ES2133751T3 - Procedimiento para la deposicion electrolitica de metales a partir de electrolitos que contienen aditivos organicos. - Google Patents

Procedimiento para la deposicion electrolitica de metales a partir de electrolitos que contienen aditivos organicos.

Info

Publication number
ES2133751T3
ES2133751T3 ES95912124T ES95912124T ES2133751T3 ES 2133751 T3 ES2133751 T3 ES 2133751T3 ES 95912124 T ES95912124 T ES 95912124T ES 95912124 T ES95912124 T ES 95912124T ES 2133751 T3 ES2133751 T3 ES 2133751T3
Authority
ES
Spain
Prior art keywords
additives
organic additives
electrolyte
organic
containing organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES95912124T
Other languages
English (en)
Inventor
Reinhard Schneider
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Application granted granted Critical
Publication of ES2133751T3 publication Critical patent/ES2133751T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing of the conductive pattern
    • H05K3/241—Reinforcing of the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

LA INVENCION TRATA DE UN PROCEDIMIENTO PARA LA DEPOSICION ELECTROLITICA DE METALES A PARTIR DE ELECTROLITOS, QUE CONTIENEN ADITIVOS ORGANICOS QUE DAN PROPIEDADES FISICAS PARTICULARES. TALES ADITIVOS SE PIERDEN CONTINUAMENTE DURANTE LA GALVANIZACION, FORMANDOSE PRODUCTOS DE DESCOMPOSICION QUE SE EXTIENDEN POR TODA LA PLANTA GALVANIZACION, Y SE DEPOSITAN EN LOS OBJETOS QUE SE VAN A GALVANIZAR. POR TANTO EL OBJETO DE LA PRESENTE INVENCION ES EL EVITAR DEFECTOS EN LAS CAPAS DE DEPOSICION CAUSADOS POR LOS RESIDUOS ORGANICOS, ASEGURANDO UNA DEPOSICION CONTINUA DE METAL Y UNA CALIDAD UNIFORME DE LAS CAPAS METALICAS OBTENIDAS. EL OBJETO SE CONSIGUE LIMITANDO FISICAMENTE LOS ADITIVOS ORGANICOS A LA PARTE DEL ELECTROLITO EN LA CUAL SON IMPORTANTES. EL ELECTROLITO SE RECICLA A TRAVES DE UN FILTRO PARA QUE ESTE LIBRE DE ADITIVOS ORGANICOS. LA NUEVA DOSIFICACION DE ADITIVOS ORGANICOS SE REALIZA CON DEPENDENCIA DE SU GASTO JUSTO ANTES DE LA ZONA IMPORTANTE DEL PROCESO.
ES95912124T 1994-02-23 1995-02-23 Procedimiento para la deposicion electrolitica de metales a partir de electrolitos que contienen aditivos organicos. Expired - Lifetime ES2133751T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4405741A DE4405741C1 (de) 1994-02-23 1994-02-23 Verfahren zur elektrolytischen Abscheidung von Metallen aus Elektrolyten mit Prozeßorganik

Publications (1)

Publication Number Publication Date
ES2133751T3 true ES2133751T3 (es) 1999-09-16

Family

ID=6510942

Family Applications (1)

Application Number Title Priority Date Filing Date
ES95912124T Expired - Lifetime ES2133751T3 (es) 1994-02-23 1995-02-23 Procedimiento para la deposicion electrolitica de metales a partir de electrolitos que contienen aditivos organicos.

Country Status (7)

Country Link
EP (1) EP0746640B1 (es)
JP (1) JP3454829B2 (es)
AT (1) ATE181118T1 (es)
CA (1) CA2179904C (es)
DE (2) DE4405741C1 (es)
ES (1) ES2133751T3 (es)
WO (1) WO1995023247A2 (es)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19539865A1 (de) * 1995-10-26 1997-04-30 Lea Ronal Gmbh Durchlauf-Galvanikanlage
EP0802990A1 (de) * 1995-10-26 1997-10-29 Lea Ronal GmbH Vorrichtung zur chemischen oder elektrolytischen oberflächenbehandlung plattenförmiger gegenstände
DE19539866C2 (de) * 1995-10-26 1997-09-18 Lea Ronal Gmbh Vorrichtung zur chemischen oder elektrolytischen Oberflächenbehandlung plattenförmiger Gegenstände
AU3778999A (en) * 1998-05-01 1999-11-23 Dj Parker Company, Inc. Chemical mixing, replenishment, and waste management system
DE10314279A1 (de) * 2003-03-29 2004-10-14 Daimlerchrysler Ag Verfahren und Vorrichtung zum Steuern mindestens einer Betriebsgröße eines elektrolytischen Bades
US7851222B2 (en) 2005-07-26 2010-12-14 Applied Materials, Inc. System and methods for measuring chemical concentrations of a plating solution
US9303329B2 (en) 2013-11-11 2016-04-05 Tel Nexx, Inc. Electrochemical deposition apparatus with remote catholyte fluid management

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2729387A1 (de) * 1977-06-27 1979-01-18 Schering Ag Verfahren zur kontinuierlichen aufbereitung eines galvanischen nickelbades sowie vorrichtung zur durchfuehrung des verfahrens
DD215589B5 (de) * 1983-05-11 1994-06-01 Heinz Dr Rer Nat Liebscher Verfahren zur elektrolytischen Metallabscheidung bei erzwungener Konvektion
DE4031979A1 (de) * 1990-09-26 1992-04-02 Huang Yun Fu Vorrichtung zum entfernen von verunreinigungen, die in chrom-galvanisierbaedern enthalten sind
DE4137377A1 (de) * 1991-11-13 1993-05-19 Jatzke Rudolf Fa Verfahren, mittel und vorrichtung zum elektrodialytischen regenerieren des elektrolyten eines galvanischen bades oder dergl.
JP5232332B2 (ja) 2011-03-31 2013-07-10 ＡｖａｎＳｔｒａｔｅ株式会社 ガラス板の製造方法

Also Published As

Publication number Publication date
WO1995023247A3 (de) 1996-01-11
CA2179904C (en) 2006-01-31
EP0746640B1 (de) 1999-06-09
DE59506171D1 (de) 1999-07-15
DE4405741C1 (de) 1995-06-01
EP0746640A1 (de) 1996-12-11
JPH09509222A (ja) 1997-09-16
JP3454829B2 (ja) 2003-10-06
WO1995023247A2 (de) 1995-08-31
CA2179904A1 (en) 1995-08-31
ATE181118T1 (de) 1999-06-15

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