ES2069525T3 - Placa impresora flexografica fotosensible. - Google Patents

Placa impresora flexografica fotosensible.

Info

Publication number
ES2069525T3
ES2069525T3 ES87109188T ES87109188T ES2069525T3 ES 2069525 T3 ES2069525 T3 ES 2069525T3 ES 87109188 T ES87109188 T ES 87109188T ES 87109188 T ES87109188 T ES 87109188T ES 2069525 T3 ES2069525 T3 ES 2069525T3
Authority
ES
Spain
Prior art keywords
photosensitive
resin layer
photosensitive flexographic
flexographic printing
cured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES87109188T
Other languages
English (en)
Inventor
Hidefumi Kusuda
Katsuji Konishi
Kazunori Kanda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=15531068&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ES2069525(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Application granted granted Critical
Publication of ES2069525T3 publication Critical patent/ES2069525T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Materials For Photolithography (AREA)

Abstract

SE PRESENTA UNA PLANCHA DE IMPRESION FLEXOGRAFICA FOTOSENSIBLE QUE TIENE UNA EXCELENTE RESISTENCIA AL USO Y QUE DA UN RELIEVE DE IMAGEN IGUAL A UNA PELICULA NEGATIVA. LA PLANCHA ESTA COMPUESTA DE UNA PLANCHA DE BASE Y UNA CAPA DE RESINA FOTOSENSIBLE SOBRE ELLA QUE ESTA FORMADA DE UN COMPUESTO DE RESINA QUE COMPRENDE UNA RESINA QUE TIENE ELASTICIDAD SIMILAR A LA GOMA, UN MONOMERO INSATURADO, UN INICIADOR DE FOTOPOLIMERIZACION Y PARTICULAS DE RESINA QUE TIENEN UN TAMAÑO ENTRE 0.01 A 6 MICRAS, Y CUANDO LA MENCIONADA CAPA DE RESINA FOTOSENSIBLE SE SECA TIENE UNA DUREZA JIS DE 30 A 80 Y UNA ELASTICIDAD DE IMPACTO DE AL MENOS EL 20%.
ES87109188T 1986-06-27 1987-06-26 Placa impresora flexografica fotosensible. Expired - Lifetime ES2069525T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61152009A JPH0746224B2 (ja) 1986-06-27 1986-06-27 感光性フレキソ印刷版

Publications (1)

Publication Number Publication Date
ES2069525T3 true ES2069525T3 (es) 1995-05-16

Family

ID=15531068

Family Applications (1)

Application Number Title Priority Date Filing Date
ES87109188T Expired - Lifetime ES2069525T3 (es) 1986-06-27 1987-06-26 Placa impresora flexografica fotosensible.

Country Status (8)

Country Link
US (1) US4957850A (es)
EP (1) EP0251228B1 (es)
JP (1) JPH0746224B2 (es)
AT (1) ATE117103T1 (es)
AU (1) AU603589B2 (es)
CA (1) CA1298145C (es)
DE (1) DE3750971T2 (es)
ES (1) ES2069525T3 (es)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PT85756A (pt) * 1986-09-22 1988-10-14 Napp Systems Inc Processo para a preparacao de chapas fotossensiveis e revelaveis com agua
JPH07113767B2 (ja) * 1986-10-02 1995-12-06 旭化成工業株式会社 段ボ−ル印刷用感光性樹脂印刷版
JPS63285551A (ja) * 1987-05-18 1988-11-22 Nippon Paint Co Ltd 水現像性印刷用版材
US4894315A (en) * 1988-08-30 1990-01-16 E. I. Du Pont De Nemours And Company Process for making flexographic printing plates with increased flexibility
US5171655A (en) * 1989-08-03 1992-12-15 Fuji Photo Film Co., Ltd. Photohardenable light-sensitive composition
JPH03161753A (ja) * 1989-11-20 1991-07-11 Fuji Photo Film Co Ltd 湿し水不要感光性平版印刷版
CA2051400A1 (en) * 1989-12-15 1991-06-16 Alan R. Browne Autodeposition emulsion for selectively protecting metallic surfaces
CA2040619A1 (en) * 1990-04-19 1991-10-20 Yoshichi Hagiwara Photocurable self-retainable gel, shaped article prepared therefrom, applications and preparations thereof
CA2041023C (en) * 1990-04-26 2002-03-12 William K. Goss Photocurable elements and flexographic printing plates prepared therefrom
US6060214A (en) * 1990-07-02 2000-05-09 Armstrong World Industries, Inc. Photopolymerizable, coatable plastisol
DE4032238A1 (de) * 1990-10-11 1992-04-23 Hoechst Ag Lichthaertbares elastomeres gemisch und daraus erhaltenes aufzeichnungsmaterial fuer die herstellung von reliefdruckplatten
JPH04274428A (ja) * 1991-03-01 1992-09-30 Nippon Paint Co Ltd オフセット印刷用感光性組成物
JP2793068B2 (ja) * 1991-04-24 1998-09-03 日本ペイント株式会社 感光性樹脂組成物
DE4211391A1 (de) 1992-04-04 1993-10-07 Hoechst Ag Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
DE4211390A1 (de) * 1992-04-04 1993-10-07 Hoechst Ag Lichthärtbares elastomeres Gemisch und daraus erhaltenes Aufzeichnungsmaterial für die Herstellung von Reliefdruckplatten
JPH06214386A (ja) * 1993-01-20 1994-08-05 Japan Synthetic Rubber Co Ltd 感光性樹脂組成物
US5496684A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
US5780202A (en) * 1994-04-08 1998-07-14 Toyo Boseki Kabushiki Kaisha Antistatic photosensitive multilayered structure and method for producing the same
US5422225A (en) * 1994-06-23 1995-06-06 Shell Oil Company Photopolymerizable recording composition for water-washable printing plates containing a water-dispersible elastomeric polymer blend
WO2002044813A1 (en) 2000-11-28 2002-06-06 Asahi Kasei Kabushiki Kaisha Improved water-developable photosensitive resin for flexography
US6881533B2 (en) * 2003-02-18 2005-04-19 Kodak Polychrome Graphics Llc Flexographic printing plate with ink-repellent non-image areas
DE102006028640A1 (de) * 2006-06-22 2008-01-03 Flint Group Germany Gmbh Fotopolymerisierbarer Schichtenverbund zur Herstellung von Flexodruckelementen
US8906593B1 (en) * 2012-09-23 2014-12-09 Hrl Laboratories, Llc Unsaturated monomeric formulations for the fabrication of polymeric waveguides

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE603930A (es) * 1960-05-19
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
US4177074A (en) * 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates
US4251618A (en) * 1978-10-11 1981-02-17 E. I. Du Pont De Nemours And Company Positive and negative working imaging systems from photoactive plastisols
US4330612A (en) * 1979-01-23 1982-05-18 Japan Synthetic Rubber Co., Ltd. Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer
BR8103183A (pt) * 1980-05-27 1982-02-09 Du Pont Camada foto-sensivel fina;elemento foto-resistor;substrato com uma camada foto-sensivel fina laminada;e processo para aparacao de camada foto-sensivel e de um material polimerico fino
US4415649A (en) * 1981-02-25 1983-11-15 E. I. Du Pont De Nemours & Co. Flexographic printing plates containing blended adhesives
US4400460A (en) * 1981-05-07 1983-08-23 E. I. Du Pont De Nemours And Compamy Process for surface treatment of flexographic printing plates containing butadiene/acrylonitrile copolymers
US4400459A (en) * 1981-05-07 1983-08-23 E. I. Du Pont De Nemours And Company Process for bromine surface treatment of photosensitive elastomeric flexographic printing plates
JPS58129066A (ja) 1982-01-27 1983-08-01 Nippon Paint Co Ltd 塗料組成物
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4414278A (en) * 1982-04-22 1983-11-08 E. I. Du Pont De Nemours And Company Crosslinked triacrylate polymer beads
EP0092783B1 (en) * 1982-04-22 1987-11-11 E.I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4518472A (en) * 1982-09-10 1985-05-21 Mitsubishi Rayon Company Ltd. Delustering coating composition excellent in abrasion resistance
US4478931A (en) * 1982-09-27 1984-10-23 E. I. Du Pont De Nemours And Company Precurled flexographic printing plate
JPS61162501A (ja) * 1985-01-10 1986-07-23 Nippon Paint Co Ltd 高エネルギ−線硬化樹脂組成物
JPH0764042B2 (ja) * 1989-09-04 1995-07-12 株式会社袋谷製作所 金属フィルムとカーボン繊維を組み合わせた軸状部材の製造方法

Also Published As

Publication number Publication date
ATE117103T1 (de) 1995-01-15
EP0251228A2 (en) 1988-01-07
AU7477487A (en) 1988-01-07
EP0251228B1 (en) 1995-01-11
JPS638648A (ja) 1988-01-14
DE3750971D1 (de) 1995-02-23
DE3750971T2 (de) 1995-05-18
CA1298145C (en) 1992-03-31
EP0251228A3 (en) 1988-09-21
JPH0746224B2 (ja) 1995-05-17
AU603589B2 (en) 1990-11-22
US4957850A (en) 1990-09-18

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