ES2082425T3 - Composiciones fotosensibles. - Google Patents

Composiciones fotosensibles.

Info

Publication number
ES2082425T3
ES2082425T3 ES92810400T ES92810400T ES2082425T3 ES 2082425 T3 ES2082425 T3 ES 2082425T3 ES 92810400 T ES92810400 T ES 92810400T ES 92810400 T ES92810400 T ES 92810400T ES 2082425 T3 ES2082425 T3 ES 2082425T3
Authority
ES
Spain
Prior art keywords
weight
alkyl
radical
cycloalkyl
mono
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES92810400T
Other languages
English (en)
Inventor
Bettina Dr Steinmann
Adrian Dr Schulthess
Max Dr Hunziker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of ES2082425T3 publication Critical patent/ES2082425T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/52—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/52—Polycarboxylic acids or polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • C08G63/56—Polyesters derived from ester-forming derivatives of polycarboxylic acids or of polyhydroxy compounds other than from esters thereof
    • C08G63/58—Cyclic ethers; Cyclic carbonates; Cyclic sulfites ; Cyclic orthoesters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

COMPUESTOS FOTOSENSIBLES QUE CONTIENEN A) 5-95% EN PESO DE UN POLIESTER DE LAS FORMULAS I, II O III EN DONDE R1 EQUIVALE A UN RESTO DE ANHIDRIDO CICLICO DE UN ACIDO DICARBOXILICO DESPUES DE ELIMINAR EL GRUPO TUIDO POR C1 ALQUENILO, C6 PUEDE ESTAR INTERRUMPIDO POR O, C1 C5 O UN RESTO QUIVALE A C1 LOS ATOMOS DE CARBONO, A LOS QUE VAN UNIDOS, EQUIVALEN A UN RESTO DE CICLOPENTILENO O CICLOHEXILENO, R4 UN RESTO CON 4 A 12 ATOMOS DE CARBONO QUE CONTIENE UN GRUPO FINAL NO SATURADO Y GRUPOS CARBOXILO O ETER, A REPRESENTA UN CARBOXILATO O ALCOHOLATO MONO O MULTIFUNCIONAL DE BAJO O ALTO PESO MOLECULAR, X UN NUMERO ENTRE 0 Y 100, N UN NUMERO ENTRE 2 Y 150 Y Z UN NUMERO ENTRE 1 Y 4. B) 10-90% EN PESO DE UN (MET)ACRILATO LIQUIDO, POLIFUNCIONAL ALIFATICO, CICLOALIFATICO O AROMATICO, C) 0-70% EN PESO DE UN MONO MOLECULAR DE 500 COMO MAXIMO, D) 0,1-10% EN PESO DE UN FOTOINICIADOR Y, DADO EL CASO, E) 0-10% EN PESO DE ADITIVOS CORRIENTES.
ES92810400T 1991-06-04 1992-05-26 Composiciones fotosensibles. Expired - Lifetime ES2082425T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH166791 1991-06-04

Publications (1)

Publication Number Publication Date
ES2082425T3 true ES2082425T3 (es) 1996-03-16

Family

ID=4215807

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92810400T Expired - Lifetime ES2082425T3 (es) 1991-06-04 1992-05-26 Composiciones fotosensibles.

Country Status (10)

Country Link
US (1) US5487966A (es)
EP (1) EP0517657B1 (es)
JP (1) JP2990398B2 (es)
KR (1) KR100214295B1 (es)
AT (1) ATE132278T1 (es)
AU (1) AU653817B2 (es)
CA (1) CA2070258C (es)
DE (1) DE59204801D1 (es)
ES (1) ES2082425T3 (es)
TW (1) TW363999B (es)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW269017B (es) * 1992-12-21 1996-01-21 Ciba Geigy Ag
US5496682A (en) * 1993-10-15 1996-03-05 W. R. Grace & Co.-Conn. Three dimensional sintered inorganic structures using photopolymerization
US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
US6569602B1 (en) * 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
JP3438027B2 (ja) 2000-09-29 2003-08-18 独立行政法人産業技術総合研究所 生分解性高分子量脂肪族ポリエステルの製造方法
GB2452545A (en) * 2007-09-07 2009-03-11 Fira Internat Ltd Lignocellulose coated with laser fused powder
US8148445B1 (en) * 2009-01-14 2012-04-03 Novartis Ag Ophthalmic and otorhinolaryngological device materials containing a multi-arm PEG macromer
WO2014002994A1 (ja) * 2012-06-26 2014-01-03 三菱レイヨン株式会社 高分子化合物の製造方法、および高分子化合物
US11283189B2 (en) 2017-05-02 2022-03-22 Rogers Corporation Connected dielectric resonator antenna array and method of making the same
KR102921761B1 (ko) * 2019-05-30 2026-02-04 로저스코포레이션 스테레오리소그래피용 광경화성 조성물, 조성물을 사용한 스테레오리소그래피 방법, 스테레오리소그래피 방법에 의해 형성된 폴리머 성분, 및 폴리머 성분을 포함하는 장치
WO2021011357A1 (en) * 2019-07-12 2021-01-21 3D Systems, Inc. Build materials for 3d printing

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1265414B (de) * 1962-02-24 1968-04-04 Bayer Ag Verfahren zum Herstellen von Polyestern
DE2057884A1 (de) * 1969-11-27 1971-06-03 Takeda Chemical Industries Ltd Verfahren zur Herstellung von Polyaetherpolyesterpolyolen
JPS4920292A (es) * 1972-06-16 1974-02-22
US4100141A (en) * 1976-07-02 1978-07-11 Loctite (Ireland) Limited Stabilized adhesive and curing compositions
US4575330A (en) * 1984-08-08 1986-03-11 Uvp, Inc. Apparatus for production of three-dimensional objects by stereolithography
EP0223587B1 (en) * 1985-11-20 1991-02-13 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
CA2007295C (en) * 1989-01-10 2001-02-20 Max Hunziker Photocurable compositions

Also Published As

Publication number Publication date
JPH05249669A (ja) 1993-09-28
CA2070258A1 (en) 1992-12-05
TW363999B (en) 1999-07-11
KR100214295B1 (ko) 1999-08-02
KR930001007A (ko) 1993-01-16
AU653817B2 (en) 1994-10-13
CA2070258C (en) 1999-12-28
JP2990398B2 (ja) 1999-12-13
AU1801292A (en) 1992-12-10
DE59204801D1 (de) 1996-02-08
EP0517657B1 (de) 1995-12-27
EP0517657A1 (de) 1992-12-09
US5487966A (en) 1996-01-30
ATE132278T1 (de) 1996-01-15

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