ES2034897B1 - Procedimiento de galvanoplastia con niquel con acumulacion reducida deiones niquel. - Google Patents

Procedimiento de galvanoplastia con niquel con acumulacion reducida deiones niquel.

Info

Publication number: ES2034897B1
Authority: ES; Spain
Prior art keywords: nickel; galvanoplasty; procedure; accumulation; deion
Prior art date: 1990-10-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

ES9102320A

Other languages

English (en)

Spanish (es)

Other versions

ES2034897A1 (es

Inventor

Robert A Tremmel

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

MacDermid Enthone Inc

Original Assignee

Enthone OMI Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1990-10-22

Filing date

1991-10-18

Publication date

1994-04-16

1991-10-18 Application filed by Enthone OMI Inc filed Critical Enthone OMI Inc

1993-04-01 Publication of ES2034897A1 publication Critical patent/ES2034897A1/es

1994-04-16 Application granted granted Critical

1994-04-16 Publication of ES2034897B1 publication Critical patent/ES2034897B1/es

2011-10-18 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title abstract 8
229910052759 nickel Inorganic materials 0.000 title abstract 4
238000009825 accumulation Methods 0.000 title abstract 3
238000000034 method Methods 0.000 title abstract 3
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 abstract 4
VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 abstract 2
229910052742 iron Inorganic materials 0.000 abstract 2
229910001453 nickel ion Inorganic materials 0.000 abstract 2
238000000151 deposition Methods 0.000 abstract 1
239000003792 electrolyte Substances 0.000 abstract 1
239000000758 substrate Substances 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating And Plating Baths Therefor (AREA)
Electroplating Methods And Accessories (AREA)
Electrolytic Production Of Metals (AREA)

ES9102320A 1990-10-22 1991-10-18 Procedimiento de galvanoplastia con niquel con acumulacion reducida deiones niquel. Expired - Lifetime ES2034897B1 (es)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US60886990A	1990-10-22	1990-10-22

Publications (2)

Publication Number	Publication Date
ES2034897A1 ES2034897A1 (es)	1993-04-01
ES2034897B1 true ES2034897B1 (es)	1994-04-16

Family

ID=24438391

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
ES9102320A Expired - Lifetime ES2034897B1 (es)	1990-10-22	1991-10-18	Procedimiento de galvanoplastia con niquel con acumulacion reducida deiones niquel.

Country Status (8)

Country	Link
JP (1)	JPH04333600A (it)
CA (1)	CA2053342A1 (it)
DE (1)	DE4134656C2 (it)
ES (1)	ES2034897B1 (it)
FR (1)	FR2668173A1 (it)
GB (1)	GB2249107A (it)
IT (1)	IT1249854B (it)
SE (1)	SE9103061L (it)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE4229917C1 (en) *	1992-09-08	1993-07-15	Lpw-Anlagen Gmbh, 4040 Neuss, De	Electrolytic bath for meter coating - has sec. anode contg. alkaline or ammonium soln. with acid added to electrolyte to compensate for pH rise

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2393516A (en) *	1943-08-19	1946-01-22	Indiana Steel & Wire Company	Process for electroplating
US2504238A (en) *	1945-07-13	1950-04-18	Int Nickel Co	Anode assembly
BE564995A (it) *	1957-02-20
DE1250712B (de) *	1963-05-22	1967-09-21	International Nickel Limited, London	Galvanisches Nickelsulfamatbad und Verfahren zum Abscheiden von Nickeluberzugen
US3374154A (en) *	1965-07-12	1968-03-19	Int Nickel Co	Electroforming and electrodeposition of stress-free nickel from the sulfamate bath
US3474011A (en) *	1967-08-03	1969-10-21	American Bank Note Co	Electroplating method and apparatus
JPS5135394B2 (it) *	1972-09-01	1976-10-01
JPS558493A (en) *	1978-07-05	1980-01-22	Mazda Motor Corp	Nickel recovery system of nickel plating apparatus
JPS56112500A (en) *	1980-02-09	1981-09-04	Ebara Yuujiraito Kk	Method for electroplating
US4466865A (en) *	1982-01-11	1984-08-21	Omi International Corporation	Trivalent chromium electroplating process
DE3347593A1 (de) *	1983-01-03	1984-07-05	Omi International Corp., Warren, Mich.	Waessriger alkalischer cyanidfreier kupferelektrolyt und verfahren zur galvanischen abscheidung einer kornverfeinerten duktilen und haftfesten kupferschicht auf einem leitfaehigen substrat
US4469569A (en) *	1983-01-03	1984-09-04	Omi International Corporation	Cyanide-free copper plating process
JPS63317698A (ja) *	1987-06-20	1988-12-26	Toyota Motor Corp	電気めっき液の金属イオン濃度と水素イオン濃度の制御装置
US4778572A (en) *	1987-09-08	1988-10-18	Eco-Tec Limited	Process for electroplating metals
US4933051A (en) *	1989-07-24	1990-06-12	Omi International Corporation	Cyanide-free copper plating process

1991
- 1991-10-11 CA CA002053342A patent/CA2053342A1/en not_active Abandoned
- 1991-10-18 ES ES9102320A patent/ES2034897B1/es not_active Expired - Lifetime
- 1991-10-18 IT ITTO910789A patent/IT1249854B/it active IP Right Grant
- 1991-10-18 FR FR9112923A patent/FR2668173A1/fr active Pending
- 1991-10-19 DE DE4134656A patent/DE4134656C2/de not_active Expired - Fee Related
- 1991-10-21 SE SE9103061A patent/SE9103061L/ not_active Application Discontinuation
- 1991-10-22 GB GB9122383A patent/GB2249107A/en not_active Withdrawn
- 1991-10-22 JP JP3301226A patent/JPH04333600A/ja active Pending

Also Published As

Publication number	Publication date
CA2053342A1 (en)	1992-04-23
IT1249854B (it)	1995-03-28
JPH04333600A (ja)	1992-11-20
ITTO910789A0 (it)	1991-10-18
DE4134656C2 (de)	1994-02-03
ES2034897A1 (es)	1993-04-01
ITTO910789A1 (it)	1993-04-18
FR2668173A1 (fr)	1992-04-24
GB9122383D0 (en)	1991-12-04
SE9103061D0 (sv)	1991-10-21
DE4134656A1 (de)	1992-04-23
GB2249107A (en)	1992-04-29
SE9103061L (sv)	1992-04-23

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Legal Events

Date	Code	Title	Description
1994-12-01	FA2A	Application withdrawn	Effective date: 19941013