ES2061862T3 - Mezclas radiosensibles y su empleo. - Google Patents
Mezclas radiosensibles y su empleo.Info
- Publication number
- ES2061862T3 ES2061862T3 ES89117621T ES89117621T ES2061862T3 ES 2061862 T3 ES2061862 T3 ES 2061862T3 ES 89117621 T ES89117621 T ES 89117621T ES 89117621 T ES89117621 T ES 89117621T ES 2061862 T3 ES2061862 T3 ES 2061862T3
- Authority
- ES
- Spain
- Prior art keywords
- radiosensitive
- mixtures
- nearby
- polyquinazolons
- polyquinazolindions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 title abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical class [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 230000004069 differentiation Effects 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 230000002285 radioactive effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/0683—Polycondensates containing six-membered rings, condensed with other rings, with nitrogen atoms as the only ring hetero atoms
- C08G73/0694—Polycondensates containing six-membered rings, condensed with other rings, with nitrogen atoms as the only ring hetero atoms with only two nitrogen atoms in the ring, e.g. polyquinoxalines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/1025—Preparatory processes from tetracarboxylic acids or derivatives and diamines polymerised by radiations
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Paints Or Removers (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Light Receiving Elements (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Abstract
EL INVENTO CONSISTE EN UNAS MEZCLAS RADIOREACTIVAS ADECUADAS PARA LA ELABORACION DE POLIMIDOS, POLIISOINDOLOQUINAZOLINDIONES, POLIOXAINDIONES, POLIQUINAZOLINDIONES O POLIQUINAZOLONES A PARTIR DE COMPUESTOS CARBONILO QUE CONTIENEN FASES PREVIAS DETERMINADAS Y DE RESTOS AROMATICOS QUE, EN ESTADO EXCITADO MEDIANTE RADIACION UV, SON CAPACES DE LA ABSTRACCION DEL HIDROGENO Y QUE, AL SER RADIADOS CON LUZ ACTINICA, EXPERIMENTAN UNA DIFERENCIACION DE LA SOLUBILIDAD. SON ADECUADAS PARA LA ELABORACION DE CAPAS AISLANTES Y DE CIRCUITOS IMPRESOS.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3833438A DE3833438A1 (de) | 1988-10-01 | 1988-10-01 | Strahlungsempfindliche gemische und deren verwendung |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2061862T3 true ES2061862T3 (es) | 1994-12-16 |
Family
ID=6364186
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES89117621T Expired - Lifetime ES2061862T3 (es) | 1988-10-01 | 1989-09-23 | Mezclas radiosensibles y su empleo. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5284734A (es) |
| EP (1) | EP0362649B1 (es) |
| JP (1) | JPH02142828A (es) |
| DE (2) | DE3833438A1 (es) |
| ES (1) | ES2061862T3 (es) |
Families Citing this family (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0459395B1 (en) * | 1990-05-29 | 1999-08-18 | Sumitomo Bakelite Company Limited | Positive photo-sensitive resin composition |
| DE69331471T2 (de) * | 1992-07-22 | 2002-06-20 | Asahi Kasei K.K., Osaka | Photoempfindliche Polyimidvorlaüferzusammensetzung |
| US5700850A (en) | 1993-08-05 | 1997-12-23 | Kimberly-Clark Worldwide | Colorant compositions and colorant stabilizers |
| US6017471A (en) | 1993-08-05 | 2000-01-25 | Kimberly-Clark Worldwide, Inc. | Colorants and colorant modifiers |
| CA2120838A1 (en) | 1993-08-05 | 1995-02-06 | Ronald Sinclair Nohr | Solid colored composition mutable by ultraviolet radiation |
| US5733693A (en) | 1993-08-05 | 1998-03-31 | Kimberly-Clark Worldwide, Inc. | Method for improving the readability of data processing forms |
| US6017661A (en) | 1994-11-09 | 2000-01-25 | Kimberly-Clark Corporation | Temporary marking using photoerasable colorants |
| US5645964A (en) | 1993-08-05 | 1997-07-08 | Kimberly-Clark Corporation | Digital information recording media and method of using same |
| US5865471A (en) | 1993-08-05 | 1999-02-02 | Kimberly-Clark Worldwide, Inc. | Photo-erasable data processing forms |
| US5721287A (en) | 1993-08-05 | 1998-02-24 | Kimberly-Clark Worldwide, Inc. | Method of mutating a colorant by irradiation |
| US6211383B1 (en) | 1993-08-05 | 2001-04-03 | Kimberly-Clark Worldwide, Inc. | Nohr-McDonald elimination reaction |
| US5773182A (en) | 1993-08-05 | 1998-06-30 | Kimberly-Clark Worldwide, Inc. | Method of light stabilizing a colorant |
| US5681380A (en) | 1995-06-05 | 1997-10-28 | Kimberly-Clark Worldwide, Inc. | Ink for ink jet printers |
| US5643356A (en) | 1993-08-05 | 1997-07-01 | Kimberly-Clark Corporation | Ink for ink jet printers |
| US6071979A (en) | 1994-06-30 | 2000-06-06 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition method of generating a reactive species and applications therefor |
| US5685754A (en) | 1994-06-30 | 1997-11-11 | Kimberly-Clark Corporation | Method of generating a reactive species and polymer coating applications therefor |
| US6242057B1 (en) | 1994-06-30 | 2001-06-05 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition and applications therefor |
| US5739175A (en) | 1995-06-05 | 1998-04-14 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer |
| US6008268A (en) | 1994-10-21 | 1999-12-28 | Kimberly-Clark Worldwide, Inc. | Photoreactor composition, method of generating a reactive species, and applications therefor |
| US5786132A (en) | 1995-06-05 | 1998-07-28 | Kimberly-Clark Corporation | Pre-dyes, mutable dye compositions, and methods of developing a color |
| US5811199A (en) | 1995-06-05 | 1998-09-22 | Kimberly-Clark Worldwide, Inc. | Adhesive compositions containing a photoreactor composition |
| US5798015A (en) | 1995-06-05 | 1998-08-25 | Kimberly-Clark Worldwide, Inc. | Method of laminating a structure with adhesive containing a photoreactor composition |
| US5747550A (en) | 1995-06-05 | 1998-05-05 | Kimberly-Clark Worldwide, Inc. | Method of generating a reactive species and polymerizing an unsaturated polymerizable material |
| BR9608367A (pt) | 1995-06-05 | 1998-08-18 | Kimberly Clark Co | Pré-corantes novos |
| US5849411A (en) | 1995-06-05 | 1998-12-15 | Kimberly-Clark Worldwide, Inc. | Polymer film, nonwoven web and fibers containing a photoreactor composition |
| JP2000506550A (ja) | 1995-06-28 | 2000-05-30 | キンバリー クラーク ワールドワイド インコーポレイテッド | 新規な着色剤および着色剤用改質剤 |
| US5855655A (en) | 1996-03-29 | 1999-01-05 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US6099628A (en) | 1996-03-29 | 2000-08-08 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| ES2175168T3 (es) | 1995-11-28 | 2002-11-16 | Kimberly Clark Co | Compuestos de colorantes estabilizados por la luz. |
| US5782963A (en) | 1996-03-29 | 1998-07-21 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US5891229A (en) | 1996-03-29 | 1999-04-06 | Kimberly-Clark Worldwide, Inc. | Colorant stabilizers |
| US6524379B2 (en) | 1997-08-15 | 2003-02-25 | Kimberly-Clark Worldwide, Inc. | Colorants, colorant stabilizers, ink compositions, and improved methods of making the same |
| SK1542000A3 (en) | 1998-06-03 | 2001-11-06 | Kimberly Clark Co | Neonanoplasts produced by microemulsion technology and inks for ink jet printing |
| SK1552000A3 (en) | 1998-06-03 | 2000-08-14 | Kimberly Clark Co | Novel photoinitiators and applications therefor |
| JP2002520470A (ja) | 1998-07-20 | 2002-07-09 | キンバリー クラーク ワールドワイド インコーポレイテッド | 改良されたインクジェットインク組成物 |
| BR9914123B1 (pt) | 1998-09-28 | 2010-11-30 | fotoiniciadores e aplicações para os mesmos. | |
| EP1144512B1 (en) | 1999-01-19 | 2003-04-23 | Kimberly-Clark Worldwide, Inc. | Novel colorants, colorant stabilizers, ink compositions, and improved methods of making the same |
| US6331056B1 (en) | 1999-02-25 | 2001-12-18 | Kimberly-Clark Worldwide, Inc. | Printing apparatus and applications therefor |
| US6294698B1 (en) | 1999-04-16 | 2001-09-25 | Kimberly-Clark Worldwide, Inc. | Photoinitiators and applications therefor |
| US6368395B1 (en) | 1999-05-24 | 2002-04-09 | Kimberly-Clark Worldwide, Inc. | Subphthalocyanine colorants, ink compositions, and method of making the same |
| AU2001269905A1 (en) | 2000-06-19 | 2002-01-08 | Kimberly-Clark Worldwide, Inc. | Novel photoinitiators and applications therefor |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL177718C (nl) * | 1973-02-22 | 1985-11-01 | Siemens Ag | Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren. |
| DE2919841A1 (de) * | 1979-05-16 | 1980-11-20 | Siemens Ag | Verfahren zur phototechnischen herstellung von reliefstrukturen |
| DE2919840A1 (de) * | 1979-05-16 | 1980-11-20 | Siemens Ag | Verfahren zur phototechnischen herstellung von reliefstrukturen |
| DE2933827A1 (de) * | 1979-08-21 | 1981-03-12 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung. |
| DE2933826A1 (de) * | 1979-08-21 | 1981-03-19 | Siemens AG, 1000 Berlin und 8000 München | Polyimid-, polyisoindolochinazolindion-, polyoxazindion- und polychinazolindion-vorstufen sowie deren herstellung |
| DE3021748A1 (de) * | 1980-06-10 | 1981-12-17 | Siemens AG, 1000 Berlin und 8000 München | Strahlungsreaktive vorstufen hochwaermebestaendiger polymerer |
| EP0119719B1 (en) * | 1983-03-03 | 1987-05-06 | Toray Industries, Inc. | Radiation sensitive polymer composition |
| US4629777A (en) * | 1983-05-18 | 1986-12-16 | Ciba-Geigy Corporation | Polyimides, a process for their preparation and their use |
| US4657832A (en) * | 1983-05-18 | 1987-04-14 | Ciba-Geigy Corporation | Photosensitive polymers as coating materials |
| JPS59220729A (ja) * | 1983-05-30 | 1984-12-12 | Ube Ind Ltd | 有機溶媒可溶性の感光性ポリイミド |
| DE3411660A1 (de) * | 1984-03-29 | 1985-10-03 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-vorstufen |
| DE3411706A1 (de) * | 1984-03-29 | 1985-10-10 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von polyimidazol- und polyimidazopyrrolon-vorstufen |
| DE3411714A1 (de) * | 1984-03-29 | 1985-10-10 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung von polyimidazol- und polyimidazopyrrolon-reliefstrukturen |
| EP0162017B1 (de) * | 1984-05-17 | 1991-08-21 | Ciba-Geigy Ag | Homo- und Copolymere, Verfahren zu deren Vernetzung und derenVerwendung |
| US4598039A (en) * | 1984-07-02 | 1986-07-01 | At&T Bell Laboratories | Formation of features in optical material |
| DE3437348A1 (de) * | 1984-10-11 | 1986-04-24 | NORFIN Graphische Produkte GmbH, 3014 Hannover | Vorrichtung zur markierung der einzelnen auflagen oder druckbogenteilstapel auf dem ablagetisch einer druckmaschine |
| US4568601A (en) * | 1984-10-19 | 1986-02-04 | International Business Machines Corporation | Use of radiation sensitive polymerizable oligomers to produce polyimide negative resists and planarized dielectric components for semiconductor structures |
| US4698295A (en) * | 1984-11-16 | 1987-10-06 | Ciba-Geigy Corporation | Polyimides, a process for their preparation and their use, and tetracarboxylic acids and tetracarboxylic acid derivatives |
| US4551522A (en) * | 1985-04-26 | 1985-11-05 | E. I. Du Pont De Nemours And Company | Process for making photopolymerizable aromatic polyamic acid derivatives |
-
1988
- 1988-10-01 DE DE3833438A patent/DE3833438A1/de not_active Withdrawn
-
1989
- 1989-09-23 EP EP89117621A patent/EP0362649B1/de not_active Expired - Lifetime
- 1989-09-23 ES ES89117621T patent/ES2061862T3/es not_active Expired - Lifetime
- 1989-09-23 DE DE89117621T patent/DE58907082D1/de not_active Expired - Lifetime
- 1989-09-26 US US07/412,467 patent/US5284734A/en not_active Expired - Fee Related
- 1989-09-29 JP JP1252550A patent/JPH02142828A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02142828A (ja) | 1990-05-31 |
| DE58907082D1 (de) | 1994-04-07 |
| EP0362649B1 (de) | 1994-03-02 |
| EP0362649A3 (de) | 1991-08-07 |
| US5284734A (en) | 1994-02-08 |
| EP0362649A2 (de) | 1990-04-11 |
| DE3833438A1 (de) | 1990-04-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FG2A | Definitive protection |
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