ES2056581T3 - Metodo de baja temperatura para convertir revestimientos precursores de silice en revestimientos ceramicos de silice. - Google Patents

Metodo de baja temperatura para convertir revestimientos precursores de silice en revestimientos ceramicos de silice.

Info

Publication number
ES2056581T3
ES2056581T3 ES91304881T ES91304881T ES2056581T3 ES 2056581 T3 ES2056581 T3 ES 2056581T3 ES 91304881 T ES91304881 T ES 91304881T ES 91304881 T ES91304881 T ES 91304881T ES 2056581 T3 ES2056581 T3 ES 2056581T3
Authority
ES
Spain
Prior art keywords
coatings
silice
low temperature
coating
converting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES91304881T
Other languages
English (en)
Inventor
Ronald Howard Baney
Carl Joseph Bilgrien
Dennis William Broderick
Leslie Earl Carpenter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Application granted granted Critical
Publication of ES2056581T3 publication Critical patent/ES2056581T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
    • C09D143/04—Homopolymers or copolymers of monomers containing silicon
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/5025—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with ceramic materials
    • C04B41/5035—Silica
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
    • C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
    • C04B2111/00844—Uses not provided for elsewhere in C04B2111/00 for electronic applications

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Silicon Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Catalysts (AREA)

Abstract

ESTE METODO SE REFIERE A UN METODO A BAJA TEMPERATURA PARA CONVERTIR REVESTIMIENTOS DE RESINA DE SILSESQUIOXANO DE HIDROGENO O R SUB XSI(OR)SUB 4-X HIDROLIZADO O PARCIALMENTE HIDROLIZADO A REVESTIMIENTOS DE SILICE CERAMICOS. ESTE METODO COMPRENDE APLICAR UN REVESTIMIENTO DE UN PRECURSOR DE SILICE A UN SUSTRATO, EXPONIENDO EL REVESTIMIENTO A UN ENTORNO QUE COMPRENDE UNA AMINA Y SUJETANDO EL REVESTIMIENTO A UNA TEMPERATURA SUFICIENTE COMO PARA PRODUCIR EL REVESTIMIENTO CERAMICO. LOS METODOS DE ESTA INVENCION SE PUEDEN APLICAR ESPECIALMENTE A REVESTIMIENTOS DE APLICACION EN DISPOSITIVOS ELECTRONICOS.
ES91304881T 1990-06-04 1991-05-30 Metodo de baja temperatura para convertir revestimientos precursores de silice en revestimientos ceramicos de silice. Expired - Lifetime ES2056581T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/532,705 US5116637A (en) 1990-06-04 1990-06-04 Amine catalysts for the low temperature conversion of silica precursors to silica

Publications (1)

Publication Number Publication Date
ES2056581T3 true ES2056581T3 (es) 1994-10-01

Family

ID=24122823

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91304881T Expired - Lifetime ES2056581T3 (es) 1990-06-04 1991-05-30 Metodo de baja temperatura para convertir revestimientos precursores de silice en revestimientos ceramicos de silice.

Country Status (7)

Country Link
US (1) US5116637A (es)
EP (1) EP0460868B1 (es)
JP (1) JP3097870B2 (es)
KR (1) KR0176259B1 (es)
CA (1) CA2042689A1 (es)
DE (1) DE69102021T2 (es)
ES (1) ES2056581T3 (es)

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US5445894A (en) * 1991-04-22 1995-08-29 Dow Corning Corporation Ceramic coatings
US5436029A (en) * 1992-07-13 1995-07-25 Dow Corning Corporation Curing silicon hydride containing materials by exposure to nitrous oxide
CA2104340A1 (en) * 1992-08-31 1994-03-01 Grish Chandra Hermetic protection for integrated circuits
US5820923A (en) * 1992-11-02 1998-10-13 Dow Corning Corporation Curing silica precursors by exposure to nitrous oxide
JP2739902B2 (ja) * 1993-09-30 1998-04-15 東京応化工業株式会社 酸化ケイ素系被膜形成用塗布液
KR0126792B1 (ko) * 1994-04-11 1998-04-01 김광호 폴리이미드(Polyimide) 표면 처리방법
US5456952A (en) * 1994-05-17 1995-10-10 Lsi Logic Corporation Process of curing hydrogen silsesquioxane coating to form silicon oxide layer
US5783716A (en) * 1996-06-28 1998-07-21 Advanced Technology Materials, Inc. Platinum source compositions for chemical vapor deposition of platinum
US5609925A (en) * 1995-12-04 1997-03-11 Dow Corning Corporation Curing hydrogen silsesquioxane resin with an electron beam
US6143855A (en) * 1997-04-21 2000-11-07 Alliedsignal Inc. Organohydridosiloxane resins with high organic content
US6015457A (en) * 1997-04-21 2000-01-18 Alliedsignal Inc. Stable inorganic polymers
US6218497B1 (en) 1997-04-21 2001-04-17 Alliedsignal Inc. Organohydridosiloxane resins with low organic content
US6743856B1 (en) 1997-04-21 2004-06-01 Honeywell International Inc. Synthesis of siloxane resins
US6177199B1 (en) 1999-01-07 2001-01-23 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with low organic content
US6218020B1 (en) 1999-01-07 2001-04-17 Alliedsignal Inc. Dielectric films from organohydridosiloxane resins with high organic content
JP2000119595A (ja) * 1998-10-14 2000-04-25 Shin Etsu Chem Co Ltd 焼成皮膜形成用オルガノポリシロキサン組成物
US6231989B1 (en) 1998-11-20 2001-05-15 Dow Corning Corporation Method of forming coatings
US6472076B1 (en) 1999-10-18 2002-10-29 Honeywell International Inc. Deposition of organosilsesquioxane films
US6440550B1 (en) * 1999-10-18 2002-08-27 Honeywell International Inc. Deposition of fluorosilsesquioxane films
KR100791564B1 (ko) * 1999-12-21 2008-01-03 삼성에스디아이 주식회사 희토류 산화물이 코팅된 형광체 및 그의 제조방법
US6913796B2 (en) * 2000-03-20 2005-07-05 Axcelis Technologies, Inc. Plasma curing process for porous low-k materials
US7011868B2 (en) * 2000-03-20 2006-03-14 Axcelis Technologies, Inc. Fluorine-free plasma curing process for porous low-k materials
US6576300B1 (en) 2000-03-20 2003-06-10 Dow Corning Corporation High modulus, low dielectric constant coatings
US6759098B2 (en) 2000-03-20 2004-07-06 Axcelis Technologies, Inc. Plasma curing of MSQ-based porous low-k film materials
US6558755B2 (en) 2000-03-20 2003-05-06 Dow Corning Corporation Plasma curing process for porous silica thin film
JP3526439B2 (ja) * 2000-09-29 2004-05-17 Ｈｏｙａ株式会社 眼鏡レンズ用コーティング組成物の製造方法
US6764809B2 (en) 2000-10-12 2004-07-20 North Carolina State University CO2-processes photoresists, polymers, and photoactive compounds for microlithography
GB0108274D0 (en) * 2001-04-03 2001-05-23 Dow Corning preparation of silicone resins
US6756085B2 (en) * 2001-09-14 2004-06-29 Axcelis Technologies, Inc. Ultraviolet curing processes for advanced low-k materials
GB0224044D0 (en) * 2002-10-16 2002-11-27 Dow Corning Silicone resins
KR100645682B1 (ko) * 2003-04-17 2006-11-13 주식회사 엘지화학 유기실록산 수지 및 이를 이용한 절연막
WO2005089480A2 (en) 2004-03-19 2005-09-29 Stuart Arthur Bateman Activation method
WO2005097883A2 (en) * 2004-03-26 2005-10-20 King Industries, Inc. Method of producing a crosslinked coating in the manufacture of integrated circuits
US8901268B2 (en) * 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
KR101264450B1 (ko) 2005-01-21 2013-05-15 더 보잉 컴파니 변형제를 이용한 활성화 방법
WO2006132655A1 (en) * 2005-06-03 2006-12-14 Axcelis Technologies, Inc. Ultraviolet curing process for low k dielectric films
US7955782B2 (en) * 2008-09-22 2011-06-07 Honeywell International Inc. Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
EP2493963A1 (en) 2009-10-28 2012-09-05 Dow Corning Corporation Polysilane - polysilazane copolymers and methods for their preparation and use
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
WO2013017132A1 (en) * 2011-07-29 2013-02-07 Inmold Biosystems A/S Reactive silicon oxide precursor facilitated anti-corrosion treatment
JP6803842B2 (ja) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング
TWI706913B (zh) * 2017-08-24 2020-10-11 南韓商Ｌｇ化學股份有限公司 二氧化矽膜之製法
CN111647270A (zh) * 2020-05-29 2020-09-11 浙江中科玖源新材料有限公司 一种绝缘聚酰亚胺薄膜及其制备方法

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US3923705A (en) * 1974-10-30 1975-12-02 Dow Corning Method of preparing fire retardant siloxane foams and foams prepared therefrom
US4384013A (en) * 1979-12-10 1983-05-17 Desoto, Inc. Volatile amine-cured trialkoxysilyl-containing aqueous latex coatings
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US4636440A (en) * 1985-10-28 1987-01-13 Manville Corporation Novel process for coating substrates with glass-like films and coated substrates
JPH0755835B2 (ja) * 1986-05-14 1995-06-14 日立化成工業株式会社 シリカガラスの製造方法
US4822697A (en) * 1986-12-03 1989-04-18 Dow Corning Corporation Platinum and rhodium catalysis of low temperature formation multilayer ceramics
US4756977A (en) * 1986-12-03 1988-07-12 Dow Corning Corporation Multilayer ceramics from hydrogen silsesquioxane
US4749631B1 (en) * 1986-12-04 1993-03-23 Multilayer ceramics from silicate esters
US4911992A (en) * 1986-12-04 1990-03-27 Dow Corning Corporation Platinum or rhodium catalyzed multilayer ceramic coatings from hydrogen silsesquioxane resin and metal oxides
JP2624254B2 (ja) * 1987-05-22 1997-06-25 東京応化工業株式会社 シリカ系被膜の膜質改善方法
US4849296A (en) * 1987-12-28 1989-07-18 Dow Corning Corporation Multilayer ceramic coatings from metal oxides and hydrogen silsesquioxane resin ceramified in ammonia
US4847162A (en) * 1987-12-28 1989-07-11 Dow Corning Corporation Multilayer ceramics coatings from the ceramification of hydrogen silsequioxane resin in the presence of ammonia
US4842888A (en) * 1988-04-07 1989-06-27 Dow Corning Corporation Ceramic coatings from the pyrolysis in ammonia of mixtures of silicate esters and other metal oxide precursors
US5059448A (en) * 1990-06-18 1991-10-22 Dow Corning Corporation Rapid thermal process for obtaining silica coatings
US5063267A (en) * 1990-11-28 1991-11-05 Dow Corning Corporation Hydrogen silsesquioxane resin fractions and their use as coating materials

Also Published As

Publication number Publication date
EP0460868B1 (en) 1994-05-18
JP3097870B2 (ja) 2000-10-10
DE69102021T2 (de) 1994-12-08
EP0460868A1 (en) 1991-12-11
KR0176259B1 (ko) 1999-04-01
JPH04228415A (ja) 1992-08-18
CA2042689A1 (en) 1991-12-05
US5116637A (en) 1992-05-26
DE69102021D1 (de) 1994-06-23
KR920000890A (ko) 1992-01-29

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