ES2112025T3 - Celda de electrodeposicion en continuo de aleaciones metalicas. - Google Patents

Celda de electrodeposicion en continuo de aleaciones metalicas.

Info

Publication number
ES2112025T3
ES2112025T3 ES95401908T ES95401908T ES2112025T3 ES 2112025 T3 ES2112025 T3 ES 2112025T3 ES 95401908 T ES95401908 T ES 95401908T ES 95401908 T ES95401908 T ES 95401908T ES 2112025 T3 ES2112025 T3 ES 2112025T3
Authority
ES
Spain
Prior art keywords
anode
strip
edges
metal alloys
continuous electrical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES95401908T
Other languages
English (en)
Inventor
Franco Delfrate
Claude Arnoux
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sollac SA
Original Assignee
Sollac SA
Lorraine de Laminage Continu SA SOLLAC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sollac SA, Lorraine de Laminage Continu SA SOLLAC filed Critical Sollac SA
Application granted granted Critical
Publication of ES2112025T3 publication Critical patent/ES2112025T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0671—Selective plating
    • C25D7/0678—Selective plating using masks
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/22—Electroplating: Baths therefor from solutions of zinc
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0642—Anodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Secondary Cells (AREA)

Abstract

CELULA DE ELECTRODEPOSICION QUE COMPRENDE UNA CUBA DE ELECTROLISIS (2) QUE CONTIENE UN BAÑO DE ELECTRODEPOSICION (S), AL MENOS UN ANODO SUMERGIDO (3),MEDIOS PARA HACER PASAR UNA BANDA EN EL BAÑO (S) FRENTE A DICHO ANODO (39, DE UNO DE SUS REBORDES (3A) AL REBORDES OPUESTO (3B), Y MASCARAS ELECTRONICAMENTE AISLANTES (4A,4B) DISPUESTOS A LO LARGO DE DICHOS REBORDES (3A, 3B). DICHAS MASCARAS SOBRESALEN RESPECTO DE DICHOS REBORDES DE UN ANCHO AL MENOS IGUAL A LA DISTANCIA QUE SEPARA DICHO ANODO (3) DE DICHA BANDA Y LOS RECUBREN SOBRE UNA ANCHO INFERIOR A LA MISMA DISTANCIA. APLICACION PARA EL REVESTIMIENTO DE ALEACIONES, PARTICULARMENTE A BASE DE ZINC, PARTICULARMENTE EN INSTALACIONES QUE PRESENTAN VARIAS CELULAS SUCESIVAS. SE MEJORA LA CALIDAD DEL REVESTIMIENTO, LO QUE FACILITA LA CONFORMACION Y EL PINTADO DE LA CHAPA REVESTIDA.
ES95401908T 1994-09-29 1995-08-18 Celda de electrodeposicion en continuo de aleaciones metalicas. Expired - Lifetime ES2112025T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9411610A FR2725215B1 (fr) 1994-09-29 1994-09-29 Cellule d'electrodeposition en continu d'alliages metalliques

Publications (1)

Publication Number Publication Date
ES2112025T3 true ES2112025T3 (es) 1998-03-16

Family

ID=9467386

Family Applications (1)

Application Number Title Priority Date Filing Date
ES95401908T Expired - Lifetime ES2112025T3 (es) 1994-09-29 1995-08-18 Celda de electrodeposicion en continuo de aleaciones metalicas.

Country Status (8)

Country Link
US (1) US5582708A (es)
EP (1) EP0704558B1 (es)
JP (1) JP3398776B2 (es)
KR (1) KR960010906A (es)
AT (1) ATE160389T1 (es)
DE (1) DE69501073T2 (es)
ES (1) ES2112025T3 (es)
FR (1) FR2725215B1 (es)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021069774A1 (es) 2019-10-07 2021-04-15 Prado Pueo Felix Instalación y procedimiento de electro-deposición con barras inter-celda activas

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19717489B4 (de) * 1997-04-25 2008-04-10 Sms Demag Ag Anordnung zur elektrogalvanischen Metallbeschichtung eines Bandes
US6174425B1 (en) * 1997-05-14 2001-01-16 Motorola, Inc. Process for depositing a layer of material over a substrate
KR19990064747A (ko) * 1999-05-06 1999-08-05 이종구 Ｎｉ-Ｆｅ 합금 박판 제조방법 및 그 장치
US6231743B1 (en) 2000-01-03 2001-05-15 Motorola, Inc. Method for forming a semiconductor device
ES2327239T3 (es) * 2003-12-23 2009-10-27 Corus Staal Bv Electrodeposicion de una banda metalica mejorada.sp.

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3692639A (en) * 1969-10-13 1972-09-19 Center Scient & Applied Res Multiplication of metal surface,by electroplating or anodic dissolution
US4128459A (en) * 1977-11-25 1978-12-05 Allied Chemical Corporation Continuous electroplating of alloy onto metallic strip
JPS5841358B2 (ja) * 1980-01-12 1983-09-12 株式会社小糸製作所 メツキ装置
JPS58181894A (ja) * 1982-04-14 1983-10-24 Nippon Kokan Kk <Nkk> 複層異種組成Ｆｅ−Ｚｎ合金電気鍍金鋼板の製造方法
JPS59160000A (ja) * 1983-02-28 1984-09-10 Kawasaki Steel Corp ストリツプ連続電気めつきのエツジオ−バ−コ−ト防止装置
JPS60121293A (ja) * 1983-12-03 1985-06-28 Kawasaki Steel Corp Ζｎ−Ｆｅ合金を主体とするΖｎ−Ｆｅ系合金電気めっき鋼板の製造方法
JPH07116636B2 (ja) * 1986-09-26 1995-12-13 川崎製鉄株式会社 ラジアル型めつきセル
GB8809750D0 (en) * 1988-04-25 1988-06-02 Beckswift Ltd Electrical apparatus
DE4139066A1 (de) * 1991-11-28 1993-06-03 Hans Josef May Vorrichtung zum elektrolytischen metallabscheiden auf metallbaendern
JP6055598B2 (ja) 2012-02-17 2016-12-27 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP7116636B2 (ja) 2018-05-11 2022-08-10 信越ポリマー株式会社 導電性高分子分散液及びその製造方法、並びに導電性フィルムの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021069774A1 (es) 2019-10-07 2021-04-15 Prado Pueo Felix Instalación y procedimiento de electro-deposición con barras inter-celda activas

Also Published As

Publication number Publication date
EP0704558A1 (fr) 1996-04-03
DE69501073T2 (de) 1998-05-07
JP3398776B2 (ja) 2003-04-21
EP0704558B1 (fr) 1997-11-19
FR2725215A1 (fr) 1996-04-05
FR2725215B1 (fr) 1996-11-22
US5582708A (en) 1996-12-10
DE69501073D1 (de) 1998-01-02
KR960010906A (ko) 1996-04-20
JPH08209394A (ja) 1996-08-13
ATE160389T1 (de) 1997-12-15

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