JPH04333600A - ニッケルイオン蓄積が減少されたニッケル電気メッキ処理 - Google Patents

ニッケルイオン蓄積が減少されたニッケル電気メッキ処理

Info

Publication number: JPH04333600A
Authority: JP; Japan
Prior art keywords: anode; nickel; current; bath; substrate
Prior art date: 1990-10-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP3301226A

Other languages

English (en)

Japanese (ja)

Inventor

Robert A Tremmel

ロバート・エー・トレンメル

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

MacDermid Enthone Inc

Original Assignee

Enthone Inc

Enthone OMI Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1990-10-22

Filing date

1991-10-22

Publication date

1992-11-20

1991-10-22 Application filed by Enthone Inc, Enthone OMI Inc filed Critical Enthone Inc

1992-11-20 Publication of JPH04333600A publication Critical patent/JPH04333600A/ja

Status Pending legal-status Critical Current

Links

PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 112
229910052759 nickel Inorganic materials 0.000 title claims abstract description 53
238000009713 electroplating Methods 0.000 title claims abstract description 35
229910001453 nickel ion Inorganic materials 0.000 title claims abstract description 22
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 33
239000000758 substrate Substances 0.000 claims abstract description 23
VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical group [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims abstract description 19
238000009825 accumulation Methods 0.000 claims abstract description 18
229910052742 iron Inorganic materials 0.000 claims abstract description 14
230000005611 electricity Effects 0.000 claims abstract 3
238000007747 plating Methods 0.000 claims description 45
238000000034 method Methods 0.000 claims description 35
239000003792 electrolyte Substances 0.000 claims description 13
239000000203 mixture Substances 0.000 claims description 10
UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 9
229910000480 nickel oxide Inorganic materials 0.000 claims description 5
GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 5
VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 claims description 3
235000013980 iron oxide Nutrition 0.000 claims 4
230000008021 deposition Effects 0.000 abstract description 3
239000000463 material Substances 0.000 abstract description 3
230000003247 decreasing effect Effects 0.000 abstract 1
229910000859 α-Fe Inorganic materials 0.000 description 15
UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 14
229910052751 metal Inorganic materials 0.000 description 14
239000002184 metal Substances 0.000 description 14
239000000243 solution Substances 0.000 description 13
238000012360 testing method Methods 0.000 description 13
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 6
239000000654 additive Substances 0.000 description 6
239000000460 chlorine Substances 0.000 description 6
229910052801 chlorine Inorganic materials 0.000 description 6
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
238000000354 decomposition reaction Methods 0.000 description 4
JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 4
239000010936 titanium Substances 0.000 description 4
229910052719 titanium Inorganic materials 0.000 description 4
230000004580 weight loss Effects 0.000 description 4
238000004458 analytical method Methods 0.000 description 3
230000015572 biosynthetic process Effects 0.000 description 3
239000000047 product Substances 0.000 description 3
239000003381 stabilizer Substances 0.000 description 3
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
229910052799 carbon Inorganic materials 0.000 description 2
230000000536 complexating effect Effects 0.000 description 2
230000000694 effects Effects 0.000 description 2
AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
150000002739 metals Chemical class 0.000 description 2
QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
230000010287 polarization Effects 0.000 description 2
239000002699 waste material Substances 0.000 description 2
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
239000005751 Copper oxide Substances 0.000 description 1
CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
230000001154 acute effect Effects 0.000 description 1
230000000996 additive effect Effects 0.000 description 1
230000002411 adverse Effects 0.000 description 1
230000033228 biological regulation Effects 0.000 description 1
239000002738 chelating agent Substances 0.000 description 1
239000003153 chemical reaction reagent Substances 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
229910052804 chromium Inorganic materials 0.000 description 1
239000011651 chromium Substances 0.000 description 1
229910001430 chromium ion Inorganic materials 0.000 description 1
JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
229910000428 cobalt oxide Inorganic materials 0.000 description 1
IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
239000008139 complexing agent Substances 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
229910052802 copper Inorganic materials 0.000 description 1
239000010949 copper Substances 0.000 description 1
229910000431 copper oxide Inorganic materials 0.000 description 1
239000007857 degradation product Substances 0.000 description 1
239000012895 dilution Substances 0.000 description 1
238000010790 dilution Methods 0.000 description 1
239000008151 electrolyte solution Substances 0.000 description 1
239000012530 fluid Substances 0.000 description 1
238000003306 harvesting Methods 0.000 description 1
-1 iron ions Chemical class 0.000 description 1
JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
229910021645 metal ion Inorganic materials 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
239000006259 organic additive Substances 0.000 description 1
UUWCBFKLGFQDME-UHFFFAOYSA-N platinum titanium Chemical compound [Ti].[Pt] UUWCBFKLGFQDME-UHFFFAOYSA-N 0.000 description 1
239000002244 precipitate Substances 0.000 description 1
238000003672 processing method Methods 0.000 description 1
238000001223 reverse osmosis Methods 0.000 description 1
239000004094 surface-active agent Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating And Plating Baths Therefor (AREA)
Electroplating Methods And Accessories (AREA)
Electrolytic Production Of Metals (AREA)

JP3301226A 1990-10-22 1991-10-22 ニッケルイオン蓄積が減少されたニッケル電気メッキ処理 Pending JPH04333600A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US60886990A	1990-10-22	1990-10-22
US07/608,869		1990-10-22

Publications (1)

Publication Number	Publication Date
JPH04333600A true JPH04333600A (ja)	1992-11-20

Family

ID=24438391

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP3301226A Pending JPH04333600A (ja)	1990-10-22	1991-10-22	ニッケルイオン蓄積が減少されたニッケル電気メッキ処理

Country Status (8)

Country	Link
JP (1)	JPH04333600A (it)
CA (1)	CA2053342A1 (it)
DE (1)	DE4134656C2 (it)
ES (1)	ES2034897B1 (it)
FR (1)	FR2668173A1 (it)
GB (1)	GB2249107A (it)
IT (1)	IT1249854B (it)
SE (1)	SE9103061L (it)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE4229917C1 (en) *	1992-09-08	1993-07-15	Lpw-Anlagen Gmbh, 4040 Neuss, De	Electrolytic bath for meter coating - has sec. anode contg. alkaline or ammonium soln. with acid added to electrolyte to compensate for pH rise

Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS4943876A (it) *	1972-09-01	1974-04-25
JPS558493A (en) *	1978-07-05	1980-01-22	Mazda Motor Corp	Nickel recovery system of nickel plating apparatus
JPS56112500A (en) *	1980-02-09	1981-09-04	Ebara Yuujiraito Kk	Method for electroplating

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US2393516A (en) *	1943-08-19	1946-01-22	Indiana Steel & Wire Company	Process for electroplating
US2504238A (en) *	1945-07-13	1950-04-18	Int Nickel Co	Anode assembly
BE564995A (it) *	1957-02-20
DE1250712B (de) *	1963-05-22	1967-09-21	International Nickel Limited, London	Galvanisches Nickelsulfamatbad und Verfahren zum Abscheiden von Nickeluberzugen
US3374154A (en) *	1965-07-12	1968-03-19	Int Nickel Co	Electroforming and electrodeposition of stress-free nickel from the sulfamate bath
US3474011A (en) *	1967-08-03	1969-10-21	American Bank Note Co	Electroplating method and apparatus
US4466865A (en) *	1982-01-11	1984-08-21	Omi International Corporation	Trivalent chromium electroplating process
DE3347593A1 (de) *	1983-01-03	1984-07-05	Omi International Corp., Warren, Mich.	Waessriger alkalischer cyanidfreier kupferelektrolyt und verfahren zur galvanischen abscheidung einer kornverfeinerten duktilen und haftfesten kupferschicht auf einem leitfaehigen substrat
US4469569A (en) *	1983-01-03	1984-09-04	Omi International Corporation	Cyanide-free copper plating process
JPS63317698A (ja) *	1987-06-20	1988-12-26	Toyota Motor Corp	電気めっき液の金属イオン濃度と水素イオン濃度の制御装置
US4778572A (en) *	1987-09-08	1988-10-18	Eco-Tec Limited	Process for electroplating metals
US4933051A (en) *	1989-07-24	1990-06-12	Omi International Corporation	Cyanide-free copper plating process

1991
- 1991-10-11 CA CA002053342A patent/CA2053342A1/en not_active Abandoned
- 1991-10-18 ES ES9102320A patent/ES2034897B1/es not_active Expired - Lifetime
- 1991-10-18 IT ITTO910789A patent/IT1249854B/it active IP Right Grant
- 1991-10-18 FR FR9112923A patent/FR2668173A1/fr active Pending
- 1991-10-19 DE DE4134656A patent/DE4134656C2/de not_active Expired - Fee Related
- 1991-10-21 SE SE9103061A patent/SE9103061L/ not_active Application Discontinuation
- 1991-10-22 GB GB9122383A patent/GB2249107A/en not_active Withdrawn
- 1991-10-22 JP JP3301226A patent/JPH04333600A/ja active Pending

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS4943876A (it) *	1972-09-01	1974-04-25
JPS558493A (en) *	1978-07-05	1980-01-22	Mazda Motor Corp	Nickel recovery system of nickel plating apparatus
JPS56112500A (en) *	1980-02-09	1981-09-04	Ebara Yuujiraito Kk	Method for electroplating

Also Published As

Publication number	Publication date
CA2053342A1 (en)	1992-04-23
IT1249854B (it)	1995-03-28
ITTO910789A0 (it)	1991-10-18
DE4134656C2 (de)	1994-02-03
ES2034897A1 (es)	1993-04-01
ITTO910789A1 (it)	1993-04-18
FR2668173A1 (fr)	1992-04-24
GB9122383D0 (en)	1991-12-04
SE9103061D0 (sv)	1991-10-21
DE4134656A1 (de)	1992-04-23
GB2249107A (en)	1992-04-29
SE9103061L (sv)	1992-04-23
ES2034897B1 (es)	1994-04-16

Publication	Publication Date	Title
US4469569A (en)	1984-09-04	Cyanide-free copper plating process
US2436316A (en)	1948-02-17	Bright alloy plating
AU647402B2 (en)	1994-03-24	Cyanide-free copper plating process
JPH01159395A (ja)	1989-06-22	金属の電気メッキ方法
KR101540615B1 (ko)	2015-07-30	주석 합금층의 도금을 위한 피로인산염계 전해조
CN105189831A (zh)	2015-12-23	用于在工件上电解沉积金属层的装置和方法
US5196109A (en)	1993-03-23	Trivalent chromium electrolytes and plating processes employing same
US4462874A (en)	1984-07-31	Cyanide-free copper plating process
CA1058553A (en)	1979-07-17	Electrodeposition of alloys of nickel, cobalt, or nickel and cobalt with iron
US4543167A (en)	1985-09-24	Control of anode gas evolution in trivalent chromium plating bath
US4466865A (en)	1984-08-21	Trivalent chromium electroplating process
US4439285A (en)	1984-03-27	Trivalent chromium electrolyte and process employing neodymium reducing agent
GB2117406A (en)	1983-10-12	Electrolytic stripping
JP2001172790A (ja)	2001-06-26	電気ニッケルめっき浴。
JPH04333600A (ja)	1992-11-20	ニッケルイオン蓄積が減少されたニッケル電気メッキ処理
US3488264A (en)	1970-01-06	High speed electrodeposition of nickel
EP0088192B1 (en)	1986-11-05	Control of anode gas evolution in trivalent chromium plating bath
CA1225064A (en)	1987-08-04	Cyanide-free copper plating process
ES2969188T3 (es)	2024-05-16	Procedimiento para la deposición galvánica de revestimientos de aleaciones de cinc-níquel a partir de un baño de aleación de cinc-níquel alcalino con degradación reducida de aditivos
US4923573A (en)	1990-05-08	Method for the electro-deposition of a zinc-nickel alloy coating on a steel band
US20140097094A1 (en)	2014-04-10	Recovery method of nickel from spent electroless nickel plating solutions by electrolysis
JPH1060683A (ja)	1998-03-03	電気めっき三元系亜鉛合金とその方法
JP2013534277A (ja)	2013-09-02	ニッケルのｐＨを調整する方法及び装置
Wery et al.	2000	Barrel zinc electrodeposition from alkaline solution
US3374154A (en)	1968-03-19	Electroforming and electrodeposition of stress-free nickel from the sulfamate bath