ES2055697T3 - Composiciones separables y metodos de separacion de capas protectoras de substratos. - Google Patents
Composiciones separables y metodos de separacion de capas protectoras de substratos.Info
- Publication number
- ES2055697T3 ES2055697T3 ES87116317T ES87116317T ES2055697T3 ES 2055697 T3 ES2055697 T3 ES 2055697T3 ES 87116317 T ES87116317 T ES 87116317T ES 87116317 T ES87116317 T ES 87116317T ES 2055697 T3 ES2055697 T3 ES 2055697T3
- Authority
- ES
- Spain
- Prior art keywords
- separation
- methods
- protective layers
- substrate protective
- separable compositions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title 1
- 239000011241 protective layer Substances 0.000 title 1
- 238000000926 separation method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
- -1 2-pyrrolidinone compound Chemical class 0.000 abstract 3
- 150000001412 amines Chemical class 0.000 abstract 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 abstract 2
- 239000002202 Polyethylene glycol Substances 0.000 abstract 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 1
- 229920001223 polyethylene glycol Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polyethers (AREA)
- Pyrrole Compounds (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US92940886A | 1986-11-10 | 1986-11-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2055697T3 true ES2055697T3 (es) | 1994-09-01 |
Family
ID=25457818
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES87116317T Expired - Lifetime ES2055697T3 (es) | 1986-11-10 | 1987-11-05 | Composiciones separables y metodos de separacion de capas protectoras de substratos. |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP0267540B1 (de) |
| JP (1) | JPS63186243A (de) |
| KR (1) | KR950000238B1 (de) |
| AT (1) | ATE88285T1 (de) |
| AU (1) | AU594509B2 (de) |
| CA (1) | CA1329037C (de) |
| DE (1) | DE3785418T2 (de) |
| ES (1) | ES2055697T3 (de) |
| IE (1) | IE59971B1 (de) |
| IL (1) | IL84388A (de) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4806506A (en) * | 1987-09-14 | 1989-02-21 | E. I. Du Pont De Nemours And Company | Process for detackifying photopolymer flexographic printing plates |
| JP2759462B2 (ja) * | 1988-11-11 | 1998-05-28 | ナガセ電子化学株式会社 | 水性剥離剤組成物 |
| CA2209677A1 (en) * | 1995-11-10 | 1997-05-15 | Toshihiko Taniguchi | A treating liquid for making a waterless planographic printing plate |
| US5909744A (en) * | 1996-01-30 | 1999-06-08 | Silicon Valley Chemlabs, Inc. | Dibasic ester stripping composition |
| US6511547B1 (en) | 1996-01-30 | 2003-01-28 | Siliconvalley Chemlabs, Inc. | Dibasic ester stripping composition |
| US5741368A (en) * | 1996-01-30 | 1998-04-21 | Silicon Valley Chemlabs | Dibasic ester stripping composition |
| KR100335011B1 (ko) * | 1999-08-19 | 2002-05-02 | 주식회사 동진쎄미켐 | 레지스트 제거용 조성물 |
| JP4501248B2 (ja) * | 2000-07-24 | 2010-07-14 | 東ソー株式会社 | レジスト剥離剤 |
| JP4501256B2 (ja) * | 2000-08-22 | 2010-07-14 | 東ソー株式会社 | レジスト剥離剤 |
| TWI275903B (en) * | 2001-03-13 | 2007-03-11 | Nagase Chemtex Corp | A composition for stripping photo resist |
| DE602005020499D1 (de) * | 2004-12-10 | 2010-05-20 | Mallinckrodt Baker Inc | Wasserfreie nicht korrosive mikroelektronische reinigungsverbindungen mit polymerischen corrosionsinhibitoren |
| JP5236217B2 (ja) * | 2006-06-22 | 2013-07-17 | 東進セミケム株式会社 | レジスト除去用組成物 |
| WO2010091045A2 (en) * | 2009-02-05 | 2010-08-12 | Advanced Technology Materials, Inc. | Non-fluoride containing composition for the removal of polymers and other organic material from a surface |
| US8309502B2 (en) | 2009-03-27 | 2012-11-13 | Eastman Chemical Company | Compositions and methods for removing organic substances |
| US8614053B2 (en) | 2009-03-27 | 2013-12-24 | Eastman Chemical Company | Processess and compositions for removing substances from substrates |
| US8444768B2 (en) | 2009-03-27 | 2013-05-21 | Eastman Chemical Company | Compositions and methods for removing organic substances |
| KR101089211B1 (ko) * | 2010-12-02 | 2011-12-02 | 엘티씨 (주) | 1차 알칸올 아민을 포함하는 ｌｃｄ 제조용 포토레지스트 박리액 조성물 |
| US9029268B2 (en) | 2012-11-21 | 2015-05-12 | Dynaloy, Llc | Process for etching metals |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4395479A (en) * | 1981-09-23 | 1983-07-26 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
| US4403029A (en) * | 1982-09-02 | 1983-09-06 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
| US4401747A (en) * | 1982-09-02 | 1983-08-30 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
| US4401748A (en) * | 1982-09-07 | 1983-08-30 | J. T. Baker Chemical Company | Stripping compositions and methods of stripping resists |
| JPS6026945A (ja) * | 1983-07-25 | 1985-02-09 | ジエイ・テイ・ベ−カ−・ケミカル・カンパニ− | ストリツピング組成物及びレジストをストリツピングする方法 |
| JPS6026340A (ja) * | 1983-07-25 | 1985-02-09 | ジエイ ティー ベイカー インコーポレーテッド | ストリツピング組成物及びレジストをストリツピングする方法 |
| JPS60131535A (ja) * | 1983-12-20 | 1985-07-13 | エッチエムシー・パテンツ・ホールディング・カンパニー・インコーポレーテッド | ポジのホトレジスト用のストリツピング組成物 |
-
1987
- 1987-09-01 IE IE234187A patent/IE59971B1/en not_active IP Right Cessation
- 1987-09-24 CA CA000547687A patent/CA1329037C/en not_active Expired - Lifetime
- 1987-09-30 AU AU79098/87A patent/AU594509B2/en not_active Expired
- 1987-10-12 JP JP62254801A patent/JPS63186243A/ja active Granted
- 1987-11-03 KR KR1019870012310A patent/KR950000238B1/ko not_active Expired - Lifetime
- 1987-11-05 ES ES87116317T patent/ES2055697T3/es not_active Expired - Lifetime
- 1987-11-05 DE DE8787116317T patent/DE3785418T2/de not_active Expired - Lifetime
- 1987-11-05 EP EP87116317A patent/EP0267540B1/de not_active Expired - Lifetime
- 1987-11-05 AT AT87116317T patent/ATE88285T1/de not_active IP Right Cessation
- 1987-11-06 IL IL84388A patent/IL84388A/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP0267540B1 (de) | 1993-04-14 |
| IE872341L (en) | 1988-05-10 |
| ATE88285T1 (de) | 1993-04-15 |
| CA1329037C (en) | 1994-05-03 |
| JPH0468624B2 (de) | 1992-11-02 |
| AU594509B2 (en) | 1990-03-08 |
| IL84388A0 (en) | 1988-04-29 |
| EP0267540A3 (en) | 1989-03-15 |
| EP0267540A2 (de) | 1988-05-18 |
| KR950000238B1 (ko) | 1995-01-12 |
| DE3785418T2 (de) | 1993-08-19 |
| AU7909887A (en) | 1988-05-12 |
| DE3785418D1 (de) | 1993-05-19 |
| IE59971B1 (en) | 1994-05-04 |
| KR880006572A (ko) | 1988-07-23 |
| JPS63186243A (ja) | 1988-08-01 |
| IL84388A (en) | 1991-06-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG2A | Definitive protection |
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