—Driving means, e.g. electrodes, coils for networks consisting of piezoelectric or electrostrictive materials consisting of a multilayered structure
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/173—Air-gaps
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/174—Membranes
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/205—Constructional features of resonators consisting of piezoelectric or electrostrictive material having multiple resonators
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/56—Monolithic crystal filters
- H03H9/566—Electric coupling means therefor
- H03H9/568—Electric coupling means therefor consisting of a ladder configuration
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/582—Multiple crystal filters implemented with thin-film techniques
- H03H9/586—Means for mounting to a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/589—Acoustic mirrors
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/58—Multiple crystal filters
- H03H9/60—Electric coupling means therefor
- H03H9/605—Electric coupling means therefor consisting of a ladder configuration
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H2003/021—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the air-gap type
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
- H03H2003/0414—Resonance frequency
- H03H2003/0421—Modification of the thickness of an element
- H03H2003/0428—Modification of the thickness of an element of an electrode
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
- H03H9/02—Details
- H03H2009/02165—Tuning
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- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Applications Claiming Priority (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962881087P | 2019-07-31 | 2019-07-31 | |
| US201962881091P | 2019-07-31 | 2019-07-31 | |
| US201962881094P | 2019-07-31 | 2019-07-31 | |
| US201962881077P | 2019-07-31 | 2019-07-31 | |
| US201962881061P | 2019-07-31 | 2019-07-31 | |
| US201962881074P | 2019-07-31 | 2019-07-31 | |
| US201962881085P | 2019-07-31 | 2019-07-31 | |
| PCT/US2020/043716 WO2021021719A1 (fr) | 2019-07-31 | 2020-07-27 | Structures, dispositifs et systèmes de résonateur à ondes acoustiques de volume (baw) |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP4004990A1 EP4004990A1 (fr) | 2022-06-01 |
| EP4004990A4 true EP4004990A4 (fr) | 2023-08-30 |
Family
ID=74228365
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP20847975.8A Pending EP4005090A4 (fr) | 2019-07-31 | 2020-07-27 | Structures de résonateur à ondes acoustiques de volume (baw) à charge de masse, dispositifs et systèmes |
| EP20848167.1A Pending EP4005091A4 (fr) | 2019-07-31 | 2020-07-27 | Structures de dispositif acoustique, filtres et systèmes |
| EP20846873.6A Pending EP4003905A4 (fr) | 2019-07-31 | 2020-07-27 | Structures de résonateur à ondes acoustiques de volume (baw) dopées, dispositifs et systèmes |
| EP20847470.0A Pending EP4004990A4 (fr) | 2019-07-31 | 2020-07-27 | Structures, dispositifs et systèmes de résonateur à ondes acoustiques de volume (baw) |
Family Applications Before (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP20847975.8A Pending EP4005090A4 (fr) | 2019-07-31 | 2020-07-27 | Structures de résonateur à ondes acoustiques de volume (baw) à charge de masse, dispositifs et systèmes |
| EP20848167.1A Pending EP4005091A4 (fr) | 2019-07-31 | 2020-07-27 | Structures de dispositif acoustique, filtres et systèmes |
| EP20846873.6A Pending EP4003905A4 (fr) | 2019-07-31 | 2020-07-27 | Structures de résonateur à ondes acoustiques de volume (baw) dopées, dispositifs et systèmes |
Country Status (4)
| Country | Link |
|---|---|
| US (23) | US11101783B2 (fr) |
| EP (4) | EP4005090A4 (fr) |
| CN (1) | CN114208031A (fr) |
| WO (10) | WO2021021723A1 (fr) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021021723A1 (fr) | 2019-07-31 | 2021-02-04 | QXONIX Inc. | Structures, dispositifs et systèmes de dispositif acoustique |
| US20260066869A1 (en) * | 2019-07-31 | 2026-03-05 | Qxonix, Inc. | Structures, acoustic devices and systems |
| US12431861B2 (en) | 2019-07-31 | 2025-09-30 | Qxoniix Inc. | Layers, structures, acoustic wave resonators, devices and systems |
| US12445109B2 (en) | 2019-07-31 | 2025-10-14 | QXONIX Inc. | Structures, acoustic wave resonators, layers, devices and systems |
| US12451860B2 (en) | 2019-07-31 | 2025-10-21 | QXONIX Inc. | Structures, acoustic wave resonators, devices and systems |
| US12206388B2 (en) | 2020-04-22 | 2025-01-21 | The Regents Of The University Of Michigan | Bulk acoustic wave resonators employing materials with piezoelectric and negative piezoelectric coefficients |
| IT202100013004A1 (it) * | 2021-05-19 | 2022-11-19 | Spectron Microsystems S R L | Dispositivo risonatore |
| WO2023039307A2 (fr) * | 2021-05-28 | 2023-03-16 | University Of Florida Research Foundation, Inc. | Résonateurs auto-amplifiés avec des éléments piézorésistifs incorporés pour des applications à haute performance, à micro-ondes à échange ultra-faible et à ondes millimétriques |
| US12015430B2 (en) | 2021-06-09 | 2024-06-18 | Qorvo Us, Inc. | Dynamic band steering filter bank module |
| US12375063B2 (en) | 2021-06-09 | 2025-07-29 | Qorvo Us, Inc. | Dynamic band steering filter bank die |
| US12149230B2 (en) * | 2021-06-09 | 2024-11-19 | Qorvo Us, Inc. | Dynamic band steering filter bank die having filter skirt management |
| KR102680174B1 (ko) * | 2021-08-19 | 2024-07-01 | (주)와이솔 | Baw 공진기 및 baw 공진기 제조방법 |
| US12362724B2 (en) * | 2021-08-20 | 2025-07-15 | Raytheon Company | N-polar rare-earth III-nitride bulk acoustic wave resonator |
| US20250055434A1 (en) * | 2021-09-10 | 2025-02-13 | Akoustis, Inc. | Methods of forming piezoelectric layers having alternating polarizations |
| CN114722755A (zh) * | 2022-03-11 | 2022-07-08 | 电子科技大学 | 一种低损耗薄膜体声波磁电谐振器的设计方法 |
| US12525944B2 (en) * | 2022-03-31 | 2026-01-13 | Skyworks Global Pte. Ltd. | Acoustic wave device with wurtzite based piezoelectric layer with high acoustic velocity |
| DE102022203971A1 (de) * | 2022-04-25 | 2023-10-26 | Robert Bosch Gesellschaft mit beschränkter Haftung | Volumenakustische Vorrichtung und Verfahren zum Herstellen einer volumenakustischen Vorrichtung |
| CN114753150B (zh) * | 2022-05-12 | 2024-05-14 | 广东欣丰科技有限公司 | 一种导电织物及其制作方法和应用 |
| CN114976666B (zh) * | 2022-07-06 | 2024-01-30 | 中国人民解放军空军工程大学 | 双层频率多元反射超表面及设计方法 |
| US12362722B2 (en) | 2022-07-20 | 2025-07-15 | Avago Technologies International Sales Pte. Limited | Resonator with intrinsic second harmonic cancellation |
| WO2024032882A1 (fr) * | 2022-08-10 | 2024-02-15 | Huawei Technologies Co., Ltd. | Dispositif de résonateur acoustique de volume à capacités de manipulation de puissance améliorées par matériau piézoélectrique à double couche |
| US12506459B2 (en) * | 2022-09-22 | 2025-12-23 | Rf360 Singapore Pte. Ltd. | Bulk acoustic wave (BAW) device with oppositely polarized piezoelectric layers for higher order resonance and method of manufacture |
| US20240322790A1 (en) * | 2023-03-23 | 2024-09-26 | Carnegie Mellon University | Overmoded Bulk Acoustic Resonators and Method of Fabricating |
| DE102023203177A1 (de) | 2023-04-05 | 2024-10-10 | Robert Bosch Gesellschaft mit beschränkter Haftung | Resonator-Vorrichtung und Verfahren zum Herstellen einer Resonator-Vorrichtung |
| US20240372519A1 (en) * | 2023-05-06 | 2024-11-07 | AAC Technologies Pte. Ltd. | Method for fabricating film bulk acoustic resonator (fbar), fbar, and filter |
| FI20236003A1 (en) * | 2023-09-07 | 2025-03-08 | Teknologian Tutkimuskeskus Vtt Oy | Multi-layer structure and filter comprising the same |
| DE102023208649A1 (de) * | 2023-09-07 | 2025-03-13 | Robert Bosch Gesellschaft mit beschränkter Haftung | Akustischer Resonator und Herstellungsverfahren für einen akustischen Resonator |
| US12603632B2 (en) * | 2023-09-18 | 2026-04-14 | Rf360 Singapore Pte. Ltd. | Bulk acoustic wave devices having electrodes with acoustic impedance gradients to improve coupling efficiency and related fabrication methods |
| DE102023209099A1 (de) * | 2023-09-19 | 2025-03-20 | Robert Bosch Gesellschaft mit beschränkter Haftung | Volumenakustisches Bauelement und Verfahren zum Herstellen eines volumenakustischen Bauelements |
| US20250150055A1 (en) * | 2023-11-07 | 2025-05-08 | Rf360 Singapore Pte. Ltd. | Thin-film surface-acoustic-wave resonator with aluminum nitride layer |
| FI20245648A1 (en) * | 2024-05-22 | 2025-11-23 | Teknologian Tutkimuskeskus Vtt Oy | Thin-film BAW (Bulk Acoustic Wave) resonator and manufacturing method |
| WO2026039508A1 (fr) * | 2024-08-13 | 2026-02-19 | Murata Manufacturing Co., Ltd. | Résonateur à structure piézoélectrique à polarisation opposée |
| CN121077426A (zh) * | 2025-11-05 | 2025-12-05 | 南京大学 | 基于叠层钽酸锂单晶的体声波谐振器 |
| CN121077425A (zh) * | 2025-11-05 | 2025-12-05 | 南京大学 | 基于叠层铌酸锂单晶的体声波谐振器 |
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| JP2007036915A (ja) * | 2005-07-29 | 2007-02-08 | Doshisha | 高次モード薄膜共振器 |
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| US20170288121A1 (en) * | 2016-03-31 | 2017-10-05 | Avago Technologies General Ip (Singapore) Pte. Ltd | Acoustic resonator including composite polarity piezoelectric layer having opposite polarities |
| WO2018111532A1 (fr) * | 2016-12-13 | 2018-06-21 | Snaptrack, Inc. | Dispositif résonateur à ondes acoustiques de volume |
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| US5945770A (en) | 1997-08-20 | 1999-08-31 | Acuson Corporation | Multilayer ultrasound transducer and the method of manufacture thereof |
| US6509813B2 (en) * | 2001-01-16 | 2003-01-21 | Nokia Mobile Phones Ltd. | Bulk acoustic wave resonator with a conductive mirror |
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