ES2084148T3 - Aparato acoplador de ondas de radio frecuencia resonante mejorado que utiliza modos superiores. - Google Patents

Aparato acoplador de ondas de radio frecuencia resonante mejorado que utiliza modos superiores.

Info

Publication number
ES2084148T3
ES2084148T3 ES91900585T ES91900585T ES2084148T3 ES 2084148 T3 ES2084148 T3 ES 2084148T3 ES 91900585 T ES91900585 T ES 91900585T ES 91900585 T ES91900585 T ES 91900585T ES 2084148 T3 ES2084148 T3 ES 2084148T3
Authority
ES
Spain
Prior art keywords
radio wave
coupling device
modes
wave coupling
improved radio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES91900585T
Other languages
English (en)
Inventor
Jes Asmussen
Jeffrey A Hopwood
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Michigan State University MSU
Original Assignee
Michigan State University MSU
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Michigan State University MSU filed Critical Michigan State University MSU
Application granted granted Critical
Publication of ES2084148T3 publication Critical patent/ES2084148T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32678—Electron cyclotron resonance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/16—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields
    • H05H1/18—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using externally-applied electric and magnetic fields wherein the fields oscillate at very high frequency, e.g. in the microwave range, e.g. using cyclotron resonance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Radar Systems Or Details Thereof (AREA)
  • Aerials With Secondary Devices (AREA)
  • Transmitters (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)

Abstract

SE DESCRIBE UN APARATO MEJORADO PARA GENERAR UNA REGION DE RESONANCIA CICLOTRONICA DEL ELECTRON (ECR) UNIFORME EN UNA REGION DE PLASMA (16) DE UNA CAMARA (15). EL APARATO UTILIZA MODOS MAS ALTOS DE CUSPIDES DE CAMPOS ELECTRICOS (16B) QUE SON ESENCIALMENTE PERPENDICULARES A LAS CUSPIDES DE CAMPO MAGNETICO (16A) DE FORMA CONTROLADA PARA PRODUCIR LA ECR. LOS MODOS SON OPTIMOS EN LA REGION ECR.
ES91900585T 1989-10-20 1990-10-15 Aparato acoplador de ondas de radio frecuencia resonante mejorado que utiliza modos superiores. Expired - Lifetime ES2084148T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/424,720 US5081398A (en) 1989-10-20 1989-10-20 Resonant radio frequency wave coupler apparatus using higher modes

Publications (1)

Publication Number Publication Date
ES2084148T3 true ES2084148T3 (es) 1996-05-01

Family

ID=23683623

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91900585T Expired - Lifetime ES2084148T3 (es) 1989-10-20 1990-10-15 Aparato acoplador de ondas de radio frecuencia resonante mejorado que utiliza modos superiores.

Country Status (9)

Country Link
US (1) US5081398A (es)
EP (1) EP0450061B1 (es)
JP (1) JP2822103B2 (es)
AT (1) ATE132687T1 (es)
DE (1) DE69024632T2 (es)
DK (1) DK0450061T3 (es)
ES (1) ES2084148T3 (es)
GR (1) GR3019184T3 (es)
WO (1) WO1991006199A1 (es)

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US6113701A (en) 1985-02-14 2000-09-05 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, manufacturing method, and system
US6673722B1 (en) 1985-10-14 2004-01-06 Semiconductor Energy Laboratory Co., Ltd. Microwave enhanced CVD system under magnetic field
US6230650B1 (en) 1985-10-14 2001-05-15 Semiconductor Energy Laboratory Co., Ltd. Microwave enhanced CVD system under magnetic field
US5804033A (en) * 1990-09-26 1998-09-08 Hitachi, Ltd. Microwave plasma processing method and apparatus
FR2671931A1 (fr) * 1991-01-22 1992-07-24 Metal Process Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma.
IT1246684B (it) * 1991-03-07 1994-11-24 Proel Tecnologie Spa Propulsore ionico a risonanza ciclotronica.
US5189446A (en) * 1991-05-17 1993-02-23 International Business Machines Corporation Plasma wafer processing tool having closed electron cyclotron resonance
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US5361016A (en) * 1992-03-26 1994-11-01 General Atomics High density plasma formation using whistler mode excitation in a reduced cross-sectional area formation tube
US5444207A (en) * 1992-03-26 1995-08-22 Kabushiki Kaisha Toshiba Plasma generating device and surface processing device and method for processing wafers in a uniform magnetic field
US5660744A (en) * 1992-03-26 1997-08-26 Kabushiki Kaisha Toshiba Plasma generating apparatus and surface processing apparatus
US5225740A (en) * 1992-03-26 1993-07-06 General Atomics Method and apparatus for producing high density plasma using whistler mode excitation
EP0566143B1 (en) * 1992-04-17 1999-11-24 Matsushita Electric Industrial Co., Ltd. Apparatus and method for generating plasma
US5292370A (en) * 1992-08-14 1994-03-08 Martin Marietta Energy Systems, Inc. Coupled microwave ECR and radio-frequency plasma source for plasma processing
AU5098293A (en) * 1992-09-02 1994-03-29 University Of North Carolina At Chapel Hill, The Method for plasma processing at high pressures
JP2972477B2 (ja) * 1993-01-27 1999-11-08 日本電気株式会社 Ｒｆ・ｅｃｒプラズマエッチング装置
US5359621A (en) * 1993-05-11 1994-10-25 General Atomics High efficiency gas laser with axial magnetic field and tunable microwave resonant cavity
US5457298A (en) * 1993-07-27 1995-10-10 Tulip Memory Systems, Inc. Coldwall hollow-cathode plasma device for support of gas discharges
US5470423A (en) * 1994-01-25 1995-11-28 Board Of Trustees Operating Michigan State University Microwave pultrusion apparatus and method of use
JPH07245193A (ja) * 1994-03-02 1995-09-19 Nissin Electric Co Ltd プラズマ発生装置及びプラズマ処理装置
IT1269413B (it) * 1994-10-21 1997-04-01 Proel Tecnologie Spa Sorgente di plasma a radiofrequenza
TW285746B (es) * 1994-10-26 1996-09-11 Matsushita Electric Industrial Co Ltd
US5589737A (en) * 1994-12-06 1996-12-31 Lam Research Corporation Plasma processor for large workpieces
US5718795A (en) * 1995-08-21 1998-02-17 Applied Materials, Inc. Radial magnetic field enhancement for plasma processing
US6077787A (en) * 1995-09-25 2000-06-20 Board Of Trustees Operating Michigan State University Method for radiofrequency wave etching
US5767628A (en) * 1995-12-20 1998-06-16 International Business Machines Corporation Helicon plasma processing tool utilizing a ferromagnetic induction coil with an internal cooling channel
US5686796A (en) * 1995-12-20 1997-11-11 International Business Machines Corporation Ion implantation helicon plasma source with magnetic dipoles
JP3225855B2 (ja) * 1996-06-06 2001-11-05 株式会社島津製作所 薄膜形成装置
US8617351B2 (en) * 2002-07-09 2013-12-31 Applied Materials, Inc. Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
US20070048882A1 (en) * 2000-03-17 2007-03-01 Applied Materials, Inc. Method to reduce plasma-induced charging damage
US8048806B2 (en) 2000-03-17 2011-11-01 Applied Materials, Inc. Methods to avoid unstable plasma states during a process transition
US6541781B1 (en) * 2000-07-25 2003-04-01 Axcelis Technologies, Inc. Waveguide for microwave excitation of plasma in an ion beam guide
US7374636B2 (en) * 2001-07-06 2008-05-20 Applied Materials, Inc. Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor
JP4009087B2 (ja) * 2001-07-06 2007-11-14 アプライド マテリアルズ インコーポレイテッド 半導体製造装置における磁気発生装置、半導体製造装置および磁場強度制御方法
US6759808B2 (en) * 2001-10-26 2004-07-06 Board Of Trustees Of Michigan State University Microwave stripline applicators
KR100458328B1 (ko) * 2002-03-27 2004-11-26 주성엔지니어링(주) 플라즈마 감지장치
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US7059268B2 (en) * 2002-12-20 2006-06-13 Tokyo Electron Limited Method, apparatus and magnet assembly for enhancing and localizing a capacitively coupled plasma
US7422654B2 (en) * 2003-02-14 2008-09-09 Applied Materials, Inc. Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor
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JP4527432B2 (ja) * 2004-04-08 2010-08-18 東京エレクトロン株式会社 プラズマ処理方法及びプラズマ処理装置
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TW201328437A (zh) * 2011-12-22 2013-07-01 Atomic Energy Council 具移動式磁鐵機構之電漿火炬裝置
US10266802B2 (en) * 2013-01-16 2019-04-23 Orteron (T.O) Ltd. Method for controlling biological processes in microorganisms
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US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
US4585668A (en) * 1983-02-28 1986-04-29 Michigan State University Method for treating a surface with a microwave or UHF plasma and improved apparatus
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FR2583250B1 (fr) * 1985-06-07 1989-06-30 France Etat Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique
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JPH02141494A (ja) * 1988-07-30 1990-05-30 Kobe Steel Ltd ダイヤモンド気相合成装置

Also Published As

Publication number Publication date
EP0450061A1 (en) 1991-10-09
JP2822103B2 (ja) 1998-11-11
DK0450061T3 (da) 1996-04-29
DE69024632D1 (de) 1996-02-15
EP0450061B1 (en) 1996-01-03
US5081398A (en) 1992-01-14
DE69024632T2 (de) 1996-05-15
ATE132687T1 (de) 1996-01-15
WO1991006199A1 (en) 1991-05-02
GR3019184T3 (en) 1996-06-30
EP0450061A4 (en) 1992-08-05

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